• Title/Summary/Keyword: ZnO photoluminescence

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Structure and Photoluminescence Properties of SnO2/Zn Core-shell Nanowires

  • Kim, Hyoun Woo;Na, Han Gil;Kwon, Yong Jung;Cho, Hong Yeon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.241-241
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    • 2014
  • $SnO_2-core/Zn-shell$ heteronanowires were fabricated by a two-step process: thermal evaporation of Sn powders and employing a sputtering technique with a Zn target. X-ray diffraction, high-resolution transmission electron microscopy, and EDX spectra coincidentally indicated that the shell layer comprised the Zn phase. From Gaussian deconvolution studies, we observed that photoluminescence (PL) spectra consisted of yellow, green, and ultraviolet (UV) emission bands, regardless of shell-coating. We speculated the possible mechanisms of these emission peaks.

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Effect of aging on the optoelectronic properties of a single ZnO nanowire (단일 ZnO 나노선의 광전 특성에 대한 에이징 효과)

  • Keem, Ki-Hyun;Kang, Jeong-Min;Jeong, Dong-Young;Kim, Sang-Sig
    • Journal of IKEEE
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    • v.10 no.2 s.19
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    • pp.161-167
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    • 2006
  • The effect of aging on the optoelectronic properties of a single ZnO nanowire is investigated in this study. The photoluminescence (PL), photocurrent spectrum, current-voltage characteristics, and photoresponse were measured for the as-grown ZnO nanowire and for the same nanowire exposed to air for three months. For the aged nanowire, the broad PL band is weaker, the intensity of the photocurrent is strengthened, and the photoresponse is slower, compared with the as-grown nanowire. It Is suggested in this paper that the observed aging effect on the PL is due to the reduction in the number of oxygen vacancies within the nanowire and that the aging effect on the photocurrent and photoresponse originates from the formation of oxygen vacancies near the surface.

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Photocurrent Characteristics of ZnO Nanoparticles (ZnO 나노입자의 광전류 특성)

  • Jun, Jin-Hyung;Seong, Ho-Jun;Cho, Kyoung-Ah;Kim, Sang-Sig
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.207-207
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    • 2008
  • ZnO is one of the widely utilized n-type semiconducting oxide materials in the field of optoelectronic devices. For its application to the fabrication of promising ultraviolet (UV) photodetectors, ZnO with various structures has been extensively studied. However, study on the photodetectors using zero-dimensional (0-D) ZnO nanoparticle is scarce while the 0-D nanoparticle structure has many advantages compared to the other dimensional structures for absorption of light. In this study, the photocurrent characteristics of ZnO nanoparticles were investigated through a simply pasting of the nanoparticles across the pre-patterned electrodes. Then the photoluminescence (PL) characteristic, photocurrent response spectrum, photo- and dark-current and photoresponse spectrum were investigated with a He-Cd laser and an Xe lamp. An dominant PL peak of the ZnO nanoparticles was located at the wavelength of 380 nm under the illumination of 325-nm wavelength light. The ratio of photocurrent to dark current (on/off ratio) is as high as 106 which is considerable value for promising photodetectors. On the other hand, the time constants in photoresponse were relatively slow. The reasons of the high on/off ratio and relatively slow photoresponse characteristic will be discussed.

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Influence of Growth Temperature for Active Layer and Buffer Layer Thickness on ZnO Nanocrystalline Thin Films Synthesized Via PA-MBE

  • Park, Hyunggil;Kim, Younggyu;Ji, Iksoo;Kim, Soaram;Lee, Sang-Heon;Kim, Jong Su;Leem, Jae-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.203.1-203.1
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    • 2013
  • Zinc oxide (ZnO) nanocrystalline thin films on various growth temperatures for active layer and different buffer layer thickness were grown by plasma-assisted molecular beam epitaxy (PA-MBE) on Si substrates. The ZnO active layer were grown with various growth temperature from 500 to $800^{\circ}C$ and the ZnO buffer layer were grown for different time from 5 to 40 minutes. To investigate the structural and optical properties of the ZnO thin films, scanning electron microscope (SEM), X-ray diffractometer (XRD), and photoluminescence (PL) spectroscopy were used, respectively. In the SEM images, the ZnO thin films have high densification of grains and good roughness and uniformity at $800^{\circ}C$ for active layer growth temperature and 20 minutes for buffer layer growth time, respectively. The PL spectra of ZnO buffer layers and active layers display sharp near band edge (NBE) emissions in UV range and broad deep level emissions (DLE) in visible range. The intensity of NBE peaks for the ZnO thin films significantly increase with increase in the active layer growth temperature. In addition, the NBE peak at 20 minutes for buffer layer growth time has the largest emission intensity and the intensity of DLE peaks decrease with increase in the growth time.

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Evaluation of Acceptor Binding Energy of Nitrogen-Doped Zinc Oxide Thin Films Grown by Dielectric Barrier Discharge in Pulsed Laser Deposition

  • Lee, Deuk-Hee;Chun, Yoon-Soo;Lee, Sang-Yeol;Kim, Sang-Sig
    • Transactions on Electrical and Electronic Materials
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    • v.12 no.5
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    • pp.200-203
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    • 2011
  • In this research, nitrogen (N)-doped zinc oxide (ZnO) thin films have been grown on a sapphire substrate by dielectric barrier discharge (DBD) in pulsed laser deposition (PLD). DBD has been used as an effective way for massive in-situ generation of N-plasma under conventional PLD process conditions. Low-temperature photoluminescence spectra of N-doped ZnO thin films provided near-band-edge emission after a thermal annealing process. The emission peak was resolved by Gaussian fitting and showed a dominant acceptor-bound excitation peak ($A^{\circ}X$) that indicated acceptor doping of ZnO with N. The acceptor binding energy of the N acceptor was estimated to be approximately 145 MeV based on the results of temperature-dependent photoluminescence (PL) measurements.

Photoluminescence properties of Mn4+-activated Li2ZnSn2O6 red phosphors

  • Choi, Byoung Su;Lee, Dong Hwa;Ryu, Jeong Ho;Cho, Hyun
    • Journal of Ceramic Processing Research
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    • v.20 no.1
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    • pp.80-83
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    • 2019
  • The Mn4+-activated Li2ZnSn2O6 (LZSO:Mn4+) red phosphors were synthesized by the solid-state reaction at temperatures of 1100-1400 ℃ in air. The synthesized LZSO:Mn4+ phosphors were confirmed to have a single hexagonal LZSO phase without the presence of any secondary phase formed by the Mn4+ addition. With near UV and blue excitation, the LZSO:Mn4+ phosphors exhibited a double band deep-red emission peaked at ~658 nm and ~673 nm due to the 2E → 4A2 transition of Mn4+ ion. PL emission intensity showed a strong dependence on the Mn4+ doping concentration and the 0.3 mol% Mn4+-doped LZSO phosphor produced the strongest PL emission intensity. Photoluminescence emission intensity was also found to be dependent on the calcination temperature and the optimal calcination temperature for the LZSO:Mn4+ phosphors was determined to be 1200 ℃. Dynamic light scattering (DLS) and field-effect scanning electron microscopy (FE-SEM) analysis revealed that the 0.3 mol% Mn4+-doped LZSO phosphor particles have an irregularly round shape and an average particle size of ~1.46 ㎛.

Photoluminescence of ZnSe/CdSe/ZnSe Single Quantum Well (ZnSe/CdSe/ZnSe 단일양자우물의 광발광 특성)

  • Park, J.G.;O, Byung-Sung;Yu, Y.M.;Yoon, M.Y.;Kim, D.J.;Choi, Y.D.
    • Journal of the Korean Vacuum Society
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    • v.16 no.3
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    • pp.192-196
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    • 2007
  • ZnSe/CdSe/ZnSe single quantum wells with different well thickness were grown by hot wall epitaxy. The quantum well thicknesses were measured by TEM. The critical thickness of single quantum well layer was found to be about $9{\AA}$ from the intensities and the full-width at half maximum of photoluminescence(PL) spectra. When the thickness of quantum wells was less than the critical thickness, the Stoke's shift was confirmed from the comparison between PL and photoluminescence excitation spectra, and it may be due to the exciton binding energy. The PL peak energy dependence on the quantum well thickness was coincident with the theoretical values.

Structural and optical properties of ZnO epilayers grown on oxygen- and hydrogen-plasma treated sapphire substrates (산소와 수소 플라즈마로 처리한 사파이어 기판 위에 성장된 ZnO 박막의 구조적.광학적 특성)

  • Lee, S.K.;Kim, J.Y.;Kwack, H.S.;Kwon, B.J.;Ko, H.J.;Yao, Takafumi;Cho, Y.H.
    • Journal of the Korean Vacuum Society
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    • v.16 no.6
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    • pp.463-467
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    • 2007
  • Structure and optical properties of ZnO epilayers grown on oxygen- and hydrogen-plasma treated sapphire substrates by plasma-assisted molecular beam epitaxy (denoted as samples A and B, respectively) have been investigated by various techniques. The crystal quality and structural properties of the surface for the ZnO epilayers were investigated by high-resolution X-ray diffraction and atomic force microscope. For investigating the optical properties of excitonic transition of ZnO, we carried out photoluminescence experiments as a function of temperature. The free exciton, bound exciton emission and their phonon replicas were investigated as a function of temperature from 10 to 300 K, and the intensity of excitonic PL peak emission from the sample A is found to be higher than that of sample B. From the results, we found that sample A has better crystal structure quality and optical properties as compared to sample B. The number of oxygen vacancies may be decreased in sample A, resulting in an enhancement of the crystal quality and a higher intensity of excitonic emission band as compared to sample B.

Spray Pyrolysis Deposition of Zinc Oxide Thin Films by ZnO Buffer Layer (ZnO buffer 층을 이용한 초음파 분무열분해 ZnO 박막 증착)

  • Han, In Sub;Park, Il-Kyu
    • Korean Journal of Materials Research
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    • v.27 no.8
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    • pp.403-408
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    • 2017
  • We investigated the effect of ZnO buffer layer on the formation of ZnO thin film by ultrasonic assisted spray pyrolysis deposition. ZnO buffer layer was formed by wet solution method, which was repeated several times. Structural and optical properties of the ZnO thin films deposited on the ZnO buffer layers with various cycles and at various temperatures were investigated by field-emission scanning electron microscopy, X-ray diffraction, and photoluminescence spectrum analysis. The structural investigations showed that three-dimensional island shaped ZnO was formed on the bare Si substrate without buffer layers, while two-dimensional ZnO thin film was deposited on the ZnO buffer layers. In addition, structural and optical investigations showed that the crystalline quality of ZnO thin film was improved by introducing the buffer layers. This improvement was attributed to the modulation of the surface energy of the Si surface by the ZnO buffer layer, which finally resulted in a modification of the growth mode from three to two-dimensional.

Effects of post-annealing treatment of ZnO Thin Films by Pulsed Laser Deposition (PLD를 이용한 ZnO 박막의 후열처리에 관한 연구)

  • Kim, Jae-Hong;Lee, Cheon
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1627-1630
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    • 2004
  • ZnO thin films on (001) sapphire substrates have been deposited by pulsed laser deposition(PLD) technique using an Nd:YAG laser with a wavelength of 266nm. Before post-annealing treatment in the oxygen ambient, the experiment of the deposition of ZnO thin films has been performed for substrate temperatures in the range of $300{\sim}450^{\circ}C$ and flow rate of 100${\sim}$700 seem. In order to investigate the effect of post-annealing treatment of ZnO thin films, films have been annealed at various temperatures after deposition. After post-annealing treatment in the oxygen ambient, the structural properties of ZnO thin films were characterized by X-ray diffraction(XRD) and the optical properties of the ZnO were characterized by photoluminescence(PL).

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