Journal of the Korean Vacuum Society (한국진공학회지)
- Volume 8 Issue 4A
- /
- Pages.490-495
- /
- 1999
- /
- 1225-8822(pISSN)
Study of plasma induced charging damage and febrication of$0.18\mu\textrm{m}$ dual polysilicon gate using dry etch
건식각을 이용한 $0.18\mu\textrm{m}$ dual polysilicon gate 형성 및 plasma damage 특성 평가
Abstract
In 0.18
Keywords