• 제목/요약/키워드: Zn precursor

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Pb(Zn, Mg)_{1/3}Nb_{2/3}O_3$계에서 Columbite Precursors의 화학적 특성이 상생성, 미세화학 및 유전특성에 미치는 영향 (Effects of the Columbite Precursors on Phase-Formation Characteristics, Microchemistry and Dielectric Properties of Pb(Zn, Mg)_{1/3}Nb_{2/3}O_3$ Ceramics)

  • 조성률;이규만;장현명
    • 한국세라믹학회지
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    • 제30권9호
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    • pp.723-730
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    • 1993
  • The mechanism of formation of perovskite phase and the dielectric properties of PZMN[Pb(Zn, Mg)1/3Nb2/3O3] ceramics were examined using two different types of the columbite precursors, (Mg, Zn)Nb2O6 (MZN) and MgNb2O6+ZnNb2O6 (MN+ZN). The formatin of perovskite phase in PbO+MN+ZN system is characterized by an initial rapid formation of Mg-rich perovskite phase, followed by a sluggish formation of Zn-rich perovskite phase. On the other hand, thepyrochlore/perovskite transformation in the PbO+MZN system proceeded uniformly with a spatial homogeneity. The degree of diffuseness of the rhombohedral/cubic phase transitionis higher in the PbO+MN+ZN system than in the PbO+MZN specimen, indicating a broadened compositional distributjion of the B-site catons (Nb+5, Zn+2, Mg+2) in the PbO+MN+ZN system.

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스프레이 공정을 이용한 nc-ZnO/ZnO 전계효과트랜지스터 제작 및 특성 분석 (The Study of nc-ZnO/ZnO Field-effect Transistors Fabricated by Spray-pyrolysis Process)

  • 조준희
    • 반도체디스플레이기술학회지
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    • 제21권3호
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    • pp.22-25
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    • 2022
  • Metal oxide semiconductor (MOS) based on spray-pyrolysis deposition technique has attracted large attention due to simple and low-cost processibility while preserving their intrinsic optical and electrical characteristics. However, their high process temperature limits practical applications. Here, we demonstrated the nc-ZnO/ZnO field-effect transistors (FETs) via spray-pyrolysis as incorporating ZnO nanocrystalline nanoparticles into typical ZnO precursor. The nc-ZnO/ZnO FETs exhibit good quality of electrical properties. Our experiments reveal that nc-ZnO in active layer enhance electrical characteristics.

용액상에서 합성된 ZnO 입자의 생성과정에 관한 연구 (A Study on the Growth Pattern of ZnO Particles in Chemical Solutions)

  • 김학수;김동환
    • 한국재료학회지
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    • 제15권10호
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    • pp.678-682
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    • 2005
  • We studied the possibility of $Zn_4O(Ac)_2(OH)$ formation as a precursor for ZnO nano particles in sol-gel method. Four different additives such as tetra methyl ammonium hydroxide, mono ethanol amine (MEA), LiOH, and $H_2O$ were used for zinc acetate dissolved in 2-methoxy ethanol. ZnO particles of 5-6 nm in size were observed. Existence of $Zn_4O(Ac)_6$ was not verified. $Zn_4O(Ac)_2(OH)$ molecules were observed and they were believed to be the precursors of ZnO. A peak at 275nm in UV-Vis analysis was observed In the case of MEA and $H_2O$ but no ZnO particles were detected in transmission electron microscopy.

전계효과트랜지스터 기반 반도체 소자 응용을 위한 스프레이 공정을 이용한 nc-ZnO/ZnO 박막 제작 및 특성 분석 (Morphological and Electrical Characteristics of nc-ZnO/ZnO Thin Films Fabricated by Spray-pyrolysis for Field-effect Transistor Application)

  • 조준희
    • 반도체디스플레이기술학회지
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    • 제20권4호
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    • pp.1-5
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    • 2021
  • Field-effect transistors based on solution-processed metal oxide semiconductors has attracted huge attention due to their intrinsic characteristics of optical and electrical characteristics with benefits of simple and low-cost process. Especially, spray-pyrolysis has shown excellent device performance which compatible to vacuum-processed Field-effect transistors. However, the high annealing temperature for crystallization of MOS and narrow range of precursors has impeded the progress of the technology. Here, we demonstrated the nc-ZnO/ZnO films performed by spray-pyrolysis with incorporating ZnO nanoparticles into typical ZnO precursor. The films exhibit preserving morphological properties of poly-crystalline ZnO and enhanced electrical characteristics with potential for low-temperature processability. The influence of nanoparticles within the film was also researched for realizing ZnO films providing good quality of performance.

Fabrication of Thin Film Transistors based on Sol-Gel Derived Oxide Semiconductor Layers by Ink-Jet Printing Technology

  • 문주호;김동조;송근규;정영민;구창영
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2009년도 춘계학술발표대회
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    • pp.16.1-16.1
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    • 2009
  • We have fabricated solution processed oxide semiconductor active layer for thin film transistors (TFTs). The oxide semiconductor layers were prepared by ink-jet printing the sol-gel precursor solution based on doped-ZnO. Inorganic ZnO-based thin films have drawn significant attention as an active channel layer for TFTs applications alternative to conventional Si-based materials and organic semiconducting materials, due to their wide energy band gap, optical transparency, high mobility, and better stability. However, in spite of such excellent device performances, the fabrication methods of ZnO related oxide active layer involve high cost vacuum processes such as sputtering and pulsed laser deposition. Herein we introduced the ink-jet printing technology to prepare the active layers of oxide semiconductor. Stable sol-gel precursor solutions were obtained by controlling the composition of precursor as well as solvents and stabilizers, and their influences on electrical performance of the transistors were demonstrated by measuring electrical parameters such as off-current, on-current, mobility, and threshold voltage. Microstructure and thermal behavior of the doped ZnO films were investigated by SEM, XRD, and TG/DTA. Furthermore, we studied the influence of the ink-jet printing conditions such as substrate temperature and surface treatment on the microstructure of the ink-jet printed active layers and electrical performance. The mobility value of the device with optimized condition was about 0.1-1.0 $cm^2/Vs$ and the on/off current ratio was about $10^6$. Our investigations demonstrate the feasibility of the ink-jet printed oxide TFTs toward successful application to cost-effective and mass-producible displays.

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스프레이 공정을 이용한 nc-ZnO/ZnO 전계효과트랜지스터의 광학적 노출에 대한 열화 현상 분석 (The Instability Behaviors of Spray-pyrolysis Processed nc-ZnO/ZnO Field-effect Transistors Under Illumination)

  • 조준희
    • 반도체디스플레이기술학회지
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    • 제22권1호
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    • pp.78-82
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    • 2023
  • Metal oxide semiconductor (MOS) adapting spray-pyrolysis deposition technique has drawn large attention based on their high quality of intrinsic and electrical properties in addition to simple and low-cost processibility. To fully utilize the merits of MOS field-effect transistors (FETs) , transparency, it is important to understand the instability behaviors of FETs under illumination. Here, we studied the photo-induced properties of nc-ZnO/ZnO field-effect transistors (FETs) based on spray-pyrolysis under illumination which incorporating ZnO nanocrystalline nanoparticles into typical ZnO precursor. Our experiments reveal that nc-ZnO in active layer suppressed the light instabilities of FETs.

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자기제한적 표면반응에 의한 ZnO 박막성장 및 기판온도에 따른 박막특성 (Self-Limiting Growth of ZnO Thin Films and Substrate-Temperature Effects on Film Properties)

  • 이두형;권새롬;이석관;노승정
    • 한국진공학회지
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    • 제18권4호
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    • pp.296-301
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    • 2009
  • ZnO에 대한 박막증착 연구를 위하여 유도결합 플라즈마 원자층박막증착(inductively coupled plasma assisted atomic layer deposition: ICP-ALD) 장치를 제작하고, 장치에 대한 기본 공정조건을 설정하기 위하여 플라즈마를 유도하지 않은 상태에서 p-type Si(100) 기판 위에 ZnO 박막을 증착하는 다양한 실험을 수행하였다. Zn 전구체(precursor)로는 Diethyl zinc [$Zn(C_2H_5)_2$, DEZn]를, 반응가스(reaction gas)로는 $H_2O$를, 캐리어(carrier) 및 퍼지가스(purge gas)로는 Ar을 사용하였다. 기판온도 $150^{\circ}C$에서 DEZn, $H_2O$, Ar의 공급시간을 변화시켜가면서 자기제한적 표면반응(self-limiting surface reaction)에 의한 박막성장조건을 성공적으로 유도하였다. 기판온도를 변화시켜가면서($90{\sim}210^{\circ}C$) 증착실험을 반복하여, 본 장치에 대한 ALD 공정온도(thermal ALD process window)를 확립하고 성장된 ZnO박막에 대한 증착특성, 결정성, 불순물 및 내부조성비등을 조사하였다. ALD 공정온도는 기판온도 $110{\sim}190^{\circ}C$로써 이 구간에서의 박막 평균증착률은 0.29 nm/cycle로 일정하게 나타났다. 기판온도가 높아질수록 결정성이 향상되어 ZnO(002) 피크가 우세하였다. 모든 ALD 공정온도에서 Zn와 O로만 구성된 고순도의 ZnO 박막을 실현하였는데, 온도가 높아질수록 Zn와 O의 비가 1에 근접하며 안정된 hexagonal wurtzite ZnO 구조의 박막이 성장되었다.

Fabrication of Conductive ZnO Thin Filn Using UV-Enhanced Atomic Layer Deposition

  • 양다솜;김홍범;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.373-373
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    • 2012
  • We fabricated conductive zinc oxide (ZnO) thin film at low temperature by UV-enhanced atomic layer deposition. The atomic layer deposition relies on alternate pulsing of the precursor gases onto the substrate surface and subsequent chemisorption of the precursors. In this experiment, diethylzinc (DEZ) and $H_2O$ were used as precursors with UV light. The UV light was very effective to improve the conductivity of the ZnO thin film. The thickness, transparency and resistivity were investigated by ellisometry, UV-visible spectroscopy and Four-point probe.

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습식 직접 합성법에 의한 Ni-Zn Ferrite의 합성 및 물성 연구 (Synthesis and Properties of Ni-Zn Ferrite by Wet-Direct Process)

  • 이경희;이병하;이융걸;황우연
    • 한국세라믹학회지
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    • 제28권3호
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    • pp.225-233
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    • 1991
  • In this study, we tried to find out the appropriate synthetic condition and magnetic properties of Ni-Zn ferrite {(NixZn1-x)Fe2O4} powders (where X=0, 0.1, 0.2, 0.3, ……0.9, 1). Ferrite powders were prepared by wet-direct method at 86℃ for 6hrs from FeCl36H2O, NiCl26H2O, and ZnCl2. The powders of (NixZn1-x)Fe2O4 (where X=0.4, 0.5, 0.6) have a good crystallinity, but the other ferrite powders consist of crystal and precursor ferrite. The ferrite powder's lattice constant is increased when ratio of ZnO contant is increased in the ferrite composition. And initial permeability was measured after sintering, result indicated regular pattern except (Ni0.4Zn0.6)Fe2O4 when the frequency were changed 10KHz to 10MHz.

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