• Title/Summary/Keyword: atomic ratio

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Characteristics and Processing Effects Of $HfO_2$ Thin Films grown by Metal-Organic Molecular Beam Epitaxy (금속 유기 분자 빔 에피택시로 성장시킨 $HfO_2$ 박막의 특성과 공정변수가 박막의 성장 및 특성에 미치는 영향)

  • Kim, Myoung-Seok;Ko, Young-Don;Nam, Tae-Hyoung;Jeong, Min-Chang;Myoung, Jae-Min;Yun, Il-Gu
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.74-77
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    • 2004
  • [ $HfO_2$ ] dielectric layers were grown on the p-type Si(100) substrate by metalorganic molecular beam epitaxy(MOMBE). Hafnium $t-butoxide[Hf(O{\cdot}t-C_4H_9)_4]$ was used as a Hf precursor and Argon gas was used as a carrier gas. The thickness of the layers was measured by scanning electron microscopy (SEM) and high-resolution transmission electron measurement(HR-TEM). The properties of the $HfO_2$ layers were evaluated by X-ray diffraction(XRD), high frequency capacitance-voltage measurement(HF C-V), current-voltage measurement(I-V), and atomic force measurement(AFM). HF C-V measurements have shown that $HfO_2$ layer grown by MOMBE has a high dielectric constant(k=19-21). The properties of $HfO_2$ films are affected by various process variables such as substrate temperature, bubbler temperature, Ar, and $O_2$ gas flows. In this paper, we examined the relationship between the $O_2/Ar$ gas ratio and the electrical properties of $HfO_2$.

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Fabrication and Characterization of Organic Thin-Film Transistors by Using Polymer Gate Electrode (고분자 게이트 전극을 이용한 유기박막 트랜지스터의 제조 및 소자성능에 관한 연구)

  • Jang, Hyun-Seok;Song, Ki-Gook;Kim, Sung-Hyun
    • Polymer(Korea)
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    • v.35 no.4
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    • pp.370-374
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    • 2011
  • A conductive PANI solution was successfully fabricated by doping with camphorsulfonic acid and the polymerization of aniline and the confirmation of doping were characterized by FTIR spectroscopy. In organic thin film transistors, PANI gate electrodes were spin-coated on a PES substrate and their conductivity variations were monitored by a 4-probe method with different annealing temperatures. The surface properties of PANI thin films were investigated by an AFM and an optical microscope, OTFTs with PANI gate electrode had characteristics of carrier mobility as large as 0.15 $cm^2$/Vs and on/off ratio of $2.4{\times}10^6$, Au gate OTFTs with the same configuration were fabricated to investigate the effect of polymer gate electrode for the comparison of device performances. We could obtain the comparable performances of PANI devices to those of Au gate devices, resulting in an excellent alternative as an electrode in flexible OTFTs instead of an expensive Au electrode.

Growth of InGaP on Ge substrates by metalorganic chemical vapor deposition for triple junction solar cells

  • Lee, Sang-Su;Yang, Chang-Jae;Sin, Geon-Uk;Yun, Ui-Jun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.133-133
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    • 2010
  • 3-5족 화합물 반도체를 이용한 집광형 삼중 접합 태양전지는 35% 이상의 광변환 효율로 주목을 받고 있다. 일반적으로 삼중 접합 태양전지는 넓은 영역대의 파장을 흡수하기 위해 밴드갭이 다른 InGaP, GaAs, Ge이 사용된다. 그 중 하부셀은 기계적 강도가 높고 장파장을 흡수할 수 있는 Ge이 사용되는데, p-type Ge 기판위에 III-V 결정막 성장 시 5족 원소가 확산되어 pn접합을 형성하게 된다. 이러한 구조를 가진 Ge 하부셀이 효율적으로 홀-전자 쌍을 형성하기 위해서는 두꺼운 베이스와 얇은 에미터 접합이 필요하다. InGaP의 phosphorus는 낮은 확산계수로 인해 GaAs의 arsenic에 비해 얇은 접합이 형성 가능하며, Ge표면 에칭효과가 더 적다는 장점이 있다. 이를 고려해 우리 연구그룹에서는 metalorganic chemical vapor depostion(MOCVD)을 이용하여 Ge기판위에 성장한 InGaP layer의 특성을 관찰해 보았다. <111>로 $6^{\circ}$ 기울어진 p-type Ge(100) 기판위에 MOCVD를 통해 InGaP layer를 형성하였고, 성장된 layer를 atomic force microscope(AFM)와 high-resolution x-ray diffraction(HRXRD)을 이용하여 표면형상, 조성, 응력상태 등을 각각 관찰하였다. 또한 phosphorus 확산에 의해 형성되는 도핑농도는 electrochemical capacitance-voltage(ECV)을 이용하여 관찰하였다. 성장된 Ge기판위의 InGaP layer의 경우 특징적으로 높이 50 nm, 밑변 길이 $1\;{\mu}m$의 경사진 표면을 관찰할 수 있었으며, 이러한 구조는 TMIn과 TMGa의 비율이 증가 할수록 감소하였다. 따라서 이러한 경사진 형태의 구조는 격자 불일치 때문인 것으로 판단된다. 추가적으로 V/III ratio의 최적화를 통해 1.3 nm의 표면 거칠기를 갖는 InGaP layer를 얻을 수 있었다. ECV를 통해 Ge 하부셀의 pn접합 형성을 관찰한 결과 약 160 nm에서 접합이 형성되는 것을 관찰할 수 있었다. 또한, 같은 성장 조건의 샘플을 1000 초 열처리 후에 접합깊이의 변화를 관찰한 결과 180 nm에서 접합이 관찰되었지만, GaAs의 arsenic에 의한 pn접합은 열처리 후에 그 깊이가 170 nm에서 300 nm로 증가 하였다. 따라서 삼중접합 태양전지의 제작 공정을 고려할 경우 phosphorus에 의한 접합 형성이 Ge 하부셀의 동작 특성에 유리할 것으로 판단된다.

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Low-temperature synthesis of graphene on nickel foil by microwave plasma chemical vapor deposition

  • Kim, Y.;Song, W.;Lee, S.Y.;Jung, W.;Kim, M.K.;Jeon, C.;Park, C.Y.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.80-80
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    • 2010
  • Graphene has attracted tremendous attention for the last a few years due to it fascinating electrical, mechanical, and chemical properties. Up to now, several methods have been developed exclusively to prepare graphene, which include micromechanical cleavage, polycrystalline Ni employing chemical vapor deposition technique, solvent thermal reaction, thermal desorption of Si from SiC substrates, chemical routes via graphite intercalation compounds or graphite oxide. In particular, polycrystalline Ni foil and conventional chemical vapor deposition system have been widely used for synthesis of large-area graphene. [1-3] In this study, synthesis of mono-layer graphene on a Ni foil, the mixing ratio of hydrocarbon ($CH_4$) gas to hydrogen gas, microwave power, and growth time were systemically optimized. It is possible to synthesize a graphene at relatively lower temperature ($500^{\circ}C$) than those (${\sim}1000^{\circ}C$) of previous results. Also, we could control the number of graphene according to the growth conditions. The structural features such as surface morphology, crystallinity and number of layer were investigated by scanning electron microscopy (SEM) and atomic force microscopy (AFM), transmission electron microscopy (TEM) and resonant Raman spectroscopy with 514 nm excitation wavelength. We believe that our approach for the synthesis of mono-layer graphene may be potentially useful for the development of many electronic devices.

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Effects of multi-stacked hybrid encapsulation layers on the electrical characteristics of flexible organic field effect transistors

  • Seol, Yeong-Guk;Heo, Uk;Park, Ji-Su;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.257-257
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    • 2010
  • One of the critical issues for applications of flexible organic thin film transistors (OTFTs) for flexible electronic systems is the electrical stabilities of the OTFT devices, including variation of the current on/off ratio ($I_{on}/I_{off}$), leakage current, threshold voltage, and hysteresis, under repetitive mechanical deformation. In particular, repetitive mechanical deformation accelerates the degradation of device performance at the ambient environment. In this work, electrical stabilities of the pentacene organic thin film transistors (OTFTs) employing multi-stack hybrid encapsulation layers were investigated under mechanical cyclic bending. Flexible bottom-gated pentacene-based OTFTs fabricated on flexible polyimide substrate with poly-4-vinyl phenol (PVP) dielectric as a gate dielectric were encapsulated by the plasma-deposited organic layer and atomic layer deposited inorganic layer. For cyclic bending experiment of flexible OTFTs, the devices were cyclically bent up to $10^5$ times with 5mm bending radius. In the most of the devices after $10^5$ times of bending cycles, the off-current of the OTFT with no encapsulation layers was quickly increased due to increases in the conductivity of the pentacene caused by doping effects from $O_2$ and $H_2O$ in the atmosphere, which leads to decrease in the $I_{on}/I_{off}$ and increase in the hysteresis. With encapsulation layers, however, the electrical stabilities of the OTFTs were improved significantly. In particular, the OTFTs with multi-stack hybrid encapsulation layer showed the best electrical stabilities up to the bending cycles of $10^5$ times compared to the devices with single organic encapsulation layer. Changes in electrical properties of cyclically bent OTFTs with encapsulation layers will be discussed in detail.

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Characteristics of Thick GaN on Si using AlN and LT-GaN Buffer Layer (AlN과 저온 GaN 완충층을 이용한 Si 기판상의 후막 GaN 성장에 관한 연구)

  • Baek, Ho-Seon;Lee, Jeong-Uk;Kim, Ha-Jin;Yu, Ji-Beom
    • Korean Journal of Materials Research
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    • v.9 no.6
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    • pp.599-603
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    • 1999
  • We have investigated the growth characteristics of thick GaN on Sim substrate with AlN and low temperature GaN buffer layer. The vertical hydride vapor phase epitaxy system with $GaCl_3$ precursor was used for growth of GaN. AlN and GaN buffer layer were deposited on Si substrate to reduce the lattice mismatch and the thermal expansion coefficient mismatch between si and GaN. Optimization of deposition condition for AlN and low temperature GaN buffer layers were carried out. We studied the effects of growth temperature, V/III ratio on the properties of thick GaN. Surface morphology, growth rate and crystallinity of thick GaN were measured using Atomic Force Microscopy (AFM), $\alpha-step$-, Scanning Electron Microscopy (SEM) and X-Ray Diffractometer(XRD).

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Evaluation of Indentation Fracture Toughens in Brittle Materials Based on FEA Solutions (유한요소해에 기초한 취성재료의 압입파괴인성평가)

  • Hyun, Hong Chul;Lee, Jin Heang;Felix, Rickhey;Lee, Hyungyil
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.37 no.12
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    • pp.1503-1512
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    • 2013
  • In this study, we proposed an indentation evaluation method for fracture toughness using cohesive finite element simulations. First, we examined the effect of material properties (yield strain, Poisson's ratio, and elastic modulus) on crack size during Vickers indentation and then generated a regression formula that explains the relations among fracture toughness, indentation load, and crack size. We also proposed another indentation formula for fracture toughness evaluation using the contact size a and E/H (H: hardness). Finally, we examined the relation between the crack size and the indenter shapes. Based on this, we can generate from the formula obtained using the Vickers indenter a formula for an indenter of different shapes. Using the proposed method, fracture toughness is directly estimated from indentation data.

Electrocatalytic Activity of Platinum-palladium Catalysts Prepared by Sequential Reduction Methods (순차적 환원 방법으로 제조된 백금-팔라듐 촉매의 전기 활성)

  • Park, Jae Young;Park, Soo-Jin;Jung, Yongju;Kim, Seok
    • Applied Chemistry for Engineering
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    • v.23 no.2
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    • pp.153-156
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    • 2012
  • In this study, two different methods were studied to prepare Pt-Pd catalysts for direct methanol fuel cells in order to enhance the electrochemical efficiency. The catalysts were compared with simultaneously deposited Pt-Pd and sequentially deposited Pt-Pd. The electrocatalysts contained 20 wt% of metal loading on carbon black and 1 : 2 of Pt : Pd atomic ratio. Electrochemical properties of the catalysts were compared by measuring cyclic voltammetries and average sizes and lattice parameters were measured by transmission electron microscopy images and x-ray diffraction. As a result, sequentially deposited Pt-Pd/C catalysts showed better electrochemical properties than those of simultaneously deposited Pt-Pd/C catalysts.

Photocurrent Characteristics of Plasma Sprayed TiO2 Composite Coatings according to Additive Transition Metal (전이금속을 첨가한 플라즈마 TiO2 복합 용사피막의 광전류 특성)

  • Ko, Byung-Chun;Ko, Young-Bong;Park, Kyeung-Chaea
    • Journal of Surface Science and Engineering
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    • v.44 no.3
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    • pp.89-94
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    • 2011
  • In this study, the photocurrent characteristics of plasma sprayed $TiO_2$ coatings have been investigated according to additive transition metal (Fe, Mn, Nb powder) and heat treatment conditions. The plasma sprayed $TiO_2$ coatings by heat treatment at $400^{\circ}C$ and 90 min had the higher photocurrent at ultraviolet light, no photocurrent at visible light. The photocurrent of plasma sprayed $TiO_2$ coatings added by Fe, Mn, Nb (named by plasma sprayed $TiO_2$ composite coatings) was lower than that of plasma sprayed $TiO_2$ coatings at ultraviolet light, as was low in intensity ratio of XRD(101)/(110). and the atomic percentage of oxygen by plasma sprayed $TiO_2$ composite coatings was higher than that by plasma sprayed $TiO_2$ coatings. The photocurrent of plasma sprayed $TiO_2$ composite coatings in heat treatment at $400^{\circ}C$ and 90 min was higher than that of plasma sprayed $TiO_2$ coatings in same heat treatment conditions at ultraviolet and visible light, as was high in oxygen affinity by heat treatment.

Screening of Gamma Radiation-Induced Pathogen Resistance Rice Lines against Xanthomonas oryzae pv. oryzae (방사선을 이용한 벼 흰잎마름병 저항성 돌연변이 벼 계통의 선발)

  • Lim, Chan Ju;Lee, Ha Yeon;Kim, Woong Bom;Ahmad, Raza;Moon, Jae Sun;Kim, Dong Sub;Kwon, Suk-Yoon
    • Journal of Radiation Industry
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    • v.4 no.3
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    • pp.209-213
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    • 2010
  • Bacterial blight is one of the most serious diseases of rice (Oryza sativa L.), and it has been known that Xanthomonas oryzae pv. oryzae (Xoo) causes this disease symptom. To develop resistance rice cultivars against Xoo, 3,000 lines of $M_3$ mutants, which were irradiated with gamma ray, were tested by 'scissor-dip method' primarily, and 191 putative resistant lines were selected. In $M_4$ generation, these lines were screened again with various ways such as measuring of symptom of bacterial blight in leaf, number of tiller, fresh weight, and phenotypic segregation ratio in next generation. Finally, six resistance lines were selected. RT-PCR analysis revealed that these lines displayed high level of R-genes such as Xa21, Pi36, and Pi-ta. These results indicate that mutations by gamma ray cause disruptions of regulatory signal transduction systems of these R-genes. Furthermore, these selected mutants could be useful for the development of rice cultivar resistant to Xoo.