• 한국재료학회:학술대회논문집
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• 한국재료학회 2010년도 춘계학술발표대회
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• pp.49.1-49.1
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• 2010

The particle generation during the plasma enhanced process is highly considered as serious problem in the semiconductor manufacturing industry. The material for the plasma processing chamber requires the plasma etching characteristics which are homogeneously etched surface and low plasma etching depth for preventing particulate contamination and high durability. We found that the materials without grain boundaries can prevent the particle generation. Therefore, the amorphous material with the low plasma etching rate may be the best candidate for the plasma processing chamber instead of the polycrystalline materials such as yttria and alumina. Three glasses based on $SiO_2$ and $Al_2O_3$ were prepared with various rare-earth elements (Gd, Y and La) which are same content in the glass. The glasses were plasma etched in the same condition and their plasma etching rate was compared including reference materials such as Si-wafer, quartz, yttria and alumina. The mechanical and thermal properties of the glasses were highly related with cationic field strength (CFS) of the rare-earth elements. We assumed that the plasma etching resistance may highly contributed by the thermal properties of the fluorine byproducts generated during the plasma exposure and it is expected that the Gd containing glass may have the highest plasma etching resistance due to the highest sublimation temperature of $GdF_3$ among three rare-earth elements (Gd, Y and La). However, it is found that the plasma etching results is highly related with the mechanical property of the glasses which indicates the cationic field strength. From the result, we conclude that the glass structure should be analyzed and the plasma etching test should be conducted with different condition in the future to understand the plasma etching behavior of the glasses perfectly.

• 한국재료학회지
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• 제9권6호
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• pp.630-634
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• 1999

$Al(OH)_3$와 비정질 $SiO_2$를 출발원료로 사용하여 반응소결을 통한 다공성 뮬라이트를 제조하였다. $Al(OH)_3$와 $SiO_2$의 몰비를 뮬라이트의 화학양론적 조성과 실리카와 얄루미나가 많은 조성으로 변화시키고, 각 조성에 $AlF_3$를 0, 1, 5, 10wt% 첨가하여 뮬라이트의 생성에 미치는 조성과 첨가제의 영향을 살펴보았다. 첨가한 $AlF_3$의 양이 많아질수록 낮은 온도에서 뮬라이트가 생성됨을 보였고, 첨가된 $AlF_3$의 양이 5wt%인 경우, 화학량론적 뮬라이트 조성에서 율라이트가 $1250^{\circ}C$에서부터 생성되기 시작하였으 며 $1300^{\circ}C$ 이상 열처리한 경우 충분히 발달한 침상형의 다공성 뮬라이트가 합성되었다. $AlF_3$의 양이 5wt% 이상 첨가한 경우 열 처리 온도의 영향은 크게 나타나지 않았으며, 소성체의 수축도 거의 일어냐지 않았다.

• 한국결정성장학회지
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• 제9권1호
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• pp.113-118
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• 1999

$AlCl_3{\cdot}6H_2O$를 출발원료로 침전법에 의해 알루미늄 수화물을 합성하였다. 용액의 pH에 따라 amorphous, boehimite, bayerite, nordstrandite 상을 얻었고, 수산화 알루미늄은 열처리 온도가 증가함에 따라 $\gamma$, $\delta$, $\theta$를 거쳐${\alpha}-Al_2O_3$로 전이되었으며, 입자크기도 증가하였다. ${\gamma}-Al_2O_3$ 를 담금피막법(dip-coating method)으로 중간층 위에 코팅하였고, 비교를 위해 비지지체 분리막도 준비하였다. 지지체 분리막은 작은 입자(grain)들로 구성된 다공질 구조(porous structure)를 나타내었지만, 비지지체 분리막에서는 상호 연결된 큰 입자(grain)들이 나타났다. 지지체 분리막에서 보다 비지지체 분리막에서 결정립 성장이 명백하게 나타났다.

• 한국세라믹학회지
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• 제47권5호
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• pp.401-406
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• 2010

For the lower-temperature preparation of calcium monoaluminate(CA, C:CaO, A:$Al_2O_3$) clinker which is hard to synthesize purely within its melting point, an equimolar hydrate was obtained and then used as a starting raw material of clinker burning. The hydrate was prepared from a mixture of waste oyster shell and industrial aluminium hydroxide by heating to $1200^{\circ}C$, grinding and mixing with water. The hydrate was composed of amorphous aluminium hydroxide and $C_3AH_6$(H:$H_2O$) formed by resolution-precipitation mechanism of the system C-A-H. By heating the hydrate, nearly pure and porous calcium monoaluminate clinker was formed at $1400^{\circ}C$ which is fairly lower temperature than that of its melting point. The formation of calcium monoaluminate was performed mainly by the reaction between amorphous alumina and $C_{12}A_7$ caused by the decomposition of $C_3AH_6$. The immediate and earlier formation of $C_{12}A_7$ seemed to be accelerated by not only high surface area and instability of the thermally decomposed hydrate but also the catalytic effect of water decomposed from the hydrate. The final calcium monoaluminate clinker was very porous because of the influence of highly porous shape of the thermally decomposed hydrate.

• Tribology and Lubricants
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• 제34권6호
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• pp.241-246
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• 2018

This research addresses the improvement of tribo-systems, specifically regarding the reduction of friction and wear through tribo-coupling between tetrahedral amorphous carbon (ta-C) with different types of counterpart materials, namely bearing steel (SUJ2), tungsten carbide (WC), stainless steel (SUS304), and alumina ($Al_2O_3$). A second variable in this project is the utilization of different values of duct bias voltage in the deposition of the ta-C coating - 0, 5, 10, 15, and 20 V. The results of this research are expected to determine the optimum duct bias and best counter materials associated with ta-C to produce the lowest friction and wear. Results obtained reveal that the tribo-couple between the ta-C coating and SUJ2 balls produces the lowest friction coefficient and wear rate. In terms of duct bias changes, deposition using 5 V produces the most optimum tribological behavior with lowest friction and wear on the tribo-system. In contrast, the tribo-couple between ta-C with a WC ball causes penetration through the coating surface layer and hence high surface delamination. This study demonstrates that the most effective ta-C coating duct bias is 5 V associated with SUJ2 counter material to produce the lowest friction and wear.

• 한국결정성장학회지
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• 제29권2호
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• pp.50-53
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• 2019

박막 태양전지에 주로 적용되는 다결정 규소층을 AIC(Aluminum Induced Crystallization) 공정을 이용하여 제조하였다. 결정립의 확대를 위하여 selective diffusion barrier 사용하였다. 이 diffusion barrier는 $Al_2O_3$ 막을 사용하였다. 공정시간의 단축을 위하여 열처리는 RTA(Rapid Thermal Annealing) 공정으로 진행하였다. 비정질 실리콘의 결정화는 XRD 측정을 통해 분석했다. 그 결과 $500^{\circ}C$에서 결정화되었으며, 결정 크기는 $15.9{\mu}m$로 계산되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.340-340
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• 2016

We have prepared alumina (Al2O3) doped zinc oxide (AZO) films by DC magnetron sputtering (MS) technique and obtained higher self surface texturing at a high target angle (f). We have characterized the films and applied it as a front electrode of a single junction amorphous silicon solar cell. At a lower f the deposited films show higher values of optical gap (Eg), charge carriers mobility & concentration, crystallite grain size and wider wavelength range of transmission. At higher target angle the sheet resistance, surface roughness, haze factor etc for the films increase. For f=72.5o the haze factor for diffused transmission becomes 6.46% at 540 nm wavelength. At f=72.5o the material shows a reduction in crystallinity and evolution of a hemispherical-type sub-micron surface textures. A Monte Carlo method (MCM) of simulation of the AZO film deposition shows that such an enhanced self-surface texturing of the films at higher f is possible.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 추계학술발표대회
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• pp.44.2-44.2
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• 2009

Polycrystalline materials suchas yttria and alumina have been applied as a plasma resisting material for the plasma processing chamber. However, polycrystal line material may easily generate particles and the particles are sources of contamination during the plasma enhanced process. Amorphous material can be suitable to prevent particle generation due to absence of grain-boundaries. We manufactured nitrogen-containing $SiO_2-Al_2O_3-Y_2O_3$ based glasses with various contents of silicon and fixed nitrogen content. The thermal properties, mechanical properties and plasma etching rate were evaluated and compared for the different composition samples. The plasma etching behavior was estimated using XPS with depth profiling. From the result, the plasma etching rate highly depends on the silicon content and it may results from very low volatile temperature of SiF4 generated during plasma etching. The silicon concentration at the plasma etched surface was very low besides the concentration of yttrium and aluminum was relatively high than that of silicon due to high volatile temperature of fluorine compounds which consisted with aluminum and yttrium. Therefore, we conclude that the samples having low silicon content should be considered to obtain low plasma etching rate for the plasma resisting material.

• 한국결정성장학회지
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• 제27권5호
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• pp.223-228
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• 2017

Aluminum nitride (AlN) powder was successfully synthesized at low temperature via carbothermal reduction and nitridation (CRN) assisted by microwave heating. The synthesis processes of AlN powder were investigated with X-ray diffraction, FE-SEM, FT-IR and TGA/DSC. Aluminum nitrate was used as an oxidizer and aluminum source, urea as fuel, and glucose as carbon source. These starting materials were mixed with D.I water and reacted in a flask at $100^{\circ}C$ for 20 minutes. After the reaction was finished, black foamy intermediate product was formed, which was considered to be an amorphous $Al_2O_3$ particles through intermediate product obtained by solution combustion synthesis (SCS) at the results of X-ray diffraction patterns and FT-IR. This intermediate product was nitridated at temperatures of $1300^{\circ}C$ and $1400^{\circ}C$ in $N_2$ atmosphere by a microwave heating furnace and then decarbonated at $600^{\circ}C$ for 2 hours in air. It should be noticed from FE-SEM images that as nitridated particles, identified as AlN from X-ray diffraction patterns, are covered with carbon residues. After decarbonating the nitridated powders, the spherical pure AlN powders were obtained without alumina and their particle sizes were dependent on the nitridating temperature with high temperature of $1400^{\circ}C$ giving large particles of around 70~100 nm.

• 한국세라믹학회지
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• 제45권5호
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• pp.297-302
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• 2008

To direct the evolution of nanostructure and immobilize ${\gamma}-Al_2O_3$ catalyst, nanocrystalline La-doped-$Al_2O_3$ powder were prepared by the sol-gel process with addition of an amphiphilic block copolymer template (pluronic P123: $(poly(ethyleneoxide)_{20}-poly(propyleneoxide)_{70}-poly(ethyleneoxide)_{20})$. The dried gel is amorphous, whereas heating at temperature above $700^{\circ}C$ leads to the formation of nanocrystalline ${\gamma}$ and ${\delta}-Al_2O_3$ and these two phases is kept until $1100^{\circ}C$. ${\alpha}-A1_2O_3 $starts to form at $1200^{\circ}C$ with $LaAl_{11}O_{18}$. The surface morphology and crystal structure has been observed by field emission scanning electron microscope (FE-SEM) and X-ray diffraction (XRD). Solid state $^{27}Al$ MAS NMR indicates two types of local environment, i.e. octahedral and tetrahedral sites. The surface area and pore size was compared among these powders using the BET nitrogen adsorption measurements.