한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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- Pages.203-203
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- 2013
Power Dissipation in a RF Capacitively Coupled Plasma
- Tran, T.H. (Center for Vacuum Technology, Korea Research Institute of Standards and Science) ;
- You, S.J. (Center for Vacuum Technology, Korea Research Institute of Standards and Science) ;
- Kim, J.H. (Center for Vacuum Technology, Korea Research Institute of Standards and Science) ;
- Seong, D.J. (Center for Vacuum Technology, Korea Research Institute of Standards and Science) ;
- Jeong, J.R. (Department of Materials Science and Engineering, Chungnam National University)
- 발행 : 2013.02.18
초록
Low pressure plasmas play a key role in many areas including electronic, aerospace, automotive, biomedical, and toxic waste management industries, and the advantages of the plasma are well known the processing procedure is established. However, the insight behavior of the discharges remains a mystery, even though a simple geometry as capacitive discharges. In this work, we measured RF power dissipation in capacitively coupled plasma (CCP) at various experiment conditions with potential probe and RF current probe. Through the results, we will have a clearer view of the inner nature of the CCP.