• Title/Summary/Keyword: beam growth

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Heteroepitaxial Structure of ZnO Films Deposited on Graphene, $SiO_2$ and Si Substrates

  • Pak, Sang-Woo;Cho, Seong-Gook;Kim, Eun-Kyu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.309-309
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    • 2012
  • Heteroepitaxial growth remains as one of the continuously growing interests, because the heterogeneous crystallization on different substrates is a common feature in the fabrication processes of many semiconductor materials and devices, such as molecular beam epitaxy, pulsed laser deposition, sputtering, chemical bath deposition, chemical vapor deposition, hydrothermal synthesis, vapor phase transport and so on [1,2]. By using the R.F. sputtering system, ZnO thin films were deposited on graphene 4 and 6 mono layers, which is grown on 400 nm and 600 nm $SiO_2$ substrates, respectively. The ZnO thin layer was deposited at various temperatures by using a ZnO target. In this experimental, the working power and pressure were $3{\times}10^{-3}$ Torr and 50 W, respectively. The base pressure of the chamber was kept at a pressure around $10^{-6}$ Torr by using a turbo molecular pump. The oxygen and argon gas flows were controlled around 5 and 10 sccm by using a mass flow controller system, respectively. The structural properties of the samples were analyzed by XRD measurement. The film surface and carrier concentration were analyzed by an atomic force microscope and Hall measurement system. The surface morphologies were observed using field emission scanning electron microscope (FE-SEM).

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Growth mode of epitaxial $Si_{0.5}Ge_{0.5}$ alloy layer grown on Si(100) by ion beam assisted deposition (이온선보조증착에 의한 Si(100)기판에 정합성장된 $Si_{0.5}Ge_{0.5}$박막의 성장방식)

  • Park, Sang-Uk;Baek, Hong-Gu
    • Korean Journal of Materials Research
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    • v.5 no.3
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    • pp.297-309
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    • 1995
  • 본 연구에서는 이온선보조증착법에 의해 Si(100)기판위에 정합성장된 $Si_{0.5}$Ge_{0.5}$층의 핵성성과 성장을 고찰하였다. 성장층에 대한 AFM(Atomic Force Microscopy), RHEED(Reflection High Energy Electron diffraction) 등의 분석결과 Si(100)기판위에 이온선보조증착에 의하여 성장된 $Si_{0.5}$Ge_{0.5}$층은 Stranski-Kranstanov(SK)기구로 성장되며, 300eV, 10 $\mu$A/$cm^{2}$의 Ar이온선을 조사시키는 경우 결정성이 향상되었고, SK 성장 방식의 임계두께가 증가하였다. Ar 이온선 조사에 의해 MBE에 의한 정합성장온도(55$0^{\circ}C$-$600^{\circ}C$)보다 훨씬 낮은 20$0^{\circ}C$에서 정합성장이 가능하였으며, $x_{mn}$값은 10.5%로 MBE에 의한 정합성장시 보고된 $x_{mn}$ 값보다 낮았다. 이온충돌에 의해 발생한 3차원 island의 분해와 표면확산의 증가가 $Si_{0.5}$Ge_{0.5}$층의 성장에 현저한 영향을 미쳤으며, 이온충돌의 영향은 3차원 island의 생성보다 3차원 island의 분해가 더 안정한 낮은 증착온도에서만 관찰되었다.

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Fracture Toughness of Leadframe/EMC Interface (리드프레임/EMC 계면의 파괴 인성치)

  • 이호영;유진
    • Journal of the Korean institute of surface engineering
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    • v.32 no.6
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    • pp.647-657
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    • 1999
  • Due to the inherently poor adhesion strength of Cu-based leadframe/EMC (Epoxy Molding Compound) interface, popcorn cracking of thin plastic packages frequently occurs during the solder reflow process. In the present work, in order to enhance the adhesion strength of Cu-based leadframe/EMC interface, black-oxide layer was formed on the leadframe surface by chemical oxidation of leadframe, and then oxidized leadframe sheets were molded with EMC and machined to form SDCB (Sandwiched Double-Cantilever Beam) and SBN (Sandwiched Brazil-Nut) specimens. SDCB and SBN specimens were designed to measure the adhesion strength between leadframe and EMC in terms of critical energy-release rate under quasi-Mode I ($G_{IC}$ ) and mixed Mode loading ($G_{C}$ /) conditions, respectively. Results showed that black-oxide treatment of Cu-based leadframe initially introduced pebble-like X$C_2$O crystals with smooth facets on its surface, and after the full growth of $Cu_2$O layer, acicular CuO crystals were formed atop of the $Cu_2$O layer. According to the result of SDCB test, $Cu_2$O crystals on the leadframe surface did not increase ($G_{IC}$), however, acicular CuO crystals on the $Cu_2$O layer enhanced $G_{IC}$ considerably. The main reason for the adhesion improvement seems to be associated with the adhesion of CuO to EMC by mechanical interlocking mechanism. On the other hand, as the Mode II component increased, $G_{C}$ was increased, and when the phase angle was -34$^{\circ}$, crack Kinking into EMC was occured.d.

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Ferromagnic Transitition Temperature of Diluted Magnetic III-V Based Semiconductor (III-V 화합물 자성 반도체의 강자성체 천이온도에 관한 연구)

  • Lee, Hwa-Yong;Kim, Song-Gang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05c
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    • pp.143-147
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    • 2001
  • Ferromagnetism in manganese compound semiconductors open prospects for tailoring magnetic and spin-related phenomena in semiconductors with a precision specific to III-V compounds. Also it addresses a question about the origin of the magnetic interactions that lead to a Curie temperature(Tc) as high as 110 K for a manganese concentration of just 5%. Zener's model of ferromagnetism, originally suggested for transition metals in 1950, can explain Tc of $Ga_{1-x}Mn_x$ As and that of its IT-VI counterpart $Zn_{1-x}Mn_x$ Te and is used to predict materials with Tc exceeding room temperature, an important step toward semiconductor electronics that use both charge and spin. In this article, we present not only the experimental result but calculated Curie temperature by RKKY interaction. The problem in making III-V semiconductor has been the low solubility of magnetic elements, such as manganese, in the compound, since the magnetic effects are roughly proportional to the concentration of the magnetic ions. Low solubility of magnetic elements was overcome by low-temperature nonequilibrium MBE{molecular beam epitaxy) growth, and ferromagnetic (Ga,Mn)As was realized. Magnetotransport measurements revealed that the magnetic transition temperature can be as high as 110 K for a small manganese concentration.

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Atomic-scale Controlled Epitaxial Growth and Characterization of Oxide Thin Films

  • Yang, G.Z.;Lu, H.B.;Chen, F.;Zhao, T.;Chen, Z.H.
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.6-11
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    • 2001
  • More than ten kinds of oxide thin films and their heterostructure have been successfully fabricated on SrTiO$_3$(001) substrates by laser molecular beam epitaxy (laser MBE). Measurements of atomic force microscopy (AFM), high-resolution transmission electron microscopy (HRTEM) and X-ray small-angle reflectivity reveal that the surfaces and interfaces are atom-level-smooth. The unit cell layers and the lattice structure are perfect. The electrical and optical properties of BaTiO$_3$-x thin films and BaTiO$_3$/SrTiO$_3$ (BTO/STO) superlattices were examined. The all-perovskite oxide P-N junctions have been successfully fabricated and the better I-V curves were observed.

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Characterizations of Thermal Compound Using CuO Particles Grown by Wet Oxidation Method (습식 산화법으로 성장된 산화구리입자를 이용한 방열 컴파운드 제조 및 특성 연구)

  • Lee, Dong Woo;Um, Chang Hyun;Chu, Jae Uk
    • Korean Journal of Materials Research
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    • v.27 no.4
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    • pp.221-228
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    • 2017
  • Various morphologies of copper oxide (CuO) have been considered to be of both fundamental and practical importance in the field of electronic materials. In this study, using Cu ($0.1{\mu}m$ and $7{\mu}m$) particles, flake-type CuO particles were grown via a wet oxidation method for 5min and 60min at $75^{\circ}C$. Using the prepared CuO, AlN, and silicone base as reagents, thermal interface material (TIM) compounds were synthesized using a high speed paste mixer. The properties of the thermal compounds prepared using the CuO particles were observed by thermal conductivity and breakdown voltage measurement. Most importantly, the volume of thermal compounds created using CuO particles grown from $0.1{\mu}m$ Cu particles increased by 192.5 % and 125 % depending on the growth time. The composition of CuO was confirmed by X-ray diffraction (XRD) analysis; cross sections of the grown CuO particles were observed using focused ion beam (FIB), field emission scanning electron microscopy (FE-SEM), and energy dispersive analysis by X-ray (EDAX). In addition, the thermal compound dispersion of the Cu and Al elements were observed by X-ray elemental mapping.

Friction Stir Welding of Ferritice Stainless Steel (페라이트계 스테인리스강의 마찰교반접합)

  • Ahn, Byung-Wook;Choi, Don-Hyun;Yeon, Yun-Mo;Jung, Seung-Boo
    • Journal of Welding and Joining
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    • v.32 no.2
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    • pp.14-17
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    • 2014
  • Ferritic stainless steels are widely used in the construction industry and in exhaust manifolds due to their low cost and relatively superior stress corrosion cracking resistance and pitting corrosion resistance compared to austenite stainless steels. Ferritic stainless steels are currently welded by various welding process including gas tungsten arc welding (GTAW), electron resistance welding (ERW) and laser beam welding. However, when these stainless steels are welded by fusion welding, some problems occur in the fusion zone (FZ) and heat affected zone (HAZ). First, the ductility of the weld is reduced due to the grain growth in the FZ and HAZ. Second, as its HAZ is frequently sensitized during welding, corrosion resistance deteriorates in this region due to the Cr depletion zone. To prevent these problems, it is recommended that ferritic stainless steels be welded with a low heat input. In this study, recent researches in the view of friction stir welded ferritic stainless steels are briefly reviewed.

Investigating deformations of RC beams: experimental and analytical study

  • Parrotta, Javier Ezeberry;Peiretti, Hugo Corres;Gribniak, Viktor;Caldentey, Alejandro Perez
    • Computers and Concrete
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    • v.13 no.6
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    • pp.799-827
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    • 2014
  • In this paper, a theoretical and experimental study of the sectional behaviour of reinforced concrete beams subjected to short-term loads is carried out. The pure bending behaviour is analysed with moment-curvature diagrams. Thus, the experimental results obtained from 24 beams tested by the authors and reported in literature are compared with theoretical results obtained from a layered model, which combines the material parameters defined in Model Code 2010 with some of the most recognized tensions-tiffening models. Although the tests were carried out for short-term loads, the analysis demonstrates that rheological effects can be important and must be accounted to understand the experimental results. Another important conclusion for the beams tested in this work is that the method proposed by EC-2 tends to underestimate the tension-stiffening effects, leading to inaccuracies in the estimations of deflections. Thus, the actual formulation is analysed and a simple modification is proposed. The idea is the separation of the deflection prediction in two parts: one for short-term loads and other for rheological effects (shrinkage). The results obtained are in fairly good agreement with the experimental results, showing the feasibility of the proposed modification.

Photoluminescence study in GaAs/AlGaAs multi-quantum well structure by hydrogen passivation (수소화 처리에 의한 GaAs/AIGaAs 다중양자우물의 PL 연구)

  • Park, Se-Ki;Lee, Cheon;Jung, Min
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.468-472
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    • 1997
  • The effect of the surface state on the quantum efficiency of underlying GaAs/AlGaAs multi-quantum well(MQW) structures consisting of three GaAs quantum wells with different thickness, is studied by low temperature photoluminescence(PL). The structure was grown by molecular beam epitaxy(MBE) on (100) GaAs substrate. The thickness of three GaAs quantum wells was 3, 6 and 9 nm, respectively. The MQWs were placed apart from 50 nm AlGaAs edge-barriers including two inner-barriers with 15 nm in thickness. The samples used in this study were prepared with different growth temperatures. Particularly, the hydrogen passivation effect to the 9 nm quantum well located at near surface appeared much stronger than any others. Transition energy and optical gain related to the hydrogen passivation effects on the multi-quantum well structure was calculated by transfer matrix method.

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Statistical Analysis for Electrical Characteristics of $HfO_2$ Thin Films ($HfO_2$ 박막의 전기적 특성에 대한 통계적 분석)

  • Lee, Jung-Hwan;Kweon, Kyoung-Eun;Ko, Young-Don;Moon, Tae-Hyoung;Myoung, Jae-Min;Yun, Il-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.223-224
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    • 2005
  • In this paper, multiple regression analysis of the electrical characteristics for $HfO_2$ thin films grown by metal organic molecular beam epitaxy (MOMBE) was investigated. The electrical properties, such as, the accumulation capacitance and the hysteresis index, are the main factors to determine the characteristics of $HfO_2$ thin films. The input factors on the process are the substrate temperature, Ar gas flow, and $O_2$ gas flow. For statistical analysis, the design of experiments was carried out and the effect plots were used to analyze the manufacturing process. This methodology can predict the electrical characteristics of the thin film growth mechanism related to the process conditions.

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