• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1588-1590
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• 2001

The voltage controlled ramp waveform(VCR) has recently been used in the reset period prior to addressing for plasma display. However, in this paper, the current controlled ramp waveform(CCR) which may prevent the oscillation of gap voltage cause current growth and decrease the background luminance has been suggested. As a result, in case of CCR method, the contrast ratio was about 14% increased compared with VCR method, whereas the addressing and sustainin discharge characteristics of CCR method were same with those of VCR method.

• International Journal of Air-Conditioning and Refrigeration
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• v.6
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• pp.36-44
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• 1998

R-410a and R-407c which have the best potential among R-22 alternatives were tested as drop-in refrigerants against a set of R-22 baseline tests. The performance evaluations were carried out in a psychometric calorimeter test facility using the residential spilt type air conditioner under the ARI rating conditions. Except the lubricant and hand-operated expansion valve, the other parts of the air conditioner were the same with the commercial system. Performance characteristics were measured; compressor power, capacity, VCR, mass flow rate and COP. The tests showed that R-407c can be directly charged into the current refrigeration system because its vapor pressure and other thermochemical properties are similar to those of R-22. However, it is required to change the volume flow rate of compressor in order to achieve the volumetric capacity of R-22. This results from its relatively small VCR and capacity. Meanwhile, R-410a has vapor pressure values too high to be substituted for the current system and this resulted relatively low COP of R-410a compared to that of R-22.

• Journal of the Korean Society for Heat Treatment
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• v.36 no.6
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• pp.374-381
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• 2023

This study develops and evaluates a deep learning model for predicting oxide and nitride layers based on plasma process data. We introduce a novel deep learning-based Varying Coefficient Regressor (VCR) by adapting the VCR, which previously relied on an existing unique function. This model is employed to forecast the oxide and nitride layers within the plasma. Through comparative experiments, the proposed VCR-based model exhibits superior performance compared to Long Short-Term Memory, Random Forest, and other methods, showcasing its excellence in predicting time series data. This study indicates the potential for advancing prediction models through deep learning in the domain of plasma processing and highlights its application prospects in industrial settings.

• Structural Engineering and Mechanics
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• v.90 no.1
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• pp.97-106
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• 2024

This paper presents a significant contribution to aided design by conducting an analytical examination of geometric links with the aim of establishing criteria for assessing an analogy measure of the extrinsic geometric and kinematic characteristics of the Variable Compression Ratio (VCR) engine with a Geared Mechanism (GBCM) in comparison to the existing Fixed Compression Ratio (FCR) engine with a Standard-Reciprocating Crankshaft configuration. Employing a mechanical approach grounded in projective computational methods, a parametric study has been conducted to analyze the kinematic behavior and geometric transformations of the moving links. The findings indicate that in order to ensure equivalent extrinsic behavior and maintain consistent input-output performance between both engine types, precise adjustments of intrinsic geometric parameters are necessary. Specifically, for a VCR configuration compared to an FCR configuration, regardless of compression ratio and gearwheel radius, for the same crankshaft ratios and stroke lengths, it is imperative to halve lengths of connecting rods, and crank radius. These insights underscore the importance of meticulous parameter adjustment in achieving comparable performance across different engine configurations, offering valuable implications for design optimization.

• Journal of the Korean Institute of Gas
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• v.27 no.2
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• pp.79-85
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• 2023

Recently, in the semiconductor process, large companies are seeking process changes from memory semiconductors to the foundry due to the increase in demand due to the 4th industry. industry is expanding. The characteristics of special gases and precursors, which are raw materials used to produce these semiconductor chips, are toxic, pyrophoric, inflammable, and corrosive. These semiconductor raw materials are operated in a closed system and do not leak to the outside during normal times, but when leaked, they spread to the inside of the gas box, and when proper ventilation is not provided inside the gas box, they spread to the outside, causing fires, explosions, or toxic substances. It can lead to major accidents such as leakage. Recently, there have been cases of accidents in which hazardous materials leaked from the closed system of the semi conductor process and spread to the inside and outside of the gas box. . In this study, we propose preventive measures based on the case of an accident in which raw material leaked from the VCR fitting, which is the connection part of the semiconductor raw material transfer pipe, and spread to the outside of the gas box.

• Journal of Korean Electronics
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• v.10 no.1
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• pp.43-51
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• 1990

• Journal of Korean Electronics
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• v.1 no.3
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• pp.54-70
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• 1981

• The Magazine of the IEIE
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• v.22 no.1
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• pp.47-55
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• 1995

• Journal of Korean Electronics
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• v.9 no.7
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• pp.46-50
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• 1989

• Journal of Korean Electronics
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• v.15 no.11
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• pp.79-85
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• 1995