• Title/Summary/Keyword: XPS.

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A Simulation Study on Regularization Method for Generating Non-Destructive Depth Profiles from Angle-Resolved XPS Data

  • Ro, Chul-Un
    • 분석과학
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    • 제8권4호
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    • pp.707-714
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    • 1995
  • Two types of regularization method (singular system and HMP approaches) for generating depth-concentration profiles from angle-resolved XPS data were evaluated. Both approaches showed qualitatively similar results although they employed different numerical algorithms. The application of the regularization method to simulated data demonstrates its excellent utility for the complex depth profile system. It includes the stable restoration of the depth-concentration profiles from the data with considerable random error and the self choice of smoothing parameter that is imperative for the successful application of the regularization method. The self choice of smoothing parameter is based on generalized cross-validation method which lets the data themselves choose the optimal value of the parameter.

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Effect of Ar ion Sputtering on the Surface Electronic Structure of Indium Tin Oxide

  • Lee, Hyunbok;Cho, Sang Wan
    • Applied Science and Convergence Technology
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    • 제25권6호
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    • pp.128-132
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    • 2016
  • We investigated the effect of Ar ion sputtering on the surface electronic structure of indium tin oxide (ITO) using X-ray and ultraviolet photoelectron spectroscopy (XPS and UPS) measurements with increasing Ar ion sputtering time. XPS measurements revealed that surface contamination on ITO was rapidly removed by Ar ion sputtering for 10 s. UPS measurements showed that the work function of ITO increased by 0.2 eV after Ar ion sputtering for 10 s. This increase in work function was attributed to the removal of surface contamination, which formed a positive interface dipole relative to the ITO substrate. However, further Ar ion sputtering did not change the work function of ITO although the surface stoichiometry of ITO did change. Therefore, removing the surface contamination is critical for increasing the work function of ITO, and Ar ion sputtering for a short time (about 10 s) can efficiently remove surface contamination.

열철리에 따른 Epoxy 복합재료의 표면 소수성증가에 관한 해석 (Analyses on the Increment of Surface Hydrophobicity of Epoxy Composites by Thermal Treatment)

  • 임경범;이백수;정무영;이덕출
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제50권4호
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    • pp.153-160
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    • 2001
  • In order to analyze the degradation process of epoxy/glass fiber for outdoor condition, FRP laminate was exposed to high temperature. Then, the degradation process was evaluated by comparing contact angle, surface potential, surface resistivity, and XPS. The experimental results showed that the amount of weight loss, contact angle, surface potential and surface resistivity increased up to 200 $^{\circ}C$ as a function of temperature. These phenomena show the existence of hydrophobic surface. With the change to the hydrophobic surface and the electrical potential and resistivity on FRP surface increased. In XPS to analyze surface chemical structures, the increased hydrophobicity in thermal increase of unsaturated double bond in carbon chains. Aslo, thermal treatment caused the discoloration on the point of treated surface. These phenomena were attributed to the generations of ether group.

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ICP에 의한 $BCI_3/CI_2$플라즈마 내에서 Pt 박막의 식각 특성 (Properties of the Pt Thin Etching in $BCI_3/CI_2$gas by Inductive Coupled Plasma)

  • 김창일;권광후
    • 한국전기전자재료학회논문지
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    • 제11권10호
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    • pp.804-808
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    • 1998
  • The inductively coupled plasma(ICP) etching of platinum with BCl$_3$/Cl$_2$ gas chemistry has been studied. X-ray photoelectron spectroscopy (XPS) was used to investigate the chemical binding states of the etched surface. The plasma characteristics was extracted from optical emission spectroscopy (OES) and a single Langmuir probe. In this case of Pt etching using BCl$_3$/Cl$_2$ gas chemistries, the result of OES and Langmuir probe showed the increase of Cl radicals and ion current densities in the plasmas with increasing Cl$_2$ gas ratio. At the same time, XPS results indicated that the intensities of Pt 4f decreased with increasing Cl$_2$ gas ratio. The decrease of Pt 4f intensities implies the increase of residue layer thickness on the etched Pt surface.

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EFFECT OF ARGON AND OXYGEN PLASMAS ON VARIOUS POLYETHYLENE SHEETS

  • Chen, Yashao;Hirayama, Naoki;Gomi, Masaki;Kiuchi, Kenji;Momose, Yoshihiro
    • 한국표면공학회지
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    • 제32권3호
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    • pp.344-350
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    • 1999
  • The surface chemical structure of three kinds of polyethylene (PE): high density (HD) PE, low density (LD) PE and linear (L)-LDPE exposed to Ar and $O_2$ plasmas has been investigated using XPS. Oxygen was incorporated in a more increased amount for HDPE than for L-LDPE and LDPE. Ar plasma tended to incorporate more oxygen than $O_2$ plasma. The XPS valence band spectra for Ar plasma exhibited a clear peak assigned to $O_2$s character. By chemical derivatization method it was found that the amount of -COOH group at the surface was much greater than that of -OH group. The hydrophilic nature of plasma-treated PE increased in the order: LDPE

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In-situ XPS Study of Core-levels of ZnO Thin Films at the Interface with Graphene/Cu

  • Choi, Jinsung;Jung, Ranju
    • Journal of the Korean Physical Society
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    • 제73권10호
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    • pp.1546-1549
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    • 2018
  • We have investigated core-levels of ZnO thin films at the interface with the graphene on Cu foil using in-situ X-ray Photoelectron Spectroscopy (XPS). Spectral evolution of C 1s, Zn 2p, and O 1s are observed in real time during RF sputtering deposition. We found binding energy (BE) shifts of Zn 2p and 'Zn-O' state of O 1s depending on ZnO film thickness. Core-levels BE shifts of ZnO will be discussed on the basis of electron transfer at the interface and it may have an important role in the electronic transport property of the ZnO/graphene-based electronic device.

XPS를 이용한 Sb-doped $SnO_2$ 투명전도막의 특성 분석 (Characterization of transparent Sb-doped $SnO_2$ conducting films by XPS analysis)

  • 임태영;김창열;심광보;오근호
    • 한국결정성장학회지
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    • 제13권5호
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    • pp.254-259
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    • 2003
  • Sol-gel dip coating법으로 soda lime glass 기판 위에 ATO(antimony-doped tin oxide) 투명전도막을 제조할 때, 기판 위에 형성된 $SiO_2$ barrier 층 및 $N_2$ gas annealing 에 따른 광투과율 및 전기적 특성에 대한 효과를 정량적으로 측정하고, XPS(X-ray photoelectron spectroscopy) 분석을 통해 고찰하였다. $SiO_2$ barrier층을 갖는 glass 기판 위에 코팅된400 nm 두께의 ATO 박막을 질소분위기에서 annealing한 결과, 광 투과율은 84%그리고 전기저항은 약 $5.0\times 10^{-3}\Omega \textrm{cm}$로 측정되었다 XPS 분석결과 이러한 우수한 전기전도성은 $SiO_2$ buffer층이 glass 기판으로부터 Na 이온의 확산을 막아 ATO막 내에 $Na_2SnO_3$ 및 SnO와 같은 2차상 불순물의 형성을 억제하여 막 내부의 Sb의 농도 및 $Sb^{5+}/Sb^{3+}$ 비를 증가시키고, $N_2$ annealing은 $Sb^{5+}$ 도 환원시키지만 $Sn^{4+}$를 환원시키는 효과가 크게 작용하였기 때문으로 사료된다.

자전연소합성법으로 제조된 SiO2 첨가된 MoSi2 분말 내에서의 SiO2의 거동 연구 (SiO2 Behavior of MoSi2 Powders Containing SiO2 Synthesized by SHS Method)

  • 나사균;전민석;송준광;한동빈;정철원;김성수;이연승
    • 한국세라믹학회지
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    • 제48권6호
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    • pp.559-564
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    • 2011
  • In order to investigate the behavior of $SiO_2$ in the molybdenum silicide powders, crystal structure of these powders was measured by XRD, in addition, surface composition and surface phase (or chemical states) and microstructure were analysed by XPS and TEM, respectively. Mo-silicide powders containing $SiO_2$ were synthesized by SHS (Self-Propagating High-Temperature Synthesis) technique. In XRD result, according to increase of $SiO_2$ contents, the crystal structure for synthesized $MoSi_2$ powders was still typical $MoSi_2$ bct without any other phases. By XPS analysis, the surface of Mo and Si source powders was covered with $MoO_3$ and $SiO_2$, respectively, and the surface of synthesized $MoSi_2$ powder was also covered with $MoO_3$ and $SiO_2$, which were stable oxides at room temperature. However, according to increase of $SiO_2$ addition, $MoSi_2$ phase in XPS spectra decreased and $SiO_2$ phase increased relatively in synthesized $MoSi_2$ powders. From the results by XPS and XRD, we found that the existent $SiO_2$ has amorphous structure. In the microstructure, the small particulates of the synthesized products added $SiO_2$ agglomerated together to form larger clusters (from ~10 nm to ~1 ${\mu}m$). From TEM, XPS, and XRD results, we found that the out layer of agglomeration of synthesized $MoSi_2$ powder is surrounded by amorphous $SiO_2$.

수종의 방법으로 임프란트 표면 처치후 표면의 형태 및 성분 변화 분석에 관한 연구 (The XPS and SEM Evaluation of Various Technique for Cleansing and Decontamination of The Rough Surface Titanium Implants)

  • 김선봉;임성빈;정진형
    • Journal of Periodontal and Implant Science
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    • 제31권4호
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    • pp.749-763
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    • 2001
  • Osseointegrated titanium implants have become an integral therapy for the replacement of teeth lost. For dental implant materials, titanium, hydroxyapatite and alumina oxide have been used, which of them, titanium implants are in wide use today. Titanium is known for its high corrosion resistance and biocompatability, because of the high stability of oxide layer mainly consists of $TiO_2$. With the development of peri-implantitis, the implant surface is changed in surface topography and element composition. None of the treatments for cleaning and detoxification of implant surface is efficient to remove surface contamination from contaminated titanium implants to such extent that the original surface elemental composition. In this sights, the purpose of this study was to evaluate rough surface titanium implants by means of scanning electron microscopy(SEM) and X-ray photoelectron spectroscopy(XPS) with respect to surface appearance and surface elemental composition. Moreover, it was also the aim to get the base for treatments of peri-implantitis. For the SEM and XPS study, rough surface titanium models were fabricated for control group. Six experimental groups were evaluated: 1) long-time room exposure, 2 ) air-powder abrasive cleaning for 1min, 3) burnishing in citric acid(pH1) for 1min, 4) burnishing in citric acid for 3min, 5) burnishing in tetracycline for 1min, 6) burnishing in tetracycline for 3min. All experimental treatments were followed by 1min of rinsing with distilled water. The results were as follows: 1. SEM observations of all experimental groups showed that any changes in surface topography were not detected when compared with control group. (750 X magnification) 2. XPS analysis showed that in all experimental groups, titanium and oxygen were increased and carbon was decreased, when compared with control group. 3. XPS analysis showed that the level of titanium, oxygen and carbon in the experimental group 3(citric acid treatment for 1min, followed by 1min of distilled water irrigation) reached to the level of control group. 4. XPS analysis showed that significant differences were not detected between the experimental group 1 and the other experimental groups except of experimental group 3. The Ti. level of experimental group 2, airpowder abrasive treatment for lmin followed by 1min of saline irrigation, was lower than the Ti. level of tetracycline treated groups, experimental group 5 and 6. From the result of this study, it may be concluded that the 1min of citric acid treatment followed by same time of rinsing with distilled water gave the best results from elemental points of view, and can be used safely to treat peri-implantitis.

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건축용 압출법 단열판(XPS)의 자기소화성에 대한 실험적 연구 및 제도적 관리에 관한 제언 (Experimental Study on the Self-extinguishing Performance of Extruded Polystyrene Insulation for Buildings and Suggestions on Institutional Management)

  • 강정기;최돈묵
    • 한국화재소방학회논문지
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    • 제34권3호
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    • pp.141-149
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    • 2020
  • 한국산업표준(KS)은 발포 플라스틱 제품에 대하여 소형화염에 의한 수평 연소성의 측정 방법 및 시험절차를 규정(KS M ISO 9772:2018)하고 측정 결과에 대한 압출법 단열판(이하 XPS)의 자기소화성과 관련한 성능 및 기준을 KS 규격(KS M 3808:2020)에서 규정하고 있다. KS 규격에 적합함을 인증 받은 제품은 연소성(이하 '자기소화성')을 가지고 있어야 함에도 공사현장에서 용접불티 등에 의해 착화 및 확산되어 대량의 인명과 재산 피해가 발생하고 있는 실정이다. 본 연구에서는 KS 인증을 받고 시중에 판매 중인 5개사의 XPS 단열재를 구입하여 공사현장에서 발생되는 용접불티에 의한 착화 및 확산 여부를 실험하였다. 실험결과, 5개사의 제품 중 3개사는 성능의 차이는 있으나 자기소화성이 있는 것으로 확인되었으나, 2개사는 쉽게 착화 및 확산되어 자기소화성이 있다고 보기 어려웠다. 동종의 제품에 대하여 KS 규정에 따른 실험결과, 용접불티에 의해 착화되었던 제품 2종을 포함한 총 3종의 제품이 KS M 3808에서 규정한 자기소화성이 없는 것으로 확인되었다.