• 전기학회논문지
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• 제59권12호
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• pp.2230-2234
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• 2010

This paper deals with the change of surface potential decay, surface resistivity, contact angle and XPS of ultraviolet-treated PET films. From the experimental results on the surface potential decay of UV degraded-samples, it was found that the accumulation of charge is decreased and the surface potential decay time is shortened. Also, from the result of XPS, it was found that the changes affected by the surface degradation of PET film were caused by the generation of carboxyl groups through the chain decomposition and recombination with oxygen molecules in the air.

• Carbon letters
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• 제8권4호
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• pp.292-298
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• 2007

In order to investigate functional groups on the surface of Multi-walled Carbon Nanotubes (MWCNTs) induced by oxyfluorination, XPS (X-ray photoelectron spectroscopy) analysis was carried out. All core level spectra of MWCNTs were deconvoluted to several Pseudo-Voigt functions (sum of Gaussian-Lorentzian functions). Both O1s and F1s binding energy of oxyfluorinated MWCNTs shifted high value as increment of fluorine mixing ratio. The carbon-fluorine covalent bonding concentration increased as increment of fluorine mixing ratio. The shape and intensity of OF10-MWCNTs are similar with those of as-received MWCNTs. However, the intensity and binding energies of main peak position of OF20-MWCNTs and OF30-MWCNTs were dramatically increased by oxyfluorination.

• Membrane and Water Treatment
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• 제7권6호
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• pp.555-571
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• 2016

Heavy metal contamination has attracted considerable attention during recent decades due to the potential risk brought about for human beings and the environment. Several adsorbent materials are utilized for the purification of contaminated water resources among which chitosan is considered as an appropriate alternative. Copper is a heavy metal contaminants found in several industrial wastewaters and its adsorption on porous and macroporous chitosan membranes is investigated in this study. Membranes are prepared by phase inversion and particulate leaching method and their morphology is characterized using SEM analysis. Batch adsorption experiments are performed and it is found that copper adsorption on macroporous chitosan membrane is higher than porous membrane. The iso-steric heat of adsorption was determined by analyzing the variations of temperature to investigate its effect on adsorption characteristics of macroporous chitosan membranes. Furthermore, desorption experiments were studied using NaCl and EDTA as eluants. The mechanism of copper adsorption was also investigated using XPS spectroscopy which confirms simultaneous occurrence of chelation and electrostatic adsorption mechanisms.

• 한국윤활학회:학술대회논문집
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• 한국윤활학회 2002년도 proceedings of the second asia international conference on tribology
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• pp.137-138
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• 2002

The benefits of using DLC coatings on steel in dry sliding are well known. The present study has investigated the effects of using the same materials but in a boundary lubricated environment. Tribological tests were performed using a load-scanning device and a lubricant with an extreme-pressure (EP) additive. XPS and grazing incidence XRD are used for chemical analysis. The chemical composition of the resulting tribofilm is correlated to different friction behaviors and contact loads, and indicates that high loads are beneficial for formation of low friction tribofilm.

• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2000년도 추계학술대회논문집
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• pp.45-48
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• 2000

High dielectric (Ba,Sr)TiO$_3$thin films were etched in an inductively coupled plasma (ICP) as a function of C1$_2$/Ar gas mixing ratio. Under Cl$_2$(20)/Ar(80), the maximum etch rate of the BST films was 400$\AA$/min and selectivities of BST to Pt and PR were obtained 0.4 and 0.2, respectively. We investigated the etched surface of BST by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and x-ray diffraction (XRD). From the result of XPS analysis, we found that residues of Ba-Cl and Ti-Cl bonds remained on the surface of the etched BST for high boiling point. The surface roughness decreased as Cl$_2$increases in C1$_2$/Ar plasma because of non-volatile etching products. This changed the nature of the crystallinity of BST. From the result of XRD analysis, the crystallinity of etched BST film maintained as similar to as-deposited BST under Ar only and Cl$_2$(20)/Ar(80). However, (100) orientation intensity of etched BST film abruptly decreased at Cl$_2$only plasma. It was caused that Cl compounds were redeposited on the etched BST surface and damaged to crystallinity of BST film during the etch process.

• Transactions on Electrical and Electronic Materials
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• 제4권3호
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• pp.1-4
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• 2003

The etching of Au thin films has been performed in an inductively coupled $CF_4 / Cl_2 / Ar$ plasma. The etch properties including etch rate and selectivity were examined as $CF_4$ content adds from o to $30\%$ to $Cl_2/Ar$ plasma. The $Cl_2/(Cl_2 + Ar)$ gas mixing ratio was fixed at $20\%$. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of -150 V, a chamber pressure of 15 mTorr, and a substrate temperature of $30^{\circ}C$. The highest etch rate of the Au thin film was 370 nm/min at a $10\%$ additive $CF_4$ into $Cl_2/Ar$ gas mixture. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. The XPS analysis shows that the intensities of Ail peaks are changed, indicating that there is a chemical reaction between Cl and Au. Au-Cl is hard to remove on the surface because of its high melting point. However, etching products can be sputtered by Ar ion bombardment.

• 한국표면공학회지
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• 제49권5호
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• pp.467-471
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• 2016

In order to investigate the Na gettering, PSG/$SiO_2$/Al-1%Si multilevel thin films were fabricated. DC magnetron sputter techniques and APCVD (atmosphere pressure chemical vapor deposition) were utilized for the deposition of Al-1%Si thin films and PSG/$SiO_2$ passivations, respectively. Heat treatment was carried out at $300^{\circ}C$ for 5 h in air. SIMS (secondary ion mass spectrometry) depth profiling and XPS (X-ray Photoelectron Spectroscopy) analysis were used to determine the distribution and binding energies of Na, Al, Si, O, P and other elements throughout the PSG/$SiO_2$/Al-1%Si multilevel thin films. Na peaks were mainly observed at the the PSG/$SiO_2$ interface and at the $SiO_2$/Al-1%Si interfaces. Na impurity gettering in PSG/$SiO_2$/Al-1%Si multilevel thin films is considered to be caused by a segregation type of gettering. The chemical state of Si and O elements in PSG passivation appears to be $SiO_2$.

• Bulletin of the Korean Chemical Society
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• 제27권11호
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• pp.1851-1853
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• 2006

We herein report a new analytical application of XPS to the identification of organic molecules in room temperature ionic liquid for the first time. An organic compound, propargylamine (1), produced in 1-butyl-3-methylimidazolium hexafluorophosphate ([bmim][$PF_6$]), which is one of the room temperature ionic liquids (RTILs), via $A^3$ coupling reaction, is characterized by means of x-ray photoelectron spectroscopy (XPS) rather than using conventional organic compound analysis techniques. There are four non-equivalent carbons in RTILs and 1 each. The ratios of normalized integrated areas of the deconvoluted binding energy of core electron of carbon (C1s) peaks are well matched to the number of carbons in those compounds. The binding energies of C1s of the featured carbons in 1, C4 (sp carbons in acetylene group) and C5 ($sp^2$ carbons in benzene ring), are assigned 286.2 and 285.4 eV, respectively. These results will be able to provide an important tool and a new strategy for the analysis of organic molecules

• 한국태양에너지학회 논문집
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• 제37권5호
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• pp.65-75
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• 2017

In this study, the change of heat loss due to the degree of deterioration of the XPS insulation in KEPCO's office buildings is analyzed. The acceleration aging test of the XPS insulation was carried out according to the test method A of KS M ISO 11561: 2009. The performance of the insulation was analyzed by applying it to the three - dimensional steady state heat transfer analysis program. The acceleration aging test of the XPS insulation, show that the thermal resistance performance decreased by 1.44% at the A regional headquarters, 0.85% at the B regional headquarters, 6.41% at the C branch office, 7.76% at the D regional headquarters, 8.51% at the E branch office, and by 8.54% at the F branch office respectively. Using simulation, we determined that the thermal resistance value of E branch office decreased by 8.04%, while its heat loss increased by 8.52%. At A regional headquarters, the thermal resistance decreased by 1.38%, and the heat loss increased by 1.51%. At D regional headquarters, these value are 6.82% and 7.17%, respectively.

• 한국전기전자재료학회논문지
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• 제16권7호
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• pp.564-568
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• 2003

The etching of Au thin films have been performed in an inductively coupled CF$_4$/Cl$_2$/Ar plasma. The etch rates were measured as CF$_4$ contents added from 0 to 30 % to Cl$_2$/Ar plasma, of which gas mixing ratio was fixed at 20%. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of 150 V, a chamber pressure of 15 mTorr, and a substrate temperature of 3$0^{\circ}C$. The highest etch rate of the Au thin film was 3700 $\AA$m/min at a 10% additive CF$_4$ into Cl$_2$/Ar plasma. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. XPS analysis indicated that Au reacted with Cl and formed Au-Cl, which is hard to remove on the surface because of its high melting point. The etching products could be sputtered by Ar ion bombardment.