• 제목/요약/키워드: Vacuum plasma

검색결과 1,750건 처리시간 0.057초

플라즈마 바이오과학 및 의학 (Plasma Bioscience and Medicines)

  • 최은하
    • 진공이야기
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    • 제2권4호
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    • pp.9-15
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    • 2015
  • Nonthermal bio-compatible plasma (bioplasma) sources and their characteristics operating at atmospheric pressure could be used for biological cell interactions, especially for plasma bioscience and medicines. The electron temperatures and plasma densities of this bioplasma are measured to be 0.7 ~ 1.8 eV and $(3-5){\times}10^{14-15}cm^{-3}$, respectively. Herein, we introduced general schematic view of the plasma-initiated ultraviolet photolysis of water inside the biological solutions or living tissue for the essential generation mechanism of the reactive hydroxyl radical [OH] and hydrogen peroxide [$H_2O_2$], which may result in apoptotic cell death in plasma bioscience and medicines. Further, we surveyed the various nonthermal bioplasma sources including plasma jet, micro-DBD (dielectric barrier discharge) and nanosecond discharged plasma. The diseased biological protein, cancer, and mutated cells could be treated by these bioplasma sources or bioplasma activated water to result in their apoptosis for new paradigm of plasma bioscience and medicines.

Feed Gas Dependent Nonthermal Plasma Interaction with Bio-organisms

  • Baik, Ku-Youn;Park, Gyung-Soon;Kim, Yong-Hee;Yoo, Young-Hyo;Lee, Jin-Young;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.174-174
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    • 2012
  • The nature of feed gas is essential for the active species formed in the nonthermal plasma jets, which would induce various biological phenomena. We investigated the different physiological effects of atmospheric pressure soft-plasma jets on Esherichia coli and blood cells according to the feed gas. Cell death rate, growth curve, membrane molecular changes and induced genes were examined. The relationship between cellular reactions and active species generated by discharge will be discussed.

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유도결합플라즈마 장비에서 Pulse Modulation Plasma의 전자온도와 플라즈마밀도 컨트롤에 관한 연구

  • 조태훈;윤명수;손찬희;김동진;남창길;전부일;조광섭;권기청
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.406-406
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    • 2012
  • 반도체 공정의 대부분은 plasma를 사용한 공정이 주를 이루고 있다. 이러한 공정에서 최근 선폭의 초 미세화가 진행되면서 pulse modulation plasma에 대한 관심을 가지게 되고 있다. Pulse modulation plasma는 RF 인가 시 일정 간격으로 on, off 시켜주게 된다. 이 때, chamber 내부에서 발생하는 plasma역시 on, off 되게 되는데 이러한 현상을 이용하면 plasma 내의 전자온도가 떨어져서 식각 공정 시 선택비의 개선을 기대할 수 있다. 실제 장비회사에서는 pulse를 이용하기 위한 장비개선 연구가 한창이다. 본 연구에서는 유도결합플라즈마 chamber에서 source와 bias에 RF pulse modulation plasma를 발생시켜 기존 CW (Continuous wave) 방전시킨 plasma의 밀도와 전자온도를 측정하여 차이를 비교, 분석 해보았다.

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An Indirect Method to Monitor Plasma Status in a Transformer Coupled Plasma

  • 유대호;안승규;김지훈;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.216-216
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    • 2011
  • There have been various direct or indirect methods to measure the characteristics of plasma. Comparing to direct method like Langmuir probe method, indirect measurements which give information as some external parameters like current, voltage, or phase are easier to obtain. In this research, an indirect method to measure averaged plasma density in a transformer coupled plasma(TCP) has been proposed and evaluated. With a simple analytic model connecting electrical characteristics to plasma impedance, direct measurement via double Langmuir probe has been performed. This result may play a meaningful role to diagnose TCP or similar plasma sources

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Plasma Engineering for Nano-Materials

  • Kim, Seong-In;Shin, Myoung-Sun;Son, Byung-Koo;Song, Seok-Kyun;Choi, Sun-Yong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.79-79
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    • 2012
  • A high temperature and a low temperature plasma process technologies were developed and demonstrated for synthesis, hybrid formation, surface treatment and CVD engineering of nano powder. RF thermal plasma is used for synthesis of spherical nano particles in a diameter ranged from 10 nm to 100 nm. A variety of nano particules such as Si, Ni, has been synthesized. The diameter of the nano-particles can be controlled by RF plasma power, pressure, gas flow rate and raw material feed rate. A modified RF thermal plasma also produces nano hybrid materials with graphene. Hemispherical nano-materials such as Ag, Ni, Si, SiO2, Al2O3, size ranged from 30 to 100 nm, has been grown on graphene nanoplatelet surface. The coverage ranged from 0.1 to 0.7 has been achieved uniformly over the graphene surface. Low temperature AC plasma is developed for surface modification of nano-powder. In order to have a three dimensional and lengthy plasma treatment, a spiral type of reactor has been developed. A similar plasma reactor has been modfied for nano plasma CVD process. The reactor can be heated with halogen lamp.

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Analysis of characteristics of discharge in liquid

  • Kim, Ju-Sung;Min, Boo-Ki;Hong, Young-June;Kang, Seong-Oun;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.209.2-209.2
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    • 2016
  • Up to now, Plasma applications are thought as a leading technology in industrial, chemical and even medical and biological field. Especially, Due to direct discharge in liquid with reaction in ambient solution, plasma in liquid is useful plasma technology. Such as electro-surgery, water purification, radical generation for synthesis. For using those plasma applications efficiently, plasma characteristics should be understood in advance. But discharge in liquid is not much well-known about its characteristics. And plasma discharge in solution is difficult to generate and analysis due to electrolysis, vaporization and radical generation. So, We make stable plasma discharge in solution(saline 0.9%) without input gas. We also analyze new type of plasma source in thermal and electrochemical view. And we check characteristics of plasma in liquid. For example, plasma density and radical density(OH) with optical emission, thermal energy with thermometer, electrical energy with oscilloscope and so on. And we try to explain the bubble and plasma formation with circuit analysis.

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Role of Non-Thermal DBD Plasma on Cell Migration and Cell Proliferation in Wound Healing

  • Ali, Anser;Lee, Seung Hyun;Kim, Yong Hee;Uhm, Han Sup;Choi, Eun Ha;Park, Bong Joo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.526-526
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    • 2013
  • Plasma technology isbeing developed for a range of medical applications including wound healing. However, the effect of plasma on many cells and tissues is unclear. Cell migration and cell proliferation are very important biological processes which are affected by plasma exposure and might be a potential target for plasma therapy during wound healing treatment. In this study, we confirmed the plasma exposure time and incubation time after plasma treatment in skin fibroblast (L-929 cells) to evaluate the optimal conditions forplasma exposure to the cell in-vitro. In addition, we used a scratch method to generate artificial wound for evaluating the cell migration by plasma treatment. Where, the cells were treated with plasma and migration rate was observed by live-cell imaging device. To find the cell proliferation, cell viability assay was executed. The results of this study indicate the increased cell proliferation and migration on mild plasma treatment. The mechanisms for cell migration and cell proliferation after plasma treatment for future studies will be discussed.

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Multi-hole RF CCP 방전에서 방전 주파수가 미치는 영향

  • 이헌수;이윤성;서상훈;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.145-145
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    • 2011
  • Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

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