• Title/Summary/Keyword: Vacuum arc

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EFFECT OF MAGNETIC FIELD STRUCTURE NEAR CATHODE ON THE ARC SPOT STABILITY OF FILTERED VACUUM ARC SOURCE OF GRAPHITE (자장 여과 진공 아크 소스에서 음극 부근의 자기장에 따른 아크 스팟 안정성 연구)

  • 김종국;이광렬;은광용;정기형
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.138-138
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    • 1999
  • 자장 여과 진공 아크법(Filtered Vacuum Arc :FVA)에 의해 증착된 비정질 다이아몬드 박막은 기계적, 광학적 특성이 매우 우수하여 많은 연구자들의 관심의 대상이 되어 왔다. 그러나 아크의 불안정성은 자장 여과 아크 소스의 연속적인 운전을 제한하고, 결과적으로 낮은 생산성을 가져왔다. 본 연구에서는 음극의 형태 및 음극 부근에서의 자기장의 구조를 음극 부식 거동의 관점에서 수치모사 및 실험을 통해서 조사하였다. 소스 전자석과 인출 전자석의 자극 방향이 평행하게 된 구조에서 (magnetic mirror configuration), 음극 후면에 반대 방향의 자극을 가지는 영구자석을 돔으로서 아크 불안정성을 억제할 수 있었다. 또한 소스 전자석에 진동하는 전류를 인가함으로써 아크 스팟의 운동 면적을 효과적으로 확장할 수 있었다. 시간 변화에 따른 빔 전류의 변화로부터 테이프형 음극이 우물형 음극에 비하여 더 안정하다는 것을 확인하였다. 진동하는 소스 전자석의 전류와 직경 80mm의 테이퍼형 음극을 사용하여, 아크 전류 60A에서 약 2000분 동안 사용하였으며, 이때 부식된 부피는 사용 가능한 음극 부피의 약 90%였다. 그리고 약 350mA의 안정한 빔 전류를 현재의 조건에서 얻었다.

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Study on the deposition rate and vapor distribution of Al films prepared by vacuum evaporation and arc-induced ion plating (증착방법에 따른 Al 피막의 증착율 및 증기분포에 관한 연구)

  • 정재인;정우철;손영호;이득진;박성렬
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.207-215
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    • 2000
  • Al films on cold-rolled steel sheet have been prepared by vacuum evaporation and arc-induced ion plating, respectively, and the evaporation rate and vapor distribution (thickness distribution over the substrate) have been investigated according to deposition conditions. The arc-induced ion plating (AIIP) method have been employed, which makes use of arc-like discharge current induced by ionization electrode located near the evaporation source. The AIIP takes advantage of high ionization rate compared with conventional ion plating, and can be carried out at low pressure of less than $10^{-4}$ torr. Very high evaporation rate of more than 2.0 mu\textrm{m}$/min could be achieved for Al evaporation using alumina liner by electron beam evaporation. The geometry factor n for the $cos^{n/\phi}$ vapor distribution, which affects the thickness distribution of films at the substrate turned out to be around 1 for vacuum evaporation, while it features around 2 or higher for ion plating. For the ion plated films, it has been found that the ionization condition and substrate bias are the main parameters to affect the thickness distribution of the films.

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Arc Ion Plating Deposition System의 Bias 종류에 따른 TiN 박막의 특성평가

  • Kim, Wang-Ryeol;Park, Min-Seok;Kim, Dae-Yeong;Kim, Hyeon-Seung;Gwon, Min-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.208-208
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    • 2012
  • 최근 환경문제가 많이 제기되면서 친환경적 운송수단인 자전거 개발과 관련하여 다양한 기술개발이 이루어지고 있다. 그 중 고부가가치의 서스펜션 포크의 프레임에 고기능성 표면처리로 Arc ion plating deposition system (AIPDS)을 이용하여 부식, 내마모 특성이 뛰어난 TiN 박막을 증착시켰다. AIPDS는 기존의 arc system과 달리 다원계 소재 코팅 공정조건 확립을 위하여 chamber wall에 2개의 rectangular type sputter source를 장착하고 소재의 pre-treatment 용 linear type ion source를 설치하였다. 장비의 Chamber 중앙에는 pipe형 arc cathode를 설치하였으며, 그 주위를 anode 역할을 하는 copper 코일로 감아 이는 발생한 arc를 target인 cathode 축을 중심으로 방향성을 가지고 회전하여 진행 할 수 있도록 유도 하였다. 이 시스템에서 증착된 TiN 박막은 bias 전압 변화에 따른 박막의 구조 및 물성을 평가하였다. XRD 장비를 통하여 TiN 박막의 상분석을 진행하였고, 마모테스터, 원자현미경, 마이크로 비커스 경도기 등을 이용하여 기계적 특성을 평가하였다.

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Changes of Electrical Conductivity and Temperature Caused by Cathode Erosion in a Free-Burning Argon Arc

  • Jeon, Hong-Pil;Lee, Jong-Cheol
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.255.2-255.2
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    • 2014
  • Electrode erosion is indispensable for atmospheric plasma systems, as well as for switching devices, due to the high heat flux transferred from arc plasmas to contacts, but experimental and theoretical works have not identified the characteristic phenomena because of the complex physical processes. Our investigation is concerned with argon free-burning arcs with anode erosion at atmospheric pressure by computational fluid dynamics (CFD) analysis. We are also interested in the energy flux and temperature transferring to the anode with a simplified unified model of arcs and their electrodes. In order to determine two thermodynamic quantities such as temperature and pressure and flow characteristics we have modified Navier-Stokes equations to take into account radiation transport, electrical power input and the electromagnetic driving forces with the relevant Maxwell equations. From the simplified self-consistent solution the energy flux to the anode can be derived.

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Microstructure and Tribological Properties of Ti-Si-C-N Nanocomposite Coatings Prepared by Filtered Vacuum Arc Cathode Deposition

  • Elangovan, T.;Kim, Do-Geun;Lee, Seung-Hun;Kim, Jong-Kuk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.54-54
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    • 2011
  • The demand for low-friction, wear and corrosion resistant components, which operate under severe conditions, has directed attentions to advanced surface engineering technologies. The Filtered Vacuum Arc Cathode Deposition (FVACD) process has demonstrated atomically smooth surface at relatively high deposition rates over large surface areas. Preparation of Ti-Si-C-N nanocomposite coatings on (100) Si and stainless steel substrates with tetramethylsilane (TMS) gas pressures to optimize the film preparation conditions. Ti-S-C-N coatings were characterized using X-ray diffraction, X-ray photoelectron spectroscopy, transmission electron microscopy, nanoindentation, Rockwell C indentation and ball-on-disk wear tests. The XRD results have confirmed phase formation information of TiSiCN coatings, which shows mixing of TiN and TiC structure, corresponding to (111), (200) and (220) planes of TiCN. The chemical composition of the film was investigated by XPS core level spectra. The binding energy of the elements present in the films was estimated using XPS measurements and it shows present of elemental information corresponding to Ti2p, N1s, Si 2p and C1. Film hardness and elastic modulus were measured with a nano-indenter, and film hardness reached 40 GPa. Tribological behaviors of the films were evaluated using a ball-on-disk tribometer, and the films demonstrated properties of low-friction and good wear resistance.

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Synthesis of Few-layer Graphene Film on a Ni Substrate by Using Filtered Vacuum Arc Source Method

  • Kim, Chang-Su;Seo, Ji-Hun;Gang, Jae-Uk;Kim, Do-Geun;Kim, Jong-Guk;Lee, Hyeong-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.157-157
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    • 2011
  • Graphene has generated significant interest in the recent years as a functional material for electronics, sensing, and energy applications due to its unique electrical, optical, and mechanical properties. Much of the considerable interest in graphene stems from results obtained for samples mechanically exfoliated from graphite. Practical applications, however, require reliable and well-controlled methods for fabrication of large area graphene films. Recently high quality graphene layers were fabricated using chemical vapor deposition (CVD) on nickel and copper with methane as the source of the carbon atoms. Here, we report a simple and efficient method to synthesize graphene layers using solid carbon source. Few-layer graphene films are grown using filtered vacuum arc source (FVAS) technique by evaporation of carbon atom on Ni catalytic metal and subsequent annealing of the samples at 800$^{\circ}$C. In our system, carbon atoms diffuse into the Ni metal layer at elevated temperatures followed by their segregation as graphene on the free surface during the cooling down step as the solubility of carbon in the metal decrease. For a given annealing condition and cooling rate, the number of graphene layers is easily controlled by changing the thickness of the initially evaporated amorphous carbon film. Based on the Raman analysis, the quality of graphene is comparable to other synthesis methods found in the literature, such as CVD and chemical methods.

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Adhesion of Diamond-like Carbon Thin Film Prepared by Filtered Vacuum Arc: The Effect of Substrate Bias Voltage (Filtered Vacuum Arc를 이용한 WC-Co상 DLC 박막 증착에서의 기판 전압에 따른 밀착력 특성 평가)

  • Kim, Gi-Taek;Yang, Won-Gyun;Lee, Seung-Hun;Kim, Do-Geun;Kim, Jong-Guk
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2013.05a
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    • pp.214-214
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    • 2013
  • Diamond like carbon(DLC) 박막은 고경도, 저마찰, 내스크래치 특성을 요구하는 표면기술 응용분야에 널리 사용되며, 대면적 저가 코팅 방법 개발 및 물성 조절 기술이 요구된다. 본 연구에서는 Filtered Vacuum Arc (FVA)를 통해 증착되는 Hydrogen-free DLC 박막의 밀착력 제어를 위한 증착시 기판 전압에 따른 증착 및 밀착력 특성을 분석하였다. 기판전압이 0~-150 V 까지 변화함에 따른 스크래치 테스트 결과를 통해 최적 증착 조건을 도출하였다.

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Arc Extinguishing of a Vacuum Interrupter for an HTS First Peak Current Limiter (반주기내 한류성능을 위한 진공차단기의 아크소호)

  • Kim, W.S.;Park, C.R.;Hyun, O.B.;Kim, H.R.;Yim, S.W.;Yu, S.D.;Yang, S.E.
    • Progress in Superconductivity
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    • v.12 no.1
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    • pp.23-26
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    • 2010
  • A double line commutation (DLC) type SFCL with first peak limiting function has been proposed for ideal fault current limiting operation. Very fast switching (commutation) without any arc or high voltage problems for any kind of switching device is needed for the first peak current limiting. We've tried to find suitable conditions for a successful switching of a Vacuum Interrupter (VI) with HTS elements as a Peak Current limiting Resistance (PCR).