• 제목/요약/키워드: amine process

검색결과 178건 처리시간 0.027초

초미분체 NiO/YSZ 고체산화물 복합재료의 제조특성 (Manufacture Properties of the Ultrafine NiO/YSZ Solid Oxide Composite)

  • 최창주;김창석;오무송;김태성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.1080-1083
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    • 2001
  • Ultrafine NiO/YSZ composite powders were prepared by using a glycine nitrate process for anode material of solid oxide fuel cells. The specific surface areas of synthesized NiO/YSZ composite powders were examined with controlling pH of a precursor solution and the content of glycine. The characteristics of synthesized composite powders were examined with X-ray diffractometer, a BET method with N$_2$absorption, scanning and transmission electron microscopy. The strongly acid precursor solution increased the specific surface area of the synthesized composite powders. This is suggested to be caused by the increased binding of metal ions and glycine under a strong acid solution of pH=0.5 that lets glycine consist of mainly the amine group of NH$_3$$\^$+/. After sintering and reducing treatment of NiO/YSZ composite powders synthesized by GNP, the Ni/YSZ pellet showed ideal micro-structure very fine Ni parties of 3-5${\mu}$m were distributed uniformly and fine pores around Ni metal particles were formed, thes, leading to an increase of the triple phase boundary among gas Ni and YSZ.

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Choline and basic amine drugs efflux from brain to blood across the blood-brain barrier

  • Lee, Na-Young;Kang, Young-Sook
    • 한국응용약물학회:학술대회논문집
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    • 한국응용약물학회 2003년도 Annual Meeting of KSAP : International Symposium on Pharmaceutical and Biomedical Sciences on Obesity
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    • pp.107-107
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    • 2003
  • The purpose of this study is to examine that the efflux transport system for choline from brain to blood is present at the blood-brain barrier (BBB) using brain efflux index (BEI) method. [$^3$H]Choline was microinjected into parietal cortex area 2 (Par2) region of rat brain, and was eliminated from the brain with an apparent elimination half life of 45 min. The BBB efflux clearance of [$^3$H]choline was 0.12 $m\ell$/min/g brain, which was calculated from the efflux rate constant (1.5${\times}$10$\^$-2/ min$\^$-1/) and the distribution volume in the brain slice (8.1 $m\ell$/g brain). This process was saturable and significantly inhibited by various organic cationic compounds including hemicholinium-3, tetraethylammonium chloride (TEA) and verapamil, by antioxidant, ${\alpha}$-phenyl-n-tert-butyl nitrone (PBN), and by Alzheimer's disease therapeutics, such as acetyl $\ell$-carnitine and tacrine. In conclusion, this finding is the first direct in vivo evidence that choline is transported from brain to the blood across the BBB via a carrier-mediated efflux transport process.

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부상공정에 의한 수용액으로부터 색 제거 (Colour Removal from Aqueous Solutions by Flotation Process)

  • 노성희;윤영재;김진환;김선일
    • 공업화학
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    • 제10권4호
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    • pp.576-580
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    • 1999
  • Column에 공기를 분사시켜 수용액으로부터 색을 제거하기 위한 연구를 수행하였다. 착색 용액을 제조하기 위해 Basic Yellow 28 및 Direct Orange 31을 사용하였으며, 모든 색은 8분 이내에 제거되었다. Sodium dodecyl sulfate, oleic acid sodium salt 및 amines와 같은 collector는 색 제거에 효과적이었다. 색 제거는 collector의 첨가량과 수용액 pH의 영향을 받는다고 할 수 있으나, 소량의 collector를 첨가하였을 경우에는 pH에 의존하였으나, 많은 양을 첨가하였을 경우에는 pH에 의존하지 않았음을 알 수 있었다.

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One- and Two-Dimensional Arrangement of DNA-Templated Gold Nanoparticle Chains using Plasma Ashing Method

  • Kim, Hyung-Jin;Hong, Byung-You
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.291-291
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    • 2010
  • Electron-beam lithography (EBL) process is a versatile tool for a fabrication of nanostructures, nano-gap electrodes or molecular arrays and its application to nano-device. However, it is not appropriate for the fabrication of sub-5 nm features and high-aspect-ratio nanostructures due to the limitation of EBL resolution. In this study, the precision assembly and alignment of DNA molecule was demonstrated using sub-5 nm nanostructures formed by a combination of conventional electron-beam lithography (EBL) and plasma ashing processes. The ma-N2401 (EBL-negative tone resist) nanostructures were patterned by EBL process at a dose of $200\;{\mu}C/cm2$ with 25 kV and then were ashed by a chemical dry etcher at microwave (${\mu}W$) power of 50 W. We confirmed that this method was useful for sub-5 nm patterning of high-aspect-ratio nanostructures. In addition, we also utilized the surface-patterning technique to create the molecular pattern comprised 3-(aminopropyl) triethoxysilane (APS) as adhesion layer and octadecyltrichlorosilane (OTS) as passivation layer. DNA-templated gold nanoparticle chain was attached only on the sub-5 nm APS region defined by the amine groups, but not on surface of the OTS region. We were able to obtain DNA molecules aligned selectively on a SiO2/Si substrate using atomic force microscopy (AFM).

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저압 나노여과 공정에서의 유해성 유기물질의 거동 (Behavior of Hazardous Organic Compounds in Low-Pressure Nanofiltration Process)

  • 오정익;이석헌;이보영
    • 상하수도학회지
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    • 제18권2호
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    • pp.165-173
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    • 2004
  • Behavior of hazardous organic compounds including bisphenol A, phtalic acid, and phosphoric acid in low pressure nanofiltration process were investigated. In the case of NTR729HF, rejection of all target organic compounds except 2-H-Benzothiazol and 2-isopropyl phenol was more than 90%. The lowest rejection for 2-H-Benzothiazol was observed in another membranes. The UTC60 and UTC20 showed similar rejection characteristics of hazardous organic compounds. Although the rejection of Bisphenol A, n-buthyl benzenesulfoneamide, N-ethyl-p-toluensulfonamide, 2-H-benzothiazol, p-t-butylphenol and 2-isopropyl phenol was less than 30%, the rejection of tributyl phosphate, triethyl phosphate, camphor, 2,2,4 trimethyl 1,3 pentandiol and diphenyl amine was more than 90% in the case of UTC60 and UTC20. The rejection characteristics of various hazardous organic compounds were converted into one parameter Ks, which was proposed in the diffusion-convection model. The Ks of hazardous organic compounds were discussed by comparing with their solute size represented by Stokes radius. The diffusion convection model considering Ks was successful to interpret rejection characteristics of hazardous organic compounds by low-pressure nanofiltration membranes.

Comparative Study on Convective and Microwave-Assisted Heating of Zeolite-Monoethanolamine Adsorbent Impregnation Process for CO2 Adsorption

  • Oktavian, Rama;Poerwadi, Bambang;Pardede, Kristian;Aulia, Zuh Rotul
    • Korean Chemical Engineering Research
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    • 제59권2호
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    • pp.260-268
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    • 2021
  • Adsorption is the most promising technology used to adsorb CO2 to reduce its concentration in the atmosphere due to its functional effectiveness. Various porous materials have been extensively synthesized to boost CO2 adsorption efficiency, for example, zeolite. Here, we report the synthesis process of zeolite adsorbent impregnated with amine, combining the benefit of these two substances. We compared conventional heating with microwave-assisted heating by varying concentrations of monoethanolamine in methanol (10% v/v and 40% v/v) as a liquid solution. The results showed that monoethanolamine impregnation helps significantly increase adsorption capacity, where adsorption occurs as a physisorption and not as chemisorption due to the adsorbent's steric hindrance effect. The highest adsorption capacity of 0.3649 mmol CO2 / gram adsorbent was reached by microwave exposure for 10 minutes. This work also reveals that a decrease in CO2 adsorption capacity was observed at a longer exposure period, and it reached a constant 40-minute adsorption rate. Impregnating activated zeolite with 40% monoethanolamine for 10 minutes in addition to microwave exposure (0.8973 mmol CO2 / gram adsorbent) is the maximum adsorption ability achieved.

Characteristic of Ru Thin Film Deposited by ALD

  • Park, Jingyu;Jeon, Heeyoung;Kim, Hyunjung;Kim, Jinho;Jeon, Hyeongtag
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.78-78
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    • 2013
  • Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

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금속 산화물을 기반으로 한 이산화탄소 포집과 저장에 대한 최근 기술 (Recent Development in Metal Oxides for Carbon Dioxide Capture and Storage)

  • 오현영;라즈쿠마 파텔
    • 멤브레인
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    • 제30권2호
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    • pp.97-110
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    • 2020
  • 이산화탄소 포집 및 저장기술(CCS)은 인류발생적 요인에 의한 이산화탄소 배출 증가와 그로 인한 기후변화를 완화시킬 수 있는 기술 중 하나이다. 그 중, 매체 순환식 연소(chemical looping combustion, CLC)와 칼슘루핑(calcium looping) 기술은 현재 아민 스크러빙(amine scrubbing)을 대체할 수 있는 유망한 기술로 주목받고 있다. 두 방법 모두 금속 산화물을 이용한 연속적인 순환 사이클 반응에 의한 것이다. 전체적인 이산화탄소 포집 및 저장 성능의 향상을 위해서는 사이클을 거듭하며 발생하는 소결(sintering)로 인한 안정성 저하 문제를 해결하고 금속 산화물의 구조 또한 최적화해야 한다. 금속 산화물 표면에 얇은 박막을 형성하는 것은 소결로 인한 손상을 막을 수 있는 방법이다. 이러한 박막 제조 기술로 잘 알려진 기술에는 화학기상증착법(chemical vapor deposition)과 원자층증착기술(atomic layer deposition)이 있다. 본 총설에서는 CVD, ALD 기술을 비롯하여 효과적인 반응 안정성 향상을 위한 안정제 첨가 방법, 금속 산화물 구조 개선에 대한 다양한 최근 기술들을 다루었다.

제과공장의 폐수처리장에서 발생하는 악취 저감 (Reduction of the Offensive Odor from Confectionery Wastewater Plant)

  • 김영식;손병현;조상원;정종현
    • 한국환경보건학회지
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    • 제24권1호
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    • pp.62-69
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    • 1998
  • It has been studied that the measurement of odor component emission at confectionery manufacture. The objects of this study were to investigate reduction of offensive odor. The survey effects of odorous materials are presented as follows. The countermeasure of operating process is to minimize sludge sediment in each unit facility. Especially, in summer, we have to clean the sludge frequently, because anaerobic decomposing is likely to occur easily. The sludge or scum from sedimentation tank pond, and floating tank should be treated quickly. We should avoid overloading operation. In the case of overloading, dissolved oxygen should be increased, the quality of wastewater input should be decreased. When dried cakes from condense tank or floating tank are left in treatment plant, we should cover, to prevent diffusion of smell with masking materials. The seasonal condition of operating should be fixed and the kind of coagulants should be changed because the wastewater in each season have different loading rates and organic materials. Odorous materials are very sensitive to the seasonal temperature variation. Especially, when the amount of rainfall is small and the high temperature of maintenance in long periods, air diffusion rate is large, so odorous materials can make great effect on surroundings comparision with other periods. To reduce odorous gas, as short term method, we had better take ceramic addition method. Especially, in summer we should take ceramic addition method. Also, as long term method, the size of wastewater treatment facility is the most important in the normal operating of wastewater treatment facility. But wastewater treatment facilities in this factory are too old, treatment process is old fashion, and the size is too small. So, large wastewater quantity to treat in summer. As results, the expansion of wastewater treatment facility and the process of improvement are required. Restriction level of odor was exceed. As it is overloaded in summer, the basis cause of odor is that the size of wastewater treatment facility is small. The prediction of air quality equilibrium density variation show that the odorous materials from working place are Amine materials whose smell strength is about 2.5(a little strong degree). We can suppose that in summer is sensitive to temperature variation, smell strength is larger as to reduce the origin of odor. We must expand wastewater treatment facility and improve the process A.S.A.P.

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아세토니트릴 용매 중에서 Copper-1-(2-Thiazolylazo)-2-naphthol 착물의 전기화학적 거동 (Electrochemical Behaviors of Copper-1-(2-Thiazolylazo)-2-naphthol Complex in Acetonitrile)

  • 배준웅;이흥락;박태명;서무룡
    • 대한화학회지
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    • 제35권4호
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    • pp.405-409
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    • 1991
  • 비양성자성용매인 아세토니트릴 중에서 Copper-1-(2-thiazolylazo)-2-naphthol(이하 Cu(II)-TAN으로 줄임) 착물의 전기화학적 성질을 조사하였다. 착물의 직류폴라로그램으로부터 환원전류의 유형과 가역성 및 양성자 주게인 물의 첨가에 따른 영향을 검토하였다. 그리고 환원반응에 관여한 전자수는 일정전위 전기분해법으로 구하였다. 또 일정전위 전기분해한 전해생성물의 UV-Vis Spectrum으로부터 전해생성물을 확인하였다. 이상의 실험 결과로부터 아세토니트릴 용매 중에서 Cu(II)-TAN 착물은 3단계의 환원과정을 거쳐 최종적으로 아민화합물이 됨을 알았다. 이 때 1단계 환원과정에서는 anion radical이 생성되는 과정이고, 2단계 환원과정에서는 dianion이 생성되는 과정이다. 또 1단계와 2단계의 환원과정은 모두 가역성이 좋은 편이었으나 3단계 환원과정은 가역성이 매우 나쁜 편이었다. 또한 각 단계의 환원전류는 확산지배적이었다.

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