• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2018.06a
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• pp.55-55
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• 2018

Recently, amorphous oxides such as InGaZnO (IGZO) and InZnO (IZO) as a channel layer of an oxide TFT have been attracted by advantages such as high mobility, good uniformity, and high transparency. In order to apply such an amorphous oxide TFTs to a display, the stability in various environments must be ensured. In the InGaZnO which has been studied in the past, Ga elements act as a suppressor of oxygen vacancy and result in a decreased mobility at the same time. Previous studies have been showed that the InZnO, which does not contain Ga, can achieve high mobility, but has relatively poor stability under various instability environments. In this study, the TFTs using $IZO/Al_2O_3$ double layer structure were studied. The introduction of an $Al_2O_3$ interlayer between source/drain and channel causes superior electrical characteristics and electrical stability as well as reduced contact resistance with optimally perfect ohmic contact. For the IZO and $Al_2O_3$ bilayer structures, the IZO 30nm IZO channels were prepared at $Ar:O_2=30:1$ by sputtering and the $Al_2O_3$ interlayer were depostied with various thickness by ALD at $150^{\circ}C$. The optimal sample exhibits considerably good TFT performance with $V_{th}$ of -3.3V and field effect mobility of $19.25cm^2/Vs$, and reduced $V_{th}$ shift under positive bias stress stability, compared to conventional IZO TFT. The enhanced TFT performances are closely related to the nice ohmic contact properties coming from the defect passivation of the IZO surface inducing charge traps, and we will provide the detail mechanism and model via electrical analysis and transmission line method.

• Korean Journal of Materials Research
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• v.27 no.4
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• pp.216-220
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• 2017

The effect of electron beam (EB) irradiation on the electrical properties of Zn-Sn-O (ZTO) thin films fabricated using a sol-gel process was investigated. As the EB dose increased, the saturation mobility of ZTO thin film transistors (TFTs) was found to slightly decrease, and the subthreshold swing and on/off ratio degenerated. X-ray photoelectron spectroscopy analysis of the O 1s core level showed that the relative area of oxygen vacancies ($V_O$) increased from 10.35 to 12.56 % as the EB dose increased from 0 to $7.5{\times}10^{16}electrons/cm^2$. Also, spectroscopic ellipsometry analysis showed that the optical band gap varied from 3.53 to 3.96 eV with increasing EB dose. From the results of the electrical property and XPS analyses of the ZTO TFTs, it was found that the electrical characteristic of the ZTO thin films changed from semiconductor to conductor with increasing EB dose. It is thought that the electrical property change is due to the formation of defect sites like oxygen vacancies.

• Korean Journal of Materials Research
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• v.11 no.6
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• pp.483-491
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• 2001

The recovery and recrystallization behavior of cold-rolled Zr-based alloys during isothermal annealing at temperatures from $575^{\circ}C$ to $650^{\circ}C$ was studied by thermoelectric power and Vickers microhardness measurement. The recovery and recrystallization resulted in the increase of TEP doe to the extinction of lattice defect, vacancy, dislocation and stacking fault during isothermal annealing after cold- rolling. The completion of recrystallization could be determined much clearly by TEP behavior than by microhardness change in Zr-based alloys. Especially, the recovery and recrystallization were classified separately by TEP behavior in Zr-0.4Nb-xSn alloys. From the analysis of TEP behavior and microhardness, the addition of Sn caused to form the interaction between stain field and dislocation, which resulted in the delay of recovery in Zr-based alloys. The precipitation due the addition of Nb suppressed the grain growth after recrystallization effectively in Zr-based alloys.

• Bulletin of the Korean Chemical Society
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• v.13 no.3
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• pp.248-252
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• 1992

$ZrO_2-dopedYb_2O_3solid$ solutions containing 1, 3, 5, 7 and 9 mol% $ZrO_2were$ synthesized from spectroscopically pure $Yb_2O_3$ and $ZrO_2$ powders and found to be rare earth C-type structure by XRD technique. Electrical conductivities were measured as a function of temperatures from 700 to $1050^{\circ}C$ and oxygen partial pressures from 1${\times}$$10^-5$ to 2${\times}$ $10^-1$atm. The electrical conductivities depend simply on temperature and the activation energies are determined to be 1.56-1.68 $_eV$. The oxygen partial pressure dependence of the electrical conductivity shows that the conductivity increases with increasing oxygen partial pressure, indicating p-type semiconductor. The $PO_2$ dependence of the system is nearly power of 1/4. It is suggested from the linearity of the temperature dependence of electrical conductivity and only one value of 1/n that the solid solutions of the system have single conduction mechanism. From these results, it is concluded that the main defects of the system are negatively doubly charged oxygen interstitial in low. $ZrO_2doping$ level and negatively triply charged cation vacancy in high doping level and the electrical conduction is due to the electronic hole formed by the defect structure.

• Journal of IKEEE
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• v.27 no.4
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• pp.556-560
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• 2023

In this study, the impact of Nitrogen implantation process on deep-level defects and lifetime in 4H-SiC Epi surfaces was comparatively analyzed. Deep Level Transient Spectroscopy (DLTS) and Time Resolved Photoluminescence (TR-PL) were employed to measure deep-level defects and carrier lifetime. As-grown Schottky Barrier Diodes (SBDs) exhibited energy levels at 0.16 eV, 0.67 eV, and 1.54 eV, while for implantation SBD, defects at 0.15 eV were observed. This indicates a reduction in defects associated with energy levels Z_1/2 and EH_6/7, known as lifetime killers, as impurities from nitrogen implantation replace titanium and carbon vacancies.

• Journal of the Korean Chemical Society
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• v.31 no.6
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• pp.491-497
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• 1987

$ThO_2-Tm_2O_3$ (TDT) solid solutions containing 1,3,5,8,10, and 15 mol% $Tm_2O_3$ were synthesized from spectroscopically pure $ThO_2$ and $Tm_2O_3$ polycrystalline powders. The TDT solid solutions were indentified to the fluorite structure by the X-ray powder technique. The values of the lattice parameter were decreased with increasing amount of $Tm_2O_3$ incorporated. But, there was no linearity for the samples containing 8, 10, and 15 mol% $Tm_2O_3$. It was concluded that these samples became incomplete solid solutions. From the intensity analyses of X-ray diffraction patterns, the residual factor was found below 0.13 even for the 15 mol% TDT system. lt was confirmed from the DTA and TGA analyses that any phase transitions did not occur under the experimental condition executed. Comparing the pycnometric density with the lattice parameter obtained from XRD, it was suggested that the predominant defect model be an oxygen vacancy.

• Journal of the Korean Chemical Society
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• v.31 no.4
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• pp.301-307
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• 1987

The electrical conductivity of highly pure polycrystalline sample of $La_2O_3$ has been measured at temperatures from $600^{\circ}C$ to $1,050^{\circ}C$ and oxygen pressure range of $1{\times}10^{-6}$ torr to $1{\times}10^2$ torr. The defect structure and semiconductor type are investigated by measuring the temperature and oxygen pressure dependences of electrical conductivity. Sintered $La_2O_3$ exhibits the electrical conductivities in the range of $1{\times}10^{-9}\;to\;1{\times}10^{-3}\;ohm^{-1}{\cdot}cm^{-1}$ under the above oxygen pressures. The oxygen pressure dependences on electrical conductivity are characterized by 5.3 at $1,000^{\circ}C$ and 5.7 at $700^{\circ}C$ and more higher values of 9∼14 below $700^{\circ}C$. The increase in n value with decreasing temperature indicates that a simple conduction mechanism does not exist in this material. The conduction carriers are not metal vacancy but oxygen ion at lower pressures. The conduction data indicate a significant ionic conduction at lower temperatures and electronic conduction at higher temperatures.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.5
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• pp.313-319
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• 2018

This study introduces a new investigation report on the microstructural and electrical property changes of $ZnO-Zn_2BiVO_6-Mn_3O_4$ (ZZMn), where 0.33 mol% of $Mn_3O_4$ and 0.5 mol% of $Zn_2BiVO_6$ were added to ZnO (99.17 mol%) as liquid phase sintering aids. $Zn_2BiVO_6$ contributes to the decrease of sintering temperatures by up to $800^{\circ}C$, and segregates its particles at the grain boundary, while $Mn_3O_4$ enhances ${\alpha}$, the nonlinear coefficient, of varistor properties up to ${\alpha}=62$. In comparison, when the sintering temperature is increased from $800^{\circ}C$ to $1,000^{\circ}C$, the resistivity of ZnO grains decreases from $0.34{\Omega}cm$ to $0.16{\Omega}cm$, and the varistor property degrades. Oxygen vacancy ($V_o^{\bullet}$) (P1, 0.33~0.36 eV) is formed as a dominant defect. Two different kinds of grain boundary activation energies of P2 (0.51~0.70 eV) and P3 (0.70~0.93 eV) are formed according to different sintering temperatures, which are tentatively attributed to be $ZnO/Zn_2BiVO_6$-rich interface and ZnO/ZnO interface, respectively. Accordingly, this study introduces a progressive method of manufacturing ZnO chip varistors by way of sintering ZZMn-based varistor under $900^{\circ}C$. However, to procure a higher reliability, an in-depth study on the multi-component varistors with double-layer grain boundaries should be executed.

• Journal of the Korean Chemical Society
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• v.25 no.4
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• pp.236-245
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• 1981

The electrical conductivities of oxidized pure and Ni-doped $SrTiO_3$ single crystals were measured as a function of the oxygen partial pressure($Po_2$) at temperature from 700 to $1200^{\circ}C$ and $Po_2$ of $10^{-8}$ to $10^{-1}$ atm. Plots of log ${\sigma}$ vs. 1/T at constant $Po_2$ were found to be linear, and the activation energies obtained from the slopes of these plots have an average value of 1.34 eV for oxidized pure and 1.06 eV for oxidized Ni-doped $SrTiO_3$ single crystals at $Po_2$'s between $10^{-8}$ to $10^{-1}$ atm. The log ${\sigma}$ vs. log $Po_2$ curves at constant temperature were found to be linear with an average slope of ${\frac{-1}{5.6}}\;{\sim}\;{\frac{-1}{6.2}}$ in the $Po_2$ ranges. From the agreement between experimental and theoretically predicted values for the electrical conductivity dependences on $Po_2$, an oxygen vacancy defect model was found applicable to oxidized pure and Ni-doped $SrTiO_3$ single crystals over the temperature range, 700~$1200^{\circ}C$. Conduction mechanisms were proposed to explain the dependences of electrical conductivity on temperature and $Po_2$.

• Journal of the Korean Chemical Society
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• v.31 no.5
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• pp.406-412
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• 1987

The electrical conductivities of ${\alpha}-Fe_2O_3$ containing 2.5 and 5.0mol% of cadmium were measured from 300 to $900^{\circ}C$ under oxygen pressures of 10$^{-7}$ to 10$^{-1}$ atmosphere. Plots of log ${\sigma}$ vs. 10$^3$/T show the extrinsic conductivity at oxygen pressure higher than $5{\times}10$^{-2}$atm. The transition points appear at about 550$^{\circ}$C and the activation energies are 1.34 eV for the intrinsic region and 0.50 eV for the extrinsic region on 5mol% Cd-doped ${\alpha}-Fe_2O_3$. The extrinsic conductivity disappears at oxygen partial pressures lower than $5{\times}10$^{-2}$ atm, and the intrinsic conductivity predominates. The electrical conductivities decrease with increasing mol% of cadmium doped. The predominant defect of ${\alpha}-Fe_2O_3$ doped with Cd is believed to be Fe${2+}$ interstitial for the intrinsic, however, oxygen vacancy predominates for the extrinsic region. The electrical conduction mechanisms are proposed and the conduction band model is suggested for the extrinsic region.