• Proceedings of the KIEE Conference
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• 1993.07b
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• pp.1256-1258
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• 1993

Optical data storage offer high density storage and archival storage capability. In this study, we selected the ablation mechanism-one of an irreversible recording system-using the antireflection trilayer(ART) structure. Optical recording medium is a $(Te_{86}Se_{14})_{50}Bi_{50}$ thin films. Actually, ART structure is fabricated and compared to monolayer structure. ART structure leads to the reduction of recording power as well as an increase in the effciency compared to the monolayer structure.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1988.05a
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• pp.74-77
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• 1988

This paper reports the properties of antireflection structure and hole formation of Te-based systems. The optical-recording characteristics of metallic recording media are enhanced significantly by incorporating the metal(Al) layer into an antreflection trilayer structure. Due to the interface condition inherent in the design of the trilayer structure, reflectivity from holes is ranked low fraction (<10%). The hole formation is carried by $Ar^+$ Laser(488nm). For 20nsec pulse duration, hole opening power(threschold) of $(Te_{86}Se_{14})_{50}Bi_{50}$ trilayer is lower than that of monolayer that used in this experiment. Hole shapes of the whole sample were clean.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.623-623
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• 2008

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.11
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• pp.5172-5177
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• 2011

This paper presents a reflection coating design scheme in the thin-film silicon solar cell. The antireflection(high reflection) coating skill is needed in the front(back) panel of the thin-film solar cell to improve an efficiency of light absorbing. In the single structure a reflectivity is changed according to the thickness of coating for antireflection scheme and its minimum value can be obtained by controlling thickness of coating. In the symmetric multi layer structure low reflectivity can be obtained in the wide wavelength range. And we also find that high reflectivity can be obtained through multi layer structure, which has alternate layers of high and low material, for high reflection scheme in the back panel.

• Korean Journal of Materials Research
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• v.13 no.6
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• pp.389-393
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• 2003

The effect of antireflection layer on the reduction of optical loss has been investigated in Si photodiodes detecting red light with central wavelength of 670 nm. The theoretical analysis showed minimum reflection loss of 6% for the $SiO_2$thickness of about $1100∼1200\AA$ in the $SiO_2$-Si system with the single antireflection layer and no reflection loss for the X$N_3$N$_4$$SiO_2$thickness of $2000\AA$/$1200\AA$ in the $Si_3$$N_4$$SiO_2$-Si system with double antireflection layer. In our experiments, Si photodiodes with the web-patterned $p^{＋}$-shallow diffusion region were fabricated by bipolar IC process technology and the devices were classified into three kinds according to the structure of $Si_3$$N_4$/$SiO_2$antireflection layer. The fabricated devices showed maximum spectral response in the optical spectrum of 650∼700 nm. The average photocurrents of the devices with the $Si_3$$N_4$$SiO_2$thickness of $1000\AA$/X$SiO\AA$, and $2000\AA$$1800\AA$ under the incident power, of -17 dBm were 3.2 uA, 3.5 uA and 3.1 uA, respectively.

• Current Optics and Photonics
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• v.5 no.4
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• pp.375-383
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• 2021

We present a simulation method to design antireflection coating (ARCs) for fiber-coupled superconducting nanowire single-photon detectors. Using a finite-element method, the absorptance of the nanowire is calculated for a defined unit-cell structure consisting of a fiber, ARC layer, nanowire absorber, distributed Bragg reflector (DBR) mirror, and air gap. We develop a method to evaluate the uncertainty in absorptance due to the uncontrollable parameter of air-gap distance. The validity of the simulation method is tested by comparison to an experimental realization for a case of single-layer ARC, which results in good agreement. We show finally a double-layer ARC design optimized for a system detection efficiency of higher than 95%, with a reduced uncertainty due to the air-gap distance.

• Journal of the Korean institute of surface engineering
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• v.42 no.2
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• pp.59-62
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• 2009

Antireflection pattern, moth-eye structure, was fabricated on lens using Ultra Violet nanoimprint lithography and flexible template. Ni template with conical shaped structure was used as a master template to molding. The flexible poly vinyl alcohol template was fabricated by molding. This poly vinyl alcohol template was used as an imprint template of imprint at lens. Using Ultra Violet nanoimprint lithography and poly vinyl alcohol template, polymer based moth-eye structure was formed on lens and its transmittance was increased up to 94% from 92% at 550 nm wavelength.

• Journal of Korean Ophthalmic Optics Society
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• v.1 no.1
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• pp.93-102
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• 1996

The optical system of lens must be designed to tramsmit light over wide wavelength range and to have lower reflectivity in order to obtain higher spectral transmittance. However, the reflection color light appears due to the remain-reflection light in any optical system of lens. The wavelength of the reflection color light can be controlled by the structure of the number of layers, thickness of layer, reflective index, wavelength of incidence, and substrate etc. In the optical systems of the single layer and the double layers, the reflection color light appears in the condition of the anti-reflection of ${\lambda}s/{\lambda}$ = 1.0 by the color mixture of the remain-reflection lights in the ranges of the longer wavelength side and the shorter one of the ${\lambda}s/{\lambda}$ = 1.0, and of the double layers and triple layers, the reflection color light positioned at P1 < ${\lambda}s/{\lambda}$ < P2 appears in the condition of the antireflection of ${\lambda}s/{\lambda}$ = $PI{\ll}1$ and $P2{\gg}1$. In the optical system of the multi-layers, many antireflection points are existed at the various s/ values, and the reflection color light by the color mixture of the remain-reflection lights in the ranges except for the antireflection points.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.13 no.9
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• pp.4139-4145
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• 2012

This paper shows an antireflection coating design skill for utilization the thin-film silicon solar cell in the future. The reflectivity of each index profile previously suggested as linear, cubic and quintic function has been calculated and compared. Each index profile is applied to the antireflection coating consisting of 6 layers with 180nm thickness. Also we suggest the graded index profile and compare it's reflectivity to the linear, cubic and quintic's ones. As a results we find the reflectivity generally decreases as the order goes to higher. However the reflectivity in the graded index profile shows the higher(lower) value than ones in the linear, cubic and quintic especially in the shorter(longer) wavelength range from 500 nm to below 700 nm(above 700 nm to 800 nm). Therefore we find that the graded index profile structure could be applied for the better antireflection coating design scheme especially for optical device and optical filter in the range of from deep red to infrared.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.251-254
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• 2001

This paper describes an efficiency improvement of buried contact solar cell (BSCS) with a structure of MgF$_2$/CeO$_2$/Ag/Cu/Ni grid/n$^{+}$ emitter/p-type Si base/p$^{+}$/Al. Theoretical and experimental investigations were performed on a double layer antireflection (DLAR) coating of MgF$_2$/CeO$_2$. We investigated CeO$_2$ films as an AR layer because they have a proper refractive index of 2.46 and demonstrate the same lattice constant as Si substrate. An optimized DLAR coating shewed a reflectance as low as 2.04 % in the wavelengths ranged from 0.4 ${\mu}{\textrm}{m}$ to 1.1 ${\mu}{\textrm}{m}$. BCSC cell efficiency was improved from 16.2 % without any AR coating to 19.9 % by employing DLAR coatings. Further details on MgF$_2$/CeO$_2$ DLAR coatings on the BCSC cells are presented in this paper.per.