• 센서학회지
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• 제9권1호
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• pp.22-27
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• 2000

고자왜특성과 연자성특성을 가짐으로서 우수한 자기기계결합특성을 나타내는 아몰퍼스 FeCoSiB 박막의 스트레인 검출특성에 대해 연구하였다. 투자율은 박막기판을 마이크로메타를 이용하여 벤딩시켜 박막에 스트레인을 인가하면서 조사하였으며, 이때 박막에 스트레인이 인가되면 박막의 자기기계결합에 의해 투자율이 변화하였다. 스트레인에 의한 성능지수 $F=({\Delta}{\mu}/{\mu})/{\varepsilon}$ (단위스트레인에 대한 투자율의 변화)가 $1.2{\times}10^5$라는 매우 높은 값을 나타내어 본 연구에서 제작한 박막이 스트레인에 대하여 고감도특성을 가지고 있음을 알 수 있었다. 또한 제작된 박막을 센서소자로 응용하기 위해 박막을 미세 가공하고, 스트레인에 대한 고주파 임피던스의 변화를 조사하였으며, 박막의 우수한 자기기계결합특성으로 박막패턴의 임피던스는 인가된 스트레인에 의해 민감하게 변화되었다. 특히, 100MHz의 구동주파수에 있어서 $300{\times}10^{-6}$의 스트레인이 인가된 경우 46%의 임피던스변화율이 얻어졌다. 따라서 본 연구에서 제작한 박막소자는 초고감도의 스트레인 센서로 사용될 수 있을 것으로 기대된다.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2006년도 동계학술연구발표회 및 자성 스핀트로닉스 국제학술대회
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• pp.42-43
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• 2006

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2003년도 하계학술연구발표회 및 한.일 공동심포지엄
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• pp.116-117
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• 2003

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2002년도 동계연구발표회 논문개요집
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• pp.208-209
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• 2002

Recently an asymmetric giant magnetoimpedance (GMI) profile has been observed in Co-based amorphous ribbons annealed at the weak field [1-4]. This phenomenon has attracted a large interest due to its practical application to sensitive magnetic sensors. It is known [5.6] that in magnetic materials, the magnetoimpedance is caused by the effect of the magnetic field on the transverse magnetic permeability of a near-surface layer. In consequence of it, the value of the magnetoimpedance depends strongly on near-surface magnetic properties of the sample. (omitted)

• 한국재료학회지
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• 제9권11호
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• pp.1117-1122
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• 1999

5~10nm 두께의 얇은 산화막 위에 $\alpha$-실리콘과 Co/Ti 이중막을 순차적으로 증착하고 급속열처리하여 코발트 폴리사이드 전극을 만든 후, SADS법으로 다결정 Si을 도핑하여 MOS 커패시터를 제작하였다. 이때 drive-in 열처리조건에 따른 커패시터의 C-V 특성과 누설전류를 측정하여, $\textrm{CoSi}_{2}$의 열적안정성과 도판트 (B 및 As)의 재분포가 Co-폴리사이드 게이트의 전기적 특성에 미치는 영향을 연구하였다.$ 700^{\circ}C$에서 60~80초간 열처리시, 다결정 Si층의 도핑으로 우수한 C-V 특성과 낮은 누설전류를 나타냈으나, 그 이상 장시간 또는 $900^{\circ}C$의 고온에서는 $\textrm{CoSi}_{2}$의 분해에 따른 Co의 확산으로 전기적 특성이 저하되었다. SADS법으로 Co-폴리사이드 게이트 전극을 형성할 때, 도판트가 다결정 Si층으로 충분히 확산되는 것뿐만 아니라, $\textrm{CoSi}_{2}$의 분해를 억제하는 것이 매우 중요하다.

• Journal of Magnetics
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• 제18권2호
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• pp.159-162
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• 2013

We present how to optimize the operation condition including frequency of the orthogonal fluxgate sensor in this paper. The orthogonal fluxgate sensor was fabricated with a Co-based amorphous wire with 10 mm long and 100 ${\mu}m$ in the diameter and a 270-turn pickup coil wound on the amorphous wire. In order to investigate the frequency dependence of the sensitivity, output spectra of the sensor which was connected by using a coaxial cable with various lengths of 0.5-5 m were measured with a RF lock-in amplifier. The maximum sensitivities were obtained at different frequencies according to coaxial cable lengths. It was found that the optimal operation frequencies, at which maximum sensitivities were appeared, were almost identical to the frequencies of impedance resonance. The maximum sensitivity and optimal operation frequency were 1.1 V/Oe (${\approx}$ 11000 V/T) and 1.25 MHz respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.136-139
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• 1997

In this paper, we inveatigate frequency dependance of inductance effects of FeCoB amorphous magnetic films. First, amorphous magnetic film having near zero magnetostriction is the basic composition of (Fe$_{1-x}$ / $Co_{x}$)$_{79}$Si$_2$B$_{19}$ with x=0.94, 0.95 and in order to decrease magnetio . anisotropy, the film was annealed in 28$0^{\circ}C$/30min, 40$0^{\circ}C$/30min, 40$0^{\circ}C$/1hr with near crystallization temperature under non-magnetic field. As result of investigation, in case of x=7.95 than x=0.94, we could have obtained high values, which inductance ratios in the low frequency was 488%. And Quality factor Q was under 0.7 in all sample, in case of annealed in 28$0^{\circ}C$/30min, we could have obtained highest value, which x=0.9fl is about 0.62 in 400[kHz], and in case of x=0.95 was about 0.35 in 1[MHz].z].].

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 제5회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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• pp.90-95
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• 2003

The present paper is to investigate the phase stability and soft magnetic properties of amorphous CoNbZr films when Pd is added as a substitution for CoNbZr alloys. The films were prepared by a RF magnetron sputtering method. The CoNbZrPd films deposited on Si wafers exhibited amorphous structures being independent upon the amount of Pd added in the films. On the addition of 4.34% Pd, the excellent soft magnetic characteristics of the films were observed with a coercive force of 0.54 Oe and an anisotropy field of 11 Oe, whereas a coercive force of 1 Oe and an anisotropy field of 3.5 Oe were shown in the film without the addition of Pd. The increased anisotropy field and low coercive force of the films may be attributed to the occupancy of Pd in the preferred sites parallel to the external magnetic field applied on the deposition process. A permeability of about 1100 was kept constant in the operation frequency ranging up to 100 MHz, which can be explained by the Landau-Lifshitz formula.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2002년도 추계학술대회 발표 논문집
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• pp.54-58
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• 2002

The present paper is to investigate the phase stability and soft magnetic properties of amorphous CoNbZr films when Pd is added as a substitution for CoNbZr alloys. The films were prepared by a RF magnetron sputtering method. The CoNbZrPd films deposited on Si wafers exhibited amorphous structures being independent upon the amount of Pd added in the films. On the addition of 4.34% Pd, the excellent soft magnetic characteristics of the films were observed with a coercive force of 0.54 Oe and an anisotropy field of 11 Oe, whereas a coercive force of 1 Oe and an anisotropy field of 3.5 Oe were shown in the film without the addition of Pd. The increased anisotropy field and low coercive force of the films may be attributed to the occupancy of Pd in the preferred sites parallel to the external magnetic field applied on the deposition process. A permeability of about 1100 was kept constant in the operation frequency ranging up to 100 MHz, which can be explained by the Landau-Lifshitz formula.

• 한국진공학회지
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• 제5권3호
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• pp.245-250
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• 1996

$Y_2O_3$ thin film on si(100) was successfully grown by ionized cluster beam(ICBD) technique at substrate temperature of around $500^{\circ}C$ and pressure of ~$10^{-5}$Torr.To prevent the oxidation of Si substrae, a very thin yttrium layer was deposited on Si before reactive depositing of oxygen and yttrium source. In asdeposited stage, b.c.c and h.c.p strucutres of $Y_2O_3$ were observed from S-ary analysis. From the observation of spots and ring patterns in selected area diffractin(SAD) patterns. crystallane formation and growth could be proceeded during the deposition. $Y_2O_3$/mixed layer/$SiO_2=170\AA/50\AA/10\AA$ structure were verified by high resolution transmition electron imcroscopy(HRTEM) image, and the formation of amorphous layer of SiO2 was discussed . Electricla charateristics of the film were also investigated . In as-deposited Pt/$Y_2O_3$/Si sturcuture, leakage current was less than $10^{-6}$A/$\textrm{cm}^2$ at 7MV/cm strength.