• Title/Summary/Keyword: bottom-contact

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Design of the Air Pressure Pick-up Head for Non-Contact Wafer Gripper (비접촉식 웨이퍼 그리퍼용 공압 파지식 헤드 설계)

  • Kim, Joon-Hyun
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.21 no.3
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    • pp.401-407
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    • 2012
  • The recent manufacturing process in the thin wafers and flat panel necessitate new approaches to reduce handling fragile and surface-sensitive damage of components. This paper presents a new pneumatic levitation for non-contact handling of parts and substrates. This levitation can achieve non-contact handling by blowing air into an air pressure pick-up head with radial passages to generate a negative pressure region. Negative pressure is caused by the radial air flow by nozzle throat and through holes connecting to the bottom region. The numerical analysis deals with the levitational motion with different design factors. The dynamic motion is examined in terms of force balance(dynamic equilibrium) occurring to the flow field between two objects. The stable equilibrium position and the safe separation distance are determined by analyzing the local pressure distribution in the fluid motion. They make considerable design factors consisting the air pressure pick-up head. As a result, in case that the safe separation distance is beyond 0.7mm, the proposed pick-up head can levitate stably at the equilibrium position. Furthermore, it can provide little effect of torque, and obtain more wide picking region according to the head size.

Optimal Design of Thin Type Ultrasonic Motor (박형 초음파모터의 최적 설계)

  • Jeong, Seong-Su;Jun, Ho-Ik;Park, Tae-Gone
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.4
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    • pp.335-340
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    • 2008
  • In this study, novel structured thin ultrasonic rotary motor has been proposed. Ultrasonic motors are based on an elliptical motion on the surface of elastic body. Thin brass plate was used as a cross shaped vibrator and eight ceramic plates were attached on upper side and bottom side of the brass plate. From the thin stator, elliptical displacements of the four contact tips were obtained. To find the optimal size of the stator, motions of the motors were simulated using ATILA by changing length, width and thickness of the ceramics. The stators had commonly three resonance peaks and contact tips of the stator moved on tangential or normal trajectories at these resonance peaks. The maximum displacements at the resonance peaks were compared. As results, maximum displacements of the contact tips were obtained at the length of 16 mm, width of 6 mm and thickness of 0.4 mm. Changes of the resonance frequencies were inversely proportional to the length of ceramic and proportional to the width of ceramic. The motor was fabricated by using the designed stator. And, the characteristics of the motor were compared with the simulated results. When the motor was fabricated with these results, speed fo 935 rpm was obtained by input voltage of 25 Vrms at 93.5 kHz.

Isothermal Characteristics of a Rectangular Parallelepiped Sodium Heat Pipe

  • Boo Joon Hong;Park Soo Yong
    • Journal of Mechanical Science and Technology
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    • v.19 no.4
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    • pp.1044-1051
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    • 2005
  • The isothermal characteristics of a rectangular parallelepiped sodium heat pipe were inves­tigated for high-temperature applications. The heat pipes was made of stainless steel of which the dimension was $140\;m\;(L)\;{\times}\;95m\;(W)\;{\times}\;46 m\;(H)$ and the thickness of the container was 5 mm. Both inner surfaces of evaporator and condenser were covered with screen meshes to help spread the liquid state working fluid. To provide additional path for the working fluid, a lattice structure covered with screen mesh wick was inserted in the heat pipe. The bottom surface of the heat pipe was heated by an electric heater and the top surface was cooled by circulating coolant. The concern in this study was to enhance the temperature uniformity at the bottom surface of the heat pipe while an uneven heat source up to 900 W was in contact. The temperature distribution over the bottom surface was monitored at more than twenty six locations. It was found that the operating performance of the sodium heat pipe was critically affected by the inner wall temperature of the condenser region where the working fluid may be changed to a solid phase unless the temperature was higher than its melting point. The maximum temperature difference across the bottom surface was observed to be $114^{\circ}C$ for 850 W thermal load and $100^{\circ}C$ coolant inlet temperature. The effects of fill charge ratio, coolant inlet temperature and operating temperature on thermal performance of heat pipe were analyzed and discussed.

Shear strength of match-cast-free dry joint in precast girders

  • Jiang, Haibo;Feng, Jiahui;Xiao, Jie;Chen, Mingzhu;Liang, Weibin
    • Computers and Concrete
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    • v.26 no.2
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    • pp.161-173
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    • 2020
  • Shear keys in precast concrete segmental bridges (PCSBs) are usually match-casting which is very labour intensive. In this research, an innovative match-casting-free construction was proposed by leaving small gap between the convex and the concave castellated shear keys in the joints of PCSBs. Specimen experiment, shear strength analysis and numerical simulation were conducted, investigating the loading performance of this new type of dry joints, the gap dry joints. Compared with match-casting joint specimens, it has been found from experiment that shear capacity of gap joint specimens significantly decreased ranging from 17.75% to 42.43% due to only partially constrained and contacted in case of gap dry joints. Through numerical simulation, the effects of bottom contacting location, the heights of the gap and the shear key base were analyzed to investigate strength reduction and methods to enhance shear capacity of gap joint specimens. Numerical results proved that shear capacity of gap dry joints under full contact condition was higher than that under partial contact. In addition, left contact destroyed the integrity of shear keys, resulting in significant strength reduction. Larger shear key base remarkably increased shear capacity of the gap joint. Experimental tests indicated that AASHTO provision underestimated shear capacity of the match-casting dry joint specimens, while the numerical results for the gap dry joint showed that AASHTO provision underestimated shear capacity of full contact specimens, but overestimated that of left contact specimens.

The Separation of the Vane and the Camring at high speed of an Oil Hydraulic Vane Pump for Automobile (자동차용 유압베인펌프의 고속에서 베인과 캠링간의 이간현상)

  • Cho, Ihn-Sung;Baek, Il-Hyun;Jung, Jae-Youn
    • Tribology and Lubricants
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    • v.26 no.2
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    • pp.136-141
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    • 2010
  • In an oil hydraulic vane pump for an automobile, it is very important that the vane doesn't separate from the camring inner race during the operation of the vane pump. The vane generally has not only the oil hydraulic force acting on the bottom face to contact to camring inner race but there is also an inertial force and viscous force. Because the oil hydraulic force is much larger than the other forces, the contact state between the vane tip and the camring inner race is sufficient. However, the contact state between the vane tip and the camring inner race is only affected by the inertial and viscous forces during the delivery of the vane pump, because the oil hydraulic force acting on the vane is in equilibrium. If the inertial force is larger than the viscous force, which happens when the vane is separated from the camring inner race, the delivery of the vane pump can become unstable or the volume efficiency can become decrease rapidly. Therefore, in this paper, the state of the contact between the vane and the camring is considered. The results show that the rotating speed of the shaft, the operating temperature of the oil, the clearance between the vane and the rotor, and the mass of the vane exert a great influence on the state of the contact between the vane and the camring.

Research on the Bottom Boundary Line on the Southeast Area of the Chungcheongdo Dialect in Yeongdong (영동지역어내의 충청방언 남동부 하한선 연구)

  • Seong, Hee-Jae
    • Lingua Humanitatis
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    • v.8
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    • pp.265-289
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    • 2006
  • The geographical characteristics of Yeongdong(永同) the southernmost part of the Chungcheongbukdo province, has attracted attention among the academic circle as one of the dialectal contact regions since it adjoins the Gyeongsang and Jeolla dialects. Unlike the local language in Mooju (Jellado dialect) adjacent to the Southwest part, the local language in Yeongdong is quite different from that of Kimcheon (Gyeongsang dialect). More specifically, it is noteworthy that the boundary line of the Gyeongsang dialect is found in this region, which is different from the administrative division. In other words, the local language in Yeongdong is divided into the Chungcheong dialect and the Gyeongsang dialect, and furthermore each dialect region still has the characteristics of the other region's dialect. For example, the phonological structure of Yeongdong Chungcheongdo dialect has very unique characteristics of the fudged dialect, which is seemingly influenced by the Gyeongsang dialect. The present study is to define the bottom boundary line of the southeast area of the Chungcheong dialect by identifying the boundary line between the Gyeongsang dialect and the Chungcheong dialect, and to clarify its specific sound system generated by the contact of these two dialects. For this, the author collected and analyzed data of the local language around Yeongdong and adjacent areas. It was found that Cheongwha-ri, Deokjin-ri, and Sanjeo-ri at Yeongsan-myeon, and Mugeunjeom, Sangga-ri, and Jungga-ri at Yeongdong-eup, among the regions that belongs to Chungcheong dialect within the local language of Yeongdong, show the characteristics of the Gyeongsang dialect. Accordingly, the western areas of these villages become the southeast boundary line of the Chungcheong dialect. Also, the unique phonological characteristics of the Yeongdong Chungcheong dialect is affected by the Gyeongsang dialect, among which "rhythms, y deletion, nasal phoneme deletion, and w deletion" appeared. It is thought to be the unique fudged dialectal phenomenon that appeared only in this region. The research result is expected to be of some help in finding out various aspects of dialectal contacts as well as clarifying the phonological features of the local language in Yeongdong, and thereby contributing to exact divisioning of the Chungcheong dialect.

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UY Ursae Majoris: An A-Subtype W UMa System with a Very Large Fill-Out Factor and an Extreme Mass Ratio

  • Kim, Chun-Hwey;Song, Mi-Hwa;Park, Jang-Ho;Jeong, Min-Ji;Kim, Hye-Young;Han, Cheongho
    • Journal of Astronomy and Space Sciences
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    • v.36 no.4
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    • pp.265-281
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    • 2019
  • We present new BVRI light curves of UY UMa with no O'Connell effect and a flat bottom secondary eclipse. Light curve synthesis with the Wilson-Devinney code gives a new solution, which is quite different from the previous study: UY UMa is an A-subtype over-contact binary with a small mass ratio of q = 0.21, a high inclination of 81°.4, a small temperature difference of ΔT=18°, a large fill-out factor of f = 0.61, and a third light of approximately 10% of the total systemic light. The absolute dimensions were newly determined. Seventeen new times of minimum light have been calculated from our observations. The period study indicates that the orbital period has intricately varied in a secular period increase in which two cyclical terms with periods of 12y.0 and 46y.3 are superposed. The secular period increase was interpreted to be due to a conservative mass transfer of 2.68 × 10-8 M/yr from the less massive to the more massive star. The cyclical components are discussed in terms of double-light time contributions from two additional bound stars. The statistical relations of Yang & Qian (2015) among the physical parameters of 45 deep, low mass ratio contact binaries were revisited by using the physical parameters of UY UMa and 25 Kepler contact binaries provided by Şenavci et al. (2016).

Selective etching of SiO2 using embedded RF pulsing in a dual-frequency capacitively coupled plasma system

  • Yeom, Won-Gyun;Jeon, Min-Hwan;Kim, Gyeong-Nam;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.136.2-136.2
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    • 2015
  • 반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

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Investigation of Effective Contact Resistance of ZTO-Based Thin Film Transistors

  • Gang, Yu-Jin;Han, Dong-Seok;Park, Jae-Hyeong;Mun, Dae-Yong;Sin, So-Ra;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.543-543
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    • 2013
  • Thin-film transistors (TFTs) based on oxide semiconductors have been regarded as promising alternatives for conventional amorphous and polycrystalline silicon TFTs. Oxide TFTs have several advantages, such as low temperature processing, transparency and high field-effect mobility. Lots of oxide semiconductors for example ZnO, SnO2, In2O3, InZnO, ZnSnO, and InGaZnO etc. have been researched. Particularly, zinc-tin oxide (ZTO) is suitable for channel layer of oxide TFTs having a high mobility that Sn in ZTO can improve the carrier transport by overlapping orbital. However, some issues related to the ZTO TFT electrical performance still remain to be resolved, such as obtaining good electrical contact between source/drain (S/D) electrodes and active channel layer. In this study, the bottom-gate type ZTO TFTs with staggered structure were prepared. Thin films of ZTO (40 nm thick) were deposited by DC magnetron sputtering and performed at room temperature in an Ar atmosphere with an oxygen partial pressure of 10%. After annealing the thin films of ZTO at $400^{\circ}C$ or an hour, Cu, Mo, ITO and Ti electrodes were used for the S/D electrodes. Cu, Mo, ITO and Ti (200 nm thick) were also deposited by DC magnetron sputtering at room temperature. The channel layer and S/D electrodes were defined using a lift-off process which resulted in a fixed width W of 100 ${\mu}m$ and channel length L varied from 10 to 50 ${\mu}m$. The TFT source/drain series resistance, the intrinsic mobility (${\mu}i$), and intrinsic threshold voltage (Vi) were extracted by transmission line method (TLM) using a series of TFTs with different channel lengths. And the performances of ZTO TFTs were measured by using HP 4145B semiconductor analyzer. The results showed that the Cu S/D electrodes had a high intrinsic field effect mobility and a low effective contact resistance compared to other electrodes such as Mo, ITO and Ti.

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Application of Pulsed Chemical Vapor Deposited Tungsten Thin Film as a Nucleation Layer for Ultrahigh Aspect Ratio Tungsten-Plug Fill Process

  • Jang, Byeonghyeon;Kim, Soo-Hyun
    • Korean Journal of Materials Research
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    • v.26 no.9
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    • pp.486-492
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    • 2016
  • Tungsten (W) thin film was deposited at $400^{\circ}C$ using pulsed chemical vapor deposition (pulsed CVD); film was then evaluated as a nucleation layer for W-plug deposition at the contact, with an ultrahigh aspect ratio of about 14~15 (top opening diameter: 240~250 nm, bottom diameter: 98~100 nm) for dynamic random access memory. The deposition stage of pulsed CVD has four steps resulting in one deposition cycle: (1) Reaction of $WF_6$ with $SiH_4$. (2) Inert gas purge. (3) $SiH_4$ exposure without $WF_6$ supply. (4) Inert gas purge while conventional CVD consists of the continuous reaction of $WF_6$ and $SiH_4$. The pulsed CVD-W film showed better conformality at contacts compared to that of conventional CVD-W nucleation layer. It was found that resistivities of films deposited by pulsed CVD were closely related with the phases formed and with the microstructure, as characterized by the grain size. A lower contact resistance was obtained by using pulsed CVD-W film as a nucleation layer compared to that of the conventional CVD-W nucleation layer, even though the former has a higher resistivity (${\sim}100{\mu}{\Omega}-cm$) than that of the latter (${\sim}25{\mu}{\Omega}-cm$). The plan-view scanning electron microscopy images after focused ion beam milling showed that the lower contact resistance of the pulsed CVD-W based W-plug fill scheme was mainly due to its better plug filling capability.