A Study of the Dry Etching Properties of TiN Thin Film in He/BCl3/Cl2 Inductively Coupled Plasma (He/BCl3/Cl2유도결합 플라즈마를 이용한 TiN 박막의 식각 특성)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.24 no.9
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- pp.718-722
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- 2011