• Journal of the Korean Geographical Society
• /
• v.38 no.5
• /
• pp.822-834
• /
• 2003

It is difficult to analyse geomorphic landscape changes effectively by a field survey. A satellite image interpretation may play an important role to overcome such a problem. The purpose of this study is to assess the accuracy of different method to identify geomorphic landscape change by using satellite imagery. The study area is the Yongjong coastal wetland in which a huge man-made environmental change occured to build a new international airport in the past decade. These changes may be summarized that a coastal landscape has been changed to a terrestrial landscape, and also a natural landscape to a man-made landscape. In order to detect these changes, we applied three different satellite interpreting methods, including a binary change mask using band difference. a binary change mask using normalized band difference. and a binary change mask using NDVI. We concluded that a binary change mask using NDVI is the best method among three different methods analysing the coastal geomorphic-landscape changes.

• Journal of the Semiconductor & Display Technology
• /
• v.15 no.2
• /
• pp.32-37
• /
• 2016

Sidewall angle (SWA) of an absorber stack in extreme ultraviolet lithography mask is considered to be $90^{\circ}$ ideally, however, it is difficult to obtain $90^{\circ}$ SWA because absorber profile is changed by complicated etching process. As the imaging performance of the mask can be varied with this SWA of the absorber stack, more complicated optical proximity correction is required to compensate for the variation of imaging performance. In this study, phase shift mask (PSM) is suggested to reduce the variation of imaging performance due to SWA change by modifying mask material and structure. Variations of imaging performance and lithography process margin depending on SWA were evaluated through aerial image and developed resist simulations to confirm the advantages of PSM over the binary intensity mask (BIM). The results show that the variations of normalized image log slope and critical dimension bias depending on SWA are reduced with PSM compared to BIM. Process margin for exposure dose and focus was also improved with PSM.

• Journal of the Semiconductor & Display Technology
• /
• v.15 no.3
• /
• pp.1-5
• /
• 2016

In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region's reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM.

• Publications of The Korean Astronomical Society
• /
• v.32 no.1
• /
• pp.347-349
• /
• 2017

This paper reviews the legacy of the SPCIA Coronagraph Instrument (SCI) of which the primary scientific objective is the characterization of Jovian exoplanets by coronagraphic spectroscopy in the infrared. Studies on binary shaped pupil mask coronagraphs are described. Cryogenic active optics is discussed as another key technology. Then approaches to observing habitable zones in exoplanetary systems with a passively-cooled space infrared telescope are discussed. The SCI was dropped in a drastic change of the SPICA mission. However, its legacy is useful for space-borne infrared telescopes dedicated for use in exoplanetary science in the future, especially for studies of biomarkers.