• Journal of the Korean Institute of Telematics and Electronics
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• v.9 no.5
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• pp.27-33
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• 1972

This paper describes the computer-aided design, fabrication and performance of high Q and high gain active filters suitable for microminiaturization in the frequency range of 10-800MHz, based on the negative resistance operation of a transistor. 48 as high as 1000 and a transducer gain as high as 35dB can readily be obtained with a single-transistor amplifier and with an inductance as small as a few nH at higher frequencies and 150 nH at lower frequencies in tile above frequency range. The gain of the proposed active filter can be stoabilized within $\pm$ 1.5 dB over the temperature range -1$0^{\circ}C$ to +5$0^{\circ}C$ and the temperature dependence of the center frequency is tapicalla 50ppm/$^{\circ}C$. An experimental FM receiver utilizing these fitters and operating at a carrier frequency of 92 MH3 was built. The whole circuit was fabricated on eight alumina substrates of by the thick-film hybrid IC technique and the coils are constructed, for miniaturization, in a spiral form of 3 or 4 turns of enamel copper wire with an overall diameter of about 5mm. The test results are also reported in this paper.

• Proceedings of the KIEE Conference
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• 1997.07d
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• pp.1600-1602
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• 1997

We have studied microstructure of carbn fiber and graphite using scanning electron microscope, x-ray diffractommetry and x-ray photoelectron spectroscopy. According to the results, intercalation of lithium ion affected formation of film on carbon surface and changed structural parameter. Also, we found that film on carbon surface included lithium ion. And, the results of XPS indicated that surface of lithiated carbon materials existed P and F consisting electrolyte. Thus, We expected electrolyte cointercalated with lithium.

• Proceedings of the KIEE Conference
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• 1990.07a
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• pp.195-198
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• 1990

In order to investigate the radiation effects induced to electrical properties of Biaxially-Oriented Polypropylen film, several observations were carried out to the sample irradiated to various dose by $Co^{60}-{\gamma}$ ray, on the characteristics of TSC spectra measuered as a function of electric field applied to a sample of 15[ ${\mu}m$] thick. The TSC spectra observed in the temperature range of $153{\sim}403[K]$ with the electric field of intensity $10{\sim}60$ [MV/m], have shown two of the distinguished peak such as ${\beta}$, ${\alpha}$, each of which appeared at $-5{\sim}20$ [ $^{\circ}C$] and 90 [ $^{\circ}C$] respectively. As the conclusions, obtained from the studies, the origin of ${\alpha}$ peak in TSC seems to be attributed by thermal excitation of ions trapped with $0.4{\sim}0.8[eV]$ deep, at the defects formed by $Co^{60}-{\gamma}$ irradiation in a crystaline region. The origin of ${\beta}$ peak was regarded as the depolarization process of "OH" or "CO" dipole with the activation energy of $0.4{\sim}0.6[eV]$ in an amorphous region.

• Journal of the Korean Ceramic Society
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• v.41 no.2
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• pp.170-175
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• 2004

The ferroelectric (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ thin films were fabricated by sol-gel method using Y-acetate, Yb-acetate, and Mn-acetate as raw materials. The stable (Y $b_{x}$ $Y_{1-x}$)Mn $O_3$ precursor solution (sol) was prepared through the reflux process with acetylaceton as a catalyst and coated on Si(100) substrate by spin coating. The heat treatment temperature and, Rw ($H_2O$/alkoxide moi ratio) dependence on crystallinity of thin films were studied. The lowest temperature for obtaining YbMn $O_3$phase and the optimum heat-treatment conditions were proved as at 7$50^{\circ}C$ and 80$0^{\circ}C$, respectively. The hexagonal YbMn $O_3$with c-axis preferred orientation could be obtained at Rw=1 condition. The remanent polarization for the thin films of x=0 or 1 was about 200 nC/㎤ while, for the specimens ot 0< x< 1, were 50∼100 nC/$\textrm{cm}^2$.

• Journal of ILASS-Korea
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• v.2 no.4
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• pp.15-21
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• 1997

In a gasoline engine with port injection system, the fuel behavior in the intake port has significant influence on the HC emission and the precise A/F control. That is to say, it is inevitable that the injection direction and behavior of fuel injected in the intake port have an effect on the generation of unburned HC within a cylinder. In this paper, we visualized fuel behavior in the intake port using micro CCD camera synchronized with the stroboscope and investigated the fuel-film characteristics formed at the wall of intake port by processing image captured with VCR in the transparent intake port made of acryl. Using these measuring methods, it was found that fuel behavior and the formation of fuel-film in the intake port could be evaluated qualitatively. And results obtained by these methods show that 2-spray injector minimizes the fuel-film formed in the intake port of a DOHC gasoline engine.

• Proceedings of the IEEK Conference
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• 2000.06b
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• pp.294-297
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• 2000

Boron Phosphide films were deposited on the glass substrate at low temperature, 550$^{\circ}C$, by the reaction of B$_2$H$\sub$6/ with PH$_3$ using CVD. N$_2$ was employed as carrier gas. The deposition rate was 1000${\AA}$/min and the refractive index of film was 2.6. The data of XRD show that the film has the preferred orientation of (1 0 1). The VIS spectrophotometer's data proved that the films are transparent in the visible range. Also, we performed AFM, FT-IR measurement. To investigate the annealing effect, the samples were annealed for 1hour, 3hours at 550$^{\circ}C$ and tested.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05c
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• pp.21-23
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• 2004

We report experimental results demonstrating a novel metal defined polymer optical waveguide with a low loss in electro-optic polymers for the first time. The polymer optical waveguides are created using a metal film on the top of upper cladding without any conventional etching process. The fabricated waveguides have an excellent lateral optical mode confinement at both 1.31 ${\square}m$ and 1.55 ${\square}m$ wavelength, resulting in a fiber-to lens optical insertion loss of ~ 7 dB at 1.55 ${\square}m$ and ~4.5 dB at 1.31 ${\square}m$ wavelength in a 3.5cm total length for TM polarizations, respectively. We also present the optical loss dependence of the waveguide as a function of optical wavelengths. These results may be used in the complex design of integrated polymer optical circuits that need simpler and cheaper fabrication process.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.456-456
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• 2009

Boron doping on an n-type Si wafer is requisite process for IBC (Interdigitated Back Contact) solar cells. Fiber laser annealing is one of boron doping methods. For the boron doping, uniformly coated or deposited film is highly required. Plasma enhanced chemical vapor deposition (PECVD) method provides a uniform dopant film or layer which can facilitate doping. Because amorphous silicon layer absorption range for the wavelength of fiber laser does not match well for the direct annealing. In this study, to enhance thermal affection on the existing p-a-Si:H layer, a ${\mu}c$-Si:H intrinsic layer was deposited on the p-a-Si:H layer additionally by PECVD. To improve heat transfer rate to the amorphous silicon layer, and as heating both sides and protecting boron eliminating from the amorphous silicon layer. For p-a-Si:H layer with the ratio of $SiH_4$ : $B_2H_6$ : $H_2$ = 30 : 30 : 120, at $200^{\circ}C$, 50 W, 0.2 Torr for 30 minutes, and for ${\mu}c$-Si:H intrinsic layer, $SiH_4$ : $H_2$ = 10 : 300, at $200^{\circ}C$, 30 W, 0.5 Torr for 60 minutes, 2 cm $\times$ 2 cm size wafers were used. In consequence of comparing the results of lifetime measurement and sheet resistance relation, the laser condition set of 20 ~ 27 % of power, 150 ~ 160 kHz, 20 ~ 50 mm/s of marking speed, and $10\;{\sim}\;50 {\mu}m$ spacing with continuous wave mode of scanner lens showed the correlation between lifetime and sheet resistance as $100\;{\Omega}/sq$ and $11.8\;{\mu}s$ vs. $17\;{\Omega}/sq$ and $8.2\;{\mu}s$. Comparing to the singly deposited p-a-Si:H layer case, the additional ${\mu}c$-Si:H layer for doping resulted in no trade-offs, but showed slight improvement of both lifetime and sheet resistance, however sheet resistance might be confined by the additional intrinsic layer. This might come from the ineffective crystallization of amorphous silicon layer. For the additional layer case, lifetime and sheet resistance were measured as $84.8\;{\Omega}/sq$ and $11.09\;{\mu}s$ vs. $79.8\;{\Omega}/sq$ and $11.93\;{\mu}s$. The co-existence of $n^+$layeronthesamesurfaceandeliminating the laser damage should be taken into account for an IBC solar cell structure. Heavily doped uniform boron layer by fiber laser brings not only basic and essential conditions for the beginning step of IBC solar cell fabrication processes, but also the controllable doping concentration and depth that can be established according to the deposition conditions of layers.

• Journal of the Korean institute of surface engineering
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• v.36 no.1
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• pp.14-21
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• 2003

Thin films of ZrO$_2$ and TiO$_2$ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters, systematic experiments were carried out in this work. XRD data show that the $ZrO_2$ films were mainly grown in the [111] orientation at the annealing temperature between 800 and $1000^{\circ}C$ while the crystal growth direction was changed to be [012] at above $1000^{\circ}C$. FT-IR spectra show that the oxygen stretching peaks become strong due to $SiO_2$ layer formation between film layers and silicon surface after annealing, and proved that a diffusion caused by either oxygen atoms of $ZrO_2$ layers or air into the interface during annealing. Different crystal growth directions were observed with the various deposition parameters such as annealing temperature, RF power magnitude, and added $O_2$ amounts. The growth rate of $TiO_2$ thin films was increased with RF power magnitude up to 150 watt, and was then decreased due to a sputtering effect. The maximum growth rate observed at 150 watt was 1500 nm/hr. Highly oriented, crack-free, stoichiometric polycrystalline $TiO_2$<110> thin film with Rutile phase was obtained after annealing at $1000^{\circ}C$ for 1 hour.

• Proceedings of the KIEE Conference
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• 1994.07b
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• pp.1268-1270
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• 1994

Fine lithographic technology in a submicron design regime is necessary for the fabrication of VLSI circuits. In such lithography, fine pattern delineation is performed by electron beam, ion beam and X-ray lithography instead of photolithography. Therefore, the new resist materials and development method have been required. So, we are investigating another positive E-beam resists which have high sensitivity and dry etching resistance, Plasma co-polymerized resist was prepared using an interelectrode gas-flow-type reacter. Methymethacrylate, tetramethyltin and styrene were chosen as the monomer to be used. The delineated pattern in the resist was developed with gas-flow-type reactor using an argon and 02 as etching gas. We studied about the effects of discharge power and mixing rate of the co-polymerized thin :film. The molecular structure of thin film was investigated by ESCA and IR, and then was discussed in relation to its quality as a resist.