Anisotropic Etching Technology of Highly Doped Polysilicon by Mixed Chloroform
(클로로포름($CHCl_3$ )을 첨가한 고농도 폴리실리콘 이방성 식각 기술)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.11 no.2
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- pp.101-105
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- 1998