• Title/Summary/Keyword: Verneuil method

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Synthesis of $TiO_2$ Powders and Growth of Rutile by Verneuil Method ($TiO_2$분말 제조 및 Verneuil 법에 의한 Rutile 단결정 성장)

  • 전형탁;김복희;손선기;오근호
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.2 no.1
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    • pp.60-69
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    • 1992
  • Fine $TiO_2$ powders were synthesized from ammonium titanium sulphate which produced from $TiCI_4$, and$(NH_4)_2$ SO. solution. Rutile single crystal were grown by the verneuil method with anatase powders and investigated the property of rutile crystal. The optimun growing conditions were as follows $\cdot$The ratio of hydrogen gas and oxygen gas; 3: 1 $\cdot$Growing temperature: $1900^{\circ}C$ $\cdot$The feeding rate of powders: 10g/hr

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Growth of Sapphire Crystals by Verneuil Method (Verneuil법에 의한 Sapphire단결정 성장)

  • Joo, K.;Bae, S.Y.;Choi, J.K.;Orr, K.K.;Son, S.K.;Beun, Y.J.;Chun, H.T.
    • Journal of the Korean Ceramic Society
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    • v.25 no.5
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    • pp.495-501
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    • 1988
  • Verneuil method uses oxyhydrogen flame for its heat source. This method was used to grow corundum monocrystals. Parametersof this method are feeding rate, gas pressure, lowering rate and growth axis. These parameters were examined. Crystals's qualities and shapes are affected by these parameters. Crystals having good qualities and shape were grown under the conditions that feeding rate, 0.2∼0.5g/min, lowering rate, 10∼20mm/hr ; gas pressure, 3∼4psi ; growth axis was shifted 60 degrees from c axis.

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$SrTiO_3$ Single Crystal Growth by Verneuil Method (Verneuil법에 의한 $SrTiO_3$ 단결정 성장)

  • Choi, I.S.;Cho, H.;Choi, J.K.;Orr, K.K.
    • Journal of the Korean Ceramic Society
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    • v.29 no.9
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    • pp.689-694
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    • 1992
  • Strontium Titanate single crystal is grown by Verneuil method. Feed materials were prepared by coprecipitation method which started with Sr(NO3)2 and TiCl4. SrTiO3 can not be grown from feed materials having the stoichiometric components due to volatilization of SrO, when the powder added more 3 wt% SrO used, the crystal can be grown. Growth conditions that the pressure of oxygen and hydrogen gas was 5 psi, the flow rate of oxygen and hydrogen was 7.3 and 30ι/min respectively, the growth rate was 20 mm/hr were optimum. The grown single crystal has the diameter of 10~15 mm and its length is 30~40 mm. The grown crystal was deep brown color and somewhat transparent. The color of grown crystal was lightened after annealing.

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$TiO_2$ Doped Sapphire Single Crystal Growth by Verneuil Method and Study for Defects (Verneuil법에 의한 $TiO_2$를 첨가한 Sapphire 단결정 성장과 결함에 관한 연구)

  • Cho, H.;Choi, J.K.;Chun, B.S.;Orr, K.H.;Park, H.S.
    • Journal of the Korean Ceramic Society
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    • v.31 no.12
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    • pp.1423-1428
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    • 1994
  • TiO2 doped sapphire single crystals were grown by Verneuil method. The doping amount of TiO2 to Al2O3 were varied 0.1, 0.2, 0.3 wt% respectively. The grown crystals have reddish color and somewhat transparent. Optimum growth condition was established by changing growth rate and gas flow ratio. Growth condition are as follows; The flow rate range of oxygen ws 5.0~7.3 ι/min and that of hydrogen was 16~25ι/min and average growth rate was 6~8mm/hr. The basic cause of color appearence and defects in crystal were studied.

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SiO2 Doped Sapphire single Crystal Growth by Verneuil Method (Verneuil법에 의한 $SiO_2$를 첨가한 Sapphire 단결정 성장)

  • Cho, H.;Orr, K.K.;Choi, J.K.;Park, H.S.
    • Journal of the Korean Ceramic Society
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    • v.29 no.10
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    • pp.822-826
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    • 1992
  • SiO2 doped sapphire single crystals were grown by Verneuil method using feed material which prepared by adding SiO2 in Al2O3. Crystal growing were attempted with varing doping amount of SiO2 from 0.01 to 1.0 wt% and when the doping amount of SiO2 were 0.01~0.04 wt%, single crystals could be attained. Starting materials for feed powder were 99.99% purity alumina and extra pure SiO2 powder. Mixing these two materials by wet milling for 24 hours and drying the mixture and then was calcined at 900~110$0^{\circ}C$ for 2~4 hours. The grown crystals had yellowish color and were somewhat transparent. During growing process the flow range of oxygen was 5~7.5ι/min and of hydrogen was 13~25ι/min, the average growth rate was 7.0~11 mm/hr. The pressure of gases were fixed at 5psi. The color of crystal was appeared and mechanical property of sapphire was developed by doping of SiO2.

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Growth of long persistent $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ phosphor single crystals by the Verneuil method (베르누이법 의한 장잔광성 $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ 단결정 성장)

  • Nam, Kyung-Ju;Choi, Jong-Keon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.6
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    • pp.225-228
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    • 2005
  • We have grown the long persistent $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ phosphor single crystal by Verneuil method. The obtained single crystals were long persistent phosphorescence peaking at ${\lambda}=520nm$ with a size of about 5 mm diameter, 55 mm length. The melting temperature of $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ measured $T_{mp}=1968^{\circ}C$. The optimum composition was $SrCO_3:Al(OH)_3:Eu_2O_3:Dy_2O_3$ = 1 : 2 : 0.015 : 0.02. Flow rate of $H_2:O_2$ is about 4 : 1. Growthing rate is about 5 mm/hr. The spectra of the phosphorescence from the crystals are quite similar to those obtained with sintered powders used for luminous pigments. The crystalline structure of long persistent $SrAl_2O_4:Eu^{2+},\;Dy^{3+}$ phosphor single crystal was determined by X-ray diffraction.

Spinel$(MgAl_2O_4)$ single crystal growth by floating zone method (Floating zone 법에 의한 Spinel$(MgAl_2O_4)$단결정 성장)

  • Seung Min Kang;Byong Sik Jeon;Keun Ho Orr
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.4 no.3
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    • pp.325-335
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    • 1994
  • The spinel $MgO.Al_20_3$ single crystals were grown by FZ (floating zone) method. Its melting point is about, $2135^{\circ}C$ and is important to the process of the growth from the melt. There have been some reports of the growth by Czochralski and Verneuil method. However, this study is the first trial to the spinel crystal with the application of FZ method. In this study, $MgAl_2O_4$ spinel crystals were grown by using FZ method which uses the ellipsoidal mirror furnace having infrared halogen lamps as a heat source. With dopants of transition metal ions, it was possible to melt the feed rod which does not absorb the infrared rays due to the transparent properties to infrared ray of spinel itself and the red, green and blue colored spinel single crystals could be grown more easily. As a conclusion, the purpose of this study is to find the spinel single crystal growth mechanism with respect to th growth interfaces and molten zone stability and to characterize the state of growth resulting from the concavity to the melt of interfaces.

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Fabrication of $Cr^{3+}$ doped sapphire single crystal by high temperature and pressure acceleration method (고온가압 확산법에 의한 $Cr^{3+}$ 고용 사파이어 단결정의 제조)

  • 최의석;정충호;김무경;김형태;홍정유;김유택
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.1
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    • pp.29-33
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    • 1999
  • Transition metallic $Cr^{3+}$ ion was diffused in white sapphire {0001}, ${10\bar{1}0}$ crystal plane which were grown by the Verneuil, it enhanced and changed the physical, electrical and optical properties of sapphires. After mixing the metallic oxide and metal powder, it were used for diffusion powder. When it was used the mixing powder of metal and metallic oxide, the dopping was slowly progressed and it needed the longer duration time and higher temperature, relatively. Metallic powder was vapoured under $1{\times}10^{-4}$ torr of vacuum pressure at $2050^{\circ}C$, first step, it were kept by the diffusion condition of 6 atm of $N_{2}$ accelerating pressure at $2050~2150^{\circ}C$. Each surface density of sapphire crystal are 0.2254(c) and $0.1199\;atom/{\AA}^2(a)$. The color of the Cr-doped sapphires was changed to red. Dopping reaction was come out more deep in the plane of ${10\bar{1}0}$ than {0001}. It was speculated that the planar density was one of the factors to determine diffusion effect.

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Fabrication of transition metal doped sapphire single crystal by high temperature and pressure acceleration method

  • Park, Eui-Seok;Jung, Choong-Ho;Kim, Moo-Kyung;Kim, Yoo-taek;Hong, Jung-Yoo
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.06a
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    • pp.77-79
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    • 1998
  • Metallic chromium was diffused in the{0001},{1120} white sapphires which were grown by the Verneuil method to enhance the physical properties of the sapphires. Chromium metal vapour pressure and {{{{ { N}_{2 } }}}} pressure were kept by {{{{ { 1$\times$10}^{-4 } }}}} torr at 21 50 $^{\circ}C$ and 6 atm in the quartz-tube, respectively. The color do the Cr-doped sapphires was changed to light red. Chromium was diffused faster in the {1120} than 수 the {0001} plane. It was speculated that the planar density was one the factors determining diffusion coeffcient

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Fabrication of Transition Metal doped Sapphire Single Crystal by High Temperature and Pressure Acceleration Method

  • Park, Eui-Seok;Jung, Choong-Ho;Kim, Moo-Kyung;Kim, Hyung-Tae;Kim, Yoo-Taek;Hong, Jung-Yoo
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1998.09a
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    • pp.97-102
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    • 1998
  • Transition metal Cr3+ and Fe3+ ion was diffused in white sapphire {0001}, {1010} crystal plane which were grown by the Verneuil method. It enhanced and changed the physical, electrical and optical properties of sapphires. After mixing the metallic oxide and metal powder, it were used for diffusion. Metallic oxide was synthesized by precipitation method and it's composition was mainly alumina which doped with chromium or ferric oxide. In case using metallic oxide, the dopping was slowly progressed and it needed the longer duration time and higher temperature, relatively. Metallic powder was vapoured under 1x10-4 torr of vacuum pressure at 1900(iron metal) and 2050(chromium)℃, first step. Diffusion condition were kept by 6atm of N2 accelerating pressure at 2050∼2150℃. Each surface density of sapphire crystal are 0.225(c) and 0.1199atom/Å2(a). The color of the Cr-doped sapphires was changed to red. Dopping reaction was come out more deep in th plane of {1010} than {0001}. It was speculated that the planar density was one of the factors to determine diffusion effect.

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