• 태양에너지
• /
• 제19권1호
• /
• pp.29-36
• /
• 1999

ZnO/n-Si junctions were fabricated by spin coating with ZnO precursor produced by the sol-gel process. In order to increase the electrical conductivity of ZnO films, the films were n-doped with Al impurity and subsequently annealed at about $450^{\circ}C$ under reducing environments. The ohmic contacts between n-Si and AI for a bottom electrode were successfully fabricated by doping the rear surface of Si substrate with phosphorous atoms. The front surface of the substrate was also doped with phosphorous atoms for improving the efficiency of the solar cells. Consequently, conversion efficiencies ranging up to about 5.3% were obtained. These efficiencies were found to decrease slowly with time because of the oxide films formed at the ZnO/Si interface upon oxygen penetration through the porous ZnO. Oxygen barrier layers could be necessary in order to prevent the reduction of conversion efficiencies.

• 한국재료학회지
• /
• 제21권3호
• /
• pp.144-148
• /
• 2011

We have investigated the structural and optical properties of Ga-doped ZnO (GZO) thin films deposited by RF magnetron sputtering at various deposition temperatures from 100 to $500^{\circ}C$. All the GZO thin films are grown as a hexagonal wurtzite phase with highly c-axis preferred parameter. The structural and electrical properties are strongly related to deposition temperature. The grain size increases with the increasing deposition temperature up to $400^{\circ}C$ and then decreases at $500^{\circ}C$. The dependence of grain size on the deposition temperature results from the variation of thermal activation energy. The resistivity of GZO thin film decreases with the increasing deposition temperature up to $300^{\circ}C$ and then decreases up to $500^{\circ}C$. GZO thin film shows the lowest resistivity of $4.3{\times}10^{-4}\;{\Omega}cm$ and highest electron concentration of $1.0{\times}10^{21}\;cm^{-3}$ at $300^{\circ}C$. The mobility of GZO thin films increases with the increasing deposition temperature up to $400^{\circ}C$ and then decreases at $500^{\circ}C$. GZO thin film shows the highest resistivity of 14.1 $cm^2/Vs$. The transmittance of GZO thin films in the visible range is above 87% at all the deposition temperatures. GZO is a feasible transparent electrode for the application to the transparent electrode of thin film solar cells.

• 한국재료학회지
• /
• 제21권4호
• /
• pp.202-206
• /
• 2011

We have investigated the structural and electrical properties of Ga-doped ZnO (GZO) thin films deposited by an RF magnetron sputtering at various RF powers from 50 to 90W. All the GZO thin films are grown as a hexagonal wurtzite phase with highly c-axis preferred parameters. The structural and electrical properties are strongly related to the RF power. The grain size increases as the RF power increases since the columnar growth of GZO thin film is enhanced at an elevated RF power. This result means that the crystallinity of GZO is improved as the RF power increases. The resistivity of GZO rapidly decreases as the RF power increases up to 70 W and saturates to 90W. In contrast, the electron concentration of GZO increases as the RF power increases up to 70 W and saturates to 90W. GZO thin film shows the lowest resistivity of $2.2{\times}10^{-4}{\Omega}cm$ and the highest electron concentration of $1.7{\times}10^{21}cm^{-3}$ at 90W. The mobility of GZO increases as the RF power increases since the grain boundary scattering decreases due to the reduced density of the grain boundary at a high RF power. The transmittance of GZO thin films in the visible range is above 90%. GZO is a feasible transparent electrode for application as a transparent electrode for thin film solar cells.

• Bulletin of the Korean Chemical Society
• /
• 제34권3호
• /
• pp.856-862
• /
• 2013

The photoanode electrode of $TiO_2$ nanotubes (NTs) anchored with ZnS/CdSSe/CdS quantum dots (QDs) was prepared by anodization of Ti metal and successive ionic layer adsorption and reaction (SILAR) procedure. The tuning of the band gap of CdSSe was done with controlled composition of Cd, S, or Se during the SILAR. A ladder-like energy structure suitable for carrier transfer was attained with the photoanode electrode. The power conversion efficiency (PCE) of our solar cell fabricated with the regular array of $TiO_2$ NTs anchored with CdSSe/CdS or CdSe/CdS QDs [i.e., (CdSSe/CdS/$TiO_2NTs$) or (CdSe/CdS/$TiO_2NTs$)] was PCE = 3.49% and 2.81% under the illumination at 100 mW/$cm^2$, respectively. To protect the photocorrosion of our solar cell from the electrolyte and to suppress carrier recombination, ZnS was introduced onto CdSSe/CdS. The PCE of our solar cell with the structure of a photoanode electrode, (ZnS/CdSSe/CdS/$TiO_2$ NTs/Ti) was 4.67% under illumination at 100 mW/$cm^2$.

• 전기화학회지
• /
• 제22권2호
• /
• pp.60-68
• /
• 2019

이차 전지의 고전압 구동은 기존 셀 구조의 변화 없이도 고용량을 구현할 수 있는 유용한 접근 방법 중에 하나이나, 전극 표면에서의 극심한 부반응과 전극 활물질의 구조 붕괴 등과 같은 문제를 야기하게 된다. 본 연구에서는 니켈-망간-코발트 삼성분계(NCM) 활물질을 도입한 양극의 고전압 구동을 위해 원자층 증착법 (Atomic Layer Deposition, ALD)을 통해 전극판 표면에 $Al_2O_3$와 ZnO층으로 구성된 코팅 층을 형성하였다. 기존 ALD법으로 제조되는 박막에 비해 유사한 조건에서도 두꺼운 Al-doped ZnO (AZO)층을 최초로 형성하였고, 코팅된 AZO층의 두께를 달리한 NCM 기반의 양극판을 제조하였다. ALD 코팅된 양극이 도입된 코인셀을 제조하여 두껍게 형성된 코팅 층의 두께에 따른 고전압에서 충방전 거동을 확인하였다.

• 한국전기화학회:학술대회논문집
• /
• 한국전기화학회 2001년도 추계총회 및 학술발표회
• /
• pp.46-46
• /
• 2001

• 한국해양공학회:학술대회논문집
• /
• 한국해양공학회 2006년 창립20주년기념 정기학술대회 및 국제워크샵
• /
• pp.177-180
• /
• 2006

This study is to make a basic study if solid zinc (Zn) can be used for buried reference electrode, so we examined the adequacy of zinc as reference electrode by using zinc which showed regular electrode for buried period. The deference of electric potential if zinc electrode for corrosion factor such as soil resistivity or pH didn't show fixed trend and there was no clear trend on the change of measurement period. From field test, it is known that the natural electric potential difference of CSE electrode and zinc electrode is 1,100mV, but the electric potential of zinc electrode for CSE electrode in the natural soil and copying soil was 1,094~1,158mV. There was no fixed trend on the change of measurement period and electric potential difference of zinc electrode for corrosion factors such as soil resistivity or pH. Consequently, there was 40~60mV of electric potential difference in every copying soil during the experiment measurement.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2009년도 추계학술대회 논문집
• /
• pp.63-63
• /
• 2009

Many researchers have been studied as active and transparent electrode using ZnO (Zinc oxide) inorganic semiconductor material due to their good properties such as wide band-gap and high electrical properties compared with amorphous-Si. In this study, we fabricated ZnO films by the RF magnetron sputtering method at a low temperature for a channel layer in thin-film transistor (TFT) and investigated the characteristics of sputtered ZnO films. Also, the electrical properties of TFT using ZnO channel layer such as field effect mobility(${\mu}$), threshold voltage ($V_{th}$), and $I_{on/off}$ ratio are investigated for the application of the display and electronic devices.

• 대한전기학회논문지:전기물성ㆍ응용부문C
• /
• 제52권9호
• /
• pp.378-382
• /
• 2003

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure md the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures ($\leq$$300^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2002년도 하계학술대회 논문집
• /
• pp.391-394
• /
• 2002

Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCl (0.5%) to examine the electrical and surface morphology Properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure and the substrate temperature. In low pressures (0.9 mTorr) and high substrate temperatures ($\leq$30$0^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.