• Title/Summary/Keyword: Work Pattern

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Investigation on the Effect of Contact Load on Fine Pattern Fabrication by AFM (AFM을 이용한 미세 패턴 가공 시 접촉 하중에 따른 선폭 변화에 대한 연구)

  • Jo S.B.;Kim D.E.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.502-505
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    • 2005
  • To overcome some of the limitations in the conventional photolithography technique, MC-SPL which has advantages such as flexibility and high speed was developed in the past. To make a fine pattern using MC-SPL, there are many variables to control, for example, applied load, scribing speed, chemical etching condition, and etc. In this work, the effect of contact load on the width of the pattern was investigated. The load not only influences the width of the pattern but it also affects the wear of the probe tip. It was found that it is beneficial to load the tip in two stages. Futhermore, the experimental results showed that the pattern width was more sensitive to the initial contact force.

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Training-Free sEMG Pattern Recognition Algorithm: A Case Study of A Patient with Partial-Hand Amputation (무학습 근전도 패턴 인식 알고리즘: 부분 수부 절단 환자 사례 연구)

  • Park, Seongsik;Lee, Hyun-Joo;Chung, Wan Kyun;Kim, Keehoon
    • The Journal of Korea Robotics Society
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    • v.14 no.3
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    • pp.211-220
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    • 2019
  • Surface electromyogram (sEMG), which is a bio-electrical signal originated from action potentials of nerves and muscle fibers activated by motor neurons, has been widely used for recognizing motion intention of robotic prosthesis for amputees because it enables a device to be operated intuitively by users without any artificial and additional work. In this paper, we propose a training-free unsupervised sEMG pattern recognition algorithm. It is useful for the gesture recognition for the amputees from whom we cannot achieve motion labels for the previous supervised pattern recognition algorithms. Using the proposed algorithm, we can classify the sEMG signals for gesture recognition and the calculated threshold probability value can be used as a sensitivity parameter for pattern registration. The proposed algorithm was verified by a case study of a patient with partial-hand amputation.

A Study on the Five Days Work System and the Quality of Working Life : Focusing on the Female Employees of Railroad-related Organizations (주5일제 근무와 직장생활의 질에 관한 연구 : 철도관련조직 여성인력을 중심으로)

  • Kim, Guie-Rye;Shin, Tack-Hyun
    • Proceedings of the KSR Conference
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    • 2007.11a
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    • pp.1633-1640
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    • 2007
  • The Five Days Work System started to be lately introduced among Korean companies is causing much interests in diverse aspects. This theme of '5 days work' seems like a hot issue both for academian and for practitioner in the respect that it incurred a great change and impact in worker's life. The purpose of this article is to depict the pattern and the effect incurred by '5 days work system', focusing on the female workers in railroad-related organizations. To attain this purpose, several aspects of current '5 days work system' and its effects both on work life and on family life are surveyed through questionaire and analyzed by SPSS. And some implications will be supposed. in based on the cognitive response of employees.

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A Study on Job Involvement according to Working Pattern and Daytime Sleepiness among Hospital Nurses (병원간호사의 근무형태와 주간수면과다증에 따른 직무몰입)

  • Hwang, Eun-Hee;Kang, Ji-Sook
    • Journal of East-West Nursing Research
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    • v.17 no.2
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    • pp.81-86
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    • 2011
  • Purpose: The purpose of this study was to examine job involvement according to working pattern and daytime sleepiness in hospital nurses. Methods: At 2 hospitals in affiliation of university, after obtaining participant's consent form, data were collected from October to November, 2007. Twohundred fifty nurses participated in the study. Questionnaire consisted of Epworth Sleepiness Scale (ESS), Job Involvement. Collected data was analyzed with SPSS 14.0 program, which was used for frequency, percentage, mean, standard deviation, t-test and Pearson correlation coefficients. Results: Major findings of this study were as follows 1) The nurses for 3 shift work was 172 (68.8%), the nurses for 2 shift work was 3 (1.2%) and the nurses for day fixation was 75 (30.0%). 2) Mean of ESS was 5.94 (3.28), daytime sleepiness was 13.2% and Job involvement had a mean of $21.27.{\pm}4.61.3$) There were significant differences between shift work and day fixed work on ESS (t=4.33, p<.001), job involvement (t=6.54, p<.001). Higher ESS were significantly related to lower job involvement (r=-.185, p=.003). Conclusion: The finding of this study gives useful informations about sleep and work involvement of hospital nurses. It is need to develop systemic management for shift work nurses by hospital, nurse organization, and government.

Brassiere Pattern Design Using the 3D Information - Application of Ruled Surface- (3차원 정보가 반영된 브래지어 패턴 설계 -Ruled surface의 활용-)

  • 이예진;홍경희
    • Journal of the Korean Society of Clothing and Textiles
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    • v.28 no.11
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    • pp.1536-1543
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    • 2004
  • Garment is made by a 2D pattern and should be fitted to a human body which has 3D characteristics. Therefore, to design a pattern more effectively, the use of 3D information of a human body and the investigation of relationship between the 3D garment and 2D pattern are necessary. In this work, ruled surface method was used to reflect the 3D information of a human body for a pattern design. The images of the brassiere line on the woman's dress form were captured by phase-shifting projection moire system and the 3D information on the design line was obtained. 2D patterns on the various parts of the brassiere were developed directly from the 3D data by the ruled surface method. In addition, design line, the area and the amount of dart were quantified. And then we verify the appropriateness of the ruled surface method to the 2D pattern development by measuring the distribution of the space between women's figure and segmented clothing item. It was found that the ruled surface method is useful to transform the 3D design line to the 2D pattern, if we followed the steps suggested in this paper.

The Expression of Color and Texture Usage of Finish Material from the Le Corbuisier's Work - Focused on the Elevation and Detail in the Chapel Ronchamp - (르 꼬르뷔제의 재료 질감 사용 및 색채 표현 - 롱샹성당의 입면과 디테일을 중심으로 -)

  • Kim, So-Hee
    • Korean Institute of Interior Design Journal
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    • v.23 no.6
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    • pp.70-77
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    • 2014
  • The purpose of this study is providing a usage of exterior, interior finish materials and color scheme for architectural design and the actual texture and pattern plans of finish materials from Le Corbuisier's work, Chapel Ronchamp. Chapel Ronchamp was analyzed to support the study for the interaction between texture usage and color expression. As a powerful design tool, texture, pattern and color of finish materials are very effective to alter the perception of the facade in the building. Most of architectural buildings, shapes and materials of elevations are monotonous and uniform. This study should be considered by details in the elevation of Chapel Ronchamp. As the part for developing and planning of architectural design, researching color plans and finish material is very important on real expression in the architectural space. As a result, this study will benefit in planning both the exterior and interior environments of color and finish material with texture and pattern.

Appropriate Package Structure to Improve Reliability of IC Pattern in Memory Devices (메모리 반도체 회로 손상의 예방을 위한 패키지 구조 개선에 관한 연구)

  • 이성민
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.32-35
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    • 2002
  • The work focuses on the development of a Cu lead-frame with a single-sided adhesive tape for cost reduction and reliability improvement of LOC (lead on chip) package products, which are widely used for the plastic-encapsulation of memory chips. Most of memory chips are assembled by the LOC packaging process where the top surface of the chip is directly attached to the area of the lead-frame with a double-sided adhesive tape. However, since the lower adhesive layer of the double-sided adhesive tape reveals the disparity in the coefficient of thermal expansion from the silicon chip by more than 20 times, it often causes thermal displacement-induced damage of the IC pattern on the active chip surface during the reliability test. So, in order to solve these problems, in the resent work, the double-sided adhesive tape is replaced by a single-sided adhesive tape. The single-sided adhesive tape does net include the lower adhesive layer but instead, uses adhesive materials, which are filled in clear holes of the base film, just for the attachment of the lead-frame to the top surface of the memory chip. Since thermal expansion of the adhesive materials can be accommodated by the base film, memory product packaged using the lead-flame with the single-sided adhesive tape is shown to have much improved reliability. Author allied this invention to the Korea Patent Office for a patent (4-2000-00097-9).

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A Study on the Holding of LED Sapphire Substrate Using Alumina Electrostatic Chuck with Fine Electrode Pattern (미세 전극 패턴을 갖는 알루미나 정전척을 이용한 LED용 사파이어 기판 흡착 연구)

  • Kim, Hyung-Ju;Shin, Yong-Gun;Ahn, Ho-Kap;Kim, Dong-Won
    • Journal of the Korean institute of surface engineering
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    • v.44 no.4
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    • pp.165-171
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    • 2011
  • In this work, handling of sapphire substrate for LED by using an electrostatic chuck was studied. The electrostatic chuck consisted of alumina dielectric, which was doped with 1.2 wt% $TiO_2$. As the volume resistivity of alumina dielectric was decreased, the electrostatic force was increased by Johnsen-Rahbek effect. The narrower width and gap size of electrode led to the stronger electrostatic force. When alumina dielectric with $3.20{\times}10^{11}{\Omega}{\cdot}cm$ resistivity and 3 mm width/1.5 mm gap sized electrode was used, the strongest electrostatic force in this work was obtained, which value reached to ~14.46 gf/$cm^2$ at 2.5 kV for 4-inch sapphire substrate. This results show that alumina electrostatic chuck with low resistivity and fine electrode pattern is suitable for handling of sapphire substrate for LED.

Design and Implementation of Disinfection Service Platform based on MVC Pattern Using Web/App

  • Jang, Ye-jin;Jo, Yu-min;Shin, Ji-in;Jang, Yun-jeong;Jeong, Da-woon;Paik, Jong-ho
    • Journal of Internet Computing and Services
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    • v.22 no.6
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    • pp.41-49
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    • 2021
  • Due to the COVID-19 pandemic, issues related to quarantine are emerging. There are various infection prevention methods, but among them, it is certain to frequently disinfect the surface or the entire space of an object that has come into contact with the virus. However, the reality is that the number of times such disinfection is legally designated and the required number of personnel are very different depending on the building and facility. For this reason, there are no companies and systems that can professionally receive orders for disinfection work. In order to solve the aforementioned problems, this paper presents a method to design a disinfection service platform based on the MVC pattern, and implements the required functions based on this. Through this, it is possible to build a more systematic system, and it is hoped that it will be of great help to quarantine with an orderly process for disinfection work.

Nanoscale Fluoropolymer Pattern Fabrication by Capillary Force Lithography for Selective Deposition of Copper

  • Baek, Jang-Mi;Lee, Rin;Seong, Myeong-Mo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.369-369
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    • 2012
  • The present work deals with selective deposition of copper on fluoropolymers patterned silicon (111) surfaces. The pattern of fluoropolymer was fabricated by nanoimprint lithography (NIL) and plasma reactive ion etching (RIE) was used to remove the residuals layers. Copper was electrochemically deposited in bare Si regions which were not covered with fluoropolymers. The patterns of fluoropolymers and copper have been investigated by scanning electron microscopy (SEM). In this work, we used two deposition methods. One is galvanic displacement method and another is electrodeposition. Selective deposition works in both cases and it shows applicability to other materials. By optimization of the deposition conditions can be achieved therefore this process represents a simple approach for a direct high resolution patterning of silicon surfaces.

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