• Journal of Magnetics
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• v.12 no.2
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• pp.77-80
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• 2007

Recently there was a proposal for a spin filter by using the spin superlattice structure. In a certain energy range, the proposed structure exhibits a high spin filtering efficiency close to 100%. Unfortunately such energy range turns out to be narrow. In this paper, we report a method to widen the energy range by using an analogy to optical anti-reflection coating. In optics, it is well known that a stack of alternating layers of two dielectric materials can function as a highly transmissive or reflective filter for wide range of wavelength. Since electrons also have wave character as light, it would be possible to make an electronic analog of an optical filter. We demonstrate that alternating layers of two materials with different g-factors can function as a spin filter that allows electrons to be transmitted only when their spins point towards a certain particular direction. This spin-superlattice-based spin filter operates in wide energy ranges, curing the problem in the previous proposal.

• Journal of Korean Ophthalmic Optics Society
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• v.6 no.2
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• pp.31-35
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• 2001

The anti-reflective anti-static(ARAS) optical film Was designed using conducting layer $TiN_x$ by Essential Macleod program. From this results, [air ${TiN_x{\mid}SiO_2{\mid}$ glass] two layer shows wide-band AR coating in the wavelength range of 450~700 nm. The $TiN_x$ thin films were prepared on the glass substrate by RF(radio-freqency) magnetron sputtering apparatus from a Ti target in agaseous mixture of argon and nitrogen with the thickness of 7~10 nm. For the films obtained, the chemical binding energy of the films was investigated by x-ray photoelectron spectroscopy(XPS) in order to analyze the chemical nature and composition of the films. In addition, we investigated the relationship between the surface resistance and the chemical nature the sheet resistance and XPS depth profiling the chemical binding of the films.

• Journal of the Korean Vacuum Society
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• v.21 no.1
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• pp.22-28
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• 2012

Transparent dye-sensitized solar cells have been widely investigated for the application to building integrated photovoltaic system. Thin film Si-based solar cells are emerging as a substitute for the dye-sensitized solar cells because their merits of well-established manufacturing processes. Since the selective transmitting layer transmits visible light and reflects infrared light, the solar cell efficiency increases with the introduction of the selective transmitting layer. In this work, AlTiO thin films were grown as the selective transmitting layer by cost-effective sputter deposition and their transmittances were improved by controlling deposition parameters.

• Journal of Korean Ophthalmic Optics Society
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• v.3 no.1
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• pp.237-242
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• 1998

A transparent and colorless $80SiO_2-20TiO_2$(mol%) thin films on soda-lime-silica slide glass and sapphire substrate were obtained by spin-coating technique using tetraethyl orthosilicate and titanium trichloride as starting materials. The prepared film annealed at $750^{\circ}C$ showed a high transmittance and a low reflectance. For the $SiO_2-TiO_2$ films on slide glasses, a strong interaction between the sodium ion and oxygens is properbly the origin of the good stability to the high temperature and the high humidity.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.7.1-7.1
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• 2011

Nanoporous templates have been widely used for the development of new functional nanostructured materials suitable for electronics, optics, magnetism, and energy storage materials. We have prepared nanoporous templates by using thin films of mixtures of polystyrene-block-poly (methyl methacrylate) (PS-b-PMMA) and PMMA homopolymers. These templates have cylindrical nanoholes spanning the entire thickness of the film. Some applications of nanoporous templates are introduced: a) anti-reflective coating, b) the preparation of conducting polymer nanowires of poly (pyrrole), poly (3,4-ethylenedioxy-thiopene) onto a glass coated with indium-tin-oxide, and c) the separation membranes for biomaterials. We found that when the pore fraction of nanoholes in the film was ~0.68, almost zero reflectance at a specific wavelength, which can be changed with film thickness, was achieved at visible wavelengths Furthermore, ultra high density array of conducting nanowires was successfully prepared onto various substrates including flexible polymer. Due to highly alignment of polymer chain along the nanowire direction, the conductivity was much increased. Furthermore, these nanoporous films were found to be very effective for the separation of human Rhinovirus type 14 (HRV 14), major pathogen of a common cold in humans, from the buffer solution. We also found that when the pore size was effectively controlled down to 6 nm, a single file diffusion was observed.

• Journal of the Korean Vacuum Society
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• v.8 no.4A
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• pp.490-495
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• 1999

In 0.18 $\mu \textrm m$ LOGIC device, the etch rate of NMOS polysilicons is different from that of PMOS polysilicons due to the state of polysilicon to manufacture gate line. To control the etch profile, we tested the ratio of $Cl_2$/HBr gas and the total chamber pressure, and also we reduced Back He pressure to get the vertical profile. In the case of manufacturing the gate photoresist line, we used Bottom Anti-Reflective Coating (BARC) to protect refrection of light. As a result we found that $CF_4O_2$ gas is good to etch BARC, because of high selectivity and good photoresist line profile after etching BARC. in the results of the characterization of plasma damage to the antenna effect of gate oxide, NO type thin film(growing gate oxide in 0, ambient followed by an NO anneal) is better than wet type thin film(growing gate oxide in $0_2+H_2$ ambient).

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1825-1828
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• 2008

A simple method for the fabrication of porous nano-master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index has usually been used. However, it is required to have high cost and long times for mass production. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process using the porous nano patterned master on silicon wafer fabricated by low-temperature anodic aluminum oxidation. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Pore diameter and inter-pore distance are about 150nm and from 150 to 200nm. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.187-187
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• 2011

Nowadays, the issue of solar cell durability in local weather and environment is a crucial issue. Above all, surface corrosion on solar cell multilayers is a major factor that determines the durability of commercial solar cells; corrosive chemical interactions between air, humidity and chemical species and solar cell multilayers can unfavorably affect the durability. Here, we study microscopic and spectroscopic surface techniques to investigate the corrosive interaction on the antireflective layers of solar cell multilayers under various conditions such as acid, base, constant temperature and humidity. Surface morphology and adhesion force were characterized with atomic force microscopy before and after chemical treatment. Chemical composition, and transmittance factors were studied with X-ray photoelectron spectroscopy, and ultraviolet-visible spectroscopy, respectively. Based on these studies, we suggest the dominant factors in the corrosive chemical processes, and their influences on the structural, compositional, and optical properties of the antireflective layers.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.4
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• pp.281-286
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• 2019

Raman spectra of a-C:H thin films deposited with an unbalanced magnetron sputtering system showed that the G peak shifted to a higher wavenumber as the target power density increased and $I_D/I_G$ ratio increased from 0.902 to 1.012. Moreover, the transmittance of a-C:H films fabricated at 60 nm tended to decrease with increasing target power density; at 550 nm in the visible light region, the transmittance decreased from 69% to 58%. The rms surface roughness values of the a-C:H thin films decreased with increasing target power density, and varied from 1.11 nm to 0.71 nm. In order to achieve efficient light trapping, the light scattering at the rough interface must be enhanced. Consequently, the surface roughness of the thin film will decrease with the target power density. Further, the refractive index and reflectivity of the a-C:H thin films increased with increasing target power density; however, the Brewster angle decreased with the target power density. Hence, dye-sensitized solar cells using an a-C:H antireflective coating increased the CE, $V_{OC}$, and $J_{SC}$ by approximately 8.6%, 5.5%, and 4.5%, respectively.

• Journal of Korean Ophthalmic Optics Society
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• v.19 no.4
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• pp.471-477
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• 2014

Purpose: We have analyzed the transmittance distribution of the ocular lens using local transmittance microscope to investigate the optical homogeneity of the lens. Methods: The transmittance of the laser which is focused on the surface of the ocular lens was measured by using the photo-detector and lock-in amplifier and analyzed. Multi-coated, uncoated, and progressive lenses were analyzed. Results: In the measurement of the progressive lens and a physical stimulated lens, local transmittance microscopy analysis showed a high degree of match with the measurement results through the optical microscope. In addition, the average value of the transmittance is reduced and the standard deviation was increased in the presence of optical defects. In unstimulated lens, there are a large impact on transmittance whether the anti-reflective coating is presence or absence in both the local transmittance microscopy and general transmittance analysis. Conclusions: The distribution of the transmittance measured by local transmission microscopy were changed when the various stimulus is applied to the lenses. These analyzes by local transmission microscopy can be utilized as a way to evaluate or determine the uniformity of the coating film or lens.