• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2005.10a
• /
• pp.268-271
• /
• 2005

Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2012.05a
• /
• pp.81.2-81.2
• /
• 2012

To fabricate a metal mold for injection molding, hot-embossing and imprinting process, mechanical machining, electro discharge machining (EDM), electrochemical machining (ECM), laser process and wet etching ($FeCl_3$ process) have been widely used. However it is hard to get precise structure with these processes. Electrochemical etching has been also employed to fabricate a micro structure in metal mold. A through mask electrochemical micro machining (TMEMM) is one of the electrochemical etching processes which can obtain finely precise structure. In this process, many parameters such as current density, process time, temperature of electrolyte and distance between electrodes should be controlled. Therefore, it is difficult to predict the result because it has low reliability and reproducibility. To improve it, we investigated this process numerically and experimentally. To search the relation between processing parameters and the results, we used finite element simulation and the commercial finite element method (FEM) software ANSYS was used to analyze the electric field. In this study, it was supposed that the anodic dissolution process is predicted depending on the current density which is one of major parameters with finite element method. In experiment, we used stainless steel (SS304) substrate with various sized square and circular array patterns as an anode and copper (Cu) plate as a cathode. A mixture of $H_2SO_4$, $H_3PO_4$ and DIW was used as an electrolyte. After electrochemical etching process, we compared the results of experiment and simulation. As a result, we got the current distribution in the electrolyte and line profile of current density of the patterns from simulation. And etching profile and surface morphologies were characterized by 3D-profiler(${\mu}$-surf, Nanofocus, Germany) and FE-SEM(S-4800, Hitachi, Japan) measurement. From comparison of these data, it was confirmed that current distribution and line profile of the patterns from simulation are similar to surface morphology and etching profile of the sample from the process, respectively. Then we concluded that current density is more concentrated at the edge of pattern and the depth of etched area is proportional to current density.

• Journal of Sensor Science and Technology
• /
• v.7 no.1
• /
• pp.73-82
• /
• 1998

In silicon surface micro-machining, the newly developed GPE(gas-phase etching) process was verified as a very effective method for the release of highly compliant micro-structures. The developed GPE system with anhydrous HF gas and $CH_{3}OH$ vapor was characterized and the selective etching properties of sacrificial layers to release silicon micro-structures were discussed. P-doped polysilicon and SOI(silicon on insulator) substrate were used as a structural layer and TEOS(tetraethyorthdsilicate) oxide, thermal oxide and LTO(low temperature oxide) as a sacrificial layer. Compared with conventional wet-release, we successfully fabricated micro-structures with virtually no process-induced striction and residual product.

• Journal of the Semiconductor & Display Technology
• /
• v.2 no.4
• /
• pp.37-40
• /
• 2003

We have studied micro-machining technologies to fabricate parts and sensors used in the semiconductor equipment. The studies were based on the silicon integrated circuit processes, and composed of the anisotropic etching of single crystal silicon to fabricate a membrane structure for hot and cold junctions in the infrared absorber. KOH and TMAH were used as etching solutions for the anisotropic wet etching for membrane structure formation. The etching characteristic was observed for the each solution, and etching rate was measured depending upon the temperature and concentration of the etching solution. The different characteristics were observed according to pattern directions and etchant concentration. The pattern was made to incline $45^{\circ}$ on the primary flat, and optimum etching property was obtained in the case of 30 wt% and $90^{\circ}C$ of KOH etching solution for the formation of the membrane structure.

• 한국연소학회:학술대회논문집
• /
• 2006.10a
• /
• pp.235-241
• /
• 2006

Catalytic combustion is one of the suitable methods for micro power source due to high energy density and no flame quenching. Catalyst loading in the micro structured combustion chamber is one of the most important issues in the development of micro catalytic combustors. In this research, to coat catalyst on the chamber wall, two methods were investigated. First, $Al_2O_3$ was selected as a support of Pt and $Pt/Al_2O_3$ was synthesized through the alumina sol-gel procedure. To improve the coating thickness and adhesion between catalyst and substrate, heat resistant and water solvable organic-inorganic hybrid binder was used. Porous silicon was also investigated as a catalyst support for platinum. Through the parametric studies of current density and etching time, fabrication process of $1{\sim}2{\mu}m$ of diameter and about $25{\mu}m$ depth pores was confirmed. Coated substrates were test in the micro channel combustor which was fabricated by the wet etching and machining of SUS 304. Using $Pt/Al_2O_3$ coated substrate and Pt coated porous silicon substrate, conversion rate of fuel was over 95% for $H_2$/Air premixed gas.

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.24 no.2 s.173
• /
• pp.338-346
• /
• 2000

Although the net-shape molding of composites is generally recommended, molded composites are frequently required cutting or grinding due to the dimensional inaccuracy for precision machine elements . During the composite machining operations such as cutting and grinding, the temperature at the cutting point may increase beyond the allowed limit due to the low thermal conductivity of composites, which might degrade the matrix of composite. Therefore, in this work, the temperature at the cutting point during cut-off grinding of carbon fiber epoxy composites was measured. The cutting force and surface roughness were also measured to investigate the cut-off grinding characteristics of the composites. The experiments were performed both under dry and wet grinding conditions with respect to cutting speed and feed rate. From the experimental investigation, the optimal conditions for the composite cut-off grinding were suggested.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2003.06a
• /
• pp.593-598
• /
• 2003

Ceramic plates containing many micro-holes are used in diverse applications such as MCP (Microchannel Plate). catalytic converters, filters, electrical insulators in integrated circuits, and so on. One of the efficient methods for machining many holes in ceramic plates is wet drilling of ceramic green bodies followed by sintering them. Since the strength of ceramic green bodies is much lower than the strength of sintered ceramic plate, ceramic green bodies can be drilled with high feed rate. The axial force during micro-drilling of ceramic green bodies increases rapidly at high feed rate, which induces the crack in workpiece. Therefore, the tool lift of micro-drill with respect to feed rate may be determined by the predicting increase of axial force. In this work, the axial force during micro-drilling was calculated using the chip flow model on the micro-drill tip. from which the tool life of diamond abrasive micro-drill during micro-drilling of ceramic green bodies was calculated.

• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.27 no.8
• /
• pp.1287-1294
• /
• 2003

The wear process of end mill is so complicated process that a more reliable technique is required for the monitoring and controlling the tool life and its performance. This research presents a new tool wear monitoring method based on the sound signal generated on the machining. The experiment carried out continuous-side-milling for 4 cases using the high-speed-steel end mill under wet condition. The sound pressure was measured at 0.5m from the cutting zone by a dynamic microphone, and was analyzed at frequency domain. As the cutter impacts the workpiece surface, a situation of farced vibration arises in which the dominant forcing frequency is equal to the tooth passing frequency of the cutter. The tooth passing frequency appears as a harmonics form, and end mill flank wear is related with the first harmonic. It is possible to detect end . mill flank wear. This paper proposed the new method of the end mill wear detection.

• Journal of the Korean Society of Combustion
• /
• v.11 no.2
• /
• pp.7-14
• /
• 2006

Catalytic combustion is one of the suitable methods for micro power source due to high energy density and it can be applied to micro structured chamber without consideration of quenching since it is flameless combustion. Catalyst loading in the micro structured combustion chamber is one of the most important issues in the development of micro catalytic combustors. In this research, to coat catalyst on the chamber wall, two methods were investigated. First, $Al_2O_3$ was selected as a support of Pt and $Pt/Al_2O_3$ was synthesized through the alumina sol-gel procedure. To improve the coating thickness and adhesion between catalyst and substrate, heat resistant and water solvable organic-inorganic hybrid binder was used. Porous silicon was also investigated as a catalyst support for platinum. Through the parametric studies of current density and etching time, fabrication process of $1{\sim}2{\mu}m$ of diameter and about $25{\mu}m$ depth pores was confirmed. Coated substrates were test in the micro channel combustor which was fabricated by the wet etching and machining of SUS 304. Using $Pt/Al_2O_3$ coated substrate and Pt coated porous silicon substrate, conversion rate of fuel was over 95 % for $H_2/Air$ premixed gas.

• Korean Journal of Materials Research
• /
• v.16 no.4
• /
• pp.225-230
• /
• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.