• Title/Summary/Keyword: atmospheric pressure plasma source

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Development of a Microplasma Source under Atmospheric Pressure using an External Ballast Capacitor (방전에너지 제어용 외부 커패시터를 이용한 대기압 마이크로 플라즈마 소스 개발)

  • Ha, Chang-Seung;Lee, Je-Hyun;Son, Eui-Jeong;Park, Cha-Soo;Lee, Ho-Jun
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.27 no.6
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    • pp.31-38
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    • 2013
  • A pulse driven atmospheric plasma jet controlled by external ballast capacitor is developed. Unlike the most commonly use DBD sources, the proposed device utilizes bare metal electrode. The discharge energy per pulse can precisely be determined by changing voltage and capacitance of the ballast capacitor. It is shown that the device can provide wide range of plasma, from stable glow mode to near arc state. Current-voltage waveforms, optical emission spectra and discharge images are investigated as a function of an injection energy. The OES shows that He and oxygen lines are increased as a function of the external ballast capacitor. Ozone and rotational temperature have similar tendency with a power consumption. The feeding gas is He and the applied DC voltage is from 400V to 800V when the gap distance is $500{\mu}m$.

A Study On High Power Factor Sine Pulse Type Power Supply For Atmospheric Pressure Plasma Cleaning System with 3-Phase PFC Boost Converter (3상 PFC 부스트 컨버터를 채용한 상압플라즈마 세정기용 고역률 정형파 펄스 출력형 전원장치에 관한 연구)

  • Han, Hee-Min;Kim, Min-Young;Seo, Kwang-Duk;Kim, Joohn-Sheok
    • The Transactions of the Korean Institute of Power Electronics
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    • v.14 no.1
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    • pp.72-81
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    • 2009
  • This paper presents quasi-resonant type high power factor ac power supply for atmospheric pressure plasma cleaning system adopting three phase PFC boost converter and it's control method. The presented ac power supply consists of single phase H-bridge inverter, step-up transformer for generating high voltage and three phase PFC boost converter for high power factor on source utility. Unlikely to the traditional LC resonant converter, the propose one has an inductor inside only. A single resonant takes place through the inside inductor and the capacitor from the plasma load modeled into two series capacitor and one resistance. The quasi-resonant can be achieved by cutting the switching signal when the load current decrease to zero. To obtain power control ability, the propose converter controlled by two control schemes. One is the changing output pulse period scheme in the manner of PFM(Pulse Frequency Modulation) control. On the other, to provide more higher power to load, the DC rail voltage is directly controlled by the 3-phase PFC boost converter. The significant merits of the proposed converter are the uniform power providing capability for high quality plasma generation and low reactive power in AC and DC side. The proposed work is verified through digital simulation and experimental implementation.

Measurement of Plasma Parameters (Te and Ne) and Reactive Oxygen Species in Nonthermal Bioplasma Operating at Atmospheric Pressure

  • Choi, Eun Ha;Kim, Yong Hee;Kwon, Gi Chung;Choi, Jin Joo;Cho, Guang Sup;Uhm, Han Sup;Kim, Doyoung;Han, Yong Gyu;Suanpoot, Pradoong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.141-141
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    • 2013
  • We have generated the needle-typed nonthermal plasma jet by using an Ar gas flow at atmospheric pressure. Diagnostics of electron temperature anddensity is critical factors in optimization of the atmospheric plasma jet source in accordance with the gas flow rate. We have investigated the electron temperature and density of plasma jet by selecting the four metastable Ar emission lines based on the atmospheric collisional radiative model and radial profile characteristics of current density, respectively. The averaged electron temperature and electron density for this plasma jet are found to be ~1.6 eV and ~$3.2{\times}10^{12}cm^{-3}$, respectively, in this experiment. The densities of OH radical species inside the various bio-solutions are found to be higher by about 4~9 times than those on the surface when the argon bioplasma jet has been bombarded onto the bio-solution surface. The densities of the OH radicalspecies inside the DI water, DMEM, and PBS are measured to be about $4.3{\times}10^{16}cm^{-3}$, $2.2{\times}10^{16}cm^{-3}$, and $2.1{\times}10^{16}cm^{-3}$, respectively, at 2 mm downstream from the surface under optimized Ar gas flow 250 sccm.

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The atmospheric plasma reactor with water wall to decompose CF4

  • Itatani, Ryohei;Deguchi, Mikio;Toda, Toshihiko;Ban, Heitaro
    • Journal of the Korean institute of surface engineering
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    • v.34 no.5
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    • pp.391-394
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    • 2001
  • A new type plasma reactor is proposed to decompose CF4 diluted with N2 gas in atmospheric pressure. The arc plasmas is surrounded with a waterwall which acts as a source of water vapor, the solvent of HF, resultant product after decomposition, and conveyer to take away fluorine compound from exhaust gas. Abatement more than 99% is achieved by small size plasmas such as 1 cm in diameter, 25cm in length and 3.4KW of DC discharge power in such gas as the mixture of 100 sccm of CF4 and 15 slm of N2. Reactors of this type are to be expanded to such a system as Nitrogen flow of 50 slm with 200 sccm of CF4 and 7-8 KW discharge power.

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Effects of Hydrophilic Surface Treatment on SUS Substrates by Using Dielectric Barrier Discharge

  • Joa, Sang-Beom;Kang, In-Je;Yang, Jong-Keun;Lee, Heon-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.458-458
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    • 2012
  • Fuel Cell is used stacking metal or polymer substrate. This hydro property of substrate surface is very important. Usually, surface property is hydrophilic. The surface oxidation of SUS is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for increasing hydrophilic property. The plasma process makes an experiment under various operating conditions of the DBD, which operating conditions are treatment time, plasma gas mixture ratio, the plasma source supply frequency. Two kinds of SUS substrate, SUS-304 and SUS 316L, were used. Discharge frequency has a crucial impact on equipment performance and gas treatment. After the plasma treatment of a SUS plate, highly improved wettability was noted. But, when high oxygen supply, the substrate damaged seriously.

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Observation of Discharge Mode Transient from Townsend to Glow at Breakdown of Helium Atmospheric Pressure Dielectric Barrier Discharge (헬륨 대기압 유전체 격벽 방전기의 타운젠트-글로우 방전 모드 전이 연구)

  • Bae, Byeongjun;Kim, Nam-Kyun;Yoon, Sung-Young;Shin, Jun-Seop;Kim, Gon-Ho
    • Journal of the Semiconductor & Display Technology
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    • v.15 no.2
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    • pp.26-31
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    • 2016
  • The Townsend to glow discharge mode transition was investigated in the dielectric barrier discharge (DBD) helium plasma source which was powered by 20 kHz / $4.5 kV_{rms}$ high voltage at atmospheric pressure. The spatial profile of the electric field strength at each modes was measured by using the intensity ratio method of two helium emission lines (667.8 nm ($3^1D{\rightarrow}2^1P$) and 728.1 nm ($3^1S{\rightarrow}2^1P$)) and the Stark effect. ICCD images were analyzed with consideration for the electric field property. The Townsend discharge (TD) mode at the initial stage of breakdown has the light emission region located in the vicinity of the anode. The electric field of the light emitting region is close to the applied field in the system. Immediately, the light emitting region moves to the cathode and the discharge transits to the glow discharge (GD) mode. This mode transition can be understood with the ionization wave propagation. The electric field of the emitting region of GD near cathode is higher than that of TD near anode because of the cathode fall formation. This observation may apply to designing a DBD process system and to analysis of the process treatment results.

Research of Heavily Selective Emitter Doping for Making Solar Cell by Using the New Atmospheric Plasma Jet (새로운 대기압 플라즈마 제트를 이용한 태양전지용 고농도 선택적 도핑에 관한 연구)

  • Cho, I Hyun;Yun, Myung Soo;Son, Chan Hee;Jo, Tae Hoon;Kim, Dong Hea;Seo, Il Won;Rho, Jun Hyoung;Jeon, Bu Il;Kim, In Tae;Choi, Eun Ha;Cho, Guangsup;Kwon, Gi Chung
    • Journal of the Korean Vacuum Society
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    • v.22 no.5
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    • pp.238-244
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    • 2013
  • Doping process using laser is an important process in fabrication of solar cell for heat treatment. However, the process of using the furnace is difficult to form a selective emitter doping region. The case of using a selective emitter laser doping is required an expensive laser equipment and induce the wafer's structure damage due to high temperature. This study, we fabricated a new costly plasma source. Through this, we research the selective emitter doping. We fabricated that the atmospheric pressure plasma jet injected Ar gas is inputted a low frequency (a few tens kHz). We used shallow doping wafers existing PSG (Phosphorus Silicate Glass) on the shallow doping CZ P-type wafer. Atmospheric plasma treatment time was 15 s and 30 s, and current for making the plasma is 40 mA and 70 mA. We investigated a doping profile by using SIMS (Secondary Ion Mass Spectroscopy) and we grasp the sheet resistance of electrical character by using doping profile. As result of experiment, prolonged doping process time and highly plasma current occur a deeper doping depth, moreover improve sheet resistance. We grasped the wafer's surface damage after atmospheric pressure plasma doping by using SEM (Scanning Electron Microscopy). We check that wafer's surface is not changed after plasma doping and atmospheric pressure doping width is broaden by increase of plasma treatment time and current.

Polymer (Polydimethylsiloxane (pdms)) Microchip Plasma with Electrothermal Vaporization for the Determination of Metal Ions in Aqueous Solution

  • Ryu, Won-Kyung;Kim, Dong-Hoon;Lim, H.B.;Houk, R.S.
    • Bulletin of the Korean Chemical Society
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    • v.28 no.4
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    • pp.553-556
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    • 2007
  • We previously reported a 27.12 MHz inductively coupled plasma source at atmospheric pressure for atomic emission spectrometry based on polymer microchip plasma technology. For the PDMS polymer microchip plasma, molecular emission was observed, but no metallic detection was done. In this experiment, a lab-made electrothermal vaporizer (ETV) with tantalum coil was connected to the microchip plasma for aqueous sample introduction to detect metal ions. The electrode geometry of this microchip plasma was redesigned for better stability and easy monitoring of emission. The plasma was operated at an rf power of 30-70 W using argon gas at 300 mL/min. Gas kinetic temperatures between 800-3200 K were obtained by measuring OH emission band. Limits of detection of about 20 ng/mL, 96.1 ng/mL, and 1.01 μ g/mL were obtained for alkali metals, Zn, and Pb, respectively, when 10 μ L samples in 0.1% nitric acid were injected into the ETV.

수처리 목적의 대기압플라즈마를 이용한 유사 폴리도파민 필름 증착

  • Mun, Mu-Gyeom;Yeom, Geun-Yeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2018.06a
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    • pp.124-124
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    • 2018
  • Polydopamine은 수중 접착력, 친환경 접착제, nanoparticle absorption 등 다양한 특성으로 많이 연구되고 있는 소재이다. 본 연구에서는 dopamine을 이용하여 수중 금속을 흡착시키는 thin film을 제작하였다. 종래의 Polydopamine coating 방법으로 wet coating 이 사용되고 있다. 하지만 wet 방식의 경우 시간이 오래 걸릴 뿐만 아니라 in-line, roll to roll 방식을 적용하는 것이 어렵기 때문에 생산적이지 않다. 이에 본 연구에서는 Atmospheric Pressure Plasma(APP)를 이용 하여 Polydopamine-like film을 coating 하였다. APP의 경우 vacuum system, solution tank가 필요 없고 in-line, roll to roll 방식을 적용 할 수 있기 때문에 더 경제적이고 생산적인 공정이다. 또한 기존의 Plasma polymerization 방법은 Plasma energy가 높기 때문에 source의 분자구조가 바뀌거나 atom 단위로 분해된다. source의 분자구조가 바뀌는 "Atomic polymerization", Neiswender-Rosskamp Mechanism이 적용되면 wet 방식 coating한 film과는 다른 특성을 갖게 된다. 하지만 APP polymerization은 Plasma energy가 vacuum plasma 보다 매우 낮기 때문에 stile polymerization mechanism을 구현 하는데 적합 하다. stile polymerization mechanism은 Plasma 내부에서 polymer source를 분해 성장 시켜서 Polymer film 얻는 것이 아닌 source의 분자구조가 깨지지 않으면서 polymer growing 시키는 방법이다. dopamine source의 분자구조를 최대한 유지하려고 하는 이유는 metal absorption과 같은 특성이 dopamine chemical structure에 영향을 받기 때문이다. 많은 논문들에서 dopamine의 catechol group이 metal absorption, adhesion force에 영향을 주는 주요 인자라고 주장하고 있기 때문이다. 그래서 본 논문에서는 Dopamine source의 형태를 보존하면서 Polymerization 하는 방법으로 APP process를 사용 하여 낮은 전압에서 Polydopamine-like film을 제작 하였다. APP system 의 Plasma 방전부 에 Dopamine source를 유입하기 위하여 본 논문에서는 Piezo Spray 방식을 사용 하였다. Dopamine을 evaporator 하는 것이 어렵고 chemical composition이 유사한 monomer를 사용해서 Plasma Polymerization으로 Dopamine 분자 구조를 재현하는 것도 어렵다. 그래서 본 연구에서는 Dopamine을 water에 immerse 하고 Dopamine solution을 mist 상태로 만들어서 Plasma discharge area에 유입하였다. 이러한 방법으로 만들어진 film은 Polydopamine film은 아니지만 Polydopamine film과 유사한 Chemical composition, chemical structure, metal absorption을 갖는 것을 FT-IR, SEM, XPS을 이용 하여 확인 하였다. Dopamine source의 보존에 대하여 명확하게 확인하기 위하여 FT-IR을 측정 하였다. 전압에 따른 Benzene ring, hydroxyl group의 비율을 확인 하였다. 낮은 전압으로 coating 된 Polydopamine-like film 일수록 hydroxyl group peak($3400{\sim}3000cm^{-1}$)과 비교하여 Benzene ring peak($1600{\sim}1580cm^{-1}$ and $1510{\sim}500cm^{-1}$)이 흡수를 더 많이 하는 것을 확인 할 수 있다. 이것은 Benzene ring이 파괴되지 않고 보존되는 것을 보여준다. Dopamine에서 Benzene ring은 absorption main factor인 catechol에 있는 chemical structure이다. 즉 Benzene ring peak이 높을수록 Catechol이 잘 보존 되었다는 의미 이다. Catechol의 보존은 absorption main factor가 보존 된다는 의미 이다. 이러한 Polydopamine-like film으로 As, Cr, Mg, Cu 200ppm solution에 대한 filtration 능력을 확인 하였다. As, Cr, Cu, Mg 의 제거율이 각각 약25%, 35%, 45%, 65%인 것을 확인 하였다. 이 수치는 시중에 판매되는 제품들과 비교했을 때 300%~500% 향상된 수치 이다.

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Color Developing Capacity of Plasma-treated Water as a Source of Nitrite for Meat Curing

  • Jung, Samooel;Kim, Hyun Joo;Park, Sanghoo;Yong, Hae In;Choe, Jun Ho;Jeon, Hee-Joon;Choe, Wonho;Jo, Cheorun
    • Food Science of Animal Resources
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    • v.35 no.5
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    • pp.703-706
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    • 2015
  • The interaction of plasma with liquid generates nitrogen species including nitrite (NO2). Therefore, the color developing capacity of plasma-treated water (PTW) as a nitrite source for meat curing was investigated in this study. PTW, which is generated by surface dielectric barrier discharge in air, and the increase of plasma treatment time resulted in increase of nitrite concentration in PTW. The PTW used in this study contains 46 ppm nitrite after plasma treatment for 30 min. To evaluate the effect of PTW on the cured meat color, meat batters were prepared under three different conditions (control, non-cured meat batter; PTW, meat batter cured with PTW; Sodium nitrite, meat batter cured with sodium nitrite). The meat batters were vacuum-packaged and cooked in a water-bath at 80℃ for 30 min. The typical color of cured meat developed in cooked meat batter treated with sodium nitrite or PTW. The lightness (L*) and yellowness (b*) values were similar in all conditions, whereas, the redness (a*) values of cooked meat batter with PTW and sodium nitrite (p<0.05) were significantly higher than the control. These data indicate that PTW can be used as a nitrite source in the curing process of meat without addition of other nitrite sources.