• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.350-350
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• 2013

Sol-gel법을 이용하여 p-Si 기판위에 yttrium이 도핑된 ZnO (YZO)를 성장하였다. ZnO의 precursor로는 zinc acetate dihydrate를, yttrium의 source로는 yttrium acetate hydrate를 사용하였으며, 용매와 안정제로는 각각 2-methoxy ethanol과 monoethanolamine (MEA)를 사용하였다. yttrium의 doping 농도에 따른 영향을 알아보기 위하여 1~4 at.%로 제작된 YZO sol을 각각 p-type Si 기판에 성장하였으며, 이 후 furnace를 이용하여 500oC에서 1시간 동안 열처리하였다. 성장된 YZO 박막의 표면과 두께를 SEM을 통하여 확인하였으며, XRD를 통한 구조적인 특성을 분석한 결과 모든 박막에서 뚜렷한 c-축 배양성을 갖는 ZnO (0002)피크를 확인하였다. Hall effect를 통하여 YZO는 모두 n-type 특성을 나타낸다는 것을 확인하였으며, 광학적인 특성은 PL을 통해서 분석하였다. n-YZO/p-Si 이종접합의 전류-전압 특성을 분석한 결과 뚜렷한 정류특성을 나타내었다.

• 센서학회지
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• 제19권3호
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• pp.197-201
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• 2010

This paper describes the fabrication and characteristics of a NO sensor using ZnO thin film integrated 3C-SiC micro heater based on polycrystalline 3C-SiC thin film of operation in harsh environments. The sensitivity, response time, and operating properties in high temperature and voltages of NO sensors based SiC MEMS are measured and analyzed. The sensitivity of device with pure ZnO thin film at the heater operating power of 13.5 mW ($300^{\circ}C$) is 0.875 in NO gas concentration of 0.046 ppm. In the case of Pt doping, the sensitivity of at power consumption of 5.9 mW ($250^{\circ}C$) was 1.92 at same gas flow rate. The ZnO with doped Pt was showed higher sensitivity, lower working temperature and faster adsorption characteristics to NO gas than pure ZnO thin film. The NO gas sensor integrated SiC micro heater is more strength than others in high voltage and temperature environments.

• 한국전기전자재료학회논문지
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• 제22권10호
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• pp.821-825
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• 2009

Recently, transparent ZnO-based TFTs have attracted much attention for flexible displays because they can be fabricated on plastic substrates at low temperature. We report the fabrication and characteristics of ZnO TFTs having different channel thicknesses deposited at low temperature. The ZnO films were deposited as active channel layer on $Si_3N_4/Ti/SiO_2/p-Si$ substrates by RF magnetron sputtering at $100^{\circ}C$ without additional annealing. Also, the ZnO thin films deposited at oxygen partial pressures of 40%. ZnO TFTs using a bottom-gate configuration were investigated. The $Si_3N_4$ film was deposited as gate insulator by PE-CVD at $150^{\circ}C$. All Processes were processed below $150^{\circ}C$ which is optimal temperature for flexible display and were used dry etching method. The fabricated devices have different threshold slop, field effect mobility and subthreshold slop according to channel thickness. This characteristics are related with ZnO crystal properties analyzed with XRD and SPM. Electrical characteristics of 60 nm ZnO TFT (W/L = $20\;{\mu}m/20\;{\mu}m$) exhibited a field-effect mobility of $0.26\;cm^2/Vs$, a threshold voltage of 8.3 V, a subthreshold slop of 2.2 V/decade, and a $I_{ON/OFF}$ ratio of $7.5\times10^2$.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.638-638
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• 2013

ZnO는 넓은 밴드갭(3.37 eV)를 가지기 때문에 UV detector로 유용하게 쓰일 수 있다. 본 연구에서는 Graphene 위에 ZnO nanorod를 hydrothermal 방법을 사용하여 성장한 후 Graphene 위에 전극을 형성한 후 UV 센서를 제작하였다. Si의 기판위에 SiO2의 막을 증착을 하고 그 위에 Graphene을 전도시킨다. Graphene위에 ZnO nanorod의 성장을 위해서 ZnO seed layer를 sputtering 방법으로 얇게 증착을 시킨다. ZnO nanorod의 성장은 hydrothermal의 방법으로 Zinc nitrate hexahydrate와 암모니아를 수용액에 넣은 후 $80^{\circ}C$에서 성장하였다. Graphene 위에 ZnO가 없는 부분에 전극을 형성하여 UV의 세기에 따른 IV 전기적 특성의 변화를 관측한다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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• pp.565-568
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• 1987

In order to determine the standard composition of ZnO varistor with higher nonlinearity, various contents of $MnO_2$, $Co_2O_3$ were added to ZnO-1.0m/o $Bi_2O_3$ system. Also, samples that contained small amount of Sb, Si-oxides in standard composition determined before were fabricated. As a result, the standard composition of higher nonlinearity-oriented ZnO varistor was shown as ZnO-1.0 m/o $Bi_2O_3$-1.0m/o $MnO_2$-1.0m/o $Co_2O_3$ and $Sb_2O_3$ largely enhanced nonlinear exponent and nonlinear resistance, hut SiO largely enhanced nonlinear exponent only.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1994년도 춘계 학술발표 강연 및 논문 개요집
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• pp.79-79
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• 1994

• 한국전기전자재료학회논문지
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• 제22권3호
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• pp.262-268
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• 2009

We investigated the properties of inorganic diatomic films like silicon oxide ($SiO_2$) and zinc oxide (ZnO) and their composite films are packed as a passivation layer around Ca cells on glass substrates by using an electron-beam evaporation technique and rf-magnetron sputtering method. When these Ca cells are exposed to an ambient atmosphere, the water vapor penetrating through the passivation layers is adsorbed in the Ca cells, resulting in a gradual progress of transparency in the Ca cells, which can be represented by changes of the optical transmittance in the visible range. Compared with the saturation times for the Ca cells to become completely transparent in the atmosphere, the protection effects against permeation of water vapor are estimated for various passivation films. The thin composite films consist of$SiO_2$ and ZnO are found to show a superior protection effect from water vapor permeation compared with diatomic inorganic films like $SiO_2$ and ZnO. Also, this inorganic thin composite films are also found that their protection effect against permeation of water vapor can be significantly enhanced by choosing their suitable composition ratio and deposition method, in addition, the main factors affecting the permeation of water vapor through the oxide films are found to be the polarizability and the packing density.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.190-190
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• 2010

Zinc oxide is the most attractive material due to the large direct band gap (3.37 eV), excellent chemical and thermal stability, and large exciton binding energy (60 meV). Recently, ZnO nanorods were used as the high efficient antireflection coating layer of solar cells based on silicon (Si). In this reports, we studied the effects of rapid thermal annealing (RTA) treatment on optical properties of ZnO nanorods. For fabrication of ZnO nanorods, there are many methods such as hydrothermal method, sol-gel method, and metal organic chemical vapor deposition method. Among of them, we used the conventional wet chemical method which is simple and low temperature growth. In order to synthesize the ZnO nanorods, the ZnO films were deposited on Si substrate by RF magnetron sputtering at room temperature and the samples were dipped to aqua solution containing the zinc nitrate and hexamethylentetramines (HMT). The synthesis process was achieved in keeping with temperature of $90-95^{\circ}C$ and under constant stirring. The morphology of ZnO nanorods on glass and Si was characterized by scanning electron microscopy. For the analysis of antireflection performance, the reflectance and transmittance were measured by spectrophotometer. And for analyzing the effects of RTA treatment on ZnO nanorods, crystalline properties were investigated by X-ray diffraction measurements and optical properties was estimated by photoluminescence spectra.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2005년도 춘계종합학술대회
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• pp.1022-1025
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• 2005

ZnO 나노 구조의 형성 시 기판 표면에 의한 영향을 알아보기 위하여, Si(111) 기판과 $Al_2O_3$C (0111)면, A (0112)면, R (2110)면의 기판을 사용하여 나노 구조를 형성시키고 광학적 특성의 변화를 관찰하였다. ZnO 나노 구조는 대기 중에서 수평형 성장로를 이용하였고, 무촉매법으로 Zn 소스만을 사용하여 성장시켰다. 기판의 온도는 500$^{\circ}C$ ${\sim}$ 600$^{\circ}C$로 설정하였고, 성장된 나노 구조는 He-Cd laser (325nm)를 이용하여 10 K에서 300K까지 온도를 변화시키면서 발광 특성의 변화를 분석하였다. 상온에서 측정한 Photoluminescence (PL) 결과로부터, Si과 $Al_2O_3$ 기판에서 각각 384nm, 391 nm의 UV 발광이 관찰되었다. Si 기판에서는 산소 결핍형 결함에 의한 것으로 판단되는 녹색 발광이 관찰되었지만 $Al_2O_3$ 기판에서는 녹색 발광이 관찰되지 않았다. 그리고 온도 변화에 따른 PL 측정 결과 Si과 $Al_2O_3$ 기판에서의 UV 발광 피크의 기원이 다름을 확인할 수 있었다. 이러한 발광 특성의 차이는 기판의 표면 에너지 차이가 나노 구조의 성장 매커니즘에 영향을 주어 발생한 것으로 생각된다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2001년도 추계 학술발표강연 및 논문개요집
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• pp.189-189
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• 2001