• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.257.1-257.1
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• 2015

Cu(In,Ga)Se2 (CIGS) 박막 태양 전지에서 buffer layer는 CIGS 흡수층과 TCO 사이의 밴드갭 차이에 대한 문제점과 lattice mismatch를 해결하기 위해 필수적이다. 흔히 buffer layer 물질로는 CdS가 가장 많이 사용되고 있으나 Cd의 독성에 관한 문제가 야기되고 있다. 따라서 ZnS(O, OH) buffer layer가 친환경 물질로 기존의 CdS 버퍼 층의 대체 물질로 각광 받고 있으며, 단파장 범위에서 높은 투과율로 인해 wide band gap의 Chalcopyrite 태양 전지에 응용되는 buffer layer로 많은 연구가 이루어지고 있다. 또한 buffer layer를 최적화 하여 carrier lifetime과 양자 효율이 증가시킬 수 있는 특성을 가지고 있다. 이 연구에서는 Cu(In,Ga)Se2 (CIGS) 박막에 화학습식공정 (CBD) 방법을 이용하여 최적화된 ZnS(O, OH)의 증착 조건을 찾고, 고품질의 buffer layer를 제조하기 위한 실험에 초점을 맞췄다. 또한, buffer layer의 막질을 개선하고 균일한 막을 제조하기 위해 processing parameters인 시약의 농도, 제조 시간 및 온도 등의 다양한 변화를 통해 실험을 진행하였다. 그 후 최적화된 ZnS(O, OH) buffer layer의 특성 분석을 위해 X-ray diffraction(XRD), photoluminescence (PL), scanning electron microscope (SEM) and GD-OES을 이용하였고, 이를 통해 제조된 CIGS 박막 태양전지는 light induced current-voltage (LIV) and external quantum efficiency (EQE)를 통해 특성 분석을 실시 하였다. 결과적으로, 제조된 ZnS(O, OH) buffer layer의 $ZnSO4{\cdot}7H2O$의 농도는 0.16 M, Thiourea는 0.5 M, NH4OH는 7.5 M, 그리고 반응 온도는 77.5 oC의 조건 하에 CIGS 기판 위에 균일하고 균열이 없는 ZnS(O, OH) 박막을 제조하였으며 이때 제조된 태양전지의 소자 특성은 Voc = 0.478 V, Jsc = 35.79 mA/cm2, FF = 47.77%, ${\eta}=8,18 %$이다.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1679-1681
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• 1996

ZnO varistor with composition of 89wt%-ZnO, 3.0wt%-$Bi_{2}O_{3}$, 3.6wt%-$Sb_{2}O_{3}$, 1.16wt%-CoO, 0.88wt%-NiO, 0.71wt%-$MnO_2$, 0.93wt%-$Cr_{2}O_{3}$, 0.013wt%-$Al_{2}O_{3}$ was fabricated by sintering methods. The effects of annealing on the J-E characteristics of ZnO varistors were investigated. These changes of electric properties were found to be caused by the variation of grains and grain boundary related to annealing. And the conductive mechanism and micostructure of ZnO varistor were researched using I-V meter, SEM and XRD.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.380-380
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• 2011

ZnO 나노라드 위에 양자점을 증착한 후 그 위에 $TiO_2$를 ALD방법으로 증착하여 그 passivation 효과가 solar cell 효율에 미친 영향에 대한 실험을 진행하였다. Hydrothermal 방법으로 수직한 1차원 형태의 ZnO 나노라드를 성장시킨다. 여기에 SILAR 방법을 거쳐서 CdS 양자점을 증착시키고, 후에 CBD를 이용하여 CdSe 양자점을 증착시킨다. 여기에 마지막으로 amorphous $TiO_2$로 표면을 덮는 과정을 거치는데, $TiO_2$가 ZnO 라드 위에 균일하고 정밀하게 증착되도록 하기 위해서 Atomic Layer Deposition을 이용하였다. 다양한 분석 방법을 통해 $TiO_2$/CdSe/CdS/ZnO 구조를 조사하였으며, ZnO 나노라드 위에 $TiO_2$가 정교하게 올라간 것을 확인한 후에 solar cell에 적용하여 그 효율을 확인하였다.

• Journal of the Korea Institute of Military Science and Technology
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• v.15 no.4
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• pp.502-506
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• 2012

In order to find the structural characteristics of the thin films of group II-VI semiconductor compounds compared with those of powder materials, films were made of 4 powders of ZnS, CdS, CdSe, and CdTe(Aldrich), each with 99.99 % purity. For the ZnS/CdS multi-layers, the ZnS layer was coated over the CdS layer on an $AlO_x$ membrane, which served as a protective layer within a vacuum at the average speed of 1 ${\AA}$/sec. After studying the structures of the group II-VI semiconductor thin films by using X-ray spectroscopy, we found that the ZnS, ZnS/CdS, CdS, and CdSe films were hexagonal and exhibited some degree of preferred orientation. Also, the particles of the thin films of II-VI semiconductor compounds proved to be more homogeneous in size compared to those of the powder materials. These results were further verified through scanning electron microscopy(SEM), EDX analysis, and powder and thin film X-ray diffraction.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.408-409
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• 2007

Al-doped p-type ZnO films were fabricated on n-Si (100) and homo-buffer layers in pure oxygen at $450^{\circ}C$ by RF magnetron sputtering. Target was ZnO ceramic mixed with 2wt% $Al_2O_3$. XRD spectra show that the Al-doped ZnO thin films have ZnO crystal structure and homo-buffer layers are beneficial to Al-doped ZnO films to grow along c-axis. Hall Effect experiments with Van der Pauw configuration show that p-type carrier concentrations are ranged from $1.66{\times}10^{16}\;to\;4.04{\times}10^{18}cm^{-3}$, mobilities from 0.194 to $2.3cm^2V^{-1}s^{-1}$ and resistivities from 7.97 to $18.4{\Omega}cm$. P-type sample has density of $5.40cm^{-3}$ which is smaller than theoretically calculated value of $5.67cm^{-3}$. XPS spectra show that O1s has O-O and Zn-O structures and A12p has only Al-O structure. P-ZnO:Al/n-ZnO:Al junctions were fabricated by magnetron sputtering. V-I curves show that the p-n junctions have rectifying characteristics.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.450-450
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• 2011

This study reports the hydrogen sulfide gas sensing properties of ZnO nanorods bundle and the investigation of gas sensing mechanism. Also the improvement of sensing properties was also studied through the application of ZnO heterstructured nanorods. The 1-Dimensional ZnO nano-structure was synthesized by hydrothermal method and ZnO nano-heterostructures were prepared by sonochemical reaction. Scanning electron microscopy (SEM) and X-ray diffraction (XRD) spectra confirmed a well-crystalline ZnO of hexagonal structure. The gas response of ZnO nanorods bundle sensor increased with increasing temperature, which is thought to be due to chemical reaction of nanorods with gas molecules. Through analysis of X-ray photoelectron spectroscopy (XPS), the sensing mechanism of ZnO nanorods bundle sensor was explained by well-known surface reaction between ZnO surface atoms and hydrogen sulfide. However at high sensing temperature, chemical conversion of ZnO nanorods becomes a dominant sensing mechanism in current system. In order to improve the gas sensing properties, simple type of gas sensor was fabricated with ZnO nano-heterostructures, which were prepared by deposition of CuO, Au on the ZnO nanorods bundle. These heteronanostructures show higher gas response and higher current level than ZnO nanorods bundle. The gas sensing mechanism of the heteronanostructure can be explained by the chemical conversion of sensing material through the reaction with target gas.

• Korean Journal of Materials Research
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• v.22 no.2
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• pp.91-96
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• 2012

AC and ZnS modified $TiO_2$ composites (AC/ZnS/$TiO_2$) were prepared using a sol-gel method. The composite obtained was characterized by Brunauer-Emmett-Teller (BET) surface area measurements, X-ray diffraction (XRD), energy dispersive X-ray (EDX) analysis, scanning electron microscope (SEM) analysis, and according to the UV-vis absorption spectra (UV-vis). XRD patterns of the composites showed that the AC/ZnS/$TiO_2$ composites contain a typical single and clear anatase phase. The surface properties as observed by SEM present the characterization of the texture of the AC/ZnS/$TiO_2$ composites, showing a homogenous composition in the particles showing the micro-surface structures and morphology of the composites. The EDX spectra of the elemental identification showed the presence of C and Ti with Zn and S peaks for the AC/ZnS/$TiO_2$ composite. UV-vis patterns of the composites showed that these composites had greater photocatalytic activity under visible light irradiation. A rhodamine B (Rh.B) solution under visible light irradiation was used to determine the photocatalytic activity. The degradation of Rh.B was determined using UV/Vis spectrophotometry. An increase in the photocatalytic activity was observed. From the photocatalytic results, the excellent activity of the Y-fullerene/$TiO_2$ composites for the degradation of methylene blue under visible irradiation could be attributed to an increase in the photo-absorption effect caused by the ZnS and to the cooperative effect of the AC.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.424-424
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• 2012

ZnO는 수열합성법을 통해 저온에서 단결정으로 성장할 수 있기 때문에 광전소자 및 압전소자로 응용되고 있으나, 성장된 ZnO nanowire 내부 산소 결함 및 표면에 OH기의 흡착에 의해 소자특성 저하를 발생시킨다. 본 연구에서는 ZnO의 결함의 최소화를 위해 Glass 기판에 수열합성법으로 성장된 ZnO nanowire를 ICP 플라즈마 장치를 이용하여 O2 25 sccm, Base Pressure $1.5{{\times}}10^{-3}$ Torr을 기준으로 파워와 시간에 따라 표면처리 하였다. 플라즈마 처리된 ZnO nanowire의 결함특성과 형상을 XPS와 FE-SEM를 통하여 분석하였으며, ZnO nanowire의 소자특성을 평가를 위해 Kapton Film/AZO/ZnO nanowire/PMMA/Au 구조의 발전기를 제작하였다. 150 W, 10 min에서 532.4 eV의 -OH결합이 최소화됨을 확인하였으며, 이를 이용하여 Flexible ZnO nanowire 발전기 제작 했을 경우 최대 Voltage 5 V, Current 156 nA 전기적 특성을 확인하였다.

• Current Photovoltaic Research
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• v.1 no.2
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• pp.115-121
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• 2013

ZnO film has been used for CIGS solar cells as a buffer layer as itself or by doping Mg and Sn; ZnO film also has been used as a transparent conducting layer by doping Al or B for solar cells. Since ZnO itself is a host material for many applications it is necessary to understand the electrical and optical properties of ZnO film itself with various preparation conditions. We prepared ZnO films by converting ZnS precursor into ZnO film by thermal annealing. ZnO film was formed at low temperature as low as $500^{\circ}C$ by annealing a ZnS precursor layer in air. In the air annealing, the electrical resistivity decreased monotonically with increasing annealing temperature; the intensity of the green photoluminescence at 505 nm increased up to $750^{\circ}C$ annealing. The electrical resistivity further decreased and the intensity of green emission also increased in reducing atmospheres. The results suggest that deep-level defects originated by oxygen vacancy enhanced green emission, which reduce light transmittance and enhance the recombination of electrons in conduction band and holes in valence. More oxidizing environment is necessary to obtain defect-free ZnO film for higher transparency.

• Journal of the Korean Vacuum Society
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• v.18 no.5
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• pp.384-389
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• 2009

ZnO, a wurtzite lattice structure, has attracted much attention as a promising material for light-emitting diodes (LEDs) due to highly efficient UV emission resulting from its large band gap of 3.37 eV, large exciton binding energy of 60 meV, and low power threshold for optical pumping at room temperature. For the realization of LEDs, both n-type ZnO and p-type ZnO are required. Now, n-type ZnO for practical applications is available; however, p-type ZnO still has many drawbacks. In this study, ZnO films were grown on glass substrates by using atomic layer deposition (ALD) and the ZnO films were irradiated by nitrogen ion beams (20 keV, $10^{13}{\sim}10^{15}ions/cm^2$). The effects of nitrogen-beam irradiation on the ZnO structure as well as the electrical property were investigated by using fieldemission scanning electron microscopy (FESEM) and Hall-effect measurement.