• Journal of Sensor Science and Technology
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• v.16 no.6
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• pp.457-461
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• 2007

This paper describes the characteristics of poly (polycrystalline) 3C-SiC grown on $SiO_{2}$ and AlN substrates, respectively. The crystallinity and the bonding structure of poly 3C-SiC grown on each substrate were investigated according to various growth temperatures. The crystalline quality of poly 3C-SiC was improved from resulting in decrease of FWHM (full width half maximum) of XRD and FT-IR by increasing the growth temperature. The minimum growth temperature of poly 3C-SiC was $1100^{\circ}C$. The surface chemical composition and the electron mobility of poly 3C-SiC grown on each substrate were investigated by XPS and Hall Effect, respectively. The chemical compositions of surface of poly 3C-SiC films grown on $SiO_{2}$ and AlN were not different. However, their electron mobilities were $7.65{\;}cm^{2}/V.s$ and $14.8{\;}cm^{2}/V.s$, respectively. Therefore, since the electron mobility of poly 3C-SiC films grown on AlN buffer layer was two times higher than that of 3C-SiC/$SiO_{2}$, a AlN film is a suitable material, as buffer layer, for the growth of poly 3C-SiC thin films with excellent properties for M/NEMS applications.

• Journal of the Korean Ceramic Society
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• v.34 no.7
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• pp.781-789
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• 1997

Pressure sintered SiC specimens were joined using MgO-Al2O3-SiO2 (MAS) glass which has a thermal expansion coefficient similar to that of SiC. MAS melt showed excellent behavior of wetting on the SiC substrate over 148$0^{\circ}C$, and the wettability was much influenced by the joining atmosphere. The joining was conducted at 150$0^{\circ}C$ for 30 min in Ar atmosphere. The flexural strength of the joined specimen shows 342~380 MPa up to 80$0^{\circ}C$, which is almost the same as that of as-recieved SiC specimen. However, the flexural strength of the joined specimen decreased to about 80 MPa at 90$0^{\circ}C$ due to softening of the glass melt. The analyses od XRD and WDS show that the reaction between the SiC specimen and the MAS melt produces the oxycarbide glass, which had a high strength and a good stability at high temperatures.

• Korean Journal of Crystallography
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• v.5 no.2
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• pp.85-92
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• 1994

Ferroelectric Bi4Ti3012 thin films have been grown on LaAlO(001) by Pulsed-laser deposition. Phase formation and structural films prepared of the films prepared at varigus deposition temperatures are investigated using x-ray diffraction The film grown at 740℃ shows epitaxial growth behavior with c-akis normal to the substrate. N2tBmstiucCures of Bi4Ti3012/YBa2Cu307-x/LaAIO3(001) have been in-situ grown. Even though the a-and b-axes of the Yba2Cu307-x layer show epitaxial growth behavior.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.7 no.2
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• pp.216-223
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• 1997

By using aluminum iso - propoxide($Al(OC_3H_7)_3$, AIP), $Al_2O_3$thin films were deposited on (100) single crystal silicon wafer by MOCVD method. The compositions of deposited films were analysed by electron spectroscopy for chemical analyse(ESCA). The morphology and thickness of the deposited films were characterized by scanning electron microscopy. The refractive index and C-V propertied were studied by using ellipsometery and HP4192A, respectively. From the results of ESCA and SEM analysis at low pressure, more uniform and stable stoichiometric film can be obtained compared with that of atmospheric pressure. For optical film usage, required refractive index can be obtained by heat treatment of deposited film. To improve C -V characteristics in NMOS device, it is requred to control OH-which is mobile charge in oxide, to form $SiO_2$ layer between $Al_2O_3$ and Si by heat treatment.

• Composites Research
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• v.13 no.5
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• pp.31-36
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• 2000

The effect of several important processing variables was investigated on formation of porous mullite with acicular microstructure. Experimental results demonstrated that microstructure and porosity of porous mullite are depending on concentration of $AlF_3$, holding time at $900^{\circ}C$ and starting material. Acicular mullite was developed by increasing amount of $AlF_3$ and holding time at $900^{\circ}C$. Mullite began to be formed at $1200^{\circ}C$ and the resultant microstructure sintered at this temperature is similar to those at higher temperatures. Porosity increases with increase in amounts of $AlF_3$ and holding time at $900^{\circ}C$ . Therefore, it is found that microstructure of reaction-sintered porous mullite can be controlled by governing the amount of $AlF_3$ and holding time at $900^{\circ}C$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07b
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• pp.648-651
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• 2003

Fine $LaAlO_3$ powders were successfully synthesized from $La_2O_3$ and ${\gamma}-Al_2O_3$ powders milling for $10{\sim}50hrs$ via the high energy milling technique (mechanochemical methode) in room temperature and air. The particle size of $LaAlO_3$ powder were estimated from XRD patterns and SEM images to be $160{\sim}180nm$. The $LaAlO_3$ ceramics are derived for the synthesized powders (milling for 10, 30 and 50hrs) by sintering at $1400^{\circ}C$. The micrographs of grains showed a agglomeration and the degree of agglomeration increased with the milling time. The $LaAlO_3$ made from synthesized powders milling for 30hrs can be sintered to 98% of theoretical density at $1,400^{\circ}C$ for 4hrs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.05a
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• pp.653-656
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• 1999

Effect of $Al_2O_3$ Additives on Microwave Dielectric Properties of $0.15(Ba_{0.85}Ca_{(0.15-y)}Mg_y)$-0.125 $Nd_2O_3-0.60TiO_2+10wt%Bi_zO_3$ (y=0.05, 0.08) Ceramics was investigated. To control of $\tau\;{f}$ on microwave dielectric properties of $0.15(Ba_{0.85}Ca_{(0.15-y)}Mg_y)$-0.125 $Nd_2O_3-0.60TiO_2+10wt%Bi_zO_3$ ceramics $Al_2O_3$ was doped in the composition range of 0 to 0.15 wt%. As a result, dielectric constant was decreased from 94 to 80 but $Q\cdot{f}_0$ value was increased from 4980 to 5210 GHz and temperature coefficient of resonant frequency can be controlled from +9 to -10$ppm^\circ{C}$ as an increase of$Al_2O_3$ doping concentration. Especially, a new microwave dielectric material having $\varepsilon\;_r=84,\;Q\cdot{f}_0=5120\;GHz\;and\;\tau_f=0\;ppm/^\circ{C}$ was obtained at $Al_2O_3$ doping concentration of 0.08 wt%.

• Journal of Magnetics
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• v.1 no.1
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• pp.46-50
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• 1996

Highly oriented ${BaFe_{12}{O_{19}$ films were obtained by a KrF excimer laser ablation technique using (110)$(012){Al_2}{O_3}$(001)$(012){Al_2}{O_3}$ and $(012){Al_2}{O_3}$ substrates, respectively.The degree of alignment of more than 95% were achieved for (100) on (110)$(012){Al_2}{O_3}$ and (001)$(001){Al_2}{O_3}$ planes, and heteroepitaxial films of (114) on (012)$(012){Al_2}{O_3}$were possible to be grown with a lasing energy density of 6.67 J/$cm^2$ at an oxygen partial pressure ${PO_2}$ of 900 mTorr. The best magnetic properties were obtained from the as-deposited films at the substrate temperature of $700^{\circ}C$, and post annealing treatment was not needed to enhance the magnetic properties. Experimentally saturated magnetization ($4_pi M_S$) of 3600~3800 Gauss and coercivities $(H_c)$ of 3050~3080 Oe, which approach 85% of those of Ba-ferrite bulk composed of single domain particles, were obtained in this study.

• Korean Journal of Materials Research
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• v.11 no.4
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• pp.278-282
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• 2001

The recombination motion of Partial dislocations on basal slip (0001) 1/3<1120> in sapphire ($\alpha$-Al$_2$$O_3$) single crystals was investigated using the four-point bending test with the prism plane (1120) samples. These bending experiments were carried but in the temperature range from $1200^{\circ}C$ to $1400^{\circ}C$ at various engineering stresses 90MPa, 120MPa, and 150MPa. During these tests it was shown that an incubation time was needed for basal slip to be activated. The activation energy for the incubation time was 5.6-6.0eV in the temperature range from $1200^{\circ}C$ to $1400^{\circ}C$. The incubation time is believed to be related to recombination of climb dissociated partial dislocations via self-climb. In addition, these activation energies are nearly same as those for oxygen self-diffusion in $Al_2$$O_3$ (approximately 6.3 eV). Thus, the recombination of the two partial dislocations would be possibly controlled by oxygen diffusion on the stacking fault between the partials.

• Journal of the Korean Ceramic Society
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• v.23 no.1
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• pp.51-59
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• 1986

It was the first time the MgO-C brick was developed for the lining materials in the hot spots in electric are furnace in 1972. MgO-C brick is high registant to thermal and structural spalling. Futhermore for the reason that carbon is hard to react with slag and MgO is high fireproof MgO-C brick shows a high corrosion registance to slag attack compared with conventional basic refractories. Owing to their excellent properties the use of MgO-C refractories are being developed widely in the field of shaped refractories and even in that of monolithic refractories. In this paper the oxidation of carbon the infiltration of slag into the brick texture and effects of additions were investigated. The results obtained were as follows : 1) The use of fused MgO-clinker and high purity carbon as raw materials increased the corosion registance and hot modulus of rupture of MgO-C brick. 2) As the oxidation reaction of the carbon proceeded the slag infiltrated into the brick texture. And then the slag components reacted with the MgO grains and formed low melting point compounds particulary CaO.MgO.$SiO_2$ and 3CaO.MgO.$2SiO_2$ that resulted in the wear of the brick. 3) It is recongnized the Al, Si, $B_3C$ effects on the oxidation registant properties of MgO-C brick by contribu-ting to the decrease of permeability according to the formation of $Al_4C_3$, SiC, $B_2O_3$ and the decrease of open pores relating to the formation of MgO.Al2O3, $SiO_2$, 3MgO.$B_2O_3$ at the decarbonized layer.