• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.860-863
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• 2007

ZnO nano film for transparent thin film transistors is prepared by injection type source delivery system of atomic layer deposition. By using this delivery system the source delivery pulse time can dramatically be reduced to 0.005s in ALD system. ZnO nanofilms obtained at $150^{\circ}C$ are characterized.

• Journal of Powder Materials
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• v.15 no.1
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• pp.1-5
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• 2008

ZnS-$SiO_2$ composite is normally used for sputtering target. In recent years, high sputtering power for higher deposition rate often causes crack formation of the target. Therefore the target material is required that the sintered target material should have high crack resistance, excellent strength and a homogeneous microstructure with high sintered density. In this study, raw ZnS and ZnS-$SiO_2$ powders prepared by a 3-D mixer or high energy ball-milling were successfully densified by spark plasma sintering, the effective densification method of hard-to-sinter materials in a short time. After sintering, the fracture toughness was measured by the indentation fracture (IF) method. Due to the effect of crack deflection by the residual stress occurred by the second phase of fine $SiO_2$, the hardness and fracture toughness reached to 3.031 GPa and $1.014MPa{\cdot}m^{1/2}$, respectively.

• Electrical & Electronic Materials
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• v.17 no.5
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• pp.13-20
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• 2004

1996년 GaN와 near band edge emission(NBE) 및 yellow deep-defect level emission의 발광 기구가 ZnO의 greene mission과 매우 유사하다는 점이 발견된 이 후［1,2］, II-VIZnO반도체에 대한 광학적 성질에 많은 관심이 집중되기 시작하였다. 1960년대 C. Klingshirin［3］에 의해 bulk ZnO의 exciton luminescence가 관측된 이래로, 1980년대 후반부터 적층 박막 성장 법들이 급속도로 발전을 하여 오고 1988 S. Bethke등이 CVD로 성장한 ZnO의 NBE emission에 관심을 갖기 시작하였고［4］, 1996년 2K에서 GaN, ZnO사이의 유사한 발광기구가 알려졌고［5］, 도호쿠 및 일본 공업대에서 ZnO의 적층 성장 및 상온에서 defect에 기인한 emission이 없는 깨끗한 PL 의 관측, 상온 lasing, 육방정계 결정 구조에서 비롯된 6-fold symmetry PL 등이 보고되기 시작하였다. ［6-8］ 2000년에 들어서면서 MgO와 CdO와의 solid solution에 의한 밴드갭을 2.6-4.2 eV 까지 조절하는 가능성이 보고되었고 이를 이용한 ZnO/MgZnO MQW 구조에 대한 연구도 병행되었다.(중략)

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.5
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• pp.461-466
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• 2006

To investigate the ZnO thin films which are interested in the next generation of short wavelength LEDs and Lasers, the ZnO thin films were deposited by RF sputtering system. At sputtering process of ZnO thin films, substrate temperature, work pressure respectively is $100^{\circ}C$ and 15 mTorr, and the purity of target is ZnO 5 N. The ZnO thin films were in-situ annealed at $600^{\circ}C$ in $O_2$ atmosphere. The thickness of ZnO thin films has implemented about $1.6{\mu}m$ at SEM analysis after in-situ annealing process. We have investigated the crystal structure of substrates, and so structural properties of ZnO thin films has estimate by using XRD, FWHM, FE-SEM and AFM. XRD and FE-SEM showed that ZnO thin films grown on substrates had a c-axis preferential orientation in the [0001] crystal direction. XPS spectra showed that ZnO thin film was showed a peak positions corresponding to the O1s and the Zn2p. As form above XPS, we showed that the atom ratio of Zn:O related 1:1.1504 on ZnO thin film, so we could obtained useful information for p-type ZnO thin film.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.06a
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• pp.272-273
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• 2006

LTCC(low temperature co-fired ceramics)용 glass/ceramic 복합체를 제조하기 위해 4 종류의 borosilicate계 glass를 선정하고 filler로 $Al_2O_3$ ceramics를 filler 사용하여 30~50 vol% glass frit에 따른 소결 및 유전 특성에 대하여 조사하였다. Glass frit은 $SiO_2$와 $B_2O_3$ 함량비를 고정한 후 R(CaO, BaO, ZnO, $Bi_2O_3$)에 따라 유리 연화온도(Ts)와 함량이 소결에 미치는 영향 및 유전 특성 변화를 고찰한 결과, CaO-$B_2O_3-SiO_2$ glass의 경우 다량의 2 차상이 형성되었고, 이에 $900^{\circ}C$ 이하에서 완전 소결이 이루어지지 않았으며, BaO-$B_2O_3-SiO_2$ glass는 celsian($BaAl_2Si_2O_8$) 결정이 형성되면서 소결성의 저하를 갖고 왔으며, ZnO-$B_2O_3-SiO_2$ glass는 소결이 진행됨에 따라 주상이 $Al_2O_3$에서 gahnite($ZnAl_2O_4$) 결정이 형성되면서 품질계수가 크게 증가하였으며, $Bi_2O_3-B_2O_3-SiO_2$ glass는 45 vol%일 때 $900^{\circ}C$에서부터 일정한 선수축율 특성을 나타내었지만, 다량의 액상으로 인하여 유전 특성의 저하를 나타내었다.

• Korean Journal of Materials Research
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• v.16 no.4
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• pp.235-240
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• 2006

We investigated the effect of ZnO filler on the microstructure of $BaO-B_2O_3-ZnO-P_2O_5$ glass system to find an etching mechanism of barrier ribs. The sintering behavior of composites heated in the temperature range $560-600^{\circ}C$ was studied by volumetric shrinkage rate and microstructure. The etching test was carried out in $HNO_3$ solution at $50^{\circ}C$ for 10 min. The volumetric shrinkage of sintered sample decreased with the increased firing temperature because of the formation of two crystals. Glass and ZnO filler react forming the $BaZn_2(PO_4)_2$ crystal phases during the sintering process. Etching phenomenon of sintered samples by $HNO_3$ showed that the $BaZn_2(PO_4)_2$ crystal phase was strongly leached compared to glass matrix, crystal phases and fillers. Therefore, the control of interface by condition of sintering is so important to achieve etching effect in barrier ribs.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.671-671
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• 2013

실리콘 태양전지와 박막형 태양전지의 뒤를 이어, 제3세대로 분류되는 양자점 감응형 태양전지(QDSC)에 대한 연구가 활발히 진행되고 있다. 이 태양전지의 TCO로는 주로 ZnO, TiO2가 대부분 사용되고 있으며, 양자점 물질로는 CdS, CdSe, CdTe, PbS, PbSe 등의 카드뮴 및 납을 주 성분으로 하는 물질들에 대한 연구만 중점적으로 이루어지고 있는 실정이다. 이런 물질들은 현재까지 알려진 한도 내에서는 QDSC 효율 중 가장 좋은 효율을 나타내고는 있으나 이런 타입의 QDSC가 상용화된다면 환경에 노출되었을 때에 미치는 악영향이 매우 큰 중금속 물질들로 이루어져 있어, 이를 극복할 수 있는 친환경 성분의 물질에 대한 연구 또한 필요한 시점이다. 따라서 본 연구에서는 CdS를 대체할 수 있는 물질로 Ag2S를 선정, 이에 대한 연구를 진행하였다. Ag2S는 밴드갭이 1.1eV의 물질로, CdS의 2.3 eV와 비교해 상당히 작은 밴드갭을 가져 월등히 넓은 영역에서 빛을 흡수할 수 있다는 장점을 가지고 있으며, 동시에 이로 인한 전자-정공 재결합이 빨라 태양전지로 제작시에 Voc가 낮게 형성된다는 단점도 가지고 있다. 태양전지에 사용된 TCO물질은 ZnO 나노선을 사용했으며, 본 연구실에서 기존에 개발한 수열합성법을 통해 제작하였다. 이를 활용하여 최종적으로 제작한 태양전지의 효율은 CdS/ZnO QDSC가 1.2%, Ag2S/ZnO QDSC가 1.2%로 동일한 성능을 나타냈으며, CdS를 대체할 물질로 Ag2S의 가능성을 보여준 결과라 할 수 있다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.7
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• pp.472-476
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• 2014

We report the characteristics of thin-film transistor (TFT) to make the bi-channel structure with stacked $Mg_{0.1}Zn_{0.9}O$ (Mg= 10 at.%) and ZnO. The ZnO and $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited by radio frequency (RF) co-sputter system onto the thermally oxidized silicon substrate. A total thickness of active layer was 50 nm. Firstly, the ZnO thin films were deposited to control the thickness from 5 nm to 30 nm. Sequentially, the $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited to change from 45 nm to 20 nm. The bi-layer TFT shows more improved properties than the single layer TFT. The field effect mobility and subthreshold slope for $Mg_{0.1}ZnO_{0.9}O$/ZnO-TFT are $7.40cm^2V^{-1}s^{-1}$ and 0.24 V/decade at the ZnO thickness of 10 nm, respectively.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.19 no.3
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• pp.44-50
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• 2005

This paper deals with the characteristics and reduction methods of the plasma luminosity caused between the ZnO surge arrester block and metal electrodes. In this study, the impulse current generator that can generate $8/20[{\mu}s]$ impulse currents with a peak short-circuit of 10[kA] is designed and fabricated. Plasma luminosity phenomena for fine and used ZnO blocks were observed as a function of the contact states between the ZnO block and electrodes and the polarity of applied impulse voltages. As a result, discharge luminous events are produced near the contact edges between the ZnO block and metal electrodes. The discharge plasma luminosity between the ZnO surge arrester block and low potential electrode is more intensive than that between the ZnO surge arrester block and high potential electrode. Surface flashover of ZnO blocks are mainly caused by plasma generation near the edge of metal electrode. Also, plasma luminosity for the fine ZnO blocks is less than that for the used ZnO blocks. Plasma luminosity at the contact of the ZnO block and ring-type electrode is more intensive than that at the contact of ZnO block and disk electrode. It is desirable to use the disk electrode with the proper contact area to reduce the plasma luminosity caused at the contact point between the ZnO block and electrodes.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.21 no.5
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• pp.205-209
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• 2011

Zinc oxide has semi-conductivity and super conductivity characteristics. It can be used optically and is applied on many areas such as gas sensor, solar cell and optical waveguide. In this paper, to improve optical characteristics of ZnO, aluminum was added on zinc oxide. Zinc oxide and aluminum zinc oxide was fabricated as nano fiber form. ZnO solution was created by mixing poly vinyl pyrrolidone, ethyl alcohol, and zinc acetate. An Al doped ZnO was created by adding aluminum solution to ZnO sol. By applying these sols on electro spinning method, nano fibers were fabricated. These fibers are heat treated at 300, 500, and $700^{\circ}C$ degrees and were analyzed with X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM) to examine the nano structures. TGA and DSC measurement was also used to measure the change of mass and calorie upon temperature change. The absorbance of ZnO and Al-doped ZnO was carried out by UV-vis measurement.