• Title/Summary/Keyword: Uniform film

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COMPUTATIONAL ANALYSIS FOR IMPROVING UNIFORMITY OF $SNO_2$ THIN FILM DEPOSITION IN AN APCVD SYSTEM ($SnO_2$ 박막증착을 위한 APCVD Reactor 내 유량 균일도 향상에 대한 수치 해석적 연구)

  • Park, J.W.;Yoon, I.R.;Chung, H.S.;Shin, S.W.;Park, S.H.;Kim, H.J.
    • 한국전산유체공학회:학술대회논문집
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    • 2010.05a
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    • pp.567-570
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    • 2010
  • With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity

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A study on the thickness distribution and pattern deformation of films in vacuum-assisted thermoforming (열진공성형에서 발생하는 필름의 두께 분포와 패턴 변형에 관한 연구)

  • Seong, Gyeom-Son;Lee, Ho-Sang
    • Design & Manufacturing
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    • v.12 no.2
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    • pp.5-10
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    • 2018
  • Vacuum-assisted thermoforming is one of the critical steps for successful application of film insert molding(FIM) to parts of complex shape. In this study, the simulations and experiments of thermoforming processes were performed to investigate the effects of process conditions on thickness distribution and printed pattern deformation of films in vacuum-assisted thermoforming. The film thickness uniformity increased with decreasing film heating time, whereas it increased with increasing vacuum delay time. After thermoforming of films with uniform pattern space of 5mm, the maximum space was 9.432mm. Based on the simulation, a modified pattern was calculated to obtain uniform spaces after thermoforming. In the experiments for film with the modified pattern, the maximum space appeared 5.837mm. In, addition. the predicted patterns were in good agreement with the experimental results.

Resistance distribution in large area thin film type SFCLS (박막형 대면적 초전도 한류소자에서의 저항 분포)

  • 김혜림;최효상;현옥배
    • Progress in Superconductivity and Cryogenics
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    • v.4 no.1
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    • pp.89-93
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    • 2002
  • We investigated the resistance distribution n 4"diameter SFCLS. $YBa_2CU_3O_7$ films coated in-situ with a gold layer were patterned into 3 mm wide 142 cm long meander lines by Photolithography. The limiters were tested with simulated fault currents. The resistance was uniform all over the film except at the edge. At lower source voltages, CFCLs did not quench simultaneously and the resistance distribution was less uniform. Compared with 2" diameter SFCLS 4" SFCLS had similar values and time dependence of resistivity at similar electric fields The resistance distribution was more uniform in 4" SFCLS. The area at the edge where the distribution was not uniform was around 3 mm wide in SFCLs of both sizes. The experimental results were quantitatively explained with a heat transfer concept.

High aspect ratio Zinc Oxide nanorods for amorphous silicon thin film solar cells

  • Kim, Yongjun;Kang, Junyoung;Jeon, Minhan;Kang, Jiyoon;Hussain, Shahzada Qamar;Khan, Shahbaz;Yi, Junsin
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.235.2-235.2
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    • 2015
  • The front transparent conductive oxide (TCO) films must exhibit good transparency, low resistivity and excellent light scattering properties for high efficiency amorphous silicon (a-Si) thin film solar cells. The light trapping phenomenon is limited due to non-uniform and low aspect ratio of the textured glass [1]. We present the low cost electrochemically deposited uniform zinc oxide (ZnO) nanorods with various aspect ratios for a-Si thin film solar cells. Since the major drawback of the electrochemically deposited ZnO nanorods was the high sheet resistance and low transmittance that was overcome by depositing the RF magnetron sputtered AZO films as a seed layer with various thicknesses [2]. The length and diameters of the ZnO nanorods was controlled by varying the deposition conditions. The length of ZnO nanorods were varied from 400 nm to $2{\mu}m$ while diameter was kept higher than 200 nm to obtain different aspect ratios. The uniform ZnO nanorods showed higher haze ratio as compared to the commercially available FTO films. We also observed that the scattering in the longer wavelength region was favored for the high aspect ratio of ZnO nanorods and much higher aspect ratios degraded the light scattering phenomenon. Therefore, we proposed our low cost and uniform ZnO nanorods for the high efficiency of thin film solar cells.

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A Study for the fabrication of Au dot-arrays using porous alumina film (다공성 알루미나 박막을 이용한 Au dot-arrays의 제작에 관한 연구)

  • Jung, Kyung-Han;Park, Sang-Hyun;Shin, Hoon-Kyu;Kwon, Young-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.922-925
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    • 2003
  • The interest of self-organization materials that have uniform and regular structure in nano scale has been grown due to their utilization in various fields of nanotechnology. An attractive candidate among these materials is anodic aluminum oxide film, which are formed by anodization of aluminum in an appropriate acid solution. The anodic aluminum oxide film has a highly ordered porous structure with very uniform and nearly parallel pores that can be organized in an almost precise close-packed hexagonal structure. In this study, we attempt to make Au dot arrays, which were fabricated using anodic aluminum oxide film as an evaporation mask. The Au dot arrays have a uniform sized dots and spacing to its neighbors and the average diameter of Au dots is about 60 nm corresponding to them of the mask.

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Effect of polymer adsorption on film formation of silica/PVA suspension

  • Kim, Sun-Hyung;Sung, Jun-Hee;Ahn, Kyung-Hyun;Lee, Seung-Jong
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 2009.10a
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    • pp.79-84
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    • 2009
  • Understanding the polymer adsorption in particle/binder/solvent system is important to achieve successful film products. While most of the reported work has dealt with the suspension microstructure, a few studies have focused on film formation. We investigated the effect of adsorption on film formation through measurement of adsorption amount in suspension and stress development in drying film with respect to mixing time ($t_m$). All of the adsorption amount (PVA), characteristic stress ($\sigma_{ch}$) exhibited similarities expressed by the form of $1-e^{t_m/{\tau}}$. The porous and non-unifonn dried film at short tm became close-packed and uniform with longer $t_m$. We found that polymer adsorption plays the key role in film fonnation as it introduces steric repulsion in suspension and suppresses the flocculation during solvent evaporation. We also found that the mixing time for the saturated polymer adsorption is the important variable to acquire the consolidated and uniform film microstructure.

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An a-D film for flat panel displays prepared by FAD

  • Liu, Xianghuai;Mao, Dongsheng
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.7-14
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    • 1998
  • Details are given of an study of the characteristics of field-induced electron emission from hydrogen-free high $sp^3$ content(>90%) amorphous diamond (a-D) film deposited on heavily doped ($\rho$<0.01 $\Omega\cdot\textrm{cm}$) n-type monocrystalline Si(111) substrate. It is demonstrated that a-D film has excellent electron field emission properties. Emission current can reach 0.9 $\mu$A at applied field as low as 1 V/$\mu\textrm{m}$, and emission current density can be obtained about several mA/$\textrm{cm}^2$. The emission current is stable when the beginning current is at 50 $\mu$A within 72 hours. Uniform fluorescence display of electron emission from whole face of the a-D film under the electric field of 10~20 V/$\mu\textrm{m}$ was also observed. It can be considered that the contribution of excellent electron emission property results from its smooth, uniform, amorphous surface and high $sp^3$ content of the a-D films.

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Uniform Ag Thin Film Growth on an Sb-terminated Si(111) Surface

  • Park, Kang-Ho;Ha, Jeong-Sook;Lee, El-Hang
    • ETRI Journal
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    • v.19 no.2
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    • pp.71-81
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    • 1997
  • We report on the room-temperature-growth of highly uniform and ultrathin Ag films on Sb-terminated Si(111) surfaces, as evidenced from a scanning tunneling microscopy (STM) study in an UHV system. With predeposition of one monolayer (ML) of Sb, uniform growth of Ag islands was observed at room temperature. The Sb layer suppresses the surface diffusion of Ag atoms on Si surface and increases the Ag island density, and then the increased island density is believed to cause coalescence of Ag islands before the beginning of multilayer growth in higher coverages, resulting in the growth of atomically flat and uniform islands on the Sb surfactant layer.

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A Study on Correlation of Dry Film Thickness with Multi-Nozzle Spray Pattern of Shop Primer (Shop Primer의 다중 노즐 분사 스프레이 패턴 인자와 도막두께의 상관관계에 관한 연구)

  • Yun, Won-Jun;Choi, Min-Kyu;Ro, Young-Shic
    • Journal of the Society of Naval Architects of Korea
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    • v.47 no.5
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    • pp.743-749
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    • 2010
  • Multi-nozzle spray painting procedure of the inorganic zinc shop primer was established in order to obtain uniform film thickness. The shop primer paint prevents the corrosion of steel block during shipbuilding. When the dry film thickness of shop primer is insufficient, rust will be generated on the steel block. Otherwise, thick coating of shop primer may be a problem of weld defect. So, it is important to obtain the uniform film thickness of shop primer. The uniformity of dry film thickness is affected by spray speed, distance from spray gun to target surface and overlapping span of spray path. In order to uniformly maintain coating thickness of shop primer, the coating procedure was established based on the correlation of shop primer spray variables.

Fabrication of the Solution-Derived BiAlO Thin Film by Using Brush Coating Process for Liquid Crystal Device (브러쉬 코팅 공정을 이용한 용액 기반 BiAlO 박막의 제작과 액정 소자에의 응용)

  • Lee, Ju Hwan;Kim, Dai-Hyun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.34 no.5
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    • pp.321-326
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    • 2021
  • We fabricated BiAlO thin film by a solution process with a brush coating to be used as liquid crystal (LC) alignment layer. Solution-processed BiAlO was coated on the glass substrate by brush process. Prepared thin films were annealed at different temperatures of 80℃, 180℃, and 280℃. To verify whether the BiAlO film was formed properly, X-ray photoelectron spectroscopy analysis was performed on Bi and Al. Using a crystal rotation method by polarized optical microscopy, LC alignment state was evaluated. At the annealing temperature of 280℃, the uniform homogenous LC alignment was achieved. To reveal the mechanism of LC alignment by brush coating, field emission scanning electron microscope was used. Through this analysis, spin-coated and brush coated film surface were compared. It was revealed that physical anisotropy was induced by brush coating at a high annealing temperature. Particles were aligned in one direction along which brush coating was made, resulting in a physical anisotropy that affects a uniform LC alignment. Therefore, it was confirmed that brush coating combined with BiAlO thin film annealed at high temperature has a significant potential for LC alignment.