• Title/Summary/Keyword: aluminum oxide layer

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Change in Electrical Properties of Al2O3/GaN MIS Structures according to the Thickness of Al2O3 Thin Film and Annealing Temperature (산화알루미늄 박막의 두께 및 열처리 온도에 따른 Al2O3/GaN MIS 구조의 전기적 특성 변화)

  • Kwak, No-Won;Lee, Woo-Seok;Kim, Ka-Lam;Kim, Hyun-Jun;Kim, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.6
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    • pp.470-475
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    • 2009
  • We deposited $Al_2O_3$ thin films on GaN by remote plasma atomic layer deposition (RPALD) technique, trimethylaluminum(TMA) and oxygen were used as precursors, at fixed process condition, the number of cycle were changed. Growth rate per cycle was $1.2\;{\AA}$/cycle. and Growth rate was in proportion to a number of cycle, the GaN MIS capacitors that $Al_2O_3$ thin film were deposited above 12 nm, have excellent electrical properties, a low electrical leakage current density(${\sim}10^{-10}\;A/cm^2$ at 1.5 MV), but below 12 nm, we can see the degradation of the leakage current density. After post deposition annealing, Dielectric constant was estimated by 1 MHz high-frequency C-V method, it was varied with the anealing temperature from 6.9 at no post anealed to 7.6 at $800^{\circ}C$, and we can see a improvement of the leakage current density and breakdown voltage by post deposition anealing below $700^{\circ}C$, but, after anealed at $800^{\circ}C$, we can see the degradation of the leakage current density and breakdown voltage.

Measurement of Tensile and Bending Properties of Nanohoneycomb Structures (나노허니컴 구조물의 인장 및 굽힘 물성 측정)

  • Jeon, Ji-Hoon;Choi, Duk-Hyun;Lee, Pyung-Soo;Lee, Kun-Hong;Park, Hyun-Chul;Hwang, Woon-Bong
    • Composites Research
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    • v.19 no.6
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    • pp.23-31
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    • 2006
  • We measured mechanical properties, including Young's modulus, effective bending modulus and nominal fracture strength of nanohoneycomb structures using an Atomic Force Microscope(AFM) and a Nano-Universal Testing Machine(UTM). Anodic aluminum oxide(AAO) films are well suited as nanohoneycomb structures because of the simple fabrication process, high aspect ratio, self-ordered hexagonal pore structure, and simple control of pore dimensions. Bending tests were carried out for cantilever structures by pressing AFM tips, and the results were compared with three-point bending tests and tensile tests using a Nano-UTM. One side of the AAO films is clogged by harrier layers, and looks like a face material of conventional sandwich structures. Analysis of this layer showed that it did not influence the bending rigidity, and was just a crack tip. The present results can act as a design guideline in applications of nanohoneycomb structures.

DIAGNOSTICS OF PLASMA INDUCED IN Nd:YAG LASER WELDING OF ALUMINUM ALLOY

  • Kim, Jong-Do;Lee, Myeong-Hoon;Kim, Young-Sik;Seiji Katayama;Akira Matsunawa
    • Proceedings of the KWS Conference
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    • 2002.10a
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    • pp.612-619
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    • 2002
  • The dynamic behavior of Al-Mg alloys plasma was very unstable and this instability was closely related to the unstable motion of keyhole during laser irradiation. The keyhole fluctuated both in size and shape and its fluctuation period was about 440 ${\mu}{\textrm}{m}$. This instability has been estimated to be caused by the evaporation phenomena of metals with different boiling point and latent heats of vaporization. Therefore, the authors have conducted the spectroscopic diagnostics of plasma induced in the pulsed YAG laser welding of Al-Mg alloys in air and argon atmospheres. In the air environment, the identified spectra were atomic lines of Al, Mg, Cr, Mn, Cu, Fe and Zn, and singly ionized Mg line, as well as strong molecular spectrum of AlO, MgO and AIH. It was confirmed that the resonant lines of Al and Mg were strongly self-absorbed, in particular in the vicinity of pool surface. The self-absorption of atomic Mg line was more eminent in alloys containing higher Mg. These facts showed that the laser-induced plasma was relatively a low temperature and high density metallic vapor. The intensities of molecular spectra of AlO and MgO were different each other depending on the power density of laser beam. Under the low power density irradiation condition, the MgO band spectra were predominant in intensity, while the AlO spectra became much stronger in higher power density. In argon atmosphere the band spectra of MgO and AlO completely vanished, but AlH molecular spectra was detected clearly. The hydrogen source was presumably the hydrogen solved in the base Metal, absorbed water on the surface oxide layer or H$_2$ and $H_2O$ in the shielding gas. The temporal change in spectral line intensities was quite similar to the fluctuation of keyhole. The time average plasma temperature at 1 mm high above the surface of A5083 alloy was determined by the Boltzmann plot method of atomic Cr lines of different excitation energy. The obtained electron temperature was 3, 280$\pm$150 K which was about 500 K higher than the boiling point of pure aluminum. The electron number density was determined by measuring the relative intensities of the spectra1lines of atomic and singly ionized Magnesium, and the obtained value was 1.85 x 1019 1/㎥.

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Dielectric properties of ${Ta_2}{O_5}$ thin film capacitor with $SnO_2$ thin film underlayer ($SnO_2$ 박막을 이용한 ${Ta_2}{O_5}$박막 커패시터의유전특성)

  • Kim, Jin-Seok;Jeong, Gang-Min;Lee, Mun-Hui
    • Korean Journal of Materials Research
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    • v.4 no.7
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    • pp.759-766
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    • 1994
  • Our investigation aimed to reduce the leakage current of $Ta_2O_5$ thin film capacitor by layering SnOz thin film layer under Ta thin film, thereby supplying extra oxygen ions from the $SnO_{2}$ underlayer to enhance the stoichiometry of $Ta_2O_5$ during the oxidation of Ta thin film. Tantalum was evaporated by e-beam or sputtered on p-Si wafers with various deposition temperatures and was oxidized by dry--oxygen at the temperatures between $500^{\circ}C$ and $900^{\circ}C$. Aluminum top and bottom electrodes were formed to make Al/$Ta_2O_5$/p-Si/Al or $Al/Ta_2O_5/SnO_2$p-Si/AI MIS type capacitors. LCR meter and pico-ammeter were used to measure the dielectric constants and leakage currents of the prepared thm film capacitors. XRD, AES and ESCA were employed to confirm the crystallization of the thin f~lm and the compositions of the films. Dielectric constant of $Ta_2O_5$ thin film capacitor with $SnO_{2}$ underlayer was found to be about 200, which is about 10 times higher than that of $Ta_2O_5$ thin film capacitor without $SnO_{2}$ underlayer. In addition, higher oxidation temperatures increased the dielectric constants and reduced the leakage current. Higher deposition temperature generally gave lower leakage current. $Ta_2O_5/SnO_2$ capacitor deposited at $200^{\circ}C$ and oxidized at $800^{\circ}C$ showed significantly lower leakage current, $10^{-7}A/\textrm{cm}^2$ at $4 \times 10^{5}$V/cm, compared to the one without $SnO_{2}$ underlayer. XRD showed that $Ta_2O_5$ thin film was crystallized above $700^{\circ}C$. AES and ESCA showed that initially the $SnO_{2}$, underlayer supplied oxygen ions to oxidize the Ta layer, however, Sn also diffused into the Ta thin film layer to form a new $Ta_xSn_YO_Z$ , ternary oxide layer after all.

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THE MORPHOLOGICAL OBSERVATION OF HUMAN GINGIVAL FIBROBLASTS ATTACHMENT AND SPREADING ON THE MECHANICAL TREATED TITANIUM PLASMA SPRAYED IMPLANT SURFACE (기계적 표면 처리된 TITANIUM PLASMA SPRAYED IMPLANT에 대한 치은섬유아세포전개양상의 형태학적 관찰)

  • Whang, Yun-Hi;Lee, Jae-Mok;Suh, Jo-Young
    • Journal of Periodontal and Implant Science
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    • v.25 no.3
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    • pp.741-755
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    • 1995
  • Currently titanium is the material of choice for implants because of its biological acceptance. This high degree of biocompatibility is thought to result, in part, from the protective and stable oxide layer that presumably aids in the bonding of the extracellular matrix at the implant-tissue interface. Endosseous dental implants are interfaced with bone, connective tissue, and epithelium when implanted into the jaw bone. The soft tissue interface including connective tissue and epithelium is one of the most critical factors in the determination of implant maintenance and prognosis. For maintenance of failing or failed implants, it is essential to treat the implant fixture surface to remove bacterial endotoxins and make a surface tolerated by surrounding soft and hard tissues. In this study, the effect of mechanical treatment on titanium plasma sprayed implant on adhesiveness and proliferation of human gingival fibroblasts and changed surface characteristics were studied. titanium plasma sprayed discs manufactured by Friedrichsfeld company were treated with loaw speed stone bur, a rubber point and a jetpolisher. Its surface components were analyzed with Energy dispersive X-ray spectroscopy to evaluate whether the surface characteristics were altered or not. To observe the spreading pattern of the human gingival fibroblasts which attached to the all specimens author used the scanning electron microscope. The results were as follows : Pure titanium and plasma sprayed titanium, stone polished titanium showed titanium peak and small amout of aluminum, so there was no alteration on surface characteristics. Under the scanning electron microscopic examination in the initial attachment of human gingival fibroblast, there was a slight enhancement in pure titanium, stone polished titanium than plasma sprayed titanium. After 6 hours, the pure titanium and stone polished titanium showed human gingival fibroblasts were elongated and connected with numerous processes. Human gingival fibroblasts were more intimately attached on the pure titanium discs than on the other discs. The human gingival fibroblasts attached on the plasma sprayed titanium by thin and elongated processes. After 24 hours, the human gingival fibroblasts connected with each other via numerous processes and compeletly covered the pure titanium and stone polshed titanium discs. Human gingival fibroblasts had multiple point contacts with more long and thin lamellopodia and showed a little bare surface on plasma sprayed titanium discs.

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Analysis of Paint Used for a Helicopter Operated in the Korean War through the History of Paint Application (페인트 도장의 역사를 통해 본 6·25전쟁 운용 헬기의 도료분석)

  • Kang Hyunsam;Jang Hanul;Choi Yangho
    • Conservation Science in Museum
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    • v.29
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    • pp.133-152
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    • 2023
  • This study references preceding studies to examine the history of paint application techniques using various paints in the past, with the aim to contribute to the long-term preservation of large military cultural heritage assets situated outdoors. To this end, the study compared the findings of preceding research with the findings of an analysis conducted on a H-13 helicopter housed at the War Memorial of Korea. Upon collecting and analyzing samples from three grounded WWII aircraft from above-ground by preceding studies, it was confirmed from each sample that the various chemical properties of chrome ensured the effectiveness of the protective coating. The compound was first tested as a corrosion-inhibiting pigment in the early 1940s and proved its excellent moisture-resistant properties over the course of 80 years, despite the deterioration of the paint layer and long-term exposure to the natural environment. For this reason, it has been widely used as a corrosion inhibitor for aluminum alloys in the aviation industry. In other word, the most widely-used material for preventing corrosion was an organic primer containing chromate. In this study, based on the paint analysis of a H-13 helicopter operated in the Korean War, it was shown that the second layer, consisting of the primer, contains chromium oxide (Cr2O3). In addition, it was estimated that red lead tetraoxide (Pb3O4) was used for the vehicle. Analysis results and data from previous studies can help to confirm the continued effectiveness of corrosion prevention function provided by chromate. Meanwhile, the result of infrared spectroscopy analysis confirmed the use of alkyd resin. In the future, comparisons with a more diverse range of artifacts will allow the identification of changes in the manufacturing technology of paints used to protect alloys from corrosion.