• Journal of KIISE
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• v.44 no.3
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• pp.295-305
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• 2017

Facial appearance is greatly influenced by illumination conditions, and therefore illumination variation is one of the factors that degrades performance of face recognition systems. In this paper, we propose a robust method for face representation under varying illumination conditions, combining non-alpha Weberface (non-alpha WF) and histogram equalization. We propose a two-step method: (1) for a given face image, non-alpha WF, which is not applied a parameter for adjusting the intensity difference between neighboring pixels in WF, is computed; (2) histogram equalization is performed to non-alpha WF, to make a uniform histogram distribution globally and to enhance the contrast. $(2D)^2PCA$ is applied to extract low-dimensional discriminating features from the preprocessed face image. Experimental results on the extended Yale B face database and the CMU PIE face database show that the proposed method yielded better recognition rates than several illumination processing methods as well as the conventional WF, achieving average recognition rates of 93.31% and 97.25%, respectively.

• Korean Journal of Materials Research
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• v.31 no.12
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• pp.719-726
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• 2021

Through the process of chemical vapor deposition, Tungsten Hexafluoride (WF₆) is widely used by the semiconductor industry to form tungsten films. Tungsten Hexafluoride (WF₆) is produced through manufacturing processes such as pulverization, wet smelting, calcination and reduction of tungsten ores. The manufacturing process of Tungsten Hexafluoride (WF₆) is required thorough quality control to improve productivity. In this paper, a real-time detection system for oxidation defects that occur in the manufacturing process of Tungsten Hexafluoride (WF₆) is proposed. The proposed system is implemented by applying YOLOv5 based on Convolutional Neural Network (CNN); it is expected to enable more stable management than existing management, which relies on skilled workers. The implementation method of the proposed system and the results of performance comparison are presented to prove the feasibility of the method for improving the efficiency of the WF₆ manufacturing process in this paper. The proposed system applying YOLOv5s, which is the most suitable material in the actual production environment, demonstrates high accuracy (mAP@0.5 99.4 %) and real-time detection speed (FPS 46).

• Korean Journal of Remote Sensing
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• v.28 no.5
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• pp.561-571
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• 2012

The MTF(Modulation Transfer Function) is one of quality assesment factors to evaluate the performance of satellite images. Image restoration is needed for MTF compensation, but it is an ill-posed problem and doesn't have a certain solution. Lots of filters were suggested to solve this problem, such as Inverse Filter(IF), Pseudo Inverse Filter(PIF) and Wiener Filter(WF). The most commonly used filter is a WF, but it has a limitation on distinguishing signal and noise. The L-curve-based Modified Wiener Filter(MWF) is a solution technique using a Tikhonov regularization method. The L-curve is used for estimating an optimal regularization parameter. The image restoration was performed with Dubaisat-1 images for PIF, WF, and MWF. It is found that the image restored with MWF results in more improved MTF by 20.93% and 10.85% than PIF and WF, respectively.

• Journal of the Microelectronics and Packaging Society
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• v.11 no.4 s.33
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• pp.29-35
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• 2004

We have deposited the W-N diffusion barrier on Si substrate with $NH_3$ pulse plasma enhanced atomic layer deposition (PPALD) method by using $WF_6$ and $NH_3$ gases. The $WF_6$ gas reacts with Si that the surface corrosion occurs severely, but the $NH_3$ gas incorporated with pulse plasma and $WF_6$ gas are easily deposited W-N thin film without Si surface corrosion. Because the $NH_3$ with pulse plasma can be active species dissociated and chemisorbed on Si. Thus the Si surface are covered and saturated with nitrogen, which are able to deposit the W-N thin film. We also examine the deposition mechanism and the effect of $NH_3$ pulse plasma treatment.

• Journal of the Korean Society of Clothing and Textiles
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• v.26 no.12
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• pp.1749-1755
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• 2002

본연구의 목적은DP가공에 의한 가교화를 통해 텐셀의 피브릴화를 조절할 때 DP가공 방법 및 NaOH전처리 효과를 물성, 표면형태, 역학적 성질 및 태의 변화의 관점에서 고찰하는데 있다. SEM 분석결과DP가공에 의해 피브릴 발생 정도는 감소하였다. DP가공 방법에 있어 서 WF법과 PDC법에 따른 물성의 차이는 나타나지 않았다. 역학적특성의 경우 DP가공은 DP가공 방법에 상관없이 효소처리한 직물의 인장선형성에는 큰 영 향을 주지 않았으나 인장에 너지, 굽힘 강성, 압축선형성, 압축 레질리언스, 기하학적 거칠기는 감소시켰고 인장 레질리언스, 굽힘이력, 압축에너지는 증가시켰다. 전단특성은 WF법에서는 증가한 반면, PDC법에서는 감소하여 DP가공 방법에 따른 차이를 나타내었다. WF법이 PDC법보다 더 높은 Koshi, Numeri, Fukurami 값을 보였으며, 종합태 값은 비슷하게 나타났다. NaOH 전처 리에 의해 수지부착량은 감소하였으나 감량률은 증가하였으며, DP성/물성은 더 낮게 나타났다. NaOH 전처리에 의해 인장선형성, 인장에너지, 압축 레질리언스, 전단 및 굽힘특성은 증가하였으나 인장레질리언스와 압축선형성, 압축에너지, 표면특성은 감소하였다. NaOH 전처리한 경우 Koshi는 증가하였고, Numrei와 Fukuramil는 감소하였으며, 종합태 값은 가장 낮았다. 처리한 시료들은 각각 다른 감성과 촉감을 나타냈다.

• Journal of the Korean Chemical Society
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• v.38 no.7
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• pp.473-479
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• 1994

Tungsten thin film was deposited on p-(100) silicon substrate by using the LPCVD(low pressure chemical vapor deposition) technique. $WF_6$ was used as a source gas for tungsten and $SiH_4$ was used as a reducing gas for $WF_6$. Tungsten thin film was deposited by either SiH4 or Si substrate reduction of $WF_6$ under cold-wall condition and it was deposited by $SiH_4$ reduction of $WF_6$ under hot-wall condition. The crystal structure of deposited thin film under both conditions were identified to be bcc (body centered cubic). The physical and electrical properties of deposited thin films were investigated. The deposited film under hot-wall condition changed to $WSi_2$ film by the annealing under $800^{\circ}C.$ From the experimental results and theoretical considerations, the change of the crystal structure of the thin film by annealing was discussed. $WSi_2$ thin film, which was known to have good compatibility with Si substrate, could be produced under hot-wall condition although the film properties were superior under cold-wall condition.

• Journal of Electrical Engineering and Technology
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• v.11 no.4
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• pp.869-877
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• 2016

Necessity has compelled man to improve upon the art of tapping wind energy for power generation; an apt reliever of strain exerted on the non-renewable fossil fuel. The power generation in a Wind Farm (WF) depends on site and wind velocity which varies with time and season which in turn determine wind power modeling. It implies, the development of an accurate wind speed model to predict wind power fluctuations at a particular site is significant. In this paper, Box-Jenkins ARIMA (Auto Regressive Integrated Moving Average) time series model for wind speed is developed for a 99MW wind farm in the southern region of India. Because of the uncertainty in wind power developed, the economic viability and reliability of power generation is significant. Life Cycle Costing (LCC) method is used to determine the economic viability of WF generated power. Reliability models of WF are developed with the help of load curve of the utility grid and Capacity Outage Probability Table (COPT). ARIMA wind speed model is used for developing COPT. The values of annual reliability indices and variations of risk index of the WF with system peak load are calculated. Such reliability models of large WF can be used in generation system planning.

• Journal of the Korean Society of Food Culture
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• v.36 no.6
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• pp.640-648
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• 2021

In this study, when manufacturing Yakgwa, 0, 25, or 50% of embryonic rice flour (ERF) was substituted for wheat flour (WF) to make the dough. After making Yakgwa by hot air frying (HF) or deep-fat frying (DF) methods, physicochemical characterization and acceptance tests were conducted. ERF had a higher water-binding capacity and a lower fat-binding capacity than WF (p<0.05). Yakgwa prepared by HF had lower crude fat contents, peroxide values, and expansion rates, but higher hardnesses, lightnesses, and rednesses (p<0.05) than that prepared by DF. Higher ERF substitution ratios reduced acid values and expansion rates and increased hardness (p<0.05). Acceptance testing showed 0% ERF Yakgwa prepared by HF had a significantly higher acceptance than Yakgwa prepared by DF. HF was found to have a positive effect on product acceptability. Yakgwa prepared with the DF method by substituting WF with ERF resulted in better flavor and overall acceptability than Yakgwa prepared with WF alone (p<0.05).

• Journal of Korean Clinical Nursing Research
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• v.22 no.1
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• pp.20-27
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• 2016

Purpose: The purpose of this study was to compare the fluid intake and output (I&O) measurement methods in order to figure out more effective and easier method for medical patients Methods: 71 hospitalized patients participated in the study. In "liquid only (LO)" method, all amount of water was summed up including any liquid types of food and IV fluids. In "whole food(WF) intake," all liquid and solid food intake and IV fluids were added up. Results: The average amount of fluid intake was 2105.29 ml for LO method and 2523.54 ml for WF method. The average amount of fluid output was 2148.98 ml. The intra-class correlations (ICC) between the intake and output measures by the two different methods was 0.803 and 0.826, respectively. The correlation between the differences of intake/output and body weight change in two different methods was r=.347 (p=.003), and r=.376 (p=.001), respectively. Conclusion: The results of this study indicate that both LO and WF method may be useful in monitoring patients' fluid balance. Given the comparability of using LO over WF, it is suggested that measuring just liquid only intake as the indicator of patient's intake is applicable in clinical setting.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.12
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• pp.69-76
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• 1993

The statistical methodology using RSM (response surface method) was used too ptimize the deposition conditions of selective CVD tungsten process for improving the deposition rate and the adhesion property. Temperature, flow rate of SiH$_4$ and WF$_6$ and H$_2$ and Ar carrier gases were chosen for the deposition variables and process characteristics due to carrier gas were intensively investigated. It was observed that temperature was the main factor influencingthe deposition rate in the case of H$_2$ carrier gas while the reactant ratio, $SiH_{4}/WF_{6}$, had the principal effect on the deposition rate in the case of Ar carrier gas. The increased deposition rate and the good adhesion to Si were obtained under Ar carrier gas compared to H$_2$ carrier gas. The optimum conditions for deposition rate and antipeeling property were found to be the temperature range of 300~32$0^{\circ}C$ and the reactant ratio, $SiH_{4}/WF_{6}$, of 0.5~0.6.