• Journal of the Korean Vacuum Society
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• v.20 no.1
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• pp.50-56
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• 2011

In this study, the effects of ZnO buffer layer thickness and annealing temperature on the heterojunction diode, ZnO/b-ZnO/p-Si(111), were reported. The effects of those on the structural and electrical properties of zinc oxide (ZnO) films on ZnO buffered p-Si (111) substrate were also studied. Structural properties of ZnO thin films were studied by X-ray diffraction and I-V characteristics were measured by a semiconductor parameter analyzer. ZnO thin films with 70 nm thick buffer layer and annealing temperature of $700^{\circ}C$ showed the best c-axis preferred orientation. The best electrical property was found at the condition of buffer layer annealing temperature of $700^{\circ}C$ and 50nm thick ZnO buffer layer (resistivity: $2.58{\times}10^{-4}[{\Omega}-cm]$, carrier concentration: $1.16{\times}1020[cm^{-3}]$). The I-V characteristics for ZnO/b-ZnO/p-Si(111) heterojunction diode were improved with increasing buffer layer thickness at buffer layer annealing temperature of $700^{\circ}C$.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.326-326
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• 2012

ZnS를 합성하는 방법 중 thioacetamide (TAA)를 녹인 물에 ZnO template를 넣어서 황화시키는 방법이 있다. 이 방법은 실험과정이 간편할 뿐만 아니라 그 반응양의 조절도 용이해 ZnS-ZnO core-shell 구조나 ZnS hollow 구조 등을 만드는데 널리 사용되고 있다. 그러나 다양한 형태의 ZnS 구조체 합성에 관한 연구는 활발한 반면, ZnS의 상형성 과정이나 구조 변화와 같은 ZnO의 황화 과정 기구에 관한 연구는 매우 미비한 실정이다. ZnS는 기본적으로 저온에서는 cubic sphalerite 구조를, 고온에서는 hexagonal wurtzite 구조를 안정상으로 가진다. 또한, 8H나 15R 등과 같은 다양한 polytype 구조도 존재한다. 그러나 다양한 구조에서 비슷한 면간거리가 존재하기 때문에 결정구조의 분석이 어려운 실정이다. 이러한 비슷한 면간거리를 가지는 ZnS 등의 결정구조 분석에 있어 원자배열을 직접적으로 관찰할 수 있는 투과전자현미경 (TEM, transmission electron microscopye)을 이용한 연구는 큰 강점을 가진다. 본 연구에서는 다공성 ZnO 막을 황화시켜 형성된 ZnS 막의 미세구조 특성을 분석하였다. 다공성 ZnO 막은 패턴된 Si (111) 기판 위에 스핀코팅법을 이용하여 4,000 rpm의 속도로 증착되었으며 ZnO 결정화를 위해 150 도와 500도에서 각각 drying과 후열처리를 수행하였다. 이렇게 만들어진 ZnO 막을 TAA를 녹인 물에 넣어 48 시간 동안 반응시켰고 최종적으로 ZnS 막을 생성하였다. 다공성 ZnS 막의 미세구조를 분석하기 위해 주사전자현미경 (SEM, scanning electron microscope), X-선 회절분석기 (XRD, x-ray diffractometer), 그리고 투과전자현미경을 이용하였으며, 정확한 결정구조 분석을 위하여 결정구조 시뮬레이션을 병행하였다.

• Membrane Journal
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• v.26 no.6
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• pp.463-469
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• 2016

In this research, a new expectation in enhancing the PES (polyethersulfone) polymer phase inversion membrane performances with nanoparticles is proposed by using ZnO. This paper investigated the synthesis of PES phase inversion membranes including ZnO nanoparticles and evaluates the performance of these mixed matrix membranes. The PES-ZnO mixed matrix membranes were fabricated by phase inversion method using the PES-ZnO-NMP(N-methyl-1-pyrrolidone) casting solutions with low ZnO nanoparticles content of 0.375 wt%. The influence of ZnO nanoparticles on the characteristics of PES-ZnO mixed matrix membranes was investigated with scanning electron microscope observations of membrane cross-sections, contact angle measurements, tensile strength measurements, pure water flux measurements and ultrafiltration experiments of BSA solution. Those results showed that the performance advancements in comparison with the pure PES membrane without ZnO in terms of increasing hydrophilicity as well as reducing membrane fouling by adding ZnO nanoparticles even in low concentration.

• Journal of IKEEE
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• v.21 no.4
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• pp.404-407
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• 2017

We investigated the microstructure, electrical and optical characteristics of ZnO, AZO and ITO films using aerosol deposition process. As gas consumption increased, the electrical and optical characteristics of ZnO, AZO and ITO films were improved, and electrical and optical characteristics of ZnO, AZO and ITO films with a thickness of 400 nm were successfully fabricated on PET substrates at room temperature. The mechanical flexibility durability test shows that the ZnO films can withstand 5,000 cycles and AZO and ITO films occurs to crack in films with degradation of resistance and transmittance. Even though the AZO and ITO films shows slightly lower durability than the ZnO films, this is expected to improve performance of films through optimized processing condition and particle size control.

• Journal of IKEEE
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• v.24 no.2
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• pp.435-440
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• 2020

ZnO:Al films with about 500 nm thick were prepared by RF magnetron sputtering. The ZnO:Al films were annealed at 100 ℃, 200 ℃, 300 ℃, and 400 ℃ for 10 h, respectively. The resistivity, carrier concentration, and mobility variation of ZnO:Al films with heat treatments were measured. The causes of the resistivity variation of ZnO:Al films with heat treatments were investigated by utilizing the results of x-ray diffraction and field emission scanning electron microscope. The energy band gap, Urbach energy, and refractive index were obtained from the transmittance of ZnO:Al films. The change in electrical properties of the ZnO:Al film was explained in relation to the optical properties.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.217-217
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• 2010

산화물유전체/금속/산화물유전체(D/M/D) 구조의 투명전극은 우수한 통전성과 투광성을 갖는 동시에 근적외선 및 전자파 차폐가 가능하여 각종 디스플레이 장치로의 응용을 위해 많은 연구가 진행 중이다. 이러한 구조의 다층막의 경우 금속층과 산화물층간 계면에서의 산소확산으로 인한 광학적, 전기적 특성 저하가 문제가 되고 있다. 본 연구에서는 층간 산소확산방지를 통해 다층막의 전기적 특성을 개선하기 위해 $TiO_2$/Ag/$TiO_2$, $TiO_2$/ZnS/Ag/ZnS/$TiO_2$ 구조의 다층막을 DC/RF 마그네트론 스퍼터를 이용하여 제조하여 ZnS 박막이 다층막의 특성에 미치는 영향을 비교 평가하였다. 제조된 박막의 전기적, 광학적, 계면 특성을 4-point probe, Spctrophotometer, AES을 이용하여 분석하였으며 PDP필터용 전극으로의 적용 가능성을 평가하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.317-317
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• 2016

이 연구에서는 산화막/산화막/산화막 적층구조의 블로킹산화막/전하저장층/터널링산화막과 InSnZnO를 채널층으로 이용한 비휘발성 메모리 (NVM) 소자의 메모리 특성을 확인하였다. NVM 소자의 기본 전기적 특성의 경우 $19.8cm2/V{\cdot}s$의 높은 전계효과 이동도, 0.09V의 낮은 문턱전압, 0.127 V/dec의 낮은 기울기 및 $1.47{\times}107$의 높은 전류점멸비를 나타내었다. 또한, InSnZnO의 경우 가시광영역에서 85% 이상의 투과도를 가짐을 확인하였다. NVM소자의 경우, +12V의 Programming과 1ms의 Programming duration time에서 104s 이후 86%이상의, 그리고 10년 후 67% 이상의 우수한 전하보유시간 특성을 나타내었다. 이를 통해 투명플렉서블 메모리 시스템에 산화막/산화막/산화막 적층구조의 InSnZnO NVM소자의 응용 가능성이 높다고 판단한다.

• Journal of IKEEE
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• v.22 no.3
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• pp.712-715
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• 2018

ZnO nanorods were grown on ZnO seed films by a hydrothermal method. The rf sputtered ZnO thin films annealed at $600^{\circ}C$ were employed as the seed films. The ZnO nanorods were annealed at $400^{\circ}C$ and $800^{\circ}C$, respectively. The structural and optical property dependence of ZnO nanorods on the annealing was studied. The UV peak showing the strong intensity and narrow FWHM was obtained from ZnO nanorods annealed at $400^{\circ}C$.

• Journal of the Korean Applied Science and Technology
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• v.39 no.1
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• pp.34-41
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• 2022

As the use of chemical products increases in daily life, the removal of dye waste has also emerged as an important environmental issue. This dye waste can be decomposed using a photocatalyst, and the photocatalyst can be synthesized very cost-effectively by using the sol-gel technology. The sol-gel technology is not only very useful for nanoscale film formation, but also can simply form multilayer structures. Using a multiple spin coating method, in this study, a ZnO film with a multilayered structure (3 layers, 5 layers) was formed by using zinc oxide (ZnO), which is effective in decomposing various dyes. For performance comparison, a ZnO film having a single layer structure by a single spin coating method was prepared as a control. Structural and elemental analysis of ZnO film was performed using an X-ray diffraction analyzer and an energy dispersive X-ray spectrometer. A nanowire-like surface morphology could be observed through a scanning electron microscope. Additionally, UV-Vis spectrophotometer was used to measure the absorbance of UV light. The ZnO film with a five-layer structure degraded the simulated methylene blue by 49% more than the ZnO film with a single-layer structure. In conclusion, it was found that ZnO having a multilayered structure is useful as a photocatalyst that decomposes methylene blue dye more effectively.

• Korean Journal of Materials Research
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• v.11 no.3
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• pp.197-202
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• 2001

M $g_{1-x}$ Z $n_{x}$O thin films with various composition x of ZnO were fabricated by a RF magnetron sputtering method, which is expected to improve the electro-optical properties of the conventional MgO protective layer for AC-PDP. Test panels with the $Mg_{1-x}$Z $n_{x}$O protective layer have been fabricated in order to investigate the effects of ZnO doping on the electrical characteristics of devices such as the discharge voltages and the memory gain. Experimental results revealed that test panels with the $Mg_{1-x}$Z $n_{x}$O(x=0.5at%) protective layer show lower firing and sustain voltages than those seen in panels with MgO protective layer by 20V. resulting in an increasement of the memory coefficient. In addition, it was found that test panels with the $Mg_{1-x}$Z $n_{x}$O protective layer show higher discharge intensity, i. e., higher plasma density, compared with panels with MgO protective layer.ve layer.layer.