• Food Science of Animal Resources
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• v.40 no.5
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• pp.831-843
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• 2020

This study investigated the potential for using vegetable powders as a natural replacement for sodium nitrite and their effects on the physicochemical characteristics of alternatively cured pork products. We analyzed pork products subjected to four treatments: control (0.015% sodium nitrite), Chinese cabbabe powder (CCP) treatment (0.4% Chinese cabbage powder), radish powder (RP) treatment (0.4% radish powder), and spinach powder (SP) treatment (0.4% spinach powder). Among the vegetable powders prepared in this study, SP had the highest (p<0.05) nitrate content, while CCP had the lowest (p<0.05). The cooking yields from these treatments were not significantly different from each other. However, the products with vegetable powders had higher (p<0.05) pH and thiobarbituric acid reactive substances values than the control. Pork products with vegetable powders also showed lower CIE L^⁎ values and higher CIE b^⁎ values than the nitrite-added control. RP treatment had similar (p>0.05) CIE a^⁎ values to the control, while SP treatment had the lowest (p<0.05) CIE a^⁎ values. The residual nitrite content was lower (p<0.05) in the vegetable powder added pork products than in the control, although nitrosyl hemochrome and total pigment contents in the CCP and RP treatments were similar (p>0.05) to those in the control. The control, CCP, and RP treatments showed curing efficiencies greater than 80%, indicating that CCP and RP would be promising potential replacements for sodium nitrite. The results of this study suggest that RP may be a suitable natural replacement for sodium nitrite to produce alternatively cured meat products, compared to other leafy vegetable powders.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1995.11a
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• pp.213-216
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• 1995

Strontium niobate, $Sr_2Nb_2O_{7}$ was prepared by the molten stilt synthesis (MSS) and the chemical coprecipitation method (CCP). Single phase $Sr_2Nb_2O_{7}$ was obtained by MSS and CCP at $750^{\circ}C$ and $800^{\circ}C$, respectively. An intermediate phase of composition, $Sr_{5}Nb_4O_{15}$, appeared at $700^{\circ}C$ when CCP method was employed. The resulting powder was observed to have finer particles and more uniform distribution of particle sizes, as compared to those obtained through the conventional method. Such powder characteristics allowed the use of a much lower sintering temperature of $1400^{\circ}C$. Grain-orientation along (0k0) direction, which is advantageous for improving dielectric properties, was also observed. The sintering characteristics and the dielectric properties prepared by MSS and CCP, were better than those by the conventional method.

• Research in Mathematical Education
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• v.20 no.1
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• pp.39-49
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• 2016

The History of Mathematics (HOM) was integrated in teaching the Cartesian Coordinate Plane (CCP) to Grade Seven learners of Moonwalk National High School using Lesson Study. After the lesson was taught, there were three valuable issues emerged: (1) HOM is a Springboard and/or a Medium of Motivation in Teaching CCP; (2) The History of CCP Opened a Wider Perspective about Its Real-life Application in the Modern World (3) Integration of History Developed a Sense of Purpose and an Appreciation of Mathematics Among Learners. Feedbacks solicited from the learners showed that they have understanding of the importance of studying Mathematics after they learned the life and contributions of Rene Descartes to Mathematics. Hence, integration of history plays a vital role in developing positive attitudes among learners towards Math.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.203-203
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• 2013

Low pressure plasmas play a key role in many areas including electronic, aerospace, automotive, biomedical, and toxic waste management industries, and the advantages of the plasma are well known the processing procedure is established. However, the insight behavior of the discharges remains a mystery, even though a simple geometry as capacitive discharges. In this work, we measured RF power dissipation in capacitively coupled plasma (CCP) at various experiment conditions with potential probe and RF current probe. Through the results, we will have a clearer view of the inner nature of the CCP.

• Journal of the East Asian Society of Dietary Life
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• v.17 no.5
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• pp.746-752
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• 2007

The purpose of this study was to investigate the effects of HACCP education on improvements of knowledge in school foodservice employees in Gyeonggi-do, particularly in Anyang, Ansan, Siheung and Hwasung City. A first and second questionnaire was answered both before and after HACCP education that was directed by a dietitian. The change in HACCP knowledge after education, as compared to before, was statistically significant(p<0.01). Specifically, the average score after education increased more than 30 points in CCP2 and CCP6, and more than 60 points in CCP3. Most of the school foodservice operations performed sanitary education once a month; however, they did not perform regular HACCP education. The fact that the level of sanitary knowledge was different after HACCP education than before suggests the possibility of improving the sanitary performance levels of foodservice employees through continual education.

• Korean Journal of Agricultural Science
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• v.38 no.3
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• pp.459-464
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• 2011

A simplified model for the colloidal calcium phosphate (CCP) nanocluster was developed from an active role of phosphate in the precipitation of casein (CN)/Ca mixtures and the composition of casein micelles (CM). The possible shape of the CCP nanocluster was selected as a tetrahedron, and we estimated that 4 CN molecules were involved in crosslinking a single CCP nanocluster. Similar values were obtained for the number of CN molecules involved in stabilizing the nanocluster when the number of CNs attached onto each nanocluster surface was deduced from the composition of CM. If one phosphoserine cluster consisted of 3 phosphoserine residues, the theoretical molecular weight and volume for the nanocluster were estimated to be 4,898 g/mol and 2.88 $nm^3$, respectively. It was also shown that the position of Ca present in our model were reasonably located to accommodate the serine phosphate in CN molecule.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.158-159
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• 2006

The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multilayer interconnection layers. In order to reduce the RC delay, low-k materials will be used for inter-metal dielectric (IMD) materials. We have developed self-consistent simulation tool that includes neutral-species transport model, based on the relaxation continuum (RCT) model. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatiotemporal steady state profile could be obtained.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.13 no.8
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• pp.3578-3585
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• 2012

The purpose of this study was to establish the critical limit at CCP (Critical Control Point) of HACCP (Hazard Analysis Critical Control Point) system for instant noodle and it was conducted at P company in Ichen(Gyeonggi-do), Korea. According to the CCP, Fried process were experimented to removal and decrease of microbiological and chemical hazards by measuring of each temperature and times. As a result, the standard plate count and pathogenic microorganism were not detected by fried processing (Temperature : $145{\pm}10^{\circ}C$, Time : $75{\pm}30$ sec). The acid value of chemical hazards produced by fried processing was able to manage, showed lower (0.2) than the legal limit (0.6). Air-borne bacterial examination results detected(3 CFU/mL, 3 CFU/mL) in the Frying Room and Steam Room. Therefore, the CCP-BC of fried process would be a great alternative to prevent and remove hazard analysis, such as general and pathogenic microorganism (E. coli O157:H7, B. cereus, Listeria monocytogenes, Salmonella spp, Sthaph. aureus etc), chemical hazard analysis. In conclusion, it suggested that HACCP plan was necessary for management standard and systematic approach in establishement of critical limit, solving the problem, method of verification, education and records management by fried processing.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.472-472
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• 2011

The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

• Proceedings of the KIPE Conference
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• 2014.07a
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• pp.97-99
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• 2014

포항가속기 연구소에서 4세대 전자를 가속시키기 위하여 RF 공급원으로 사용하는 펄스 모듈레이터의 고전압 안정도는 50ppm 이하의 고전압이 요구된다. 200 MW 모듈레이터에 공급하기 위하여 개발된 고전압 CCPS사양은 50 kV, 120 kJ/sec, 2400mA, 20ppm이하이다. XFEL용 모듈레이터는 고정밀 고전압 CCPS를 적용하여 운전하였으며 모듈레이터 사양은 400kV, 500A, 8us, 60Hz, beam voltage stability 0.005(%)이다. 본 논문에서는 개발한 고정밀 고전압 CCPS를 사용하여 시험한 모듈레이터의 시험 결과에 대하여 발표하고자 한다.