• Title/Summary/Keyword: avalanche

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Study on the Trap Parameters according to the Nitridation Conditions of the Oxide Films (산화막의 질화 조건에 따른 트랩 파라미터에 관한 연구)

  • Yoon, Woon-Ha;Kang, Seong-Jun;Joung, Yang-Hee
    • The Journal of the Korea institute of electronic communication sciences
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    • v.11 no.5
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    • pp.473-478
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    • 2016
  • In this paper, the MIS(: Metal-Insulator-Semiconductor) Capacitor with the nitrided-oxide by RTP are fabricated to investigate the carrier trap parameters due to avalanche electron injection. Two times turn-around phenomenon of the flatband voltage shift generated by the avalanche injection are observed. This shows that electron trapping occurs in the oxide film at the first stage. As the electron injection increases, the first turn-around occures due to a positive charge in the oxide layer. After further injection, the curves turns around once again by electron captured. Based on the experimental results, the carrier trapping model for system having multi-traps is proposed and is fitting with experimental data in order to determine trap parameter of nitrided-oxide.

Diffusion Process Modeling for High-speed Avalanche Photodiodes using Neural Networks (고속 애벌린치 포토타이모드 제작을 위한 확산 공정의 신경망 모델링)

  • 고영돈;정지훈;윤밀구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.37-40
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    • 2001
  • This paper presents the modeling methodology of Zinc diffusion process applied for high-speed avalanche photodiode fabrication using neural networks. Three process factors (sealing pressure, amount of Zn$_3$P$_2$ source per volume, and doping concentration of diffused layer) are examined by means of D-optimal design experiment. Then, diffusion rate and doping concentration of Zinc in diffused layer are characterized by a static response model generated by training fred-forward error back-propagation neural networks. It is observed that the process models developed here exhibit good agreement with experimental results.

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A study on the carrier trapping characteristics of the dry and wet oxide films under the avalanche injection (Avalnche주입에 따른 dry oxide와 wet oxide의 캐리어 트랩핑에 관한 연구)

  • 정경호;정양희;박영걸
    • Electrical & Electronic Materials
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    • v.6 no.2
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    • pp.115-120
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    • 1993
  • 본 연구에서는 dry oxide와 wet oxide로 MOS capacitor를 제작하여 avalanche 전자주입 실험으로 산화막의 캐리어 트랩핑특성을 조사하였다. dry oxide에서는 avalanche 전자주입 시 전자 trapping이 주도적으로 일어났다. wet oxide에서는 주입 초기에 전자 trapping이 주도적이다가 hole trapping이 주도적으로 바뀌게 되는 turn-around 현상이 일어났다. 주입시간이 길어지면 다시 전자 trapping이 주도적으로 되는 또 한번의 turn-around 현상이 일어났다. 산화막의 트랩 parameter를 결정하기 위해 실험결과를 기초로 하여 종류가 다른 여러 트랩을 가지는 계에 대한 캐리어 트랩핑 이론식을 세워서 실험결과와 curve-fitting한 결과 실험치와 잘 일치하는 곡선을 얻었다.

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High-Speed, High-Reliability Planar-Structure InP/InGaAs Avalanche Photodiodes for 10Gb/s Optical Receivers with Recess Etching (수광영역의 식각을 통한 단일확산 공정의 고속 평판형 InP/InGaAs 10Gb/s 광 검출기의 신뢰성)

  • Jung, Ji-Houn;Kwon, Yong-Hwan;Hyun, Kyung-Sook;Yun, Il-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.1022-1025
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    • 2002
  • This paper presents the reliability of planar InP/InGaAs avalanche photodiodes (APD's) with recess etching, which is very crucial for the commercial 10-Gb/s optical receiver application. A versatile design for the planar InP/InGaAs APD's and bias-temperature tests to evaluate long-term reliability at temperature from 200 to $250^{\circ}C$. The reliability is examined by accelerated life tests by monitoring dark current and breakdown voltage. The lifetime of the APD's is estimated by a degradation activation energy. Based on the test results, it is concluded that the planar InP/InGaAs APD's with recess etching shows the sufficient reliability for practical 10-Gb/s optical receivers.

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Prebreakdown Avalanche Pulses in Compressed SF6 under Uniform Field (평등전계에서 압축 SF6가스의 절연파괴 선구 애벌렌체의 전류 펄스)

    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.33 no.3
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    • pp.106-111
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    • 1984
  • Prebreakdown current pulses arising from avalanche growth in SF6 were recorded under static uniform field at pressures up to about 400kpa. At pressures less than 100kpa the current pulses consist of the electron component observed as the fast rise of current, the negative ioncomponent which is superimposed, and the positive ion component comprising the tail of the pulse. The values of positive ion drift velocity were measured from the present pulse data. At pressures in excess of about 100 Kpa the pulse shapes becam distorted such that quantitative analysis was no longer possible, and did not indicate the action of any photosecondary process at the cathode. Breakdown appers to result from the seperate development of single avalanche.

A Study on the Breakdown Mechanism of Compressed $SF_6$ by Polarity of a Protrusion on Electrode Surface (전극표면상 미소돌기의 극성에 의한 압축 $SF_6$ 개스의 절연파괴 Mechanism에 관한 연구)

  • 이동인;이광식;김인식
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.39 no.9
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    • pp.956-963
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    • 1990
  • The general shapes of prebreakdown pulses in a discharge gap were calculated and the current pulses due to avalanche were detected in SF6 by changing the polarity of the protrusion placed on an electrode at pressures up to about 400 Kpa. The mathematical model of prebreakdown pulse development with a negative protrusion shows agreement with the observed pulses. No evidence of intense bursts of field-emitted electrons was observed. Breakdown probably results from a single avalanche developing to a critical size. However the calculated shape of prebreakdown current pulse does not agree with the observed pulses with a positive protrusion. The breakdown is preceded by multiple avalanche development at pressures less than about 200 Kpa. This observation has been interpreted as due to the formation of negative ions following photoionization in the gas which drift into the critical volume near a positive protrusion.

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Improved Circuits for Single-photon Avalanche Photodiode Detectors

  • Kim, Kyunghoon;Lee, Junan;Song, Bongsub;Burm, Jinwook
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.14 no.6
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    • pp.789-796
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    • 2014
  • A CMOS photo detection bias quenching circuit is developed to be used with single photon avalanche photodiodes (SPADs) operating in Geiger mode for the detection of weak optical signals. The proposed bias quenching circuits for the performance improvement reduce the circuit size as well as improve the performance of the quenching operation. They are fabricated in a $0.18-{\mu}m$ standard CMOS technology to verify the effectiveness of this technique with the chip area of only $300{\mu}m^2$, which is about 60 % of the previous reported circuit. Two types of proposed circuits with resistive and capacitive load demonstrated improved performance of reduced quenching time. With a commercial APD by HAMAMATSU, the dead time can be adjusted as small as 50 ns.