• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.7
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• pp.652-655
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• 2005

ZnO thin films on (001) $Al_2O_3$ substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YAG laser with a wavelength of 266 nm. The influence of the deposition parameters, such as oxygen gas flow, substrate temperature and laser energy density variation on the properties of the grown film, was studied. The experiments were performed for substrate temperatures in the range of $300\~450^{\circ}C$ and oxygen gas flow rate of $100\~900$ sccm. We investigated the structural and optical properties of ZnO thin films using X-ray diffraction(XRD) and photoluminescence(PL).

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.189-189
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• 2010

ZnO nanorods 구조는 광소자 및 태양광 소자의 성능을 향상시키기 위해서 무반사계수, 광추출효율, 전기적, 열적 전도도를 개선시킬 수 있어, 매우 큰 관심을 가지고 왔다. 또한 Ag 나노입자는 표면 플라즈몬 효과를 이용하여 LED나 태양전지에 응용하여 소자의 성능이 향상됨을 이론적, 실험적으로 증명되어 왔으며, 현재에도 활발한 연구가 진행되고 있다. 이러한 ZnO nanorods 특성과 Ag 나노입자의 표면 플라즈몬 효과를 이용하기 위해서, 본 연구에서는 Ag 나노 입자를 형성된 ZnO seed층에 ZnO nanorods를 성장시켰다. 시료를 제작을 위해서 비교적 성장이 간단하고 저온성장이 가능한 화학적 합성방법을 이용하였다. Ag 나노입자가 형성된 ZnO seed층 제작을 위해서 먼저 Si 기판위에 RF magnetron 스퍼터를 이용하여 고진공, $N_2$ 분위기에서 일정한 두께로 증착을 하였으며, 이후 Ag 박막을 thermal evaporator로 10 nm 두께로 증착하였다. 그 다음, 크기가 다른 Ag 나노입자를 형성을 위해서 rapid thermal annealing (RTA)을 여러 가지 온도에서 수행하였다. 그리고 이러한 시료들를 이용하여, ZnO nanorods를 성장하기 위하여, $90-95^{\circ}$의 온도에서 zinc nitrate $Zn(NO_3)_2{\cdot}6H_2O$과 hexamethylentetramines (HMT)으로 혼합된 용액에 담가두어 ZnO nanorods를 성장시켰다. Ag 나노입자의 크기에 따라 ZnO nanorods의 구조와 형태에 대하여 어떠한 영향을 주는지를 관찰하기 위해 field emission scanning electron microscopy (FE-SEM)을 이용하여 측정하였으며, Ag와 ZnO의 성분분석과 결정성을 조사하기 위해 X-ray diffraction (XRD)을 이용하여 분석하였다. 그리고 표면 플라즈몬에 의한 영향에 대하여 조사하기 위해, ZnO nanorods와 Ag 나노입자가 형성된 ZnO nanorods를 UV-Vis-NIR spectrophotometer을 이용하여 흡수계수와 반사계수를 비교하여 측정하였으며. 태양전지의 성능향상을 수 있음을 이론적으로 계산하였다. 그리고 또한 photoluminescence (PL) 분석을 수행하여 ZnO nanorods의 구조에 대하여 Ag 나노입자의 영향에 대한 광특성을 측정하였다.

• Korean Journal of Materials Research
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• v.14 no.8
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• pp.600-606
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• 2004

$Zn_{2}SiO_{4}:Mn$ phosphor particles were prepared by a flame spray pyrolysis method. It has been generally known that the high-temperature flame enables fast drying and decomposition of droplets. In the present investigation, the morphology and luminescent property of $Zn_{2}SiO_{4}:Mn$ phosphor were controlled in a severe flame preparation condition. The particle formation in the flame spray pyrolysis process was achieved by the droplet-to-particle conversion without any evaporation of precursors, which made it possible to obtain spherical $Zn_{2}SiO_{4}:Mn$ particles of a pure phase from a droplet. Using colloidal solutions wherein dispersed nano-sized silica particles were adopted as a silicon precursor. $Zn_{2}SiO_{4}:Mn$ particles with spherical shape and filled morphology were prepared and the spherical morphology was maintained even after the high-temperature heat treatment, which is necessary to increase the photoluminescence intensity. The $Zn_{2}SiO_{4}:Mn$ particles with spherical shape, which were prepared by the flame spray pyrolysis and posttreated at $1150^{\circ}C$, showed good luminescent characteristics under vacuum ultraviolet (VUV) excitation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.9-9
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• 2009

1 wt % Ga-dope ZnO (ZnO:Ga) thin films with n-type semiconducting behavior were grown on c-sapphire substrates by radio frequency magnetron sputtering at various growth temperatures. The room temperature grown ZnO:Ga film showed the faint preferred orientation behavior along the c-axis with small domain size and high density of stacking faults, despite limited surface diffusion of the deposited atoms. The increase in the growth temperature in the range between $300\sim550^{\circ}C$ led to the granular shape of epitaxial ZnO:Ga films due to not enough thermal energy and large lattice mismatch. The growth temperature above $550^{\circ}C$ induced the quite flat surface and the simultaneous improvement of electrical carrier concentration and carrier mobility, $6.3\;\times\;10^{18}/cm^3$ and $27\;cm^2/Vs$, respectively. In addition, the increase in the grain size and the decrease in the dislocation density were observed in the high temperature grown films. The low-temperature photoluminescence of the ZnO:Ga films grown below $450^{\circ}C$ showed the redshift of deep-level emission, which was due to the transition from $Zn_j$ to $O_i$ level.

• Transactions on Electrical and Electronic Materials
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• v.14 no.4
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• pp.208-210
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• 2013

ZnO films were deposited on glass substrates by radio frequency (RF) magnetron sputtering and exposed to intense electron beam irradiation to investigate the effects of electron irradiation on the properties of the films. Although all of the films had ZnO (002) textured structure regardless of electron irradiation, the grain sizes of the films decreased with electron irradiation. Surface roughness also depended on electron irradiation. The surface roughness varied between 2.3 and 1.6 nm, depending on the irradiation energy. Based on photoluminescence (PL) characterization, the most intense UV emission was observed from ZnO films irradiated at 900 eV. Since the intensity of UV emission is dependent upon the stoichiometric of ZnO films, we conclude that 900 eV was the optimum electron irradiation energy to achieve the best stoichiometric of ZnO films in this study.

• Proceedings of the KIEE Conference
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• 2007.11a
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• pp.110-111
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• 2007

In order to form a p-type ZnO thin film, ZnO thin film is deposited by pulsed laser deposition(PLD) on GaAs substrate followed by nermal treatment that ensures the diffusion of As atoms from the GaAs substrate to the ZnO thin films. Photoluminescence (PL) measurement reveals that the improved qualify of ZnO thin films is acquired at the growth temperature of $400^{\circ}C$. It is ZnO film grown at $100^{\circ}C$ that shows the change from n-type to p-type by the thermal treatment. Measured carrier concentration in the film is changed from $-5.70{\times}10^{13}\;to\;9.09{\times}10^{18}$.

• Journal of the Korean Vacuum Society
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• v.12 no.4
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• pp.269-274
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• 2003

The electrical, optical and structural properties of ZnNiO thin _ films deposited on Si substrates using rf-magnetron sputtering method have been investigated before and after the thermal annealing processes. The crystallinity of the ZnNiO thin film become degraded with increasing the Ni contents. This is mainly because the lattice of the thin film was expanded due to the oxygen-deficient conditions. Concerning the electrical properties of the thin film, the carrier concentration increases ($6.81\times10^{14}\textrm{cm}^{-2}$) and Hall mobility decreases (36.3 $\textrm{cm}^2$/Vㆍs) with higher doping concentration of Ni. However, the carrier concentration and Hall mobility became low ($1.10\times10^{14}\textrm{cm}^2$ and high (209.6 $\textrm{cm}^2$/Vㆍs), respectively, after the thermal annealing process at $1000 ^{\circ}C$. We also observed a strong luminescene center peaking at 546 nm in photoluminescence spectra, which was caused by a deep level center in the ZnO band gap with oxygen deficient ZnNiO structure.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.05a
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• pp.236-237
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• 2012

ZnO nanorods were grown on R-plane sapphire substrates with the seed layers annealed at different temperature. The effects of annealing temperature for the seed layers on the properties of the ZnO nanorods were investigated by scanning electron microscopy, X-ray diffraction, UV-visible spectroscopy, and photoluminescence. For the as-prepared seed layers, the ZnO nanorods and the ZnO nanosheets were observed. Only the ZnO nanorods were grown as the annealing temperature was above $700^{\circ}C$. The optical transmittance in the UV region was almost zero while that in the visible region was gradually increased as the annealing temperature increased to $700^{\circ}C$. The optical band gap of the ZnO nanorods was increased as the annealing temperature increased to $700^{\circ}C$. In the visible region, the refractive index was decreased with increasing the wavelength, and the extinction coefficient was decreased as the annealing temperature increased to $700^{\circ}C$. The non-linear exciton radiative life time of the FX emission peak was established by cubic equation. The values of Varshni's empirical equation fitting parameters were ${\alpha}=4{\times}10^{-3}eV/K$, ${\beta}=1{\times}10^4K$, and $E_g(0)=3.335eV$ and the activation energy was found to be about 94.6 meV.

• Korean Journal of Metals and Materials
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• v.49 no.5
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• pp.406-410
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• 2011

ZnO nanorods were prepared by the electrodeposition route on conductive Au/Si substrates. The effects of deposition time on the microstructural evolution and optical properties of ZnO nanorods were investigated. With increasing deposition time from 1 h to 20 h, the diameter and length of the ZnO nanorods increased gradually to about 328 nm and 6.55${\mu}m$, respectively. The ZnO nanorods were dense and vertically well-aligned. The photoluminescence (PL) peaks corresponding to the near band edge of ZnO were observed. With increasing deposition time, the intensity of PL peaks increased with nanorod growth up to 4 h and then decreased. This might be due to the degradation of crystal quality caused by merging of nanorods.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.5
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• pp.15-20
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• 2007

We fabricated ZnO thin films on quartz substrate using pulsed laser deposition method and investigated structural and optical properties of ZnO thin films with various substrate temperatures. Regardless of the substrate temperature variation, all ZnO thin films had grown to (002) and the thin film deposited at 400 $^{\circ}C$ exhibited an excellent crystallinity having 0.24$^{\circ}$ of Full-Width-Half-Maximum (FWHM). In the result of photoluminescence property, UV and deep-level emission peaks were observed in all ZnO films and the emission peaks were changed with various substrate temperatures. An highest UV emission was exhibited on the specimen deposited at 400 $^{\circ}C$ and the FWHM of UV peak was 14 nm. The optical transmittance was about 85 % in visible region regardless of the substrate temperature. The comparison result of the bandgap energies obtained from optical transmittance and UV emission centers, the two values were about the same. From these results, it is found that UV emission center has close relationship with near band edge emission of ZnO thin film.