• Title/Summary/Keyword: X-ray Film

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Origin of High Critical Current density in $MgB_2$ thin films

  • Kang, W.N.;Kim, Hyeong-Jin;Park, Eun-Mi;Kim, Mun-Seong;Kim, Kijoon H. P.
    • Progress in Superconductivity
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    • v.3 no.2
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    • pp.135-139
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    • 2002
  • We have fabricated high-quality c-axis-oriented $MgB_2$ thin films by using a pulsed laser deposition technique. The thin films grown on (1 1 0 2) $Al_2$$O_3$ substrates show an onset transition temperature of 39.2 K with a sharp transition width of ~0.15 K. X-ray diffraction patterns indicate a c-axis-oriented crystal structure perpendicular to the substrate surface. We observed high critical current densities ($J_{c}$) of ~ 16 $MA/\textrm{cm}^2$ at 15 K and under self-field, which is comparable to or exceeds those of cuprate high-temperature superconductors. The extrapolation $J_{c}$ at 5 K was estimated to be ~ 40 MA/$\textrm{cm}^2$, which is the highest record for $MgB_2$ compounds. At a magnetic field of 5 T, the $J_{c}$ of~ 0.1 $MA/\textrm{cm}^2$ was detected at 15 K, suggesting that this compound is very promising candidate for the practical applications at high temperature with lower power consumption. As a possible explanation for the high current-carving capability, the vortex-glass phase will be discussed.d.d.d.

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Deposition of YBCO Films on Moving Substrate by a Spray Pyrolysis method (분무 열분해 CVD법으로 이동 중인 LaAlO_3(100) 단결정 위에 증착시킨 YBCO 박막의 특성)

  • Kim, Jae-Gun;Hong, Suk-Kwan;Kim, Ho-Jin;Yu, Seok-Koo;Cho, Han-Woo;Ahn, Jin-Hyun;Joo, Jin-Hoo;Lee, Hee-Gyoun;Hong, Gye-Won
    • Progress in Superconductivity
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    • v.8 no.1
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    • pp.93-97
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    • 2006
  • YBCO films were deposited on a moving substrate by a spray pyrolysis method using nitrate aqueous solution as precursors. Deposition was made on $LaAlO_3$(100) single crystal substrate by spraying precursor droplets generated by a concentric nozzle. The cation ratio of precursor solution was Y:Ba:Cu=1:2.65:4.5. The distance between nozzle and substrate was 15 cm. Substrate was transported with a speed ranging from 0.23 cm/min to 0.5 cm/min. Films were deposited at the pressure ranging from 10 Torr to 20 Torr and the deposition temperature was ranged from $740^{\circ}C\;to\;790^{\circ}C$. Oxygen partial pressure was controlled between 1 Tow and S Torr. Superconducting YBCO films were obtained from $740^{\circ}C\;to\;790^{\circ}C$ with an oxygen partial pressure of 3 Torr. Scanning electron microscope(SEM) and X-ray diffraction(XRD) observation revealed that films are smooth and highly texture with(001) plans parallel to substrate plane. Highest Jc was 0.72 $MA/cm^2$ at 77K and self-field for the film with a thickness of 0.15 m prepared at a substrate temperature of $740^{\circ}C$ and $PO_2$=3 Torr.

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The electronic structure of the ion-beam-mixed Pt-Cu alloys by XPS and XANES

  • Lim, K.Y.;Lee, Y.S.;Chung, Y.D.;Lee, K.M.;Jeon, Y.;Whang, C.N.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.133-133
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    • 1998
  • In the thin film alloy formation of the transition metals ion-beam-mixing technique forms a metastable structure which cannot be found in the arc-melted metal alloys. Sppecifically it is well known that the studies about the electronic structure of ion-beam-mixed alloys pprovide the useful information in understanding the metastable structures in the metal alloy. We studied the electronic change in the ion-beam-mixed ppt-Ct alloys by XppS and XANES. These analysis tools pprovide us information about the charge transfer in the valence band of intermetallic bonding. The multi-layered films were depposited on the SiO2 substrate by the sequential electron beam evapporation at a ppressure of less than 5$\times$10-7 Torr. These compprise of 4 ppairs of ppt and Cu layers where thicknesses of each layer were varied in order to change the alloy compposition. Ion-beam-mixing pprocess was carried out with 80 keV Ae+ ions with a dose of $1.5\times$ 1016 Ar+/cm2 at room tempperature. The core and valence level energy shift in these system were investigated by x-ray pphotoelectron sppectroscoppy(XppS) pphotoelectrons were excited by monochromatized Al K a(1486.6 eV) The ppass energy of the hemisppherical analyzer was 23.5 eV. Core-level binding energies were calibrated with the Fermi level edge. ppt L3-edge and Cu K-edge XANES sppectra were measured with the flourescence mode detector at the 3C1 beam line of the ppLS (ppohang light source). By using the change of White line(WL) area of the each metal sites and the core level shift we can obtain the information about the electrons pparticippating in the intermetallic bonding of the ion-beam-mixed alloys.

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DC magnetron sputtering을 이용하여 증착한 $SnO_2$ 기반의 박막 트랜지스터의 전기적 및 광학적 특성 비교

  • Kim, Gyeong-Taek;Mun, Yeon-Geon;Kim, Ung-Seon;Sin, Sae-Yeong;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.104-104
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    • 2010
  • 현재 디스플레이 시장은 급변하게 변화하고 있다. 특히, 비정질 실리콘의 경우 디스플레이의 채널층으로 주로 상용화되어 왔다. 비정질 실리콘 기반의 박막 트랜지스터는 제작의 경제성 및 균일성을 가지고 있어서 널리 상용화되고 있다. 하지만 비정질 실리콘의 경우 낮은 전자 이동도(< $1\;cm^2/Vs$)로 인하여 디스플레이의 대면적화에 부적합하며, 광학적으로 불투명한 특성을 갖기 때문에 차세대 디스플레이의 응용에 불리한 점이 있다. 이런 문제점의 대안으로 현재 국내외 여러 연구 그룹에서 산화물 기반의 반도체를 박막 트랜지스터의 채널층으로 사용하려는 연구가 진행중이다. 산화물 기반의 반도체는 밴드갭이 넓어서 광학적으로 투명하고, 상온에서 증착이 가능하며, 비정질 실리콘에 비해 월등히 우수한 이동도를 가짐으로 디스플레이의 대면적화에 유리하다. 특히 Zinc Oxide, Tin Oxide, Titanum Oxide등의 산화물이 연구되고 있으며, indium이나 aluminum등을 첨가하여 전기적인 특성을 향상시키려는 노력을 보이고 있다. Tin oxide의 경우 천연적으로 풍부한 자원이며, 낮은 가격이 큰 이점으로 작용을 한다. 또한, $SnO_2$의 경우 ITO나 ZnO 열적으로 화학적 과정에서 더 안정하다고 알려져 있다. 본 연구에서는 $SnO_2$ 기반의 박막 트랜지스터를 DC magnetron sputtering를 이용하여 상온에서 제작을 하였다. 일반적으로, $SnO_2$의 경우 증착 과정에서 산소 분압 조절과 oxygen vacancy 조절를 통하여 박막의 전도성을 조절할 수 있다. 이렇게 제작된 $SnO_2$의 박막을 High-resolution X-ray diffractometer, photoluminescence spectra, Hall effect measurement를 이용하여 전기적 및 광학적 특성을 알 수 있다. 그리고 후열처리 통하여 박막의 전기적 특성 변화를 확인하였다. gate insulator의 처리를 통하여 thin film의 interface의 trap density를 감소시킴으로써 소자의 성능 향상을 시도하였다. 그리고 semiconductor analyzer로 소자의 출력 특성 및 전이 특성을 평가하였다. 그리고 Temperature, Bias Temperature stability, 경시변화 등의 다양한 조건에서의 안정성을 평가하여 안정성이 확보된다면 비정질 실리콘을 대체할 유력한 후보 중의 하나가 될 것이라고 기대된다.

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XPS Analysis of Acrylic Acid Films Polymerized by Remote Plasma-Enhanced Chemical Vapor Deposition (원격 플라즈마 화학기상증착법에 의해 중합된 아크릴산 필름의 XPS 분석)

  • Kim, Seonghoon;Seomoon, Kyu
    • Applied Chemistry for Engineering
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    • v.20 no.5
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    • pp.536-541
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    • 2009
  • Plasma-polymerized acrylic acid films were deposited on Si wafer and KBr pellet by remote plasma-enhanced chemical vapor deposition (PECVD). Effects of plasma power, reaction pressure, indirect plasma method on the growth rate, chemical structure, and chemical bonding state of the films were investigated. Chemical structure and chemical state of the films were characterized by Fourier transformed infrared (FT-IR) spectroscopy and X-ray photoelectron spectroscopy (XPS) analysis and curve fitting technique. Growth rate of the film increased to a saturation value with plasma power of 100 W, but showed the maximum with reaction pressure at 300 mtorr. Whenever W/FM factor (applied energy per gas molecule) increased by increasing plasma power or lowering pressure, the fragmentation of acrylic acid molecules was promoted. From the XPS curve fitting analyses, we found that the intensity of carboxyl COO bonding peak decreased with W/FM factor, and the tendency of intensity change of carboxylic COO peak was contrary to those of ether C-O and carbonyl C=O peaks.

A Study on Image Quality and Exposure Dose of Hard-radiation Radiography of the Chest (흉부(胸部) 경선질촬영(硬線質撮影)에 있어서 피폭선양(被曝線量)의 저감(低減)에 관(關)한 연구(硏究))

  • Hayashi, Taro;Ishida, Yuji;Maeda, Mika;Sakurai, Tatsuya;Kim, Chung-Woon;Hwang, Jong-Sun
    • Journal of radiological science and technology
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    • v.14 no.2
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    • pp.15-21
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    • 1991
  • Experiment was conducted on the image quality and exposure dose following replacement of $CaWO_4$ system screen BH-III and BX-III which have so far been used for high-voltage hard-radiation quality radiography, with rare earth system screen KO750, combined with high contrast film SRH, while additional filter was altered, Cu 0.8 mm+Al 1.4 mm(HVL : Al 8.8 mm), Cu 1.3 mm+Al 1.0 mm(HVL : Al 10.6 mm) and Cu 1.8 mm+Al 1.5 mm(HVL : Al 11.4 mm). AS a result, visual evaluation did not detect extreme changes in image quality under the respective condition(HVL : $Al\;8.8\;mm{\sim}Al\;11.4\;mm$). It was noted, however, that surface exposure dose declined with an increase in the thickness of the additional filter, as it was $18.9\;{\mu}Gy$ at HVL Al 8.8 mm, $17.5\;{\mu}Gy$ at Al 10.6 mm and $15.7\;{\mu}Gy$ at Al 11.4 mm. Considering the limited rating of X-ray equipment and wear of machinery, however, the range of $Cu\;1.3\;mm{\sim}1.8\;mm+Al\;1.0\;mm{\sim}1.5\;mm(1/16\;VL{\sim}1/32\;VL)$ seemed to be a limit.

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Clinicopathological observations on the experimental pancreatitis Induced by ligation of pancreatic ducts (췌관 결찰에 의한 실험적 췌장염의 임상병리학적 관찰)

  • Sung, Eun-jue;Lee, Hyun-beom
    • Korean Journal of Veterinary Research
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    • v.34 no.2
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    • pp.407-415
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    • 1994
  • Present experiments were undertaken in order to find out the most available diagnostic method for acute pancreatitis. Experimental dogs were divided into experimental group and control group. The experimental dogs were laparotomized and their pancreatic ducts were ligated for the induction of pancreatitis. The control dogs were laparotomized only for comparison. In addition to the complete blood count, serum amylase and lipase activities, serum glucose, total protein and albumin contents were measured daily for 11 days after the operation. Fecal fat droplet count by Sudan III staining and fecal trypsin activity examination by x-ray film digetion test were also undertaken daily. The results obtained were summarized as follows; 1. Serum amylase activities of the experimental group increased to peak on the third day and returned to the preoperative values on the eighth day. 2. Serum lipase activities of the experimental group increased to peak on the first day and returned to the preopertive values within six to eight days. 3. Serum glucose contents of the experimental group showed significant increse only on the first day. 4. Serum albumin contents of the experimental group decreased significantly during the experimental period. Whereas those of the control group significantly decreased only on the first day. 5. The experimental group showed marked leukocytosis, neutrophilia, and lymphopenia for the first 5 or 8 days. Whereas the control group showed only neutrophilia for the first 3 days. 6. The results of fecal fat droplet count showed some diagnostic value on the third and fourth day in only one experimental dog(No 1). No significant changes in the fecal trypsin activity were noticed in all dogs. 7. Histopathologically. all dogs of experimental group showed changes of pancreatitis. However the degree of the pancreatic lesion was not pararell to the degree of the serum amylase or lipase activity changes.

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Photoelectrochamical characteristics of $WO_3$ on metal substrate for hydrogen production (텅스텐산화물/금속기판의 광전극 특성)

  • Go, GeunHo;Shinde, Pravin S.;Seo, SeonHee;Lee, Dongyoon;Lee, Wonjae
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.99.2-99.2
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    • 2011
  • Transparent conducting oxides (TCOs) supported on glass are widely used as substrates in PEC studies for photovoltaic hydrogen generation applications However, high sheet resistane ($10{\sim}15{\Omega}/cm^2$) and fragileness of glass-supported TCO substrates are the obstacles to produce the large area PEC cells. Such internal sheet resistance is detrimental to efficient collection of photogenerated majority charge carriers at the photoactive material and electrolyte interface. Moreover, these TCO substrates are very expensive and consume about 40~60% cost of the devices. Hence, a low sheet resistance of the substrate is a key point in improving the performance of PEC devices. Metallic substrates coated with a photoactive material would be a good choice for efficient charge collection. Such metal substrates based photanodes are best candidate for large-scale phtoelectrochemical water splitting for hydrogen generation. In this study, we report the enhanced PEC performance of $WO_3$ film on metal(chemical etched, bare) substrate. It is proposed that interface between $WO_3$ and the metal substrate is responsible for efficient charge transfer and demonstrated significant improvement in the photoelectrochmical performance. X-ray diffration and FESEM suduies reveled that $WO_3$ films are monoclinic, porous, polycrystalline with average grain size of ~50nm. Photocurrent of $WO_3$ prepared on metal substrates was measured in 0.5M $H_2SO_4$ electroyte under simulated $100mW/cm^2$ illumination.

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TFT 채널층으로 사용하기 위한 IGZO박막의 산소분압에 따른 특성변화

  • Sin, Ju-Hong;Kim, Ji-Hong;No, Ji-Hyeong;Lee, Gyeong-Ju;Kim, Jae-Won;Do, Gang-Min;Park, Jae-Ho;Jo, Seul-Gi;Yeo, In-Hyeong;Mun, Byeong-Mu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.260-260
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    • 2011
  • 투명 비정질 산화물반도체는 디스플레이의 구동소자인 박막 트랜지스터에 채널층으로 사용된다. 또한 투명하면서 유연성이 있는 소자를 저비용으로 제작할 수 있는 장점을 가진다. 투명 산화물반도체 재료 중 IGZO는 Si 또는 GaAs와 같은 공유결합성 반도체와는 다른 전자 배치로 전도대가 금속이온의 ns 궤도에서 형성되며, 가전도대가 산소 음이온의 2p 궤도에서 형성된다. 특히 큰 반경의 금속 양이온은 인접한 양이온과 궤도 겹침이 크게 발생하게 되며 캐리어의 효과적인 이동 경로를 제공해줌으로써 다른 비정질 반도체와는 다르게 높은 전하이동도(~10 $cm^2$/Vs)를 가진다. 따라서 저온공정에서 우수한 성능의 TFT소자를 제작할 수 있는 장점이 있다. 본 연구에서는 TFT 채널층으로 사용하기 위한 a-IGZO박막의 산소분압에 따른 특성변화를 분석 하였다. a-IGZO박막은 Pulsed Laser Deposition (PLD)를 이용하여 산소분압(20~200 mTorr) 변화에 따라 Glass기판에 증착하였다. 증착된 a-IGZO 박막의 구조적 특성으로는 X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), 광학적 특성은 UV-vis spectroscopy 분석을 통해서 알아보았다. TFT 채널층의 조건으로는 낮은 off-current, 높은 on-off ratio를 위해 고저항 ($10^3\;{\Omega}cm$)의 진성반도체 성질과 source/drain금속과의 낮은 접촉저항(ohmic contact) 등의 전기적 성질이 필요하다. 따라서 이러한 전기적 특성확인을 위해 transmission line method (TLM)을 사용하여 접촉저항과 비저항을 측정하였고, 채널층으로 적합한 분압조건을 확인해볼 수 있었다.

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Understanding of Growth Habits of $VO_2$ Film on Graphene and Their Effects on Metal to Insulator $Transition_2$

  • Yang, Jae-Hoon;Kim, Keun-Soo;Jang, A-Rang;Yang, Hyoung-Woo;Kang, Dae-Joon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.572-572
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    • 2012
  • Growth of metal oxides on graphene may lead to a better understanding of delicate effects of their growth habits on their underlying physics. The vanadium dioxide ($VO_2$) is well known for its metal-to-insulator transition accompanied by a reversible first order structural phase transition at 340 K. This transition makes $VO_2$ a potentially useful material for applications in electrical and optical devices. We report a successful growth of $VO_2$ nanostructures on a graphene substrate via a vapor-solid transport route. As-grown $VO_2$ nanostructures on graphene were systematically characterized by field emission scanning electron microscopy, x-ray diffraction, Raman spectroscopy, FT-IR spectroscopy and high resolution transmission electron microscopy. These results indicate that the strain between $VO_2$ and graphene layers may be easily controlled by the number of underlying graphene layer. We also found that the strain in-between $VO_2$ and graphene layer affected its metal-to-insulator transition characteristics. This study demonstrates a new way for synthesizing $VO_2$ in a desired phase on the transparent conducting graphene substrate and an easy pathway for controlling metal-to-insulator phase transition via strain.

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