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http://dx.doi.org/10.22156/CS4SMB.2020.10.08.137

Rapid Thermal Annealing for Ag Layers on SiO2 Coated Metal Foils  

Kim, Kyoung-Bo (Department of Metallurgical and Materials Engineering, Inha Technical College)
Publication Information
Journal of Convergence for Information Technology / v.10, no.8, 2020 , pp. 137-143 More about this Journal
Abstract
This study examined the effects of rapid thermal annealing (RTA) on the physical and chemical characteristics of thin silver (Ag) layers on SiO2 coated metal foils. Ag layers were annealed at various temperatures of the range between 150 ℃ and 550 ℃ for 20 min. The surface roughness and resistivity are increased at the annealing temperatures of 550 ℃. We also found that oxygen (O) and silicon (Si) atoms exist at the Ag film surface by using compositional analysis in the annealing temperatures of 550 ℃. The total reflectance is decreased with increasing temperature. These phenomena are due to an out-diffusion of Si atoms from SiO2 layers during the RTA annealing. The results offer the possibility of using it as a substrate for various flexible optoelectronic devices.
Keywords
Ag; SiO2; Rapid thermal annealing; Metal foil; Optical and electrical properties;
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Times Cited By KSCI : 3  (Citation Analysis)
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