• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 하계학술대회 논문집 C
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• pp.1627-1630
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• 2004

ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YAG laser with a wavelength of 266nm. Before post-annealing treatment in the oxygen ambient, the experiment of the deposition of ZnO thin films has been performed for substrate temperatures in the range of $300{\sim}450^{\circ}C$ and flow rate of 100${\sim}$700 seem. In order to investigate the effect of post-annealing treatment of ZnO thin films, films have been annealed at various temperatures after deposition. After post-annealing treatment in the oxygen ambient, the structural properties of ZnO thin films were characterized by X-ray diffraction(XRD) and the optical properties of the ZnO were characterized by photoluminescence(PL).

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 춘계학술대회 논문집
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• pp.14-14
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• 2010

Recently, low temperature co-fired ceramic (LTCC) technology has gained a remarkable application potential in sensors, actuators and micro systems fields because of its very good electrical and mechanical properties, high reliability and stability as well as possibility of making 3D micro structures. In this study, we investigated the effects of annealing treatment on the electrical properties of $Pb(ZrTi)O_3$ (PZT) thin films deposited on LTCC substrate. PZT thin films were deposited on Au / LTCC substrates by RF magnetron sputtering method. Then, the change of the crystallization of the films were investigated under various annealing temperatures and times. The results showed that the crystallization of the films were enhanced as increasing annealing temperatures. The film, annealed at $700^{\circ}C$, 3min, was well crystallized in the perovskite structure.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2008년도 하계종합학술대회
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• pp.501-502
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• 2008

In this study, P-doped ZnO thin films were prepared on sapphire substrates by pulsed laser deposition and annealing method. The electrical properties were investigated as a function of annealing temperatures at a fixed oxygen pressure. The XRD measurement showed that p-doped ZnO thin films were c-axis oriented. The Hall measurement showed that p-type ZnO thin film was observed. The carrier concentration of $1.18{\times}10^{16}cm^{-3}$ and the mobility of $0.96\;cm^{-3}/Vs$ were obtained for the P-doped ZnO thin film fabricated annealing temperature $850^{\circ}C$.

• Applied Biological Chemistry
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• 제34권2호
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• pp.187-189
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• 1991

Gelatinization temperatures of upland and lowland waxy brown rice starches annealed at $25^{\circ}C$ and $60^{\circ}C$ for 24hr were investigated with differential scanning calorimetry No annealing effect was observed at low temperature. The upland rice starch showed narrower range of gelatinization temperature upon annealing treatment at $60\circ}C$ compared with the lowland rice starch. The enthalpy of gelatinization was not changed in case of the upland rice starch but was increased in case of the lowland one upon annealing.

• 한국표면공학회지
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• 제23권1호
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• pp.16-26
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• 1990

The standrd electrolyte for the electrodeposition of chromium were preparwith reagent grade chromic acid(200g/L), sulfuric acid(pH=1.8)and oxalic acalic acid(640g/L)as additive. Carbon content in chromium plating varied about2.0-3.8 wt% with current density and temperatures of the bath. The hardeness of chromium platings incresed with increasing the annealing temperatures and showed maximum value of about Hv 1700 after annealing at$ 700^{\circ}C$for 60min. But, decreased it as annealing at above $700^{\circ}C$. The reason for varing thee hardness of chromium codeposited with carbon gradually foumed chromium carbide(Cr7C3), but that changed to Cr23C6 as annealing temperature at above $^700{\circ}C$. The X-ray diffraction pattern indicated that chromium carbides, such as Cr7C3 or Cr3C2, formed at formed at above $300^{\circ}C$. titanium coating sputtered on the on surface of chromium plating had performed and determined the hardness after annealing at 500, 600, $700^{\circ}C$ for 60min. the maximum hardeness was about Hv 2400 as annealing at $700^{\circ}C$. The titanium carbide formed in layer was identified by X-ray diffraction. It was confirmed that chromium and titanium carbide has effect of increasing the hardness.

• 소성∙가공
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• 제18권8호
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• pp.625-632
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• 2009

The influence of the subsequent-annealing(SA) temperature on the plasma electrolytic oxidation(PEO)-treated Mgbased alloy was investigated in terms of surface properties associated with hardness and corrosion. For this purpose, a series of the SA treatments were performed on the PEO-treated samples at four different temperatures, i.e., 100, 150, 200, and $250^{\circ}C$ for 10 hrs. When compared to the sample without SA, the samples annealed at temperatures higher than $200^{\circ}C$ showed a difference in surface morphology due to the volume expansion accompanied by the dehydration reaction where the part of $Mg(OH)_2$ changed into MgO, working as harder phase. From the results of nano-indentation tests, the applied loads of the samples were seen to increase with increasing SA temperatures. However, the electro-chemical and corrosion properties of the sample annealed at $150^{\circ}C$ were higher than those of the samples annealed at three temperatures.

• Corrosion Science and Technology
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• 제14권6호
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• pp.296-300
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• 2015

ALDC8 (Al-Si-Cu) alloy has been often corroded with pattern of intergranular corrosion in corrosive environments. Thus, in order to improve its corrosion resistance, the effect of annealing heat treatment to corrosion resistance and hardness was investigated with parameters of heating temperatures such as $100^{\circ}C$, $200^{\circ}C$, $300^{\circ}C$, $400^{\circ}C$ and $500^{\circ}C$ for 1hr. The hardness was varied with annealing temperature and slightly decreased with annealing heat treatment. However, the relation between annealing temperature and hardness agreed not well each other. Corrosion potential was shifted to noble direction and corrosion current density was also decreased with increasing annealing temperature. Moreover, both AC impedance at 10 mHz and polarization resistance on the cyclic voltammogram curve were also increased with increasing annealing temperature. Furthermore, intergranular corrosion was somewhat observed in non heat treatment as well as annealing temperatures at $100^{\circ}C$, $200^{\circ}C$ and $300^{\circ}C$, while, intergranular corrosion was not nearly observed at annealing temperature of $400^{\circ}C$, $500^{\circ}C$. Consequently, it is considered that the annealing heat treatment of ALDC8 alloy may be an available method not only to inhibit its intergranular corrosion but also to improve its corrosion resistance.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.270-271
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• 2008

Antimony (6 wt%) doped tin oxide (ATO) films to improve conductivity were deposited on 7059 coming glass by RF magnetron sputtering method for application to transparent electrodes. The ATO film was deposited at a working pressure of 5 mTorr and RF power of 175 W. We investigated the effects of the post-annealing temperature on structural, electrical and optical properties of the ATO films. The films were annealed at temperatures ranging from $300^{\circ}C$ to $600^{\circ}C$ in step of $100^{\circ}C$ using RTA equipment in vacuum ambient. X-ray diffraction (XRD) measurements showed the ATO films to be crystallized with a strong (101) preferred orientation as the annealing temperature increased. Electrical resistivity decreased significantly with annealing temperatures up to $600^{\circ}C$. ATO film annealed at temperature of $600^{\circ}C$ showed the lowest resistivity of $5.6\times10^{-3}\Omega$-cm. Optical transmittance increased significantly with annealing temperatures up to $600^{\circ}C$. The highest transmittance was 90.8 % in the visible range from 400 to 800 nm.

• Journal of Advanced Marine Engineering and Technology
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• 제29권6호
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• pp.654-661
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• 2005

Copper is a well known alloying element that is used to improve the resistance to general corrosion of stainless steel And also Cu cation have the anti-fouling effect to inhibit adhesion of the marine algae and shellfish to the surface of heat exchanger cooling pipe or outside wall of the ship, Therefore there are some anti-fouling methods such as anti-fouling Paint mixed with copper oxide or MGPS(Marine Growth Preventing System) by using Cu cation dissolved to the sea wather solution. Cu cation can be dissolved spontaneously by galvanic current due to Potential difference between Cu and cooling pipe of heat exchanger with Ti material, which may be one of the anti-fouling designs. In this study the effect of annealing heat treatment to galvanic current and Polarization behavior was investigated with a electrochemical points of view such as measurement of corrosion Potential, anodic polarization curve. cyclic voltammetric curve, galvanic current etc The grain size of the surface in annealed at $700^{\circ}C$ was the smallest than that of other annealing temperatures. and also the corrosion Potential showed more positive potential than other annealing temperatures. The galvanic current between Ti and Cu with annealed at $700^{\circ}C$ was the largest value in the case of static condition. However its value in the case of flow condition was the smallest than the other temperatures. Therefore in order to increase anti-fouling effect by Cu cation, the optimum annealing temperature in static condition of sea water is $700^{\circ}C$, however non- heat treated specimen in the case of flow condition may be desirable.

• 융합정보논문지
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• 제10권8호
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• pp.137-143
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• 2020

SiO2 증착된 금속 호일 기판에 형성된 은 금속 박막의 급속 열처리에 대한 물리적 및 화학적 특성 영향을 조사하였다. 은 박막을 150도에서 550도까지 온도를 변화시키며, 각 온도에서 20분 동안 급속 열처리를 진행하였다. 550도에서 표면 거칠기와 저항이 급격하게 증가하는 현상을 발견하였다. 따라서 550도의 열처리 온도 샘플에 대해 조성 분석 기법을 사용하였고, 은 필름 표면에 산소 (O) 및 실리콘 (Si) 원자가 존재함을 확인하였다. 박막의 광학적 특성인, 전체 반사율은 온도가 증가함에 따라 감소하였으며, 특히 550도에서 공정을 진행한 박막은 박막 및 기판 표면으로부터의 다중 반사에 의한 광학적 간섭으로 인해 정현파 특성을 나타냄을 확인하였다. 이러한 현상은 급속 열처리 동안 SiO2 층으로부터 Si 원자의 외부 확산에 기인한 것이다. 본 연구 결과는 다양한 플렉서블 광전자소자의 기판으로 사용할 수 있는 가능성을 제공한다.