• Journal of the Microelectronics and Packaging Society
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• v.25 no.4
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• pp.137-142
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• 2018

Room temperature ferromagnetism of Co doped ZnO was studied using (ZnO/Co) multilayer structure, and the effects of ZnO sub-layer thickness on the RT ferromagnetism was investigated. As for the as-deposited state, the diamagnetism was observed for ($ZnO\;20{\AA}/Co\;x{\AA}$) while the ferromagnetism was observed for ($ZnO\;40{\AA}/Co\;x{\AA}$). After vacuum-annealed, both showed the RT ferromagnetism and ($ZnO\;40{\AA}/Co\;x{\AA}$) structure interestingly showed negative remanence magnetization behavior. UV-Vis spectrometer revealed that Co atoms were substituted with Zn in ZnO and Co cluster was not found in XPS and HRTEM EDS analysis.

• Journal of IKEEE
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• v.24 no.2
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• pp.435-440
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• 2020

ZnO:Al films with about 500 nm thick were prepared by RF magnetron sputtering. The ZnO:Al films were annealed at 100 ℃, 200 ℃, 300 ℃, and 400 ℃ for 10 h, respectively. The resistivity, carrier concentration, and mobility variation of ZnO:Al films with heat treatments were measured. The causes of the resistivity variation of ZnO:Al films with heat treatments were investigated by utilizing the results of x-ray diffraction and field emission scanning electron microscope. The energy band gap, Urbach energy, and refractive index were obtained from the transmittance of ZnO:Al films. The change in electrical properties of the ZnO:Al film was explained in relation to the optical properties.

• Journal of the Korean Vacuum Society
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• v.18 no.5
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• pp.394-401
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• 2009

This paper reports the structural and optical properties of ZnO/glass thin films grown by radio-frequency magnetron sputtering with a powder target. In contrast to ZnO ceramic target typically used, a ZnO raw powder target was sputtered in this study. ZnO grew with the (0002) preferred orientation along the surface normal direction. Initially, the surface of ZnO thin films was flat considerably and then it became rougher as the thickness increased. The optical transmittance was as high as 88% in the range of 400-1000 nm. The bandgap energy of 3.23 eV at the 220 nm thick sample was estimated.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.265-265
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• 2007

In the present work, we have studied low temperature sintering and microwave dielectric properties of $ZnAl_2O_4$-zinc borosilicate (ZBS, 65ZnO-$25B_2O_3-10SiO_2$) glass composites. The focus of this paper was on the improvement of sinterability, low dielectric constant, and on the theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-ZBS glass composites, respectively. The $ZnAl_2O_4$ with 60 vo1% ZBS glass ensured successful sintering below $900^{\circ}C$. It is considered that the non-reactive liquid phase sintering (NPLS) occurred. In addition, $ZnAl_2O_4$ was observed in the $ZnAl_2O_4$-(x)ZBS composites, indicating that there were no reactions between $ZnAl_2O_4$ and ZBS glass. $ZnB_2O_4\;and\;Zn_2SiO_4$ with the willemite structure as the secondary phase was observed in the all $ZnAl_2O_4$-(x)ZBScomposites. In terms of dielectric properties, the application of the $ZnAl_2O_4$-(x)ZBS composites sintered at $900^{\circ}C$ to LTCC substrate were shown to be appropriate; $ZnAl_2O_4$-60ZBS (${\varepsilon}_r$= 6.7, $Q{\times}f$ value= 13,000 GHz, ${\tau}_f$= -30 ppm/$^{\circ}C$). Also, in this work was possible theoretical proof regarding of microwave dielectric properties in $ZnAl_2O_4$-(x)ZBS composites.

• Korean Journal of Crystallography
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• v.4 no.2
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• pp.92-99
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• 1993

ZnO thin films were depositsd by Plasma enhanced CVD (PUW) using Diethylzinc and N2O gas, and micro-structue of ZnO thin films were investigated ZnO thin films composed of micro-crystallites was deposited at the substrate of loot. However, highly c-axis oriented ZnO thin films were deposited on the glass substrates above 200℃. TEM analysis revealed that an epitaxial (002) ZnO thin film was deposited on c-plane sapphire substrate at the substrate temperature of 350℃, and More patterns showing partial dislocation were observed at the grain boundary.

• Journal of the Korean Ceramic Society
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• v.40 no.11
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• pp.1113-1119
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• 2003

We used isopropanol which has low boiling point to prepare thin films at low temperature and changed mole concentration of zinc acetate from 0.3 to 1.3 mol/l. The structural, optical and electrical properties of ZnO thin films with Zn content were investigated. ZnO thin films highly oriented along the c-axis were obtained at Zn concentration of 0.7 mol/l. ZnO thin films with Zn concentration of 0.7 mol/l showed a homogeneous surface layer of nano structure. The transmittance of ZnO thin films by UV-vis. measurement was about 87% under the Zn concentration of 0.7 mol/l, but rapidly decreased over the 1.0 mol/l. The optical band gap energy was obtained from 3.07 to 3.22 eV which is very close to the band gap of bulk ZnO (3.2 eV). The electrical resistivity of ZnO thin films was about 150 $\Omega$-cm that shows little difference with Zn concentration. I-V curves of ZnO thin films exhibited typical ohmic contact properties.

• Journal of the Korean Chemical Society
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• v.39 no.3
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• pp.176-185
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• 1995

To improve photosensisitizing efficiency of ZnO/$H_2Pc(I)_x$ system, ZnO/$H_2Pc(I)_x$ system was dispersed in a typical photoconductive polymer of poly(9-vinylcarbazole)(PVCZ). The iodine dopant level(x) of ZnO/${\chi}-H_2Pc(I)_x$ is proportional to concentration of iodine, whereas x of ZnO/${\beta}-H_2Pc(I)_x$ decreased from the highest x=0.97 at more than $6.3{\times}10^{-3}$ M iodine solution. The Raman spectra of ZnO/${\chi}-H_2Pc(I)_x$ at 514 nm exhibited characteristic $I_3^-$ patterns in the range of 50∼550 $cm^{-1}$ at $x{\geq}0.57.$ The surface photovoltage of ZnO/${\chi}-H_2Pc(I)_{0.48}$/PVCZ was approximately 1.6 times greater than ZnO/${\chi}-H_2 Pc(I)_{0.48}$ and was 1.8 times of ZnO/${\chi}-H_2Pc(I)_{0.57}$/PVCZ at 670 nm. With ZnO/$H_2Pc(I)_x$/PVCZ, the highest iodine dopant levels showed a higher photovoltage. Therefore the injection of holes from H2Pc into PVCZ resulted in that photosensisitizing effect of ZnO/$H_2Pc(I)_x$/PVCZ system was improved compared to ZnO/$H_2Pc(I)_x$ case.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.378-382
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• 1999

저 전압용 형광체는 최근에 활발히 연구가 진행되고 있으며 가장 대표적인 형광체가 ZnO Zn 녹색 형광체이다. ZnO : Zn 형광체는 자체발광형 형광체로써 ZnO을 환원분위기 하에서 열처리를 함으로써 얻을 수 있다. 본 연구에서는 자발착화 연소반응법(Glycine Nitrate Process)을 이용하여 ZnO : Zn 분말을 합성하고 형광특성 및 분말특성을 알아보았다. 출발물질로는 Zn Nitrate와 Glycine을 이용하였고 자발연소 반웅이 발생하는데 적절한 글리신의 양을 확인하기 위해서 글리신과 양이온의 비를 변화시키며 ZnO를 합성하였다. 그리고 Zn Excess가 생겨난 앙과 그에 따른 형광특성을 관찰하기 위해 $N_2$ 분위기 에서 각기 50$0^{\circ}C$, 75$0^{\circ}C$, 95$0^{\circ}C$의 온도에서 열처리를 행하였다. 제조된 ZnO 분말의 입자형태와 결정상 태는 SEM과 XRD를 이용하여 분석하였고 TG-DTA를 측정하여 열처리온도에 따른 질량감소(Zn excess)를 관찰하였다. 또 Particle size analyzer로 분말의 크기를 알아보았고 형광체로써의 발광특성을 살펴보기 위해 PL을 이용하여 발광피크를 관찰하였다.

• Clean Technology
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• v.22 no.2
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• pp.89-95
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• 2016

The nanotoxicity of ZnO nanoparticles used in cosmetics and tire industry is one of emerged issues. Herein, the removal of ZnO nanoparticles dispersed in aqueous phase and its ecotoxicity were investigated. In the short-term exposure for fertilized eggs (O. latipes), the deformity was observed at 5 mg L⁻¹ of ZnO nanoparticles in some individuals and delayed hatching of eggs by retarded growth was observed at 10 mg L⁻¹ of ZnO nanoparticles. This result show that ZnO nanoparticles have cytotoxic effect to the organisms lived in water phase. Therefore, herein, the removal of ZnO nanoparticles in aqueous phase by chemical precipitation was investigated. After addition of Na₂S and Na₂HPO₄, the precipitated ZnO was transformed to ZnS and Zn₃(PO₄)₂ particles, respectively. The removal efficiency of ZnO was reached to almost 100% for two cases. In addition, the toxicity tests about ZnS and Zn₃(PO₄)₂ particles showed no acute toxicity for D. magna. This implies that transformation of ZnO to ZnS and Zn₃(PO₄)₂ particles with very low ionization constant might decrease effectively the toxicity of ZnO.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.112-112
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• 2010

Zinc Oxide (ZnO) thin-films were deposited according to the magnetron sputtering method. The deposited ZnO films were annealed with RTA equipment at various annealing temperatures in an vacuum ambient. The influence of the annealing temperature on the structural, electrical, and optical properties of the ZnO films was experimentally investigated, and the effect of conductivity of the ZnO active layer on the device performance of the oxide-TFT was tested. As a result, an increase of the annealing temperature was attributed to improvements of crystallinity in ZnO films. The grain size was found to lead to an increase of conductivity in the ZnO films. Fabricated ZnO TFTs with annealed ZnO active layer provided good performance in the TFT devices. Consequently, the performance of the TFT was determined by the conductivity of the ZnO film, which was related to the structural properties of the ZnO film.