• Title/Summary/Keyword: X-ray generation

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Correlation between Oxygen Related Bonds and Defects Formation in ZnO Thin Films by Using X-ray Diffraction and X-ray Photoelectron Spectroscopy (XRD와 XPS를 사용한 산화아연 박막의 결함형성과 산소연관 결합사이의 상관성)

  • Oh, Teresa
    • Korean Journal of Materials Research
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    • v.23 no.10
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    • pp.580-585
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    • 2013
  • To observe the formation of defects at the interface between an oxide semiconductor and $SiO_2$, ZnO was prepared on $SiO_2$ with various oxygen gas flow rates by RF magnetron sputtering deposition. The crystallinity of ZnO depends on the characteristic of the surface of the substrate. The crystallinity of ZnO on a Si wafer increased due to the activation of ionic interactions after an annealing process, whereas that of ZnO on $SiO_2$ changed due to the various types of defects which had formed as a result of the deposition conditions and the annealing process. To observe the chemical shift to understand of defect deformations at the interface between the ZnO and $SiO_2$, the O 1s electron spectra were convoluted into three sub-peaks by a Gaussian fitting. The O 1s electron spectra consisted of three peaks as metal oxygen (at 530.5 eV), $O^{2-}$ ions in an oxygen-deficient region (at 531.66 eV) and OH bonding (at 532.5 eV). In view of the crystallinity from the peak (103) in the XRD pattern, the metal oxygen increased with a decrease in the crystallinity. However, the low FWHM (full width at half maximum) at the (103) plane caused by the high crystallinity depended on the increment of the oxygen vacancies at 531.66 eV due to the generation of $O^{2-}$ ions in the oxygen-deficient region formed by thermal activation energy.

Evaluation of Hydrogenation Properties on Ti-Nb-Cr Alloys by Single-Roll Melt Spinning (단롤주조법에 의한 Ti-Nb-Cr 합금의 제조와 수소화 특성 평가)

  • Kim, Kyeong-Il;Hong, Tae-Whan
    • Korean Journal of Metals and Materials
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    • v.47 no.7
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    • pp.433-439
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    • 2009
  • Ti and Ti based hydrogen storage alloys have been thought to be the third generation of alloys with a high hydrogen capacity, which makes it difficult to handle because of high reactivity. In order to solve the problem, the activation of a wide range of hysteresis of hydriding/dehydriding and without degradation of hydrogen capacity due to the hydriding/dehydriding cycle have to be improved in order to be aplied. Ti-Cr alloys have a high capacity about 0.8 wt.% in an ambient atmosphere. When the Ti-Cr alloys are added to Nb and Ta elements, they formed a laves phase in the alloy system. The Nb element was expected to make easy diffuse hydrogen in the Ti-Cr storage alloy, which was a catalytic element. In this study, the Ti-Nb-Cr ternary alloy was prepared by melt spinning. As-received specimens were characterized using XRD (X-ray Diffraction), SEM (Scanning Electron Microscopy) with EDX (Energy Dispersive X-ray) and TG/DSC (Thermo Gravimetric Analysis/Differential Scanning Calorimetry). In order to examine hydrogenation behavior, the PCI (Pressure-Composition-Isotherm) was performed at 293, 323, 373 and 423 K.

MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant

  • Shin, Changhee;Lee, Namgue;Choi, Hyeongsu;Park, Hyunwoo;Jung, Chanwon;Song, Seokhwi;Yuk, Hyunwoo;Kim, Youngjoon;Kim, Jong-Woo;Kim, Keunsik;Choi, Youngtae;Seo, Hyungtak;Jeon, Hyeongtag
    • Journal of Ceramic Processing Research
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    • v.20 no.5
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    • pp.484-489
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    • 2019
  • VO2 is an attractive candidate as a transition metal oxide switching material as a selection device for reduction of sneak-path current. We demonstrate deposition of nanoscale VO2 thin films via thermal atomic layer deposition (ALD) with H2O reactant. Using this method, we demonstrate VO2 thin films with high-quality characteristics, including crystallinity, reproducibility using X-ray diffraction, and X-ray photoelectron spectroscopy measurement. We also present a method that can increase uniformity and thin film quality by splitting the pulse cycle into two using scanning electron microscope measurement. We demonstrate an ON / OFF ratio of about 40, which is caused by metal insulator transition (MIT) of VO2 thin film. ALD-deposited VO2 films with high film uniformity can be applied to next-generation nonvolatile memory devices with high density due to their metal-insulator transition characteristic with high current density, fast switching speed, and high ON / OFF ratio.

Temperature dependence of Heteroeptaxial $Y_2O_3$ films grown on Si by ionized cluster beam deposition

  • Cho, M.-H.;Ko, D.-H.;Whangbo, S.W.;Kim, H.B.;Jeong, K.H.;Whang, C.N.;Choi, S.C.;Cho, S.J.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.57-77
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    • 1998
  • Heteroepitaxial $Y_2O_3$ films were grown on a Si(111) substrate by ionized cluster beam deposition(ICBD) in ultra high vacuum, and its qualities such as crystllitnity, film stress, and morphological characteristics were investigated using the various measurement methods. The crystallinity was investigated by x-ray diffraction (XRD) and reflection high energy electron diffraction (RHEED). Interface crystallinity was also examined by Rutherford backscattering spectroscopy(RBS) channeling, transmission electron microscopy(TEM). The stress of the films was measured by RBS channeling and XRD. Surface and interface morphological characteristics were investigated by atomic force microscopy (AFM) and x-ray scattering method. Comparing the interface with the surface characteristics, we can conclude that many defects at the interface region were generated by interface reaction between the yttrium metal and SiO2 layer and by ion beam characteristic such as shallow implantation, so that they influenced the film qualities. The film quality was dominantly depended on the characteristic temperature range. In the temperature range from $500^{\circ}C$ to $600^{\circ}C$, the crystallinity was mainly improved and the surface roughness was drastically decreased. On the other hand, in the temperature range from $600^{\circ}C$ to $700^{\circ}C$, the compressive stress and film density were dominantly increased, and the island size was more decreased. Also the surface morphological shape was transformed from elliptical shape to triangular. The film stress existed dominantly at the interface region due to the defects generation.

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Superacidic Property of $ZrO_2$ Modified with Sulfur Compounds (황화합물로 개질된 $ZrO_2$의 초강산 성질)

  • Jong Rack Sohn;Hae Won Kim;Jong Taik Kim
    • Journal of the Korean Chemical Society
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    • v.31 no.4
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    • pp.322-327
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    • 1987
  • $ZrO_2$was modified by treating with $H_2SO_4$ and by treating witb $SO_2,\;H_2S,\;and\;CS_2$ followed by oxidation. The oxidized species and oxidation state of sulfur compounds were investigated by infrared and X-ray photoelectron spectroscopies. The generation of strong acidity of modified $ZrO_2$ was independent of the sulfur source after oxidation. The sulfur ($SO_4{^{2-}}$) in the highest oxidation state was responsible for the superacidic property of the modified $ZrO_2$.

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Effect of Cathode in Electrochemical Reaction for Treating Ballast Water (선박평형수 처리를 위한 전기화학 반응에서 음극의 영향)

  • Kim, Dong Seog;Park, Hye Jin;Yoon, Jong Mun;Park, Yong Seok;Park, Young Seek
    • Journal of Environmental Science International
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    • v.23 no.6
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    • pp.1175-1182
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    • 2014
  • In this study, we examined the effect of cathode from electrolysis reactor for treating ballast water. We are going to select a suitable cathode for seawater electrolysis after considering the effect on the generation of the oxidant of cathode and the electrode deposition materials adhering to the surface of cathode. Anode is Ru-Ti-Pd electrode and cathode are Ti, Pt, JP520 (Ni-Pt-Ce) electrodes. Using the cathode of the three types, experiments were conducted to examine the effects of TRO (total residual oxidants) generation concentration and RNO (N, N-Dimethyl-4-nitrosoaniline, indicator of the generation of OH radical) degradation concentration (in 1, 35 psu), ohmic drop, FESEM(field emission scanning electron microscope) observation of cathode surface and EDX (energy dispersive X-ray spectroscopy) measurements of attached fouling material. The results showed that TRO generation concentration and RNO degradation concentration in according to each type of cathode are not different. The attached fouling materials were observed on the surface of Ti and the JP520 electrode by the observation of SEM after electrolysis for two hours, but it was not observed on the surface of Pt electrode. When considering the surface ohmic drop of cathode and the attached fouling materials, Pt electrode was judged as the excellent cathode.

Hot Corrosion Properties of Heat Resistant Chrome Steels (내열강의 고온부식특성에 대한 크롬함량의 영향)

  • Lee, Han-sang;Jung, Jine-sung;Yoo, Keun-bong;Kim, Eui-hyun
    • Korean Journal of Metals and Materials
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    • v.48 no.4
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    • pp.277-288
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    • 2010
  • The hot corrosion properties of heat-resistant steels were investigated in an oxidation atmosphere including artificial ash and sulfur dioxide. The heat-resistant steels of T22, T92, T122, T347HFG, Super304H and HR3C were evaluated at 620, 670 and $720^{\circ}C$ for 400 hours. The relationship between the corrosion rate and the temperature followed a bell-shaped curve with a peak rate at around $670^{\circ}C$. The corrosion rates showed a decreasing tendency as the chrome contents of these steels increased from 2.15 wt.% to 24.5 wt.%, and austenitic steels had a lower corrosion rate than ferritic steels. Sulfidation by $SO_2$ as well as molten salt corrosion also had an effect on the total corrosion rate, especially showing an increase in the corrosion rate in ferritic steels. Regardless of the chrome content in the steels and irrespective of the test temperature, the corrosion scale was composed of an outer oxide and an artificial ash mixed layer, a middle oxide layer and inner sulfide, and a mixed oxide layer. As the chrome content increased, the proportion of chrome oxide in the corrosion scale increased. Before spalling of the corrosion scale, voids and cracks were initiated in the sulfide and the mixed oxide layer or at the interface with the substrate.

Performance Evaluations of a Novel Prototype of High Frequency Non-Contact Power Transformer

  • Gamage, Laknath;Ishitobi, Manabu;Nakaoka, Mutsuo
    • Journal of Power Electronics
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    • v.4 no.1
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    • pp.12-17
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    • 2004
  • In this paper, a practical implementation to reduce leakage flux of a high-frequency inverter based non-contact type power transformer composed of EE-shape ferrite cores is presented for key technology of the next generation medical use X-ray CT scanner system. Design consideration for the unique structure of the non-contact power transformer with 900mm in diameter is also introduced. The complete non-contact transformer is actually arranged by several blocks of the magnetic circuit assembled by using 10 small EE shape cores with 120mm in length. It is experimentally and analytically discussed from a reduced leakage flux viewpoint related to its inductively coupling coefficient. A practical method to lower the leakage flux is described based on effective Copper-Sheet- Treatment placed on EE shape ferrite cores of magnetic circuit.

Gasification from Surface during Discharge and Thermal Processes in Plasma Display Panel (PDP)

  • Soh, Hyun;Lee, Sang-Moo;Kim, Young-Chai
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.495-498
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    • 2004
  • PDP use the mixture of inert gases to generate a discharge inside display pixels. Inside of PDP, there exist highly reactive conditions in the gap between two glass panels. MgO layer and phosphor have been investigated as a function of discharge and thermal process. Impurities such as CO, $CO_2$, OH and $H_2O$ in discharge region may deteriorate the characteristics of PDP operation during life time. Change of impurity generation of various MgO and phosphor surfaces were measured by using x-ray photoelectron spectroscopy(XPS) and quadropole mass spectrometer (QMS). Carbon containing species such as C, CO and $CO_2$ were drastically increased on the surfaces during discharge and thermal treatment. Carbon impurities on the MgO and phosphor are the dominant factor for their instability.

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Plasma Channel Expansion in a Laser-Induced Plasma (LIP) Using a Focused Laser Beam (집속된 레이저빔에 의한 레이저 유도 플라즈마 채널의 형성 및 팽창에 관한 연구)

  • Kim, Jong-Uk;Kim, Chang-Bum;Kim, Guang-Hoon;Lee, Hae-June;Hyyong Suk
    • Proceedings of the Optical Society of Korea Conference
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    • 2002.07a
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    • pp.240-241
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    • 2002
  • Propagation of an intense laser pulse through fully ionized plasma has been an interesting topic in many fields. It includes laser-driven electron accelerators,(1) generation of high harmonics,(2) soft x-ray laser development(3) and so on. Specifically, in the application of laser-driven electron accelerators a large laser-plasma interaction length is required to get sufficient acceleration energy of electron. (omitted)

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