• Title/Summary/Keyword: c-si solar cell

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The Effects of Composition on the Interface Resistance in Bi-System Glass Frit (Bi 계열 Glass Frit 조성이 계면저항에 미치는 영향)

  • Kim, In Ae;Shin, Hyo Soon;Yeo, Dong Hun;Jeong, Dae Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.12
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    • pp.858-862
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    • 2013
  • The front electrode should be used to make solar cell panel so as to collect electron. The front electrode is used by paste type, printed on the Si-solar cell wafer and sintered at about $800^{\circ}C$. The paste is composed Ag powder and glass frit which make the ohmic contact between Ag electrode and n-type semiconductor layer. From the previous study, the Ag electrodes which used two commercial glass frit of Bi-system were so different on the interface resistance. The main composition of them was Bi-Zn-B-Si-O and few additives added in one of them. In this study, glass frit was made with the ratio of $Bi_2O_3$ and ZnO on the main composition, and then paste using glass frit was prepared respectively. And, also, the paste using the glass frit added oxide additives were prepared. The change of interface resistance was not large with the ratio of $Bi_2O_3$ and ZnO. In the case of G6 glass frit, 78 wt% $Bi_2O_3$ addition, the interface resistance was $190{\Omega}$ and most low. In the glass frit added oxide, the case of Ca increased over 10 times than it of G6 glass frit on the interface resistance. It was thaught that after sintering, Ca added glass frit was not flowed to the interface between Ag electrode and wafer but was in the Ag electrode.

The Properties of Passivation Films on Al2O3/SiNX Stack Layer in Crystalline Silicon Solar Cells (결정질 실리콘 태양전지의 Al2O3/SiNX 패시베이션 특성 분석)

  • Hyun, Ji Yeon;Song, In Seol;Kim, Jae Eun;Bae, Soohyun;Kang, Yoonmook;Lee, Hae-Seok;Kim, Donghwan
    • Current Photovoltaic Research
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    • v.5 no.2
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    • pp.63-67
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    • 2017
  • Aluminum oxide ($Al_2O_3$) film deposited by atomic layer deposition (ALD) is known to supply excellent surface passivation properties on crystalline Si surface. The quality of passivation layer is important for high-efficiency silicon solar cell. double-layer structures have many advantages over single-layer materials. $Al_2O_3/SiN_X$ passivation stacks have been widely adopted for high- efficiency silicon solar cells. The first layer, $Al_2O_3$, passivates the surface, while $SiN_X$ acts as a hydrogen source that saturates silicon dangling bonds during annealing treatment. We explored the properties on passivation film of $Al_2O_3/SiN_X$ stack layer with changing the conditions. For the post annealing temperature, it was found that $500^{\circ}C$ is the most suitable temperature to improvement surface passivation.

Varying Refractive Index of Antireflection Layer for Crystalline Si Solar Cell

  • Yeo, In-Hwan;Park, Ju-Eok;Kim, Jun-Hui;Jo, Hae-Seong;Im, Dong-Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.702-702
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    • 2013
  • 태양전지에서 SiNX층은 반사방지막 역할과 태양전지 소자 보호 역할 2가지를 동시에 하고 있다. 태양전지에서 반사방지막은 굴절률 1.97, 두께 76 nm가 이론적으로 최적의 상태이다. PECVD장비를 이용하여 SiNx 층을 증착하였다. SiNX층 증착 시에 RF 파워와 혼합 가스를 변화한 후 굴절률을 측정하였다. RF 파워는 100~400 W로 변화시켰고 혼합가스 변화는 SiH4가스와 N2, H2, N2+H2 가스 각각을 같이 넣어 주면서 증착하였다. SiNX 가스 자체에 N2가 80%섞여 있는 가스를 사용하기 때문에 SiH4 가스자체 만으로도 SiNx층을 형성 할 수 있다. RF파워 300 W, SiH4 50 sccm, 기판 온도 $300^{\circ}C$, 공정시간 63초에서 굴절률 1.965, 두께 76 nm를 갖는 SiNx층을 형성 할 수 있었고 개방전압: 0.616 V, 전류밀도: 37.78 mA/$cm^2$, 충실도:76.59%, 효율: 17.82%로 가장 높은 효율을 얻을 수 있었다.

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The characteristics of Efficiency through HIT layer thickness (HIT 층 두께 변화를 통한 태양전지 효율 특성)

  • Kim, Moo-Jung;Pyeon, Jin-Ho;Yi, Jun-Sin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.232-232
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    • 2010
  • Simulation Program (AFORS-HET 2.4.1) was used, include the basic structure of crystalline silicon thin film as above, under the intrinsic a-Si:H films bonded symmetrical structure (Symmetrical structure) were used. The structure of ITO, a-Si p-type, intrinsic a-Si, c-Si, intrinsic a-Si, a-Si n-type, metal (Al) layer has one of the seven. When thickness for each layer was given the change, the changes of a-Si p-type layer and the intrinsic a-Si layer on top had an impact on efficiency. Efficiency ratio of p-type a-Si:H layer thickness was sensitive to, especially a-Si: H layer thickness is increased in a rapid decrease in Jsc and FF, and efficiency was also decreased.

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Reliability of a Cobalt Silicide on Counter Electrodes for Dye Sensitized Solar Cells (코발트실리사이드를 이용한 염료감응형 태양전지 상대전극의 신뢰성 평가)

  • Kim, Kwangbae;Park, Taeyeul;Song, Ohsung
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.18 no.4
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    • pp.1-7
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    • 2017
  • Cobalt silicide was used as a counter electrode in order to confirm its reliability in dye-sensitized solar cell (DSSC) devices. 100 nm-Co/300 nm-Si/quartz was formed by an evaporator and cobalt silicide was formed by vacuum heat treatment at $700^{\circ}C$ for 60 min to form approximately 350 nm-CoSi. This process was followed by etching in $80^{\circ}C$-30% $H_2SO_4$ to remove the cobalt residue on the cobalt silicide surface. Also, for the comparison against Pt, we prepared a 100 nm-Pt/glass counter electrode. Cobalt silicide was used for the counter electrode in order to confirm its reliability in DSSC devices and maintained for 0, 168, 336, 504, 672, and 840 hours at $80^{\circ}C$. The photovoltaic properties of the DSSCs employing cobalt silicide were confirmed by using a simulator and potentiostat. Cyclic-voltammetry, field emission scanning electron microscopy, focused ion beam scanning electron microscopy, and energy dispersive spectrometry analyses were used to confirm the catalytic activity, microstructure, and composition, respectively. The energy conversion efficiency (ECE) as a function of time and ECE of the DSSC with Pt and CoSi counter electrodes were maintained for 504 hours. However, after 672 hours, the ECEs decreased to a half of their initial values. The results of the catalytic activity analysis showed that the catalytic activities of the Pt and CoSi counter electrodes decreased to 64% and 57% of their initial values, respectively(after 840 hours). The microstructure analysis showed that the CoSi layer improved the durability in the electrolyte, but because the stress concentrates on the contact surface between the lower quartz substrate and the CoSi layer, cracks are formed locally and flaking occurs. Thus, deterioration occurs due to the residual stress built up during the silicidation of the CoSi counter electrode, so it is necessary to take measures against these residual stresses, in order to ensure the reliability of the electrode.

Using Spatial Data and Land Surface Modeling to Monitor Evapotranspiration across Geographic Areas in South Korea (공간자료와 지면모형을 이용한 면적증발산 추정)

  • Yun J. I.;Nam J. C.;Hong S. Y.;Kim J.;Kim K. S.;Chung U.;Chae N. Y.;Choi T. J
    • Korean Journal of Agricultural and Forest Meteorology
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    • v.6 no.3
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    • pp.149-163
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    • 2004
  • Evapotranspiration (ET) is a critical component of the hydrologic cycle which influences economic activities as well as the natural ecosystem. While there have been numerous studies on ET estimation for homogeneous areas using point measurements of meteorological variables, monitoring of spatial ET has not been possible at landscape - or watershed - scales. We propose a site-specific application of the land surface model, which is enabled by spatially interpolated input data at the desired resolution. Gyunggi Province of South Korea was divided into a regular grid of 10 million cells with 30m spacing and hourly temperature, humidity, wind, precipitation and solar irradiance were estimated for each grid cell by spatial interpolation of synoptic weather data. Topoclimatology models were used to accommodate effects of topography in a spatial interpolation procedure, including cold air drainage on nocturnal temperature and solar irradiance on daytime temperature. Satellite remote sensing data were used to classify the vegetation type of each grid cell, and corresponding spatial attributes including soil texture, canopy structure, and phenological features were identified. All data were fed into a standalone version of SiB2(Simple Biosphere Model 2) to simulate latent heat flux at each grid cell. A computer program was written for data management in the cell - based SiB2 operation such as extracting input data for SiB2 from grid matrices and recombining the output data back to the grid format. ET estimates at selected grid cells were validated against the actual measurement of latent heat fluxes by eddy covariance measurement. We applied this system to obtain the spatial ET of the study area on a continuous basis for the 2001-2003 period. The results showed a strong feasibility of using spatial - data driven land surface models for operational monitoring of regional ET.

Hydrogenated Amorphous Silicon Thin Films as Passivation Layers Deposited by Microwave Remote-PECVD for Heterojunction Solar Cells

  • Jeon, Min-Sung;Kamisako, Koichi
    • Transactions on Electrical and Electronic Materials
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    • v.10 no.3
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    • pp.75-79
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    • 2009
  • An intrinsic silicon thin film passivation layer is deposited by the microwave remote-plasma enhanced chemical vapor deposition at temperature of $175^{\circ}C$ and various gas ratios for solar cell applications. The good quality amorphous silicon films were formed at silane $(SiH_4)$ gas flow rates above 15 seem. The highest effective carrier lifetime was obtained at the $SiH_4$, flow rate of 20 seem and the value was about 3 times higher compared with the bulk lifetime of 5.6 ${\mu}s$ at a fixed injection level of ${\Delta}n\;=\;5{\times}10^{14}\;cm^{-3}$. An annealing treatment was performed and the carrier life times were increased approximately 5 times compared with the bulk lifetime. The optimal annealing temperature and time were obtained at 250 $^{\circ}C$ and 60 sec respectively. This indicates that the combination of the deposition of an amorphous thin film at a low temperature and the annealing treatment contributes to the excellent surface and bulk passivation.

Analysis of the residual stress as the thickness of thin films and substrates for flexible CIGS solar cell (연성 CIGS 태양전지의 기판과 박막층의 두께에 따른 잔류응력해석)

  • Han, Yoonho;Lee, Minsu;Um, Hokyung;Kim, Donghwan;Yim, Taihong
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.05a
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    • pp.116.2-116.2
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    • 2011
  • 연성 CIGS 태양전지를 제작하기 위해서는 휘어지는 연성 기판재의 적용이 반드시 필요하다. 상용되는 연성 기판재로는 플라스틱, 폴리이미드, 금속재가 있다. 그러나 플라스틱과 폴리이미드는 고효율의 CIGS 흡수층을 제조하기 위한 $500{\sim}600^{\circ}C$의 공정에 접합하지 못하다. 금속 기판재의 경우는 몰리브데늄, 알루미늄, 티타늄, 크롬강, 스테인레스강, 합금재 등이 있다. 이러한 금속 기판재 중에서 Fe-Ni 합금재는 Ni 함량의 변화에 따라 기계적, 자기적, 열팽창 특성이 다르게 나타나는 것으로 알려져 있다. 선행 연구에서 CIGS 태양전지의 기판재로 열팽창 계수가 박막층과 유사한 SUS400번 계열과 Fe-52Ni이 적합하다는 것을 확인 하였다. 따라서 본 연구에서는 유한요소해석(Finite element analysis) 프로그램인 Algor를 이용하여 CIGS solar cell을 설계하고 Fe-52Ni 기판재와 절연층인 SiO2, 흡수층인 CIGS의 두께에 따른 Cell의 잔류응력을 해석하였다.

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The Effect of SiON Film on the Blistering Phenomenon of Al2O3 Rear Passivation Layer in PERC Solar Cell

  • Jo, Guk-Hyeon;Jang, Hyo-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.364.1-364.1
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    • 2014
  • 고효율 태양전지로 가기 위해서는 태양전지의 후면 패시베이션은 중요한 역할을 한다. 후면 패시베이션 막으로 사용되는 $Al_2O_3$ 막은 $Al_2O_3/Si$ 계면에서 높은 화학적 패시베이션과 Negative Fixed Charge를 가지고 있어 적합한 Barrier막으로 여겨진다. 하지만 이후에 전면 Metal paste의 소성 공정에 의해 $800^{\circ}C$이상 온도를 올려주게 됨에 따라 $Al_2O_3$ 막 내부에 결합되어 있던 수소들이 방출되어 blister가 생성되고 막 질은 떨어지게 된다. 우리는 blister가 생성되는 것을 방지하기 위한 방법으로 PECVD 장비로 SiNx를 증착하는 공정 중에 $N_2O$ 가스를 첨가하여 SiON 막을 증착하였다. SiON막은 $N_2O$가스량을 조절하여 막의 특성을 변화시키고 변화에 따라 소성시 막에 미치는 영향에 대하여 조사하였다. 공정을 위해 $156{\times}156mm2$, $200{\mu}m$, $0.5-3.0{\Omega}{\cdot}cm$ and p-type 단결정 실리콘 웨이퍼를 사용하였고, $Al_2O_3$ 막을 올리기 전에 RCA Cleaning 실행하였다. ALD 장비를 통해 $Al_2O_3$ 막을 10nm 증착하였고 RF-PECVD 장비로 SiNx막과 SiON막을 80nm 증착하였다. 소성로에서 $850^{\circ}C$ ($680^{\circ}C$) 5초동안 소성하고 QSSPC를 통해 유효 반송자 수명을 알아보았다.

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Recent Development of High-efficiency Silicon Heterojunction Technology Solar Cells (실리콘 이종접합 태양전지 개발동향)

  • Lee, Ahreum;Yoo, Jinsu;Park, Sungeun;Park, Joo Hyung;Ahn, Seungkyu;Cho, Jun-Sik
    • Current Photovoltaic Research
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    • v.9 no.4
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    • pp.111-122
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    • 2021
  • Silicon heterojunction technology (HJT) solar cells have received considerable attention due to advantages that include high efficiency over 26%, good performance in the real world environment, and easy application to bifacial power generation using symmetric device structure. Furthermore, ultra-highly efficient perovskite/c-Si tandem devices using the HJT bottom cells have been reported. In this paper, we discuss the unique feature of the HJT solar cells, the fabrication processes and the current status of technology development. We also investigate practical challenges and key technologies of the HJT solar cell manufacturers for reducing fabrication cost and increasing productivity.