• Title/Summary/Keyword: bombardment

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The effect of the working pressure on electro-optical properties of aluminium-doped zinc oxide thin film

  • Bang, Bo-Rae;Koo, Hong-Mo;Moon, Yeon-Keon;Kim, Se-Hyun;Park, Jong-Wan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.1526-1529
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    • 2005
  • Zinc oxide films have been actively investigated as transparent electrode materials for display. We report the effect of the working pressures on electro-optical properties of Al-doped ZnO thin films deposited by d.c. magnetron sputtering. The resistivity of the ZnO thin films was depended on atomic bombardment effect by working pressure.

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Electrical Properties of SBT Thin Films after Etching in Cl$_2$/Ar Inductively Coupled Plasma (Ar/Cl$_2$ 유도결합플라츠마 식각 후 SBT 박막의 전기적 특성)

  • 이철인;권동표;깅창일
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.58-61
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    • 2002
  • SBT thin films were etched at different content of Cl$_2$in Cl$_2$/Ar plasma. We obtained the maximum etch rate of 883 ${\AA}$/min at Cl$_2$(20%)/Ar(80%). As Cl$_2$ gas increased in Cl$_2$/Ar plasma, the etch rate decreased. The maximum etch rate may be explained by variation of volume density for Cl atoms and by the concurrence of two etching mechanisms such as physical sputtering and chemical reaction with formation of low-volatile products, which can be desorbed only by ion bombardment. The variation of volume density for Cl, F and Ar atoms and ion current density were measured by the optical emission spectroscopy and Langmuir probe. To evaluate the physical damage due to plasma, X-ray diffraction and atomic force microscopy analysis carried out. After etching process, P-E hysteresis loops were measured by ferroelectric workstation.

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Effect of MgO Deposition Condition on the Discharge Characteristic of AC-PDP (AC-PDP에서 MgO 증착조건에 따른 패널특성 연구)

  • Jeong, Joo-Young;Cho, Sung-Yong;Lee, Don-Kyu;Lee, Hae-June;Lee, Ho-Jun;Park, Chung-Hoo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.58 no.8
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    • pp.1566-1571
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    • 2009
  • The discharge electrodes in ac PDP are coated with dielectric layer, and transparent MgO thin films are deposited on the dielectric layer. The main role of the MgO thin films in ac PDP is to protect the dielectric layer from sputtering by ion bombardment in the glow-discharge plasma. An additional important role of the MgO thin film is the high secondary electron emission coefficient which leads the low firing voltage and low cost of the PDP. In this paper, we investigated the relations of the crystal orientation about deposition thickness, deposition rate, temperature of substrate, and distance between the MgO tablet and the substrate. Additionally, we investigated the discharge characteristics of the AC PDP using nano-powder MgO tablet

Review of Shock Test Standards for Unifying Specification of Naval Equipments (함정탑재장비 규격통일화를 위한 충격시험기준 고찰)

  • Kim, Young-Ju;Kim, Joon-Won
    • Proceedings of the Korean Society of Marine Engineers Conference
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    • 2005.11a
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    • pp.214-215
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    • 2005
  • Naval equipments are installed and used for naval vessel with different environmental conditions comparing to the commercial vessel, for example, high engine power per ship displacement size, severe vibration and shock due to high running speed and explosion from naval gun's bombardment and underwater weapons. Therefore, those equipments must be installed on shipboard with small spaces, high ambient temperature around engine room and which are required be fabricated with high resistances of vibration, shock and heat resources. But in case of commercial vessel, the performances of their recent equipments naval have been improved continuously due to the technology development of domestic shipbuilding and shipboard equipment industries, together with the related fundamental industries i.e, metal, steel and electronic industries, to an international level since 1970. With these results, it became possible to unify the specifications of shipboard equipments for the commercial and military vessels(Dual-Use). In this study, vibration and shock test standards for the commercial and military vessels will be compared and reviewed technically.

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Development of transgenic sweet potato producing human lactoferrin (인체 락토페린 생산 형질전환 고구마 개발)

  • Min, Sung-Ran;Kim, Jae-Wha;Jeong, Won-Joong;Lee, Young-Bok;Liu, Jang R.
    • Journal of Plant Biotechnology
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    • v.36 no.3
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    • pp.224-229
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    • 2009
  • Human lactoferrin is an iron-binding glycoprotein with many biological activities, including the protection against microbial and virus infection and stimulation of the immune system. We introduced a human lactoferrin (hLf) cDNA under the control of 35S promoter into sweet potato by particle bombardment. Transgenic plants were regenerated via somatic embryogenesis. Transgenic plants were produced typical tuberous roots in soil. PCR, Southern and northern analyses confirmed that the hLf cDNA was incorporated into the plant genome and was properly expressed in plants. Western blot analysis showed that the 80 kDa full length hLf protein was produced in transgenic tuberous roots. Overall results indicated that sweet potato would be an excellent host to produce human therapeutic proteins.

Reactive Ion Etching Characteristics of Aluminum Oxide Films Prepared by PECVD in $CCl_4$ Dry Etch Plasma (플라즈마 화학증착한 알루미늄 산화박막의 $CCl_4$ 플라즈마에서의 반응성 이온식각 특성)

  • 김재환;김형석;이원종
    • Journal of the Korean Ceramic Society
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    • v.31 no.5
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    • pp.485-490
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    • 1994
  • The reactive ion etching characteristics of aluminum oxide films, prepared by PECVD, were investigated in the CCl4 plasma. The atomic chlorine concentration and the DC self bias were determined at various etching conditions, and their effects on the etch rate of aluminum oxide film were studied. The bombarding energy of incident particles was found to play the more important role in determining the etch rate of aluminum oxide rather than the atomic chlorine concentration. It is considered to be because the bombardment of ions or neutral atoms breaks the strong Al-O bonds of aluminum oxide to help activate the formation reaction of AlCl3 which is the volatile etch product.

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A Study on the Surface Treatment of CNT Paste Emitter by Ar Ion Irradiation (아르곤 이온빔을 이용한 CNT 페이스트 에미터의 표면처리에 관한 연구)

  • Kwon, Sang-Jik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.5
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    • pp.456-461
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    • 2007
  • In this study, a surface treatment method using accelerated Ar ions was experimented for exposing the carbon nanotubes (CNT) from the screen-printed CNT paste. After making a cathode electrode on the glass substrate, photo sensitive CNT paste was screen-printed, and then back-side was exposed by UV light. Then, the exposed CNT paste was selectively remained by development. After post-baking, the remained CNT paste was bombarded by accelerated Ar ions for removing some binders and exposing only CNTs. As results, the field emission characteristics were strongly depended on the accelerating energy, bombardment time, and the power of RF plasma ion source. When Ar ions accelerated with 100 eV energy from the 100 W RF plasma source are bombarded on the CNT paste surface for 10 min, the emission level and the uniformity were best.

Preparation of ITO Thin Film with Distance of Between Two Targets (타겟간 거리 변화에 따른 OLED용 ITO 박막의 제작)

  • Kim, Hyun-Woong;Keum, Min-Jong;Kim, Kyung-Hwan
    • Proceedings of the KIEE Conference
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    • 2005.11a
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    • pp.62-64
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    • 2005
  • Indium Tim Oxide(ITO) thin film was prepared for TOLEDs by Facing Targets Sputtering(FTS) apparatus which can suppress the damage of organic layer due to the collisions of high energetic particles. In particular, ITO thin film was prepared with changing the distance between two targets for reduced the bombardment by high energetic particles such as ${\gamma}-electron$ or negative oxygen ions. The electrical and optical properties of ITO thin films as a function of distance of between two targets were measured. Additionally, the ITO thin films were prepared on the cell (cell : MgAg/LiF/EML/HTL/ bottom electrode) with distance of between two targets. And the I-V characteristics of ITO/cell was investigated.

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The Effects of Sputtering conditions in Pre Sputtering on the Formation Behavior of Nitride Layer in the Ion Nitriding of Stainless Steel (초기 스퍼터링조건이 스테인리스강의 이온질화시 지로하층 형성거동에 미치는 영향)

  • 최상진
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 1999.10a
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    • pp.197-203
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    • 1999
  • Stainless steels in general has passive film having strong corrosion resistance on surface. Therefore it must be necessarily removed by etching in mixing solution of sulfuric and chloric acid before Nitriding treatment. But in the ion nitriding, nitride layer was easily formed because passive film was removed without difficult by sputtering effect. The removal extent of these passive films was greatly effected by gas mixing ratios and pressure and holding times of pre sputtering factors in pre sputtering stage. As a results of experiment it has been known that pre sputtering pressure and holding time was not nearly effective on the formation behavior of nitride layer. But when A/H2 gas mixing ratios was 1/2 (vol%) was the most effective of the all pre sputtering conditions. It was resulted from the combination of mechanical reaction byArgon bombardment and chemical reaction by reduction of hydrogen on the passive film.

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An Evaluation Model for Fire Performance (사격효과측정 모델연구)

  • Han, Kyu-Chill
    • Journal of the military operations research society of Korea
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    • v.3 no.1
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    • pp.97-107
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    • 1977
  • This report examines several models, such as random or area bombardment, salvo fire and pattern fire, for the computation of target coverage when multiple rounds are fired at a target. Fractional kill of a fragment sensitive target by a fragmenting projectile as a function of the number of rounds fired is compared for two salvo fire models. The first is a standard salvo fire model in which N rounds are fired at the same aim point, in the second model single kill probability is computed for a fragment sensitive target and then fractional kill from the firing of N rounds is computed according to the assumption that the effects of each round are independent. Because the method of solution becomes very laborious for large patterns, this report gives a method only for the case of evaluating the effectiveness of stick and trianglar pattern fire. The need for the sophisticated and complicated target coverage models is demonstrated by the results of computations performed in this report.

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