• 제목/요약/키워드: XPS.

검색결과 2,182건 처리시간 0.029초

In-situ spectroscopic studies of SOFC cathode materials

  • Ju, Jong-Hun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 한국재료학회 2012년도 춘계학술발표대회
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    • pp.70.1-70.1
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    • 2012
  • In-situ X-ray photoelectron spectroscopy (XPS) and infrared (IR) spectroscopy studies of SOFC cathode materials will be discussed in this presentation. The mixed conducting perovskites (ABO3) containing rare and alkaline earth metals on the A-site and a transition metal on the B-site are commonly used as cathodes for solid oxide fuel cells (SOFC). However, the details of the oxygen reduction reaction are still not clearly understood. The information about the type of adsorbed oxygen species and their concentration is important for a mechanistic understanding of the oxygen incorporation into these cathode materials. XPS has been widely used for the analysis of adsorbed species and surface structure. However, the conventional XPS experiments have the severe drawback to operate at room temperature and with the sample under ultrahigh vacuum (UHV) conditions, which is far from the relevant conditions of SOFC operation. The disadvantages of conventional XPS can be overcome to a large extent with a "high pressure" XPS setup installed at the BESSY II synchrotron. It allows sample depth profiling over 2 nm without sputtering by variation of the excitation energy, and most importantly measurements under a residual gas pressure in the mbar range. It is also well known that the catalytic activity for the oxygen reduction is very sensitive to their electrical conductivity and oxygen nonstoichiometry. Although the electrical conductivity of perovskite oxides has been intensively studied as a function of temperature or oxygen partial pressure (Po2), in-situ measurements of the conductivity of these materials in contact with the electrolyte as a SOFC configuration have little been reported. In order to measure the in-plane conductivity of an electrode film on the electrolyte, a substrate with high resistance is required for excluding the leakage current of the substrate. It is also hardly possible to measure the conductivity of cracked thin film by electrical methods. In this study, we report the electrical conductivity of perovskite $La_{0.6}Sr_{0.4}CoO_{3-{\delta}}$ (LSC) thin films on yttria-stabilized zirconia (YSZ) electrolyte quantitatively obtained by in-situ IR spectroscopy. This method enables a reliable measurement of the electronic conductivity of the electrodes as part of the SOFC configuration regardless of leakage current to the substrate and cracks in the film.

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Surface Characterization of the d-PMMA Thin Films Treated by Oxygen Plasma (산소 플라즈마 처리된 d-PMMA 박막의 표면특성 분석)

  • Kim, Soong-Hoon;Choi, Dong-Jin;Lee, Jeong-Su;Choi, Ho-Suk
    • Polymer(Korea)
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    • 제33권3호
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    • pp.263-267
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    • 2009
  • In order to improve the hydrophilic property on the surface of d-PMMA(deuterated poly-(methyl methacrylate)) film, it was exposed to oxygen plasma, All experimental conditions were same except to plasma exposure time that was varied from 0 to 180 s, The effects according to the exposure time were identified using contact angles, X-ray reflectometer(XRR), neutron reflectometer(NR), and X-ray photoelectron spectroscopy(XPS). By confirming that as the exposure time increases, water contact angle decreases while the composition of oxygen increases, it was confirmed that the composition of oxygen has a huge influence on improving the hydrophilic property. The physical characters as a function of the exposure time were investigated by the XRR. By analyzing complementally the results of the XRR, NR, and XPS, more detailed chemical bonding conditions were studied by obtaining not only composition of the carbon and oxygen but that of the hydrogen.

Quantitative Mass Spectrometric Analysis of Mixed Self-Assembled Monolayers for Biochips

  • Son, Jin Gyeong;Shon, Hyun Kyong;Hong, Daewha;Choi, Changrok;Han, Sang Woo;Choi, Insung S.;Lee, Tae Geol
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.275-275
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    • 2013
  • Formation and characterization of self-assembled monolayers (SAMs) on various surfaces are the essential basis for many other applications, including molecular switches, biosensors, microfluidics, and fundamental studies in surfaces and interfaces. To improve the performance at these applications, it is a key to control the quantity of each molecule in various mixed SAMs on the surface. In this study, using mixed SAM of carbamate-based hydroquinone (HQ)-PhBr and11-mercaptoundecanol, the quantitative mass spectrometric method of mixed SAM was developed based on comparison study with XPS and FT-IR methods. In addition, our method was applied to another mixed SAM of biotinylated PEG alkane thiol and 11-mercaptoundecanol for verification purpose. Time-of-flight secondary mass spectrometry (ToF-SIMS) analysis was performed to identify and quantify each molecule of mixed SAM along with principal component analysis (PCA). Since there is no matrix effect in the X-ray photoelectron spectroscopy (XPS) and Fourier transform-infrared (FT-IR) techniques, we compared ToF-SIMS results with XPS and FT-IR results. Because PCA results from ToF-SIMS analysis are well matched with XPS and FT-IR results from both mixed SAMs, we are expecting that our method will be useful to identify and quantify each molecule in various mixed SAMs.

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XPS study of sapphire substrate surface nitridated by plasma activated nitrogen source (Plasma로 활성화된 질소 원자를 사용한 사파이어 기판 표면의 저온 질화처리의 XPS 연구)

  • 이지면;백종식;김경국;김동준;김효근;박성주
    • Journal of the Korean Vacuum Society
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    • 제7권4호
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    • pp.320-327
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    • 1998
  • The chemical aspects of nitridated surface of sapphire(0001) have been studied by X-ray photoelectron spectroscopy. Nitridated layer was formed by remote plasma enhanced-ultrahigh vacuum deposition at a low temperature range. It was confirmed that this nitridated surface was mainly consists of AIN layer. The relative amounts of nitrogen reacted with AL on the sapphire surface and their surface morphology were investigated with X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) as a function of radio-frequency power, reaction temperature, and reaction time. The amounts of atomic nitrogen activated by plasma which was subsequently incorporated into sapphire were increased with RF power. But the amounts of nitrogen reacted with AI in sapphire was initially increased and then remained constant. However, the relative amounts of AIN were nearly constant with irrespective of nitridation temperature and time. Furthermore, a depth porfile of nitridated layer with XPS showed that the nitridated surface consisted of three layers with different stoichiometry.

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Tribochemical Mechanism of Borate of Triethanolamine in Water Solution by XPS

  • Du, Da-Chang;Kim, Seock-Sam;Suh, Chang-Min
    • KSTLE International Journal
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    • 제2권2호
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    • pp.138-141
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    • 2001
  • Tribological behaviors of a borate of triethanolamine in water solution were evaluated using a four-ball wear tester. X-ray photoelectron spectroscopy (XPS) was employed to study tribochemical species on worn scars of steel balls. Results show that a thick deposit layer was produced on the worn scars, which came from the decomposition of the borate. The surface film on the worn scars was mostly consisted with H$_3$BO$_3$, B$_2$O$_3$and large amounts of ferricyanides.

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Deposition and XPS Study of Pb, Zr, and Ti Films

  • Choi, Sujin;Park, Juyun;Jeong, Eunkang;Kim, Beob Jun;Son, Seo Yoon;Lee, Jeong Min;Lee, Jin Seong;Jo, Hee Jin;Park, Jihun;Kang, Yong-Cheol
    • Journal of Integrative Natural Science
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    • 제7권3호
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    • pp.183-187
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    • 2014
  • Lead zirconate titanate (PZT) is significant material in electrical and optical devices for their ferroelectric, piezoelectric and dielectric properties. In this research, PZT films were fabricated by reactive RF co-sputtering method using Pb, Zr, and Ti targets. From XPS study, lead, zirconium, and titanium are successfully deposited on Si(100) substrate. Thickness of PZT films was measured with a surface profiler and the thickness was decreased as the oxygen gas ratio increased in the sputter gas.

The Etching Mechanism of $(Ba, Sr)TiO_3$Thin Films in $Ar/CF_4$ High Density Plasma ($Ar/CF_4$ 고밀도 플라즈마에서 $(Ba, Sr)TiO_3$ 박막의 식각 메카니즘)

  • Kim, Seung-Beom;Kim, Chang-Il
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • 제49권5호
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    • pp.265-269
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    • 2000
  • $(Ba, Sr)TiO_3$thin films were etched with a magnetically enhanced inductively coupled plasma (MEICP) at different CF4/Ar gas mixing ratios. Experimental was done by varying the etching parameters such as rf power, dc bias and chamber pressure. The maximum etch rate of the BST films was $1800{AA}/min$ under $CF_4/(CF_4+Ar)$ of 0.1, 600 W/350 V and 5 mTorr. The selectivity of BST to Pt and PR was 0.6, 0.7, respectively. X-ray photoelectron spectroscopy (XPS) results show that surface reaction between Ba, Sr, Ti and C, F radicals occurs during the (Ba, Sr)TiO3 etching. To analyze the composition of surface residue after the etching, films etched with different CF_4/Ar$ gas mixing ratio were investigated using XPS and secondary ion mass spectroscopy (SIMS).

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The Properties of RF Sputtered Zirconium Oxide Thin Films at Different Plasma Gas Ratio

  • Park, Ju-Yun;Heo, Jin-Kook;Kang, Yong-Cheol
    • Bulletin of the Korean Chemical Society
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    • 제31권2호
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    • pp.397-400
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    • 2010
  • Zirconium oxide thin films deposited on the p-type Si(100) substrates by radio-frequency (RF) reactive magnetron sputtering with different plasma gas ratios have been studied by using spectroscopic ellipsometry (SE), atomic force microscopy (AFM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The deposition of the films was monitored by the oxygen gas ratio which has been increased from 0 to 80%. We found that the thickness and roughness of the zirconium oxide thin films are relatively constant. The XRD revealed that the deposited thin films have polycrystalline phases, Zr(101) and monoclinic $ZrO_2$ ($\bar{1}31$). The XPS result showed that the oxidation states of zirconium suboxides were changed to zirconia form with increasing $O_2$ gas ratio.

Structure and chemical composition of $CsB_{3}O_{5}$ (CBO) optical surface

  • V.V. Atuchin;V.G. Kesler;L.D. Pokrovsky;N. Yu. Maklakova;M. Yoshimura;N. Ushiyama;T. Matsui;K. Kamimura;Y. Mori;T. Sasaki
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • 제13권1호
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    • pp.19-23
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    • 2003
  • Polished surface of $CsB_{3}O_{5}$ (CBO) has been observed by reflection high energy electron diffraction (RHEED) and X-ray photoelectron spectroscopy (XPS). For comparison, electronic properties of CBO powder have been studied by XPS. It has been found that the crystal surface is covered by thick amorphous layer with chemical composition closely related to that of CBO. Great enrichment of top surface by cesium, ~30 % in reference to the bulk of the modified layer, has been displayed by depth profiling.

Surface properties of Nb oxide thin films prepared by rf sputtering

  • Park, Ju-Yeon;Gang, Yong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.306.2-306.2
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    • 2016
  • Niobium oxide thin films were synthesized by reactive rf magnetron sputtering. The target was metallic niobium with 2 inch in diameter and the substrate was n-type Si wafer. To control the surface properties of the films, Nb oxide thin films were obtained at various mixing ratios of argon and oxygen gases. Nb oxide thin films were analyzed with alpha step, scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS). The result of alpha step showed that the thickness of Nb oxide thin films were decreased with increasing the oxygen gas ratios. SEM images showed that the granular morphology was formed at 0% of oxygen gas ratio and then disappeared at 20 and 75% of oxygen gas ratio. The amorphous Nb oxide was observed by XRD at all films. The oxidation state of Nb and O were studied with high resolution Ni 2p and O 1s XPS spectra. And the change in the chemical environment of Nb oxide thin films was investigated by XPS with Ar+ sputtering.

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