• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2017.05a
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• pp.168-171
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• 2017

In this study, we observed degradation mechanism of FKM O-ring by X-ray photoelectron spectroscopy(XPS) at atmosphere condition. FKM O-ring had 3.53mm of cross-sectional diameter and 91.67mm of inner diameter. After thermal degradation, oxygen atom concentration of FKM O-ring was increased to 20.39%, and fluorine atom concentration was decreased to 8.29%. We observed that degradation reaction occurred by oxidation reaction. By C1s and F1s peak analysis, we confirmed that oxidation reaction usually occurred at C-F bonding of FKM main chain. Also, carboxyl group(C-OH, C=O, O=C-O) produced by oxidation reaction from O1s peak analysis.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.4-4
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• 2009

Surface analysis on defective wire-bonding pads are performed in flash memory assembly. Week wire bonding may cause a significant effect on the final product reliability, and the surface condition of the aluminum bond pads is critical in terms of product reliability. To find out possible week bonding on semiconductor interconnects, ball sheer test (BST) has been performed. On some defective or week bonded pads, we have investigated the surface contents, assuming that the week bonding is induced from the surface conditions. AES and XPS are employed for the quantitative surface analysis on defective dies.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.144-147
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• 2000

The effect of accelerated aging test on ethylene-propylene-diene monomer(EPDM) rubber used for outdoor insulation was studied by X-ray photoelectron spectroscopy(XPS), scanning electron microscope(SEM), FFT spectrum alalysis, and electrical pulse counts using PC by oscilloscope(300 MHz). In electrical alalysis, FFT spectrum analysis indicated arcing caused a significant increase in the third harmonic content of the leakage current of polluted insulator. Also, pulse counts increased as aging time. The surface oxygen and aluminum content were found to increase and that of carbon and nitrogen were found to decrease with time. The detailed XPS analysis indicated that the concentration of carbon in C-C decreased and concentration of highly oxidized carbons increased with time, which was due to the oxidation of EPDM rubber polymer SEM analysis indicated that crack and erosion of EPDM rubber occurred with time.

• Advances in materials Research
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• v.13 no.2
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• pp.141-151
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• 2024

The aim of this work was to determine the behavior of alloy elements and compounds formed during solidification in the manufacturing process of the CuAgZrCr alloy under an oxidizing environment. Bulk and surface analysis techniques, such as Scanning Electron Microscopy (SEM), X-ray Photoelectron Spectroscopy (XPS), Raman and X-ray diffraction (XRD) were used to characterize the phases obtained in the solidification process. In order to focus the analysis on the on grain boundary interface, partial removal of the matrix phase by acid attack was performed. The compositional differences obtained by SEM-EDX, Raman and XPS on post-manufacturing materials allowed us to conclude that the composition of grain boundaries of the alloy is directly influenced by the oxidizing environment of alloy manufacturing.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2002.10b
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• pp.151-152
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• 2002

An oxidized surface layer was intentionally formed on a sputtered $MoS_2$ film by introducing oxygen gas in the final stage of sputtering process. The film showed longer life than the normal Ar-sputtered film when the surface layer was slightly oxidized. A XPS analysis revealed co-existence of $MoS_2$ and $MoO_3$ in the surface layer. suggesting that the existence of some amount of oxides in the surface layer had beneficial effect. A confusing result was obtained: the life was much shorter than normal Ar-sputtered film when the film was exposed to $O_2$ environment for 1 minute after normal Ar-sputtering, although almost no oxide was detected in XPS analysis.

• Transactions on Electrical and Electronic Materials
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• v.6 no.4
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• pp.164-168
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• 2005

Effects of high-temperature slurry were investigated on the chemical mechanical polishing (CMP) performance of tetra-ethyl ortho-silicate (TEOS) film with silica and ceria slurries by the surface analysis of X-ray photoelectron spectroscopy (XPS). The pH showed a slight tendency to decrease with increasing slurry temperature, which means that the hydroxyl $(OH^-)$ groups increased in slurry as the slurry temperature increased and then they diffused into the TEOS film. The surface of TEOS film became hydro-carbonated by the diffused hydroxyl groups. The hydro-carbonated surface of TEOS film could be removed more easily. Consequently, the removal rate of TEOS film improved dramatically with increasing slurry temperature.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.05c
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• pp.106-109
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• 2001

In this paper, we have investigated the degradation of shed materials of outdoor insulators by UV-radiation by using corona-charging and XPS analysis. The accumulated charges on polymeric surface having intrinsic hydrophobic property have a negative impact on retaining its hydrophobicity. Therefore, shorter decay times of surface charges are preferred. The surface voltage decay on UV-treated silicone rubber and EPDM show a different decay trend with UV treated time. From the XPS analysis, the oxidized groups of silica-like structure in silicone rubber increase with UV treatment time. For EPDM, the oxidized carbon groups of C=O, O=C-O increase as elapse of UV radiation time. These oxidized surface for each material have different electrostatic characteristics, so deposited charges may be expected to have different impacts on their surface hydrophobicity. The degradation mechanism based on our results is discussed.

• Journal of the Semiconductor & Display Technology
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• v.16 no.2
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• pp.9-14
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• 2017

$ISnO_2$ thin films were prepared on p-type and n-type Si substrates to research the interface characteristics between $SnO_2$ and substrate. After the annealing processes, the amorphous structure was formed at the interface to make a Schottky contact. The O 1s spectra showed the bond of 530.4 eV as an amorphous structure, and the Schottky contact. The analysis by the deconvoluted spectra was observed the drastic variation of oxygen vacancies at the amorphous structure because of the depletion layer is directly related to the oxygen vacancy. $SnO_2$ thin film changed the electrical properties depending on the characteristics of substrates. It was confirmed that it is useful to observe the Schottky contact's properties by complementary using the XPS analysis and I-V measurement.

• Proceedings of the Korean Vacuum Society Conference
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• 1996.02a
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• pp.152-152
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• 1996

• Proceedings of the KIEE Conference
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• 2001.11a
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• pp.16-19
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• 2001

DLC films are deposited using a modified FCVA system. Carbon amorphous networks, chemical bonding states, $sp^3$ fraction, interfaces, and structures are studied as a function of substrate voltage ($0{\sim}-250V$). The $sp^3$ content in the films is evaluated by analyzing the XPS spectra(C1s). The structural properties of the surface, bulk, and interfacial layers in DLC/Si systems are quantitatively analyzed by employing XRR method. As the substrate voltage is increased, the $sp^3$ fraction is decreased by means of XPS and Raman spectroscopy. In addition, the structural properties (interfacial layer, contamination layer, and sp3 fraction) derived from XPS depth profile are relatively correlated with the XRR results.