• Journal of the Korean Chemical Society
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• v.16 no.4
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• pp.208-213
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• 1972

Isostric heats of adsorption of amines on paraffin and polyethyleneglycol were measured by gas chromatography. Value with polyethyleneglycol were significantly higher than those with paraffin due to the N-H...O bonding. The contribution of C-H...O bonding to the isosoteric heats of adsorption was negligible. The additional heats of adsorption observed as the sample size increased also increased as the number of amino hydrogen atoms decreased. This tendency was more significant with polyethyleneglycol indicating that strong directing force of amino hydrogen of primary and secondary amines to the surface hinder lateral attractive interaction which could be favored with free orientation.

• 제어로봇시스템학회:학술대회논문집
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• 1990.10b
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• pp.1071-1076
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• 1990

This paper proposes a navigation strategy of multiple autonomous mobile robots with communication within a specified space. Assuming that each robot has complete detectability with finite range, simple navigation strategy is derived by introducing repulsive forces between robots and attractive force between a robot and its goal point analogous to those between electric charges. When a robot is close to its goal point, a pseudo-domain based on the distance between the closest point of the domain boundary and the goal point is proposed to enhance its convergence to the goal state. This paper concludes with the results of computer simulation studies on the dynamic behavior of multiple interacting robots with the proposed navigation strategy.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.12
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• pp.76-82
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• 1997

Chemical mechanical polishing (CMP) has become widely accepted for the planarization of multi-interconnect structures in semiconductor manufacturing. However, perfect planarization is not so easily ahieved because it depends on the pattern sensitivity, the large number of controllable process parameters, and the absence of a reliable process model, etc. In this paper, we realized the planarization of deposited oxide layers followed by metal (W) polishing as a replacement for tungsten etch-back process for via formation. Atomic force microscope (AFM) is used for the evaluation of pattern topography during CMP. As a result, AFM evaluation is very attractive compared to conventional methods for the measurment of planarity. mOreover, it will contribute to analyze planarization characteristics and establish CMP model.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.57 no.5
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• pp.783-788
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• 2008

This paper presents the mechanism of the machine and the numerical result of attractive force in the Electro-Permanent Magnet Lifter (EPML) and an improved niching Genetic Algorithm (GA) applying the concept of auto-tuning and detecting traces. Population size and both (right and left) niche radii of each peak in an asymmetrical objective function can be determined automatically. The validity of the proposed method is verified by simulation results.

• Proceedings of the KIEE Conference
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• 2008.10c
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• pp.53-55
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• 2008

In high speed applications, the slotless permanent magnet(PM) motors appear an attractive solution, being almost insensitive to magneto-motive force harmonics and to pulse width modulation(PWM) current ripple and exhibiting lower stator iron losses and rotor losses (significant with square wave current control). So, this paper deals with methods for design of permanent magnet synchronous motor/generator.

• Macromolecular Research
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• v.8 no.3
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• pp.120-124
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• 2000

Clay-dispersed nanocomposites have been prepared by simple melt-mixing of two components, styrenic polymers with different content of functional groups and two different organophilic clays (Cloisite(R) 25A and Cloisite(R)30A) with a twin screw extruder. Dispersibility of 10-$\AA$-thick silicate layers of clay in the hybrid was investigated by using an X-ray diffraction method and a transmission electron microscope. It was found that if the interaction force between intercalant and matrix polymer is attractive, the matrix polymer intercalates more rapidly into the gallery of silicate layers. The faster intercalation of matrix polymer leads to the better dispersibility of silicate layers in the matrix polymer.

• Textile Coloration and Finishing
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• v.15 no.5
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• pp.294-300
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• 2003

The anionic agent containing dichloro-s-triazinyl reactive group was synthesized and applied to the cotton fabrics to introduce covalent bonds. This attempt was expected to improve the affinities of cationic compounds, such as cationic dyes, chitosan, quaternary ammonium antimicrobial agents and metal ions, by the electrostatic attractive force. As expected, the anionic agent was reacted with cotton fabrics at room temperature. In order to examine the adsorptivity of the cationic compounds on to the anionized cotton fabrics, firstly a cationic dye(C. I. Basic Violet 7) was applied. The color strength of the dyeing of anioized cotton fabric was highly increased comparing to that of untreated fabric.

• Journal of the Korean Society for Precision Engineering
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• v.25 no.12
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• pp.82-88
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• 2008

This paper describes an application of sliding mode control to an active magnetic bearing(AMB) system. A sliding mode control is robust to model uncertainties and external disturbances. To ensure the authority of sliding mode control, model parameter uncertainties caused from linearization of electro-magnetic attractive force are analyzed and a domain of parameter uncertainties in which reachability to sliding surface is guaranteed is derived. The validity of the analysis is illustrated along with some simulation examples.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 1996.11a
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• pp.167-171
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• 1996

Chemical mechanical polishing (CMP) has become widely accepted for the planarization of multi-interconnect structures in semiconductor manufacturing. However, perfect planarization is not so easily achieved because it depends on the pattern sensitivity, the large number of controllable process parameters, and the absence of a reliable process model, etc. In this paper, we realized the planarization of deposited oxide layers followed by metal (W) polishing as a replacement for tungsten etchback process for via formation. Atomic force microscope (AFM) is used for the evaluation of pattern topography during CMP. As a result, AFM evaluation is very attractive compared to conventional methods for the measurement of planarity. Moreover, it will contribute to analyze planarization characteristics and establish CMP model.

• Electrical & Electronic Materials
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• v.9 no.9
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• pp.891-899
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• 1996

A model for predicting the characteristics of elastic ferromagnetic materials having a moving gap was presented. Based on the model parameters concerning behavior of material, such as the instantaneous field intensity, attractive force between the poles, length of gap, and the induced current/ emf in the circuit can be determined from the numerical integrations of the governing equations derived. From the results of the model it is found that when dc emf is imposed on the circuit the current sharply rise and fall for very short duration then stabilize at extremely low level which depends mainly on elasticity, permeabilities and ratio of resistivity. Subsequently output emf is shown stabilized at constant value which depends on the previous parameters as well as the resistivity ratio of primary to secondary circuit after sufficient progress of time.