• 한국분무공학회지
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• 제25권4호
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• pp.154-161
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• 2020

A single spray plume is the basic unit of the entire spray plume and is an important factor in understanding the spray characteristics. However, since the multi-hole GDI injector has a narrow spray angle, the superposition of the spray plumes occurs severely. Therefore, the spray uniformity and the spray atomization characteristics of a single spray plume were analyzed in this study using a single-hole GDI injector. Five single-hole GDI injectors with different nozzle hole diameters were used in the experiment. The uniformity of the spray was evaluated through the analysis of the spray pattern images. In addition, the atomization characteristics were compared using the diameter distribution of the spray droplets obtained using PDPA. As a result, the larger diameter of the nozzle hole, the less uniformity of the spray, and the injection pressure did not have a significant effect on the spray uniformity. It is judged that the surface roughness of the injector has a greater effect on spray uniformity than the diameter of the nozzle hole. Also, the size of the spray droplets increased sharply when the diameter of the nozzle hole was 230 ㎛.

• 설비공학논문집
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• 제28권1호
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• pp.35-41
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• 2016

With the assumption that the performance of a catalyst is guaranteed and that the performance of an SCR reactor is influenced by the uniformity of fluid flow into the catalyst, this study carried out a numerical analysis of flow uniformity, which is an important design factor in SCR reactors. CFD was used to grasp flow uniformity and flow characteristics inside the SCR reactor. As for the flow uniformity, analysis was carried out on the velocity and direction of the fluid flowing into the front of the first SCR reactor. Numerical analysis was carried out in terms of the area ratios of the mixing evaporator to the catalyst for 500 PS SCR, 1 : 1.9, 1 : 3.1, 1 : 4.5, and 1 : 7.0. The results showed that the larger the area ratio, the smaller the flow uniformity. On the basis of these results, the flow uniformity of the modified SCR reactor is 77%. A guidevane was installed to improve flow uniformity, and attempts were made to grasp the flow uniformity based on the shape of the guide vane. The shape of the guide vane was cylindrical, and numerical analysis was carried out for cases with two cylinders and three cylinders. As a result of the numerical analysis, it was found that while there was no great difference between 82.7% with two cylinders and 81.7% with three cylinders, the effects of the installation of the guide vane on the improvement of flow uniformity were indisputable.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.160-160
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• 2008

In practical etching process, etch ant is sprayed on the metal-deposited panel through nozzles collectively connected to the manifold and that panel is usually composed of many PCB(printed circuit board)'s. The etching uniformity, the difference between individual PCB's on the same panel, has become one of most important features of etching process. In this paper, the prediction of nozzle trajectory has been performed by the combination of algebraic formula and numerical simulation. With the pre-determined geometrical factors of nozzle distribution, the trajectories of individual nozzles were predicted with the change of process operational factors such as panel speed, nozzle swing frequency and so on. As results, two dimensional distribution of impulsive force of etchant spray which could be considered as a key factor determining the etching performance have been successfully obtained. Though only qualitative prediction of etching uniformity have been predicted by the process developed in this study, the expansion to the quantitative prediction of etching uniformity is expected to be apparent by this study.

• Journal of Korean Vacuum Science & Technology
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• 제3권2호
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• pp.101-106
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• 1999

The main consideration factor to design a magnetron of the sputtering system for TFT-LCD metallization is high sheet resistance (Rs) uniformity which is provided by the high target erosion and high current efficiency. The present study has developed a rectangular magnetron for TFT-LCD to bve considered full target erosion and high film uniformity. After an aluminum-2 at.% and alloy target was installed in a magnetron source and the film was deposited on the glass of 600${\times}$720 mm, the Rs uniformity of the deposited film was measured as functions of the magnet tilt and magnet scanning configuration. And the target erosion profile was observed with the target voltage. When sputtered at 4mtorr and 10kW, the magnet tilt for the high Rs uniformity of 8.38% was 7mm. The plasma voltage at the dwell home and end for full-face target erosion, when scanned the magnetron was 120% compared to the mean voltage of the other area.

• 반도체디스플레이기술학회지
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• 제11권2호
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• pp.63-69
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• 2012

As decreasing size of chips, the need of wafer level packaging is increased in semi-conductor and display industries. Temperature uniformity is a crucial factor in vacuum soldering process to guarantee quality of bonding between chips and wafer. In this paper, a stepwise iterative algorithm has been suggested to obtain output profile of each heat source. Since this algorithm is based on open-loop stepwise iterative experimental technique, it is easier to implement and cost effective than real time feedback controls. Along with some experiments, it was shown that the suggested algorithm can remarkably improve temperature uniformity of wafer during whole heating process compared with the ordinary manual trial-and error method.

• 한국대기환경학회지
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• 제26권2호
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• pp.234-240
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• 2010

Gas flow uniformity is an important factor to guarantee particle removal performance of electrostatic precipitators (EP), and the gas flow uniformity is evaluated by a fraction of standard deviation to the mean of gas flow distribution (%RMS) or a technical standard, ICAC EP-7, provided by The Institute of Clean Air Companies. In this study, relationship between the ICAC EP-7 and %RMS in evaluation of gas flow uniformity was investigated in terms of flow velocity. The maximum values of %RMS for gas velocity distribution of normal distribution has been obtained, and the maximum values of %RMS with gas velocity distribution satisfying ICAC EP-7 standards were also evaluated. With gas flow distribution obtained from CFD analysis and physical model test of real EP, %RMS values were calculated and it was tested if those gas flow distribution satisfy the criteria specified in ICAC EP-7. The %RMS values satisfying criteria of ICAC have been appeared to have similar values with %RMS values calculated with normal distribution of gas velocities.

• 한국초전도ㆍ저온공학회논문지
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• 제17권3호
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• pp.23-27
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• 2015

Quadruple magnet is an essential component for the accelerator, and the field uniformity in the good field region reflects the quality of quadruple magnet. In this paper, the total magnetic field B was separated into the coil-induced magnetic field $B_s$ and the iron-induced magnetic field $B_c$ to explain why the total magnetic field B has some inhomogeneity. Using Fourier analysis, harmonic components of $B_s$, $B_c$ and B have been analyzed at good field region, respectively. The harmonics of multipole magnet and Fourier analysis are helpful to show the uniformity of magnetic field. Several geometries of yoke and coils were defined to analyze the effect on field uniformity of an HTS quadruple magnet. By the analysis, it was found that the sixth harmonics which is the main factor of field inhomogeneity can be reduced to zero. It means that the sixth harmonics of the magnetic field B can be removed by adjusting the geometry of the magnet pole and the position of coils. We expect that this result can effectively improve the uniformity of an HTS quadruple magnet.

• 열처리공학회지
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• 제2권2호
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• pp.33-37
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• 1989

In order to improve hardness uniformity of standard-hardness blocks. experimental procedure was designed using Taguchi Method. For this purpose the following factors were studied: austenitizing temperature, tempering condition, grinding condition, subzero treatment, lapping time, $15{\mu}m$ polishing time, final polishing time. These factors were processed and then ten hardness values were measured on each specimen. SN (signal to noise) ratio for each condition was calculated with standard variations of these values. Finally, from the calculated value of ANOVA on SN ratios, the lapping time was found to be the main factor Better uniformity with longer lapping time implies that residual stress that was formed after quenching is a dominent parameter that affects on the uniformity of hardness. Therefore, step-quenching method was adapted to minimize the residual stress. By this modification of quenching procedure, the hardness uniformity was improved remarkably and the yield ratio was increased from 55% to 88%.

• 한국기계가공학회지
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• 제11권6호
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• pp.28-35
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• 2012

This study is on SCR reactor, NOx reduction system in Marine that has been an issue nowadays. Especially design data was obtained by numerical on flow uniformity that is one of the design factor in SCR reactor. Also pressure drop on catalyst size inserted into SCR reactor was compared by experiment and numerical analysis. S/W, numerical analysis used for this study was confirmed that the result of numerical analysis used STAR-CCM+, common use CFD code, pressure drop on catalyst is not big different from the result of numerical analysis. In addition, degree of uniformity of liquid on SCR reactor was over 0.9. Whereas it was assured that degree of uniformity of liquid was changed depends on the shape of pipe at the entrance of SCR.

• 한국광학회지
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• 제34권5호
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• pp.202-209
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• 2023

절대복사온도계의 분광 복사 휘도 감응도를 교정하기 위해 압축된 polytetrafluoroethylene (PTFE)과 반사봉을 사용하여 높은 공간 복사 휘도 분포를 가진 KRISS형 소형 적분구를 제작하였다. 이 적분구의 공간 복사 휘도 균일도는 ±0.009%로 지금까지 국외 표준기관들이 보고한 최고값보다 5배 높았다. 또한, 상용 제품인 소결된 PTFE 적분구의 공간 복사 휘도 균일도를 10배 향상시켰다.