• Explosives and Blasting
• /
• v.8 no.4
• /
• pp.3-22
• /
• 1990

The $\varphi{4.5}$ meters pilot tunneling work is almost done to the $\varphi{11.3}$ meters twin tunnel of NAM SAN No1. The south side pit of 400 meters is weak zone of Rock status, so client request us to allow the cautious blasting pattern for drilling on the condition of 0.2 kine vibration allowance limited for the safety of side running tunnel. The pattern of cautious blasting carried out by 6 time divided fiving on the round drilling depth of 1.20 meters(1.10) and also applied control blasting method with line drilling due to the reduction of vibration.

• Journal of the Korean Society of Manufacturing Process Engineers
• /
• v.3 no.3
• /
• pp.32-38
• /
• 2004

Recently, the system of high speed milling(HSM) is widely used for reducing the operation time and maximizing efficiency of work. The most research of high speed milling system is still leaves much to be desired. Specially the research of mass pocket high speed processing with high precision is the first and probably the last. So this paper showed mass pocket processing of high precision with a duralumin and then confirmed a cause of inferior goods through the CAD/CAM pattern simulation and experimentation. And this paper showed high speed processing system reduce the rate of inferior from this optimal pattern.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.16 no.6
• /
• pp.515-521
• /
• 2003

There are now many theoretical investigations and real manufactures for numerous applications of photonic crystals (PCs) associated with photonic band gap and photonic integrated circuits. However, there are some difficulties to design and fabricate the desired pattern quality. It is not easy to satisfy accurate critical dimension (CD) for patterns with arbitrary shapes and pitch sizes aligned in various directions. In this work, we report the optimum conditions to better fabricate and design, and greatly improve pattern quality in delineating two-dimensional (2D) PCs in the nanometer range using single- step e-beam lithography system with conventional exposure mode.

• Proceedings of the KIEE Conference
• /
• 1999.07e
• /
• pp.2051-2053
• /
• 1999

In this work, PD patterns and electrical trees are observed by use of the XLPE cable insulation. and the tree initiation voltage related to the contamination are also measured in order to calculate the electric stress necessary for the design of cable insulation. Throughout these works, correlation between the PD pattern and the shape of electrical tree has been observed that there may exist three distinct pattern of PD dependence on the stage of tree propagation, Such correlation could bring a basic information in connection with the partial discharge of cable system. It was also found that the electrical stress necessary for the initiation of electrical tree was measured to the 290kV/mm for the 154kV XLPE cables manufactured in KOREA.

• KIEE International Transactions on Electrophysics and Applications
• /
• v.11C no.2
• /
• pp.12-17
• /
• 2001

In this work, the correlation between the PD Patterns and the electrical tree propagation has been investigated by use of the specimen removed from the insulation of the real 154 kV XLPE underground power cables. As a result, it could be deduced that the PD pattern regarding electrical trees depends on their type which could be classified into three different distinct groups such as branch-bush mixed. Considering the results of our investigation, if the partial discharge magnitude is only considered for the diagnosis of the cable system, it is possible to draw a wrong decision. Therefore, it is possible to propose that the time characteristics of PD pattern should be taken into account for the diagnosis of the cable system in addition to the conventional $\Phi$-q-n characteristics.

• Journal of the Korean Home Economics Association
• /
• v.26 no.3
• /
• pp.153-169
• /
• 1988

This study aimed at investigating the socialization of householdwork to the difference of life style pattern of housewives. For the purpose, questionnaires were administrated to the housewives in Seoul and to analyse of the date, factor analysis F-test, t-test and path analysis were used. The results can be summarized as follows ; 1. By utilizing factor analysis, the life style patterns of housewives were classified into 7 types, they were named, self-improvement type, social activity type, modernistic type, sound and thrifty type, variety-seeking type, passive stability-seeking type, the traditional and conservative type. And the patterns of life style differed significantly according to all of the demographic variables except family type. 2. The level of socialization of householdwork was not reaching the medium, and the mean was 19.45. 3. The socialization of householdwork were influenced indirectly by the age, educational level, income level, family type and social activity type, variety seeking type, traditional and conservative type of the life style pattern. And directly, the age and educational level influenced the socialization of householdwork.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1998.06a
• /
• pp.131-134
• /
• 1998

This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resist for the nano process and a vacuum lithography process. The thin films of plasma polymerization were fabricated by the plasma po1ymerization of inter-electrode capacitively coupled gas flow system. After delineating the pattern at accelerating voltage of 30[kV]. ranging the dose of 1∼500[${\mu}$C/$\textrm{cm}^2$], the pattern was developed with dry tree and formed by plasma etching. By analysing of the molecule structure using FT-lR, it was confirmed that the thin films of PPMST contains the functional radicals of the MST monomer. The thin films of PPMST had a highly crosslinked structure resulting in a higher molecule weight than the conventional resist.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.12 no.1
• /
• pp.81-87
• /
• 1999

The surface morphology of liquid crystal alignment layer has been investigated by using Brewster angle microscope(BAM) for the first time. The samples used in this work for liquid crystal alignment layer were mechanically rubbed polyimide films. The rubbing pattern on this layer has been analyzed with the terms of microgroove and rubbing induced optical birefringence. For the mechanically rubbed surface, the geometrical factors of microgroove play the major role for the formation of rubbing pattern. We propose that the BAM can be used as a powerful tool not only for observing the rubbing pattern, but also for inspecting the surface defects.

• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.60 no.2
• /
• pp.435-440
• /
• 2011

A touchless user interface system is proposed for real-time mobile devices in this work. The proposed system first recognizes the position of pattern to interact various applications based on the scene taken from mobile camera. Then, the proposed system traces the route of the pattern, which estimates the motion of pattern based on the mean-shift method. Based on this information, we control menu and keypad for the various applications. Differ from other user interface systems, the proposed system provides the new experience to even for the user of low-end mobile without additional hardware. Simulation results demonstrate that the proposed algorithm provides better interaction performances than the conventional method, while achieving real-time user interacting for mobile devices.

• Electrical & Electronic Materials
• /
• v.9 no.1
• /
• pp.59-66
• /
• 1996

Polyimides containing cyclobutane ring in main chain is known to be thermally stable and able to be developed in organic solvents after photolysis with 254 nm UV light. This type of polyimides can be used as promising positive photoresist in VLSI fabrication process. In the current VLSI process, photoresist films are formed by spin coating. The film thickness is more than several hundred nano meters. It seems that there is room for improvement of film coating process by introducing Langmuir Blodgett technique. Thereby ultra thin film photoresist can be formed, and higher density of integration in VLSI be achieved. In the present work, depositing procedure of LB films of this polyimide was investigated. LB film thickness was measured by ellipsometry to evaluate deposited film status. Chemical imidization procedure was studied to avoid several problems in thermal imidization. The pattern of submicron dimension has successfully formed on LB film of 8nm thick, which found showing good contrast.